公开(公告)号：US5051585A

公开(公告)日：1991-09-24

申请号：US373223

申请日：1989-06-28

申请人： Hiroya Koshishiba ,  Satoru Fushimi ,  Yasuo Nakagawa ,  Kozo Nakahata

发明人： Hiroya Koshishiba ,  Satoru Fushimi ,  Yasuo Nakagawa ,  Kozo Nakahata

IPC分类号： G01B15/00 ,  G01N23/04 ,  G01Q30/02 ,  G01Q30/04 ,  G03F1/00 ,  H01J37/147 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/30 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66

CPC分类号： G03F1/86 ,  H01J37/28 ,  H01J37/3005

摘要： A pattern detection apparatus based on a scanning transmission electron microscope having an electron gun for generating and accelerating an electron beam, a plurality of convergent lenses for converging the electron beam, a deflection circuit for deflecting the electron beam so that it scans an object to be inspected, such as an X-ray mask, a detection circuit which receives electrons that have been dispersed and transmitted in the object and converts the detected electrons into an electrical signal, and an image forming circuit which forms a detected image of the object under test in response to the detected signal from the detection circuit and in synchronism with the deflection signal applied to the deflection circuit.

公开(公告)号：US4814615A

公开(公告)日：1989-03-21

申请号：US45538

申请日：1987-05-04

申请人： Satoru Fushimi ,  Yasuo Nakagawa ,  Asahiro Kuni ,  Hitoshi Kubota ,  Hiroya Koshishiba

发明人： Satoru Fushimi ,  Yasuo Nakagawa ,  Asahiro Kuni ,  Hitoshi Kubota ,  Hiroya Koshishiba

IPC分类号： H01L21/66 ,  G01B15/00 ,  G01N23/02 ,  G02B21/00 ,  G03F1/00 ,  G03F1/84 ,  G03F1/86 ,  H01J37/26 ,  H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/86 ,  H01J37/3174 ,  H01J2237/2802 ,  H01J2237/31798

摘要： In accordance with the present invention, there is provided a pattern defect detecting apparatus using a scanning and transmission electron microscope, comprising an electron gun for accelerating an electron beam with high energy enough to transmit it through a sample and for radiating the accelerated electron beam, a condenser lens for focusing the electron beam generated by said electron gun, a beam deflection coil for deflecting the electron beam focused by said condenser lens, an objective lens for further focusing the electron beam deflected by said beam deflection coil onto a fixed spot, an XY stage for disposing the sample so as to be opposed to said objective lens, said XY stage being movable in X and Y directions in a step and repeat manner, a sample chamber for housing the XY stage in vacuum, said sample chamber including at least the outlet of the electron beam of said objective lens, an electron beam detector for detecting electron beams transmitted through said sample, said electron beam detector being fixed to a stationary member such as said chamber or a lens barrel, and defect detecting means for scanning the electron beam by using said beam deflection coil for each step and repeat operation of said XY stage, for comparing a video signal obtained from said electron beam detector with a reference pattern read out from memory means, and for thereby detecting a defect of the sample.

摘要翻译： 根据本发明，提供了一种使用扫描和透射电子显微镜的图案缺陷检测装置，其包括用于加速具有足够高能量的电子束以通过样品透射并用于辐射加速电子束的电子枪的电子枪， 用于聚焦由所述电子枪产生的电子束的聚光透镜，用于偏转由所述聚光透镜聚焦的电子束的光束偏转线圈，用于将由所述光束偏转线圈偏转的电子束进一步聚焦到固定点上的物镜， XY台，用于将样品设置为与所述物镜相对，所述XY台可以在X和Y方向上以一个步骤和重复的方式移动，用于在XY真空中容纳XY台的样品室，所述样品室至少包括 所述物镜的电子束的出口，用于检测透过所述样品的电子束的电子束检测器 d电子束检测器固定到诸如所述腔室或透镜镜筒之类的静止构件上，以及缺陷检测装置，用于通过每个步骤使用所述光束偏转线圈扫描电子束，并重复所述XY平台的操作，用于比较视频信号 从所述电子束检测器获得从存储装置读出的参考图案，从而检测样品的缺陷。

