公开(公告)号：US4564764A

公开(公告)日：1986-01-14

申请号：US537624

申请日：1983-09-30

申请人： Hiroshi Yasuda ,  Kenichi Kawashima ,  Takayuki Miyazaki ,  Koichi Kobayashi

发明人： Hiroshi Yasuda ,  Kenichi Kawashima ,  Takayuki Miyazaki ,  Koichi Kobayashi

IPC分类号： G01B15/00 ,  H01J37/304 ,  H01L21/027 ,  G01N23/00

CPC分类号： H01J37/3045

摘要： A wafer having chips for determining the position of the wafer, at least one of the chips comprising a plurality of first-direction line groups formed on one side portion of the chip and a plurality of second-direction line groups formed on the other region of the chip, the first-direction line groups and the second-direction line groups being orthogonal to each other, each of the first-direction line groups comprising one first-direction main mark and one first-direction code mark expressing the position of the one first-direction main mark, each of the second-direction line groups comprising one second-direction main mark and one second-direction code mark, whereby, by scanning only one of the first-direction line groups and only one of the second-direction line groups by means of an electron beam, the position of the wafer is determined.

摘要翻译： 具有用于确定晶片的位置的芯片的晶片，至少一个芯片包括形成在芯片的一个侧面上的多个第一方向线组和形成在芯片的另一个区域上的多个第二方向线组 芯片，第一方向线组和第二方向线组彼此正交，每个第一方向线组包括一个第一方向主标记和一个表示一个位置的第一方向代码标记 第一方向主标记，每个第二方向线组包括一个第二方向主标记和一个第二方向代码标记，由此，通过仅扫描第一方向线组中的一个并且只有一个第二方向 线组，通过电子束确定晶片的位置。

公开(公告)号：US4853870A

公开(公告)日：1989-08-01

申请号：US54782

申请日：1987-05-27

申请人： Nobuyuki Yasutake ,  Jun-ichi Kai ,  Hiroshi Yasuda ,  Kenichi Kawashima

发明人： Nobuyuki Yasutake ,  Jun-ichi Kai ,  Hiroshi Yasuda ,  Kenichi Kawashima

IPC分类号： H01J37/147 ,  G05B15/02 ,  H01J37/304 ,  H01J37/317 ,  H01L21/027 ,  H01L21/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/15 ,  H01J2237/30455 ,  H01J2237/31766

摘要： In an electron beam exposure system controlled by a computer, the system includes: an electron optical device for generating electron beams and irradiating the beams to a sample on a stage through a plurality of electron lens, a main deflection coil, and sub deflection electrodes, to form predetermined circuit patterns on the sample. The system also includes a position control device controlling the driving of the stage based on a stage position coordinate designated by the computer, detecting an actual stage position coordinate, and calculating an error value between the designated stage position coordinate and the actual stage position coordinate, the error value being divided into two components of an upper bits portion having an relatively large error value and a lower bits portion having a relatively small error value, and a deflection control device controlling the direction of the electron beams based on the main pattern data corrected by the upper bits portion and the sub pattern data corrected by the lower bits portion, and based on selected main and sub wait times determined by exposure and non-exposure timings.

摘要翻译： 在由计算机控制的电子束曝光系统中，该系统包括：用于产生电子束并通过多个电子透镜，主偏转线圈和副偏转电极将光束照射到载物台上的样品的电子光学装置， 以在样品上形成预定的电路图案。 该系统还包括：基于由计算机指定的舞台位置坐标来控制舞台的驾驶的位置控制装置，检测实际舞台位置坐标，以及计算指定舞台位置坐标与实际舞台位置坐标之间的误差值， 误差值被分成具有相对较大误差值的较高位部分和具有相对较小误差值的较低位部分的两个分量，以及基于校正的主图案数据控制电子束方向的偏转控制装置 通过由较低位部分校正的较高比特部分和子图形数据，并且基于由曝光和非曝光定时确定的选择的主等待时间和次等待时间。

公开(公告)号：US4291231A

公开(公告)日：1981-09-22

申请号：US971693

申请日：1978-12-21

申请人： Kenichi Kawashima ,  Hiroshi Yasuda ,  Kenyu Uema

发明人： Kenichi Kawashima ,  Hiroshi Yasuda ,  Kenyu Uema

IPC分类号： H01L21/027 ,  H01J37/302 ,  H01J37/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J2237/31762

摘要： Electron beam exposure system provides a basic pattern data memory for storing data corresponding to the dimensions and the positions of patterns of a basic unit pattern which frequently appears as a unit in a pattern to be exposed on a wafer, and a central processing unit provided with an additional memory system which stores data corresponding to the position at which the basic unit pattern is to be exposed. This system determines the position of the basic unit pattern by adding data from the basic pattern data memory and data from the additional memory system through the central processing unit in accordance with a command of the central processing unit. Thereafter, data corresponding to the dimensions of the patterns in the basic unit patterns from the basic pattern data memory are sent as an input to a deflection system. As a result, the system according to the present invention applies electron beam deflection signals, which are produced by using the obtained data corresponding to the positions and the dimensions of the basic unit patterns, to the deflecting means of the electron beam exposure apparatus.

