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公开(公告)号：US07355143B1
公开(公告)日：2008-04-08
申请号：US09763735
申请日：1999-12-27
CPC分类号： G01N15/0227 , G01N15/0211 , G01N2015/0216
摘要： Making it possible to execute the detection of the particles floating inside a processing chamber with the use of an optical system including one observing window and one unit (An object of the present invention is, by using an optical system including one observing window and one unit, to make it possible to execute the detection of the particles floating inside a processing chamber.) Also, in order to be able to detect exceedingly feeble particle scattered-lights with a high-accuracy, when performing a desired thin-film forming or thin-film processing treatment toward a to-be-processed target inside the processing chamber, the following method is employed: First, the irradiation with a beam is executed into the processing chamber through the observing window. Here, the beam is P-polarized and is intensity-modulated with a frequency differing from an exciting source's frequency and its integer-multiples, and the observing window has an inclination that forms Brewster angle toward the P-polarized incident beam. Next, backward scattered-lights scattered by the particles inside the processing chamber are received and image-photographed at a detecting optical system through the above-described one and the same observing window. Moreover, the above-described frequency component and a wavelength component of the above-described intensity-modulated beam are detected out of the received signals. Finally, the detected components and the image-photographed image information are used so as to judge the number, the size, and the distribution of the particles.
摘要翻译： 通过使用包括一个观察窗口和一个单元的光学系统，可以执行浮动在处理室内的颗粒的检测。本发明的目的是通过使用包括一个观察窗口和一个单元的光学系统 ，使得可以执行浮在处理室内的颗粒的检测。）此外，为了能够以高精度检测到极度微弱的粒子散射光，当进行所需的薄膜形成或薄 对处理室内的待处理靶材进行膜处理，采用以下方法：首先，通过观察窗口将光束照射进入处理室。 这里，光束是P偏振光并且以不同于激发光源的频率和其整数倍的频率进行强度调制，并且观察窗口具有朝向P偏振入射光束形成布鲁斯特角的倾斜度。 接下来，通过上述同一观察窗口，在检测光学系统中接收并处理由处理室内的颗粒散射的向后散射光并进行图像拍摄。 此外，从接收信号中检测出上述强度调制波束的上述频率分量和波长分量。 最后，使用检测到的分量和图像拍摄图像信息来判断粒子的数量，大小和分布。
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公开(公告)号：US06631547B2
公开(公告)日：2003-10-14
申请号：US09778776
申请日：2001-02-08
IPC分类号： G11B5127
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/3166 , G11B5/3173 , G11B2005/3996 , Y10T29/49004 , Y10T29/49025 , Y10T29/49032 , Y10T29/49036 , Y10T29/49048 , Y10T29/49131
摘要： To measure positions of a plurality of thin film magnetic head elements formed in a line on a bar, the quantity of positions of samples in the bar is estimated from the magnetic head elements the amount of deviation in position of the next element, and the distance between the elements are obtained, and the amount of deviation and distance are estimated by a primary approximate linear or several-order approximate curve. The estimated amount and the distance between the elements are moved simultaneously, and an image formed by a lens optical system is photo-converted to an image signal, and dimensions are computed. The conversion step is carried out immediately after movement of the next element and is continuously repeated, and the computing step is processed in parallel with the conversation step.
摘要翻译： 为了测量形成在棒上的线中的多个薄膜磁头元件的位置，从磁头元件估计条中样品的位置数量，下一个元件的位置偏差量以及距离 获得元素之间的距离，并且通过初级近似线性或几阶近似曲线来估计偏差量和距离。 估计的量和元件之间的距离同时移动，并且由透镜光学系统形成的图像被光转换成图像信号，并且计算尺寸。 转换步骤在下一个元素的移动之后立即执行并且被连续地重复，并且计算步骤与对话步骤并行处理。
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3.发明授权公开(公告)号：US06831277B1
公开(公告)日：2004-12-14
申请号：US09437265
申请日：1999-11-10
申请人： Toshihiko Nakata , Hideaki Sasazawa , Kenji Furusawa , Minako Morisato , Hideo Yamakura , Toshio Tamura
发明人： Toshihiko Nakata , Hideaki Sasazawa , Kenji Furusawa , Minako Morisato , Hideo Yamakura , Toshio Tamura
IPC分类号： G01B1100
CPC分类号： G11B5/3173 , G11B5/3103 , G11B5/3166 , G11B5/3169 , G11B5/3189 , G11B5/3903 , G11B5/3967 , Y10T29/49036
摘要： A method of measuring variation in dimensions and alignment error of thin film magnetic heads formed on a raw bar cut-off from a substrate is provided. Such method comprises illuminating a MR element and a resistance detector element which is formed for monitoring a lapping process, both of which are formed on the raw bar, with illuminating light whose wavelength is 300 nm or less; forming an image by imaging light reflected from the elements; and converting the image to an image signal through photoelectric conversion so as to detect variation in dimensions of the MR element and the resistance detector element formed on the raw bar, and alignment error between the MR element and the resistance detector element with a high degree of accuracy.
