Process for producing organic carboxylic acid esters
    4.
    发明授权
    Process for producing organic carboxylic acid esters 失效
    生产有机羧酸酯的方法

    公开(公告)号:US5151547A

    公开(公告)日:1992-09-29

    申请号:US664198

    申请日:1991-03-04

    IPC分类号: C07C67/08

    CPC分类号: C07C67/08

    摘要: Disclosed is a process for producing an organic carboxylic acid ester from an organic carboxylic acid corresponding to said organic carboxylic acid ester and an alcohol by esterification reaction in gas phase which comprises carrying out the reaction with continuously or intermittently feeding sulfuric acid as a catalyst component in the presence of a catalyst carrier. The sulfuric acid may be previously supported on the catalyst carrier.

    Crystalline semiconductor film manufacturing method and crystalline semiconductor film manufacturing apparatus
    5.
    发明授权
    Crystalline semiconductor film manufacturing method and crystalline semiconductor film manufacturing apparatus 有权
    晶体半导体膜制造方法和结晶半导体膜制造装置

    公开(公告)号:US08716113B2

    公开(公告)日:2014-05-06

    申请号:US13295317

    申请日:2011-11-14

    IPC分类号: H01L21/20 H01L21/36 H01L21/02

    摘要: A semiconductor film manufacturing method includes: forming a metal layer above the substrate; forming a gate electrode in each of pixels by patterning a metal layer; forming a gate insulating firm on the gate electrode; forming an amorphous semiconductor film on the gate insulating film; and crystallizing the amorphous semiconductor film by irradiating the amorphous semiconductor film with a laser beam, and a laser irradiation width of the laser beam corresponds to n times a width of each pixel (n is an integer of 2 or above), a laser energy intensity is higher in one end portion of the laser irradiation width than in the other end portion, and in the crystallizing, the laser energy intensity of the laser beam is inverted in increments of n pixels, alternately between one of the end portions of the laser irradiation width of the laser beam and the other end portion.

    摘要翻译: 半导体膜制造方法包括:在基板上形成金属层; 通过图案化金属层在每个像素中形成栅电极; 在栅电极上形成栅绝缘体; 在栅极绝缘膜上形成非晶半导体膜; 并且通过用激光束照射非晶半导体膜来结晶非晶半导体膜,并且激光束的激光照射宽度对应于每个像素的宽度的n倍(n为2以上的整数),激光能量强度 在激光照射宽度的一个端部比在另一端部高,并且在结晶中,激光束的激光能量强度以n个像素为增量反转,交替地在激光照射的一个端部之间 激光束的宽度和另一端部。

    ELECTRONIC COMPONENT PACKAGE, ELECTRONIC COMPONENT, AND ELECTRONIC COMPONENT PACKAGE MANUFACTURING METHOD
    6.
    发明申请
    ELECTRONIC COMPONENT PACKAGE, ELECTRONIC COMPONENT, AND ELECTRONIC COMPONENT PACKAGE MANUFACTURING METHOD 有权
    电子元件封装,电子元件和电子元件封装制造方法

    公开(公告)号:US20140083735A1

    公开(公告)日:2014-03-27

    申请号:US13635024

    申请日:2012-03-16

    IPC分类号: H05K5/06 H05K13/00

    摘要: An electronic component package has a first sealing member main surface with mounted electronic element, and a second sealing member. An outer circumference portion of a second sealing member is molded into a tapered shape, providing a tapered area in at least part of the outer circumference. A flat area adjacent to the tapered area is provided in at least part of a flat portion inward of the outer circumference portion of the surface of the second sealing member. A first area corresponding to the tapered area and a second area corresponding to the flat area are provided adjacent to each other on a first main surface of the first sealing member with mounted electronic component element. A width W2 of the second area is 0.66 to 1.2 times a width W4 of the flat area. First and second bonding layers are formed and bonded with each other by heating.

    摘要翻译: 电子部件封装具有安装有电子元件的第一密封构件主表面和第二密封构件。 第二密封构件的外周部分模制成锥形,在外周的至少一部分中提供锥形区域。 与第二密封构件的表面的外周部的内侧的平坦部的至少一部分设置有与锥形区域相邻的平坦区域。 相对于锥形区域的第一区域和对应于平坦区域的第二区域在具有安装的电子元件的第一密封构件的第一主表面上彼此相邻地设置。 第二区域的宽度W2为平坦区域的宽度W4的0.66〜1.2倍。 通过加热形成第一和第二接合层并彼此接合。

    Process for forming resist pattern, and resist coating and developing apparatus
    9.
    发明授权
    Process for forming resist pattern, and resist coating and developing apparatus 有权
    用于形成抗蚀剂图案的方法,以及抗蚀涂层和显影装置

    公开(公告)号:US07527442B2

    公开(公告)日:2009-05-05

    申请号:US11872055

    申请日:2007-10-15

    申请人: Hiroshi Yoshioka

    发明人: Hiroshi Yoshioka

    IPC分类号: G03D5/00 G03C5/00 H01L21/00

    CPC分类号: G03F7/70933 G03F7/38 G03F7/40

    摘要: A process for forming a resist pattern according to the invention is a process for forming a resist pattern in which a photoresist is coated on a first substrate, the coated photoresist is exposed to light of a predetermined pattern, and afterwards developing is performed, wherein in at least one of the processes of coating, exposing, and developing, whenever lots to which the first substrate belongs change, the atmosphere residing in the lot is changed.

    摘要翻译: 根据本发明的形成抗蚀剂图案的方法是形成抗蚀剂图案的方法,其中将光致抗蚀剂涂覆在第一基底上,将涂覆的光致抗蚀剂暴露于预定图案的光,然后进行显影 涂布,曝光和显影的过程中的至少一个,无论第一底材所属的地点何处,改变了批次中存在的气氛。

    FUEL SUPPLY SYSTEM
    10.
    发明申请
    FUEL SUPPLY SYSTEM 审中-公开
    燃油供应系统

    公开(公告)号:US20080216904A1

    公开(公告)日:2008-09-11

    申请号:US11836421

    申请日:2007-08-09

    IPC分类号: F23K5/04

    摘要: A fuel supply system includes: a flange mounted at an upper opening in a fuel tank; a fuel pump that discharges fuel in the fuel tank; a high-pressure filter that filters fuel discharged from the fuel pump; and a filter case that accommodates the high-pressure filter and includes an upper case and a lower case, the upper case integrally formed with the flange. The fuel pump is fitted to an underside of the lower case to be positioned substantially coaxial with the high-pressure filter.

    摘要翻译: 燃料供给系统包括:安装在燃料箱的上部开口的凸缘; 燃料泵,其在燃料箱中排出燃料; 高压过滤器,其对从燃料泵排出的燃料进行过滤; 以及容纳高压过滤器并且包括上壳体和下壳体的过滤器壳体,上壳体与凸缘一体形成。 燃料泵安装在下壳体的下侧,以与高压过滤器基本同轴。