公开(公告)号：US6018395A

公开(公告)日：2000-01-25

申请号：US766928

申请日：1996-12-16

申请人： Makiko Mori ,  Shunichi Uzawa ,  Kunitaka Ozawa ,  Hirohisa Ohta ,  Noriyuki Nose

发明人： Makiko Mori ,  Shunichi Uzawa ,  Kunitaka Ozawa ,  Hirohisa Ohta ,  Noriyuki Nose

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/70

摘要： An alignment method useable with an original having a pattern and a substrate having a surface area on which the pattern of the original is printed. The alignment method comprises detecting plural marks, calculating plural times, the amount of rotational deviation on the basis of different combinations of marks, calculating the quantity of rotational correction of the original and the substrate by using the computed rotational deviations, and aligning on the basis of the calculated quantity of the rotational deviation.

摘要翻译： 可用于具有图案的原稿的对准方法和具有印刷原稿图案的表面积的基板。 对准方法包括基于不同的标记组合来检测多个标记，多次计算旋转偏差量，通过使用计算出的旋转偏差来计算原件和基板的旋转校正量，并基于 的计算量的旋转偏差。

公开(公告)号：US5142156A

公开(公告)日：1992-08-25

申请号：US588947

申请日：1990-09-27

申请人： Kunitaka Ozawa ,  Shunichi Uzawa ,  Hirohisa Ohta ,  Makiko Mori ,  Noriyuki Nose

发明人： Kunitaka Ozawa ,  Shunichi Uzawa ,  Hirohisa Ohta ,  Makiko Mori ,  Noriyuki Nose

IPC分类号： G03F7/20 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70883 ,  G03F9/70

摘要： An alignment method for use in an exposure apparatus for printing a pattern of an original onto different surface areas of a substrate, the alignment method comprising the steps of: providing alignment marks around the pattern of the original and placing the original on an original supporting stage; providing a reference mark on an X-Y stage for supporting the substrate and being movable in X and Y directions, and moving the X-Y stage so as to place the reference mark at those positions, in sequence, which correspond to the alignment marks of the original, respectively, and which are preset in respect to a stage coordinate system; detecting, in sequence, positional errors of the alignment marks of the original with respect to the corresponding set positions, respectively, by using the reference mark and through the movement of the X-Y stage, wherein the positional errors are detected by use of positional error detectors which are provided to be associated with the alignment marks of the original, respectively; calculating a rotational error of the original with respect to the stage coordinate system, in .theta. direction, by using the positional errors; and rotationally moving the original supporting table in the .theta. direction so as to correct the rotational error.

公开(公告)号：US5182615A

公开(公告)日：1993-01-26

申请号：US563420

申请日：1990-08-07

申请人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Nobutoshi Mizusawa ,  Shigeyuki Suda ,  Noriyuki Nose ,  Takao Kariya

发明人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Nobutoshi Mizusawa ,  Shigeyuki Suda ,  Noriyuki Nose ,  Takao Kariya

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70691 ,  G03F9/7049

摘要： An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.

公开(公告)号：US5161176A

公开(公告)日：1992-11-03

申请号：US802705

申请日：1991-12-06

申请人： Ryuichi Ebinuma ,  Kunitaka Ozawa ,  Takao Kariya ,  Shunichi Uzawa ,  Noriyuki Nose

发明人： Ryuichi Ebinuma ,  Kunitaka Ozawa ,  Takao Kariya ,  Shunichi Uzawa ,  Noriyuki Nose

IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70066

摘要： An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.

摘要翻译： 曝光装置包括用于通过掩模曝光晶片的光源; 遮光装置可移动并且有效地阻挡来自光源的光以限制曝光区域; 用于检测掩模和晶片之间的位置偏差的位置偏差检测系统; 以及驱动控制系统，用于基于来自位置偏差检测系统的检测信号移动遮光装置以执行其位置控制。

公开(公告)号：US5459573A

公开(公告)日：1995-10-17

申请号：US291747

申请日：1994-08-17

申请人： Naoto Abe ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Noriyuki Nose

发明人： Naoto Abe ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Noriyuki Nose

IPC分类号： G01B11/00 ,  G01D5/26 ,  G03F9/00 ,  H01L21/68 ,  H01L31/12 ,  H01L33/00 ,  H01S5/06 ,  H01S5/062 ,  H01S5/0683 ,  G01N21/86