摘要翻译： 提供了一种测量从基板上切割的生条上形成的薄膜磁头的尺寸变化和对准误差的方法。 这种方法包括：照射MR元件和电阻检测器元件，该元件形成用于监测两者都是在原料条上形成的研磨过程，其中波长为300nm或更小的照明光; 通过对从元件反射的光进行成像来形成图像; 并且通过光电转换将图像转换成图像信号，以便检测形成在原始条上的MR元件和电阻检测器元件的尺寸变化，以及MR元件和电阻检测器元件之间的对准误差 准确性。
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4.发明授权Pattern inspection device of substrate surface and pattern inspection method of the same 有权基板表面图案检查装置及图案检验方法相同公开(公告)号：US08736830B2
公开(公告)日：2014-05-27
申请号：US13145968
申请日：2009-12-10
IPC分类号： G01N21/00
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译： 提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。 用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。
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5.发明申请PATTERN INSPECTION DEVICE OF SUBSTRATE SURFACE AND PATTERN INSPECTION METHOD OF THE SAME 有权基板表面图案检测装置及其图案检测方法公开(公告)号：US20120013890A1
公开(公告)日：2012-01-19
申请号：US13145968
申请日：2009-12-10
IPC分类号： G01N21/956 , G01N21/47
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译： 提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。 用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。
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6.发明授权Disk surface inspection apparatus, inspection system thereof, and inspection method thereof 失效磁盘表面检查装置及其检查系统及其检查方法公开(公告)号：US08253935B2
公开(公告)日：2012-08-28
申请号：US12694297
申请日：2010-01-27
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/9506
摘要： The invention has a function of preparing a data base for a relation between a defect shape and an arrangement for the optical system capable of detecting the shape at high sensitivity and automatically adjusting the arrangement for the optical system. As the method of preparing the data base, a method of using optical simulation or an experimental method of using a sample having an optical shape is applied. A pinhole position and a beam size are adjusted automatically so as to attain the optimal arrangement for the optical system to an inputted defect shape based on the data base.
摘要翻译： 本发明具有为能够以高灵敏度检测形状并自动调整光学系统的配置的光学系统的缺陷形状和布置之间的关系的准备数据库的功能。 作为准备数据库的方法，应用使用光学模拟的方法或使用具有光学形状的样本的实验方法。 自动调整针孔位置和光束尺寸，以便根据数据库为光学系统达到输入缺陷形状的最佳布置。
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7.发明授权Method for controlling semiconductor device production process and a method for producing semiconductor devices 失效半导体器件制造方法的控制方法以及半导体器件的制造方法公开(公告)号：US07273685B2
公开(公告)日：2007-09-25
申请号：US11304778
申请日：2005-12-16
CPC分类号： G03F7/70641
摘要： In order to realize individually and easily optimization of exposure conditions such as exposure dose and focus by photolithography in a production process of semiconductor devices, the present invention is such that: light is radiated onto a pattern on a semiconductor wafer; by an optical system that detects information on a pattern shape using scattered light by its reflection, waveforms of an FEM sample wafer having a plurality of shape deformation patterns prepared in advance are detected and stored; one or more characteristic points on a spectral waveform generated in association with a pattern change is recorded; and a variation model of the characteristic points is obtained. As to a pattern to be measured, a spectral waveform is detected in the same manner as that described above, and deviations (exposure dose deviation and focus deviation) of the formation conditions are estimated from a displacement of the characteristic points on the waveform using the variation model. Thereby, the exposure dose and focus can be independently fed back and the process control can be achieved with high accuracy.