摘要翻译： 电子束曝光系统提供基本图案数据存储器，用于存储对应于经常以要暴露在晶片上的图案中以单元形式出现的基本单元图案的尺寸和图案的尺寸和位置的数据;以及中央处理单元， 存储与基本单元图案要被曝光的位置对应的数据的附加存储器系统。 该系统根据中央处理单元的命令，通过从基本模式数据存储器和来自附加存储器系统的数据通过中央处理单元添加数据来确定基本单元模式的位置。 此后，将与来自基本图案数据存储器的基本单元图案中的图案的尺寸相对应的数据作为输入发送到偏转系统。 结果，根据本发明的系统将通过使用与基本单元图案的位置和尺寸对应的获得的数据产生的电子束偏转信号应用于电子束曝光装置的偏转装置。

公开(公告)号：US5260579A

公开(公告)日：1993-11-09

申请号：US851400

申请日：1992-03-13

申请人： Hiroshi Yasuda ,  Yasushi Takahashi ,  Kiichi Sakamoto ,  Akio Yamada ,  Yoshihisa Oae ,  Junichi Kai ,  Shunsuke Fueki ,  Kenichi Kawashima

发明人： Hiroshi Yasuda ,  Yasushi Takahashi ,  Kiichi Sakamoto ,  Akio Yamada ,  Yoshihisa Oae ,  Junichi Kai ,  Shunsuke Fueki ,  Kenichi Kawashima

IPC分类号： H01J37/09 ,  H01J37/317 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/0435

摘要： A charged particle beam exposure system is directed to an exposure process of an electron beam for sequentially scanning an electron beam employing a blanking aperture array including a plurality of blanking apertures. The system facilitates re-focusing for compensation of focus error due to Coulumb effect and makes wiring the blanking aperture array easier. The system further allows exposure without an irradiation gap. The blanking aperture array 6 is formed with a plurality of said blanking apertures 62 arranged in a two-dimensional configuration. A control system 24 controls the blanking aperture array 62 to set the blanking aperture to the ON state where the charged particle beams pass through the blanking aperture and reach the object 19 to be exposed or the OFF state where the charged particle beams cannot reach the object 19 to be exposed. The other control system of the control means performs a control so that a plurality of said charged particle beams that have passed through different blanking apertures of said blanking aperture array overlaps and is irradiated a plurality of times onto the specified position or the peripheral position in the vicinity of the specified position of the object to be exposed to the charged particle beams.

公开(公告)号：US4426439A

公开(公告)日：1984-01-17

申请号：US329941

申请日：1981-12-11

申请人： Koichi Kobayashi ,  Kenichi Kawashima ,  Shuzo Oshio

发明人： Koichi Kobayashi ,  Kenichi Kawashima ,  Shuzo Oshio

IPC分类号： H01L21/302 ,  G03F7/038 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  H01L21/3065 ,  G03C5/04

CPC分类号： G03F7/38 ,  G03F7/20 ,  Y10S430/168

摘要： A negative photoresist emulsion, wherein after a film of negative photoresist emulsion on a substrate has been exposed for pattern writing in vacuum to charged particle beams or soft X-ray beams, the film-coated substrate is transferred to, and kept in, a chamber filled with non-oxidizing gas, and then the substrate is removed to the outside atmosphere. By this method, a curing effect of the photoresist film is prevented, enabling formation of fine patterns with precision. An apparatus for carrying out the above method, has a gas chamber filled with non-oxidizing gas connected to an exposure chamber, and the substrate, after such exposure, is kept in an atmosphere of non-oxidizing gas in the gas chamber before being removed to the outside atmosphere. In either the above-method or apparatus, the concentration of oxygen in the non-oxidizing gas must be less than 5%, preferably less than 1%.