CPC分类号： G03F9/7088 ,  G03F9/7049 ,  H01L21/68 ,  H01L21/682 ,  H01S5/06835 ,  H01S5/06216

摘要： A position detecting apparatus usable for aligning mask and a semiconductor wafer, wherein a laser beam produced by a semiconductor laser is projected through a predetermined optical system to alignment marks formed on the mask and the wafer, and the light reflected by the marks are detected by an accumulation type sensor to produce an electrical signal, from which the relative positional relation between the mask and the wafer are detected on the basis of the electrical signal. To obtain proper mark signals, the quantity of light incident on the accumulation sensor is controlled. In this apparatus, the beam emitting strength of the semiconductor laser is made constant, and the control of thee amount of light incident on the accumulation sensor is effected by controlling the operation period of the semiconductor laser. In addition, the actuation timing of the semiconductor laser is advanced from the accumulation start of the accumulation type sensor by the time required for the semiconductor laser to be thermally stabilized after its actuation. The mark detection signal produced by the accumulation sensor is precise.

摘要翻译： 一种可用于对准掩模和半导体晶片的位置检测装置，其中由半导体激光器产生的激光束通过预定的光学系统投射到形成在掩模和晶片上的对准标记，并且由标记反射的光被 用于产生电信号的累积型传感器，根据电信号检测掩模和晶片之间的相对位置关系。 为了获得适当的标记信号，控制入射在累积传感器上的光量。 在该装置中，半导体激光器的发射光强度保持恒定，并且通过控制半导体激光器的工作周期来控制入射到积聚传感器上的光量。 此外，半导体激光器的激活定时从累积型传感器的累积开始到半导体激光器在其致动之后被热稳定所需的时间前进。 由积累传感器产生的标记检测信号是精确的。

公开(公告)号：US5495336A

公开(公告)日：1996-02-27

申请号：US441982

申请日：1995-05-16

申请人： Noriyuki Nose ,  Kunitaka Ozawa ,  Masanobu Hasegawa

发明人： Noriyuki Nose ,  Kunitaka Ozawa ,  Masanobu Hasegawa

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/70

摘要： A method of detecting the positional relationship between a first object and a second object is disclosed which includes projecting a first light through a convex lens mark of the first object and a concave lens pattern of the second object onto a first plane and projecting a second light through a concave lens mark of the first object and a convex lens pattern of the second object onto the first plane, wherein a first spacing between positions of incidence of the first light and the second light on the first plane increases with displacement of the second object relative to the first object in a predetermined direction. The method also includes projecting a third light through a concave lens mark of the first object and a convex lens pattern of the second object onto a second plane and projecting a fourth light through a convex lens mark of the first object and a concave lens pattern of the second object onto the second plane, wherein a second spacing between positions of incidence of the third light and the fourth light on the second plane decreases with displacement of the second object relative to the first object in the predetermined direction. The method also includes determining a reference for the detection of a position of the first object relative to a position of the second object on the basis of the first spacing and the second spacing as they become substantially equal to each other.

摘要翻译： 本发明公开了一种检测第一物体与第二物体之间的位置关系的方法，其中包括将第一物体的凸透镜标记的第一光和第二物体的凹透镜图案投射到第一平面上，并将第二光 通过第一物体的凹透镜标记和第二物体的凸透镜图案到第一平面上，其中第一光的入射位置和第一平面上的第二光的位置之间的第一间隔随着第二物体的位移而增加 相对于第一物体在预定方向上。 该方法还包括通过第一物体的凹透镜标记和第二物体的凸透镜图案将第三光投射到第二平面上，并将第四光通过第一物体的凸透镜标记投射并且将第四光投射到第二物体的凹透镜图案 所述第二物体在所述第二平面上，其中所述第三光的入射位置与所述第二平面上的所述第四光的位置之间的第二间隔随着所述第二物体相对于所述第一物体沿所述预定方向的位移而减小。 该方法还包括基于第一间隔和第二间隔基于彼此基本相等而确定用于检测第一物体相对于第二物体的位置的位置的参考。

公开(公告)号：US5028797A

公开(公告)日：1991-07-02

申请号：US413739

申请日：1989-09-28

申请人： Naoto Abe ,  Shigeyuki Suda ,  Koji Uda ,  Hirohisa Ohta ,  Noriyuki Nose

发明人： Naoto Abe ,  Shigeyuki Suda ,  Koji Uda ,  Hirohisa Ohta ,  Noriyuki Nose

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7096 ,  G03F9/7049

摘要： An alignment system for aligning a mask and a wafer into a predetermined positional relationship uses alignment marks provided on the mask and the water. In this system, light from a light source is directed to the alignment marks of the mask and the wafer and, then, the light from these alignment marks is detected by an accumulation type photoelectric converting device, for alignment of the mask and the wafer. The accumulation time of the photoelectric converting device is controlled to be sufficiently longer than or to be equal to a multiple, by an integral number, of the period of relative and natural vibration of the mask and the wafer. This makes it possible to reduce the effect of the relative vibration of the mask and the wafer upon the alignment result and, therefore, makes it possible to enhance the alignment precision.