公开(公告)号：US4990776A

公开(公告)日：1991-02-05

申请号：US227645

申请日：1988-08-03

申请人： Satoru Fushimi ,  Hiroya Koshishiba

发明人： Satoru Fushimi ,  Hiroya Koshishiba

IPC分类号： H01J37/141 ,  G01R31/305 ,  H01J37/21 ,  H01J37/22 ,  H01J37/244

CPC分类号： H01J37/21 ,  G01R31/305 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/2482

摘要： An auto-focusing electron microscope used for the observation, measurement and/or checking of a circuit pattern or the like comprises an objective lens capable of changing a focal position of an electron beam, an optical system for projecting a light and shade pattern having a light-permeable portion and a light-shielding portion onto the surface of a specimen through the objective lens, and a detector for detecting the projected pattern while optically reflecting it, whereby focusing can be made while reducing any damage and/or charging of the specimen.

摘要翻译： 用于电路图案等的观察，测量和/或检查的自动聚焦电子显微镜包括能够改变电子束的焦点位置的物镜，用于投影具有 光透射部分和遮光部分通过物镜到样本表面上，以及用于在光学反射的同时检测投影图案的检测器，从而可以在减少样本的损伤和/或充电的同时进行聚焦 。

公开(公告)号：US4791586A

公开(公告)日：1988-12-13

申请号：US812928

申请日：1985-12-23

申请人： Shunji Maeda ,  Hitoshi Kubota ,  Satoru Fushimi ,  Hiroshi Makihira ,  Takanori Ninomiya ,  Yasuo Nakagawa

发明人： Shunji Maeda ,  Hitoshi Kubota ,  Satoru Fushimi ,  Hiroshi Makihira ,  Takanori Ninomiya ,  Yasuo Nakagawa

IPC分类号： H01L21/66 ,  G06T7/00 ,  G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148

摘要： Method of and apparatus for checking the geometry of multi-layer patterns for IC structures having identical functions, each of the multi-layer patterns including layer patterns arranged in different level layers, wherein electrical image signals corresponding to any two of the multi-layer patterns and having more than two levels are registered with each other and then compared to determine unmatched and matched portions. The comparison of the registered electric image signals may be performed with respect to their amplitude or their gradients. The registration and comparison of two electric image signals may be repeated for all of the layer patterns with the matched portions being no longer subjected to the registration and comparison. A defect detection signal is produced from finally unmatched portions, if any, of the electric image signals having undergone the said registration and comparison.

摘要翻译： 用于检查具有相同功能的IC结构的多层图案的几何形状的方法和装置，每个多层图案包括布置在不同层级中的层图案，其中对应于多层图案中的任何两个的电图像信号 并且具有两个以上的级别彼此登记，然后进行比较以确定不匹配和匹配的部分。 登记的电图像信号的比较可以相对于它们的振幅或梯度进行。 对于所有的层图案，可以对匹配的部分不再进行注册和比较来重复两个电图像信号的配准和比较。 如果有的话，经过所述登记和比较的电子图像信号的最终不匹配的部分产生缺陷检测信号。

公开(公告)号：US4614430A

公开(公告)日：1986-09-30

申请号：US604998

申请日：1984-04-27

申请人： Yasuhiko Hara ,  Yoshimasa Ohshima ,  Satoru Fushimi ,  Hiroshi Makihira

发明人： Yasuhiko Hara ,  Yoshimasa Ohshima ,  Satoru Fushimi ,  Hiroshi Makihira

IPC分类号： G01N21/956 ,  G06T7/00 ,  G01N21/88

CPC分类号： G06T7/001 ,  G01N21/95607 ,  G06T2207/10056 ,  G06T2207/30148

摘要： A pattern defect is detected in accordance with the difference between a pair of patterns. The patterns are scanned and imaged to obtain first and second binary signals. A positioning error between the patterns is two-dimensionally detected during the scanning with respective first and second binary signals delayed by a prescribed amount so that each of the picture elements in a prescribed area of a two-dimensional image, delayed and cut out two-dimensionally, corresponding to one pattern, is compared with a specified picture element in a predetermined area of an image delayed and cut out two-dimensionally corresponding to another pattern. The result of the comparison is statistically summed to derive a positioning error by detecting the position shown as an extreme value from the summed values. The positioning error is corrected by two-dimensionally shifting at least one of the delayed binary signals. The corrected binary signals are then two-dimensionally compared with each other.