摘要翻译： 为了在半导体器件的生产过程中实现通过光刻的曝光量和曝光量等的曝光条件的单独和容易的优化，本发明使得：将光照射到半导体晶片上的图案上; 通过利用其反射检测使用散射光的图案形状的信息的光学系统，检测并存储具有预先准备的多个形状变形图案的FEM样品晶片的波形; 记录与图案变化相关联地生成的光谱波形上的一个或多个特征点; 并获得特征点的变化模型。 对于要测量的图案，以与上述相同的方式检测光谱波形，并且使用波形的波形上的特征点的位移来估计形成条件的偏差（曝光剂量偏差和聚焦偏差） 变异模型。 因此，可以独立地反馈曝光剂量和聚焦，并且可以以高精度实现过程控制。
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8.发明授权Method and apparatus for automatic focusing and a method and apparatus for three dimensional profile detection 失效自动对焦的方法和装置以及用于三维轮廓检测的方法和装置
公开(公告)号：US5780866A
公开(公告)日：1998-07-14
申请号：US559946
申请日：1995-11-17
IPC分类号： G01B11/02 , G01B11/24 , G01C3/06 , G01N21/956 , G01R31/309 , G06T1/00 , G01N21/84
CPC分类号： G01R31/309 , G01B11/026 , G01B11/24 , G01N21/956
摘要： A method for automatic focusing and three dimensional profile detection and an apparatus for automatic focusing and three dimensional profile detection have the purpose of detecting a three dimensional profile of the state of mounting of parts or soldering on a board without the affects of warp, even if the board of the detection object is warped, as if the surface of the board were on a flat plane. The board surface height is detected in a plurality of windows corresponding to stage scanning regions from a three dimensional profile signal of the part-mounted board detected by a height detection optical system. The board height or inclination in the next window is forecasted from the board surface height and the control history of stage height in the already-detected plurality of windows. Based on the forecasted board surface height or inclination, the speed or height in the Z direction of a Z-stage is controlled according to a feedforward method with scanning so as that the board surface and the focal plane of the height detection optical system are made coincident.
摘要翻译： 用于自动聚焦和三维轮廓检测的方法以及用于自动聚焦和三维轮廓检测的装置的目的是检测零件的安装状态或焊接在板上的三维轮廓，而不影响翘曲，即使 检测对象的板翘曲，仿佛板的表面在平面上。 根据由高度检测光学系统检测的部件安装板的三维轮廓信号，在与台架扫描区域相对应的多个窗口中检测板表面高度。 在已经检测到的多个窗口中，从板表面高度和台架高度的控制历史预测下一窗口中的板高度或倾斜度。 基于预测的板表面高度或倾斜度，根据前馈方法控制Z级Z方向的速度或高度，以使得高度检测光学系统的板表面和焦平面成为 巧合
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公开(公告)号：US20120287426A1
公开(公告)日：2012-11-15
申请号：US13520217
申请日：2011-01-27
CPC分类号： G11B5/855 , G01B11/0641 , G01N21/95607
摘要： In an optical inspection for patterned media for hard disks, a pattern inspection device is provided for inspecting patterns without being susceptible to variations in film thickness and film quality of an underlying film, the device includes optical characteristics detection means for detecting optical characteristics of multilayers by processing, upon the reflected light being dispersed and detected by the spectroscopic detection means, the reflected light from a non-patterned region on the substrate, and processing a detection signal corresponding to, and detecting optical characteristics of, the reflected light from the patterns including the multilayers; and pattern inspection means for inspecting the patterns formed on the multilayers, by viewing, upon the detection of the optical characteristics by the optical characteristics detection means, information on the optical characteristics of the reflected light from the multilayers, and processing information on the optical characteristics of the reflected light from the patterns including the multilayers.
摘要翻译： 在用于硬盘的图案化介质的光学检查中，提供了用于检查图案的图案检查装置，而不会影响底层膜的膜厚度和膜质量的变化，该装置包括用于通过以下方式检测多层膜的光学特性的光学特性检测装置 在由所述分光检测装置分散和检测的反射光中，对来自所述基板上的非图案化区域的反射光进行处理，并处理与来自所述图案的反射光相对应的检测信号和检测来自所述图案的反射光的检测信号，所述反射光包括 多层 以及用于检查形成在多层上的图案的图案检查装置，通过在通过光学特性检测装置检测到光学特性时观察，查看来自多层的反射光的光学特性的信息，以及关于光学特性的处理信息 来自包括多层的图案的反射光。
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10.发明授权Spectral detection method and device, and defect inspection method and apparatus using the same 有权光谱检测方法和装置，以及使用其的缺陷检查方法和装置公开(公告)号：US08279431B2
公开(公告)日：2012-10-02
申请号：US12626963
申请日：2009-11-30
IPC分类号： G01N21/00
CPC分类号： G01J3/02 , G01B2210/56 , G01J3/0208 , G01J3/021 , G01J3/0229 , G01N21/95607
摘要： In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object.
摘要翻译： 在用于检测在测试对象的表面上均匀形成的重复图案结构的形状的光谱检测中，有利的是在短波长范围内使用宽波长范围的光。 然而，实现能够在短波长区域即紫外线区域中具有宽波长范围的光的光谱检测的相对简单的光学系统是不容易的。 本发明提供一种用于检测图案缺陷的检查装置。 检查装置包括能够对从深紫外线到近红外线的波长范围内的光进行光谱检测的光谱检测光学系统。 光谱检测光学系统包括用作半反射镜的空间部分反射镜和设置有孔径光阑的反射物镜，该孔径光阑用于限制被施加到测试对象并由被测物体反射的光的角度和方向。
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