公开(公告)号：US20120123081A1

公开(公告)日：2012-05-17

申请号：US13383631

申请日：2010-07-12

申请人： Hiroyuki Okada ,  Hiroshi Horikoshi ,  Kenichi Toi

发明人： Hiroyuki Okada ,  Hiroshi Horikoshi ,  Kenichi Toi

IPC分类号： C08G18/73 ,  B29D11/00

CPC分类号： G02B1/04 ,  C08G18/3868 ,  C08G18/3874 ,  C08G18/3876 ,  C08G18/7642 ,  G02B1/041 ,  C08L81/00

摘要： The present invention is a production process for an optical material using, as raw materials thereof, a compound (a), a compound (b), a compound (c), a compound (d) and a compound (e) as shown below, the process comprising the following steps 1 to 5: Step 1: a step of obtaining a first liquid by dissolving the compound (b) in the compound (a); Step 2: a step of obtaining a second liquid by adding the compound (e) mixed with a portion of the compound (d) to the first liquid obtained in Step 1 and mixing the compound (e) mixed with a portion of the compound (d) with the first liquid uniformly; Step 3: a step of obtaining a reaction mixture by adding the compound (c) to the second liquid obtained in Step 2 and reacting the resulting mixture under reduced pressure; Step 4: a step of obtaining a resin composition for an optical material by adding the remainder of the compound (d) to the reaction mixture obtained in Step 3 and mixing the remainder of the compound (d) to the reaction mixture uniformly; and Step 5: a step of obtaining an optical material by casting and polymerizing the resin composition for an optical material obtained in Step 4.

摘要翻译： 本发明是使用如下所示的化合物（a），化合物（b），化合物（c），化合物（d）和化合物（e））作为原料的光学材料的制造方法。 该方法包括以下步骤1至5：步骤1：通过将化合物（b）溶解在化合物（a）中获得第一液体的步骤; 步骤2：通过将与化合物（d）的一部分混合的化合物（e）加入到步骤1中获得的第一液体中并混合化合物（e）与化合物的一部分（ d）与第一液体均匀; 步骤3：通过向步骤2中获得的第二液体中加入化合物（c）并在减压下使所得混合物反应获得反应混合物的步骤; 步骤4：通过向步骤3中获得的反应混合物中加入剩余的化合物（d）并将剩余的化合物（d）均匀混合到反应混合物中，获得光学材料用树脂组合物的步骤; 步骤5：通过浇铸和聚合步骤4中获得的光学材料用树脂组合物获得光学材料的步骤。

公开(公告)号：US09182520B2

公开(公告)日：2015-11-10

申请号：US13383631

申请日：2010-07-12

申请人： Hiroyuki Okada ,  Hiroshi Horikoshi ,  Kenichi Toi

发明人： Hiroyuki Okada ,  Hiroshi Horikoshi ,  Kenichi Toi

IPC分类号： G02B1/04 ,  C08G18/38 ,  C08G18/76

CPC分类号： G02B1/04 ,  C08G18/3868 ,  C08G18/3874 ,  C08G18/3876 ,  C08G18/7642 ,  G02B1/041 ,  C08L81/00

摘要： The present invention provides an optical material, an optical lens, and a production process for making the same. The production process includes a step of obtaining a first liquid by dissolving a compound (b) in compound (a); a step of obtaining a second liquid by adding a compound (e) mixed with a portion of a compound (d) to the first liquid and mixing; a step of obtaining a reaction mixture by adding a compound (c) to the second liquid and reacting the resulting mixture under reduced pressure; a step of obtaining a resin composition for an optical material by adding the remainder of the compound (d) to the reaction mixture and mixing; and a step of obtaining an optical material by casting and polymerizing the resin composition.