公开(公告)号：US5861952A

公开(公告)日：1999-01-19

申请号：US984509

申请日：1992-12-02

申请人： Toshihiko Tsuji ,  Kyoichi Miyazaki ,  Seiji Takeuchi ,  Minoru Yoshii ,  Noriyuki Nose

发明人： Toshihiko Tsuji ,  Kyoichi Miyazaki ,  Seiji Takeuchi ,  Minoru Yoshii ,  Noriyuki Nose

IPC分类号： G01N21/94 ,  G01B9/02 ,  G01N21/88

CPC分类号： G01N21/94

摘要： A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.

摘要翻译： 具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。 激光束随后被半反射镜分开。 其中一个激光束被光电检测器作为参考光检测，相应的信号被施加到同步检测器。 另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。 在由扫描光点照射的表面上的位置处，基于光学外差干扰以激光束以拍频DELTA w进行调制。 同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号，从而可以以良好的信噪比检测颗粒或缺陷。

公开(公告)号：US5486919A

公开(公告)日：1996-01-23

申请号：US76951

申请日：1993-06-15

申请人： Toshihiko Tsuji ,  Seiji Takeuchi ,  Kyoichi Miyazaki ,  Minoru Yoshii ,  Noriyuki Nose ,  Tetsuzo Mori

发明人： Toshihiko Tsuji ,  Seiji Takeuchi ,  Kyoichi Miyazaki ,  Minoru Yoshii ,  Noriyuki Nose ,  Tetsuzo Mori

IPC分类号： G01J9/02 ,  G01J9/04 ,  G01N21/88 ,  G01N21/94 ,  G03F7/20 ,  G01B9/02

CPC分类号： G03F7/70616 ,  G01N21/88 ,  G01N21/94 ,  G03F7/7065 ,  G03F7/70916 ,  G01J2009/0261 ,  G01J9/04 ,  G01N2021/4792 ,  G01N21/8806

摘要： Disclosed is an inspection method and apparatus: wherein (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, different from the first state of polarization, and a second wavelength, different from the first wavelength are produced; at least the first light is projected to a position of inspection; and heterodyne interference light produced on the basis of the second light and light scattered at the inspection position and having its state of polarization changed, by the scattering, from the first state of polarization, is detected.

摘要翻译： 公开了一种检查方法和装置：其中（i）具有第一偏振状态和第一波长的第一光，以及（ii）具有与第一偏振态不同的第二极化状态的第二光，以及第二波长 ，与第一波长不同; 至少第一个光被投射到检查的位置; 并且检测基于第二光产生的外差干涉光和在检查位置上散射并且具有从第一极化状态通过散射改变其偏振状态的光。

公开(公告)号：US5465148A

公开(公告)日：1995-11-07

申请号：US139143

申请日：1993-10-21

申请人： Takahiro Matsumoto ,  Noriyuki Nose ,  Kenji Saito ,  Koichi Sentoku

发明人： Takahiro Matsumoto ,  Noriyuki Nose ,  Kenji Saito ,  Koichi Sentoku

IPC分类号： G01B9/02 ,  G01B11/24 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70633 ,  G03F9/70

摘要： A first Savart plate and an object to be measured are arranged on the light path of a Zeeman light source. The object to be measured is constructed of a diffraction grating on a mask and a diffraction grating on a wafer. A second Savart plate, a deflection plate and a photoelectric detector are sequentially arranged in the light path for the diffracted beams from the measured object. The output of the photoelectric detector is connected to a phase-difference unit to detect the phase difference between two beat signals. Herein, the light is split into two beams by the Savart plate. After a diffraction is caused by the diffraction gratings, thereafter, the beams are re-synthesized by the Savart plates. The two beams travel on the same light path, thereby improving a measurement accuracy.

摘要翻译： 第一萨瓦特板和待测对象被布置在塞曼光源的光路上。 要测量的对象由掩模上的衍射光栅和晶片上的衍射光栅构成。 第二萨瓦特板，偏转板和光电检测器依次布置在来自测量对象的衍射光束的光路中。 光电检测器的输出连接到相位差单元，以检测两个差拍信号之间的相位差。 这里，萨瓦特板将光分成两束。 衍射由衍射光栅引起之后，光束由Savart板重新合成。 两个光束在相同的光路上行进，从而提高测量精度。