摘要翻译： 根据一对图案之间的差异来检测图案缺陷。 扫描和成像图案以获得第一和第二二进制信号。 在扫描期间，以相应的第一和第二二进制信号延迟规定量的二维检测图案之间的定位误差，使得二维图像的规定区域中的每个图像元素被延迟和切出二维图像， 对应于一个图案的尺寸与在与另一图案对应地延迟和切出的图像的预定区域中的指定图像元素进行比较。 比较的结果被统计学地相加以通过从求和值中检测显示为极值的位置来导出定位误差。 通过二维移位延迟的二进制信号中的至少一个来校正定位误差。 然后将校正后的二进制信号二维地进行比较。

公开(公告)号：US4508453A

公开(公告)日：1985-04-02

申请号：US397900

申请日：1982-07-13

申请人： Yasuhiko Hara ,  Nobuyuki Akiyama ,  Satoru Fushimi ,  Yoshimasa Oshima ,  Nobuhiko Aoki

发明人： Yasuhiko Hara ,  Nobuyuki Akiyama ,  Satoru Fushimi ,  Yoshimasa Oshima ,  Nobuhiko Aoki

IPC分类号： G01N21/956 ,  G01R31/308 ,  G03F7/20 ,  G01M11/00

CPC分类号： G03F7/70616 ,  G01N21/956 ,  G01R31/308 ,  G03F7/7065

摘要： A pattern detection system for inspecting defects in fine or minute patterns such as photomask patterns at a fast speed is disclosed. The system comprises an illuminator, a device for moving objects with the patterns to be inspected with being illuminated by the illuminator, an optical system for imaging the objects, a scanner for scanning the objects in a direction intersected at a given angle with respect to direction of the objects moved by the moving device and arrays of photosensors arranged linearly in a direction perpendicular to that of images on the objects scanned by the scanner, on the surface of which the images are formed by the optical system and for producing respective outputs parallelly on the time basis.

摘要翻译： 公开了一种用于以高速度检查诸如光掩模图案的精细或微小图案中的缺陷的图案检测系统。 该系统包括照明器，用于利用照明器照亮要检查的图案来移动物体的装置，用于对物体进行成像的光学系统，用于沿相对于方向以给定角度相交的方向扫描物体的扫描仪 由移动装置移动的物体和由扫描仪扫描的物体上垂直于图像的方向线性布置的光敏器件的阵列，其表面上由光学系统形成图像并且平行地产生相应的输出 时间基础。

公开(公告)号：US5157735A

公开(公告)日：1992-10-20

申请号：US393936

申请日：1989-08-15

申请人： Shunji Maeda ,  Hitoshi Kubota ,  Satoru Fushimi ,  Takashi Hiroi

发明人： Shunji Maeda ,  Hitoshi Kubota ,  Satoru Fushimi ,  Takashi Hiroi

IPC分类号： G06T7/00 ,  G06T7/60

CPC分类号： G06T7/604 ,  G06T7/0002 ,  G06T2207/30136 ,  G06T2207/30164

摘要： A system and a method of detecting a chipping of the rail part of a slider of a thin film magnetic head obtains the image of the object of detection and its boundary coordinates by tracing the boundary of the object of detection from the image. A chipping size is obtained from the coordinates of the points on the boundary, and the presence or absence of chipping is judged from the chipping size, thereby enabling the highly precise detection of a chipping defect generated on the boundary portion of the object of detection using a simple structure.

摘要翻译： 检测薄膜磁头的滑块的轨道部分的碎裂的系统和方法通过从图像中追踪检测对象的边界来获得检测对象的图像及其边界坐标。 从边界上的点的坐标获得切片尺寸，根据切片尺寸判断是否存在切片，从而能够高精度地检测在检测对象的边界部分上产生的切屑缺陷，使用 一个简单的结构。