摘要翻译： 本发明提供一种光学材料，光学透镜及其制造方法。 制备方法包括通过将化合物（b）溶解在化合物（a）中获得第一液体的步骤; 通过将与化合物（d）的一部分混合的化合物（e）加入到第一液体中并混合而获得第二液体的步骤; 通过向第二液体中加入化合物（c）并在减压下使所得混合物反应获得反应混合物的步骤; 通过将剩余的化合物（d）加入到反应混合物中并混合获得用于光学材料的树脂组合物的步骤; 以及通过浇铸和聚合树脂组合物获得光学材料的步骤。

公开(公告)号：US07446163B2

公开(公告)日：2008-11-04

申请号：US11189859

申请日：2005-07-27

申请人： Masaki Tamura ,  Takahiro Matsui ,  Masanori Shimuta ,  Yuichi Yoshimura ,  Motoharu Takeuchi ,  Hiroshi Horikoshi ,  Hiroyuki Okada

发明人： Masaki Tamura ,  Takahiro Matsui ,  Masanori Shimuta ,  Yuichi Yoshimura ,  Motoharu Takeuchi ,  Hiroshi Horikoshi ,  Hiroyuki Okada

IPC分类号： C08G75/08

CPC分类号： C08G75/08 ,  C07D331/02

摘要： In the present invention, an episulfide compound having, in one molecule, at least one epithio structure represented by the following Formula 2: wherein R5 is C1-C10 hydrocarbylene or single bond, R6, R7 and R8 are each independently C1-C10 hydrocarbyl or hydrogen, Y is O, S, Se or Te, p is an integer from 1 to 5 and q is an integer from 0 to 5, is polymerized in the presence of a halide of a 13-16 group element of the long periodic table and/or a polymerization regulator represented by the following Formula 1: wherein R1, R2 and R3 are each C1-C10 hydrocarbyl or hydrogen, R4 is C1-C10 hydrocarbylene or single bond, X is F, Cl, Br, I, As, SH, OH, C1-C10 alkoxyl, C1-C10 alkylthio, or C1-C10 mercaptoalkylthio, and m is an integer from 1 to 5, to produce a cured resin suitable as an optical material. By using the polymerization regulator, the polymerization rate of the episulfide compound can be suitably regulated to obtain a cured resin with less defect. By using the halide, the increase in the viscosity of the starting composition during the storage or the casting operation can be prevented.

摘要翻译： 在本发明中，在一个分子中具有由下式2表示的至少一个环硫结构的环硫化合物：其中R 5是C 1 -C 10亚烃基或单键，R 6 R 7和R 8各自独立地为C 1 -C 10烃基或氢，Y为O，S，Se或Te，p为1的整数 至5和q为0至5的整数，在长周期表的13-16族元素的卤化物和/或由下式1表示的聚合调节剂的存在下聚合：其中R“ R 1，R 2和R 3各自为C 1 -C 10烃基或氢，R 4为C 1 -C 10亚烃基或单 键，X为F，Cl，Br，I，As，SH，OH，C1-C10烷氧基，C1-C10烷硫基或C1-C10巯基烷硫基，m为1〜5的整数， 作为光学材料。 通过使用聚合调节剂，可以适当调节环硫化合物的聚合速度，得到缺陷少的固化树脂。 通过使用卤化物，可以防止在储存或铸造操作期间起始组合物的粘度的增加。

公开(公告)号：US07169845B2

公开(公告)日：2007-01-30

申请号：US10297383

申请日：2002-04-04

申请人： Masaki Tamura ,  Takahiro Matsui ,  Masanori Shimuta ,  Yuichi Yoshimura ,  Motoharu Takeuchi ,  Hiroshi Horikoshi ,  Hiroyuki Okada

发明人： Masaki Tamura ,  Takahiro Matsui ,  Masanori Shimuta ,  Yuichi Yoshimura ,  Motoharu Takeuchi ,  Hiroshi Horikoshi ,  Hiroyuki Okada