摘要翻译： 一种负性光致抗蚀剂乳液，其中在基底上的负性光致抗蚀剂乳剂的膜已暴露以在真空中进行图案书写以填充带电粒子束或软X射线束之后，将该膜涂覆的基底转移到并保持在室中 填充非氧化性气体，然后将基板除去到外部气氛。 通过该方法，防止光致抗蚀剂膜的固化效果，从而能够精确地形成精细图案。 用于执行上述方法的装置具有填充有与曝光室连接的非氧化性气体的气室，并且在暴露之后，将衬底在去除之前保持在气体室中的非氧化气体气氛中 到外面的气氛。 在上述方法或装置中，非氧化性气体中的氧浓度必须小于5％，优选小于1％。

公开(公告)号：US4508968A

公开(公告)日：1985-04-02

申请号：US510584

申请日：1983-07-05

申请人： Koichi Kobayashi ,  Kenichi Kawashima ,  Shuzo Oshio

发明人： Koichi Kobayashi ,  Kenichi Kawashima ,  Shuzo Oshio

IPC分类号： H01L21/302 ,  G03F7/038 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  H01L21/3065 ,  G01N23/00 ,  G01N21/00

CPC分类号： G03F7/38 ,  G03F7/20 ,  Y10S430/168

摘要： A negative photoresist emulsion, wherein after a film of negative photoresist emulsion on a substrate has been exposed for pattern writing in vacuum to charged particle beams or soft X-ray beams, the film-coated substrate is transferred to, and kept in, a chamber filled with non-oxidizing gas, and then the substrate is removed to the outside atmosphere. By this method, a curing effect of the photoresist film is prevented, enabling formation of fine patterns with precision. An apparatus for carrying out the above method has a gas chamber filled with non-oxidizing gas connected to an exposure chamber, and the substrate, after such exposure, is kept in an atmosphere of non-oxidizing gas in the gas chamber before being removed to the outside atmosphere. In either the above-method or apparatus, the concentration of oxygen in the non-oxidizing gas must be less than 5%, preferably less than 1%.

公开(公告)号：US4815943A

公开(公告)日：1989-03-28

申请号：US102656

申请日：1987-09-30

申请人： Kenichi Kawashima ,  Kenji Emi ,  Akira Tezuka ,  Kosaku Sayo ,  Toshikazu Ito ,  Toshio Sudo ,  Yukio Takahashi ,  Isao Hayase ,  Atsushi Suginuma ,  Kiyosi Yamamoto ,  Hideo Usui ,  Kunihiko Takao ,  Masao Mizukami ,  Masaru Ito ,  Masahiro Moritaka

发明人： Kenichi Kawashima ,  Kenji Emi ,  Akira Tezuka ,  Kosaku Sayo ,  Toshikazu Ito ,  Toshio Sudo ,  Yukio Takahashi ,  Isao Hayase ,  Atsushi Suginuma ,  Kiyosi Yamamoto ,  Hideo Usui ,  Kunihiko Takao ,  Masao Mizukami ,  Masaru Ito ,  Masahiro Moritaka

IPC分类号： F04B27/10 ,  F04B49/24 ,  F04B1/26

CPC分类号： F04B27/1072 ,  F04B49/24

摘要： A variable displacement compressor comprises a housing forming a crank chamber, a shaft, expansible chambers including pistons, a swash plate connected to the shaft so as to be smoothly changeable in inclination against the shaft and driven to rotate, a wobble plate rotatable on the swash plate, a rotation preventing mechanism including a shoe member slidable in an axial direction, and a pressure control valve which is provided in a refrigerant passage from a suction port of the compressor to the expansible chamber to control the pressure of refrigerant to be sucked responsive to the suction pressure and both to the suction pressure and to the discharge pressure when the discharge pressure is high. The refrigerant passage has a sharply bent portion for separating lubrication oil from a refrigerant flowing therein and communicates with the crank chamber to discharge blow-by gas therefrom.

摘要翻译： 可变排量压缩机包括形成曲柄室的壳体，轴，包括活塞的可膨胀室，连接到轴的斜盘，以便能够相对于轴倾斜平滑地变化并被驱动旋转，可在斜盘上旋转的摆动板 板，包括可沿轴向滑动的靴形构件的旋转防止机构和压力控制阀，该压力控制阀设置在从压缩机的吸入口到可膨胀室的制冷剂通道中，以响应于所述压缩机控制被吸入的制冷剂的压力 当排出压力高时，吸入压力以及吸入压力和排出压力两者。 制冷剂通道具有用于将润滑油与其中流动的制冷剂分离的急剧弯曲部分，并与曲柄室连通以从其中排出窜气。

公开(公告)号：US4636148A

公开(公告)日：1987-01-13

申请号：US836110

申请日：1986-03-04

申请人： Kunihiko Takao ,  Kenichi Kawashima ,  Yozo Nakamura ,  Isao Hayase

发明人： Kunihiko Takao ,  Kenichi Kawashima ,  Yozo Nakamura ,  Isao Hayase

IPC分类号： F04C28/02 ,  F04B49/02 ,  F04C28/16

CPC分类号： F04C28/16 ,  F04C28/02

摘要： A vane type compressor includes a plurality of working chambers defined by the cooperation of a rotor, a plurality of vanes and a cam ring. A valve assembly is disposed in a low pressure passage communicated with the working chambers and operative to bring a portion of the low pressure passage communicated with at least one of the working chambers to a full-closed or full-open position, to thereby effect control of the volume of gas discharged from the compressor.

摘要翻译： 叶片型压缩机包括由转子，多个叶片和凸轮环的协作限定的多个工作室。 阀组件设置在与工作室连通的低压通道中，并且可操作地将与至少一个工作室连通的低压通道的一部分连通到全闭或全开位置，从而实现控制 从压缩机排出的气体体积。

公开(公告)号：US3989426A

公开(公告)日：1976-11-02

申请号：US597176

申请日：1975-07-18

申请人： Masayuki Sato ,  Fumio Fujisawa ,  Kenichi Kawashima

发明人： Masayuki Sato ,  Fumio Fujisawa ,  Kenichi Kawashima

IPC分类号： F04C2/352 ,  F01C1/352 ,  F01C21/08 ,  F04C15/00 ,  F04C18/352 ,  F04C29/10

CPC分类号： F01C21/0836 ,  F04C15/0042

摘要： A vane pump comprising a cylindrical pump chamber, vanes adapted to rotate within the pump chamber, and a drive rotor arranged eccentrically with respect to the center of rotation of the vanes, such vane pump being formed with through holes in portions of opposite end walls of the drive rotor which are in spaced juxtaposed relationship with side end faces of each vane, such through holes being connected to a line for supplying therethrough a portion of the fluid discharged by the vane pump. During operation of the vane pump, the portion of the fluid discharged by the pump and supplied through the line is ejected through the through openings against the side end faces of the vanes so as to avoid collision between the end walls of the drive rotor and the side end faces of the vanes whereby the service life of the vane pump can be increased.

摘要翻译： 一种叶片泵，包括圆柱形泵室，适于在泵室内旋转的叶片以及相对于叶片旋转中心偏心设置的驱动转子，该叶片泵在相对端壁的相对端壁的部分中形成有通孔 所述驱动转子与每个叶片的侧端面间隔开并置关系，所述通孔连接到用于通过叶片泵排出的流体的一部分供给的管线。 在叶片泵的操作期间，由泵排出并通过管线供应的流体的部分通过通孔被喷射抵靠叶片的侧端面，以避免驱动转子的端壁与 叶片的侧端面，从而可以增加叶片泵的使用寿命。

公开(公告)号：US06543360B2

公开(公告)日：2003-04-08

申请号：US09748864

申请日：2000-12-28

申请人： Hiroshi Sasaki ,  Mitsuyoshi Shouji ,  Kenichi Kawashima ,  Yutaka Ito ,  Teruaki Mitsuya ,  Nobuyoshi Hoshi

发明人： Hiroshi Sasaki ,  Mitsuyoshi Shouji ,  Kenichi Kawashima ,  Yutaka Ito ,  Teruaki Mitsuya ,  Nobuyoshi Hoshi

IPC分类号： B41N114

CPC分类号： B41C1/10 ,  B41C1/1066 ,  B41N3/006

摘要： A printing system is provided which ensures easy formation of a plate and regeneration of the plate for continued use. The press plate used in a the printing system to form an image using a water-based ink is characterized in that, (I) prior to formation of a latent image, the surface forming the latent image exhibits extra ink-repellency to the ink to be used; (2) the press plate allows a water soluble material forming the latent image to be deposited thereon; (3) the latent image can be formed by allowing the water soluble material to be deposited on the press plate surface; and (4) the press plate can be regenerated as a plate which allows a new latent image to be formed by washing the press plate with water and drying it, upon completion of ensuing processes of development and transfer.

摘要翻译： 提供一种印刷系统，其确保板的容易形成和板的再生以供继续使用。 在印刷系统中使用的使用水性油墨形成图像的压板的特征在于，（I）在形成潜像之前，形成潜像的表面对油墨具有额外的拒油性， 使用; （2）压板允许形成潜像的水溶性材料沉积在其上; （3）可以通过使水溶性材料沉积在压板表面上来形成潜像; 和（4）压板可以再生成板，其允许通过用水洗涤压板并使其干燥来形成新的潜像，在完成随后的显影和转印过程之后。