IPC分类号： C08L81/00 ,  C08K3/16

CPC分类号： C08G75/08 ,  C07D331/02

摘要： In the present invention, an episulfide compound having, in one molecule, at least one epithio structure represented by the following Formula 2: wherein R5 is C1–C10 hydrocarbylene or single bond, R6, R7 and R8 are each independently C1–C10 hydrocarbyl or hydrogen, Y is O, S, Se or Te, p is an integer from 1 to 5 and q is an integer from 0 to 5, is polymerized in the presence of a halide of a 13–16 group element of the long periodic table and/or a polymerization regulator represented by the following Formula 1: wherein R1, R2 and R3 are each C1–C10 hydocarbyl or hydrogen, R4 is C1–C10 hydrocarbylene or single bond, X is F, Cl, Br, I, As, SH, OH, C1–C10 alkoxyl, C1–C10 alkylthio, or C1–C10 mercaptoalkythio, and m is an integer from 1 to 5, to produce a cured resin suitable as an optical material. By using the polymerization regulator, the polymerization rate of the episulfide compound can be suitably regulated to obtain a cured resin with less defect. By using the halide, the increase in the viscosity of the starting composition during the storage or the casting operation can be prevented.

摘要翻译： 在本发明中，在一个分子中具有由下式2表示的至少一个环硫结构的环硫化合物：其中R 5是C 1 -C 10亚烃基或单键，R 6 R 7和R 8各自独立地为C 1 -C 10烃基或氢，Y为O，S，Se或Te，p为1的整数 至5和q为0至5的整数，在长周期表的13-16族元素的卤化物和/或由下式1表示的聚合调节剂的存在下聚合：其中R“ 1，R 2和R 3各自为C 1 -C 10氢碳基或氢，R 4为C 1 -C 10亚烃基或单 键，X为F，Cl，Br，I，As，SH，OH，C 1 -C 10烷氧基，C 1 -C 10烷硫基或C 1 -C 10巯基偶氮，m为1〜5的整数， 作为光学材料。 通过使用聚合调节剂，可以适当调节环硫化合物的聚合速度，得到缺陷少的固化树脂。 通过使用卤化物，可以防止在储存或铸造操作期间起始组合物的粘度的增加。

公开(公告)号：US20050261467A1

公开(公告)日：2005-11-24

申请号：US11189859

申请日：2005-07-27

申请人： Masaki Tamura ,  Takahiro Matsui ,  Masanori Shimuta ,  Yuichi Yoshimura ,  Motoharu Takeuchi ,  Hiroshi Horikoshi ,  Hiroyuki Okada

发明人： Masaki Tamura ,  Takahiro Matsui ,  Masanori Shimuta ,  Yuichi Yoshimura ,  Motoharu Takeuchi ,  Hiroshi Horikoshi ,  Hiroyuki Okada

IPC分类号： C07D331/02 ,  C08G75/08 ,  C08G75/00

CPC分类号： C08G75/08 ,  C07D331/02

摘要： In the present invention, an episulfide compound having, in one molecule, at least one epithio structure represented by the following Formula 2: wherein R5 is C1-C10 hydrocarbylene or single bond, R6, R7 and R8 are each independently C1-C10 hydrocarbyl or hydrogen, Y is O, S, Se or Te, p is an integer from 1 to 5 and q is an integer from 0 to 5, is polymerized in the presence of a halide of a 13-16 group element of the long periodic table and/or a polymerization regulator represented by the following Formula 1: wherein R1, R2 and R3 are each C1-C10 hydrocarbyl or hydrogen, R4 is C1-C10 hydrocarbylene or single bond, X is F, Cl, Br, I, As, SH, OH, C1-C10 alkoxyl, C1-C10 alkylthio, or C1-C10 mercaptoalkylthio, and m is an integer from 1 to 5, to produce a cured resin suitable as an optical material. By using the polymerization regulator, the polymerization rate of the episulfide compound can be suitably regulated to obtain a cured resin with less defect. By using the halide, the increase in the viscosity of the starting composition during the storage or the casting operation can be prevented.

摘要翻译： 在本发明中，在一个分子中具有由下式2表示的至少一个环硫结构的环硫化合物：其中R 5是C 1 -C 10亚烃基或单键，R 6 R 7和R 8各自独立地为C 1 -C 10烃基或氢，Y为O，S，Se或Te，p为1的整数 至5和q为0至5的整数，在长周期表的13-16族元素的卤化物和/或由下式1表示的聚合调节剂的存在下聚合：其中R“ R 1，R 2和R 3各自为C 1 -C 10烃基或氢，R 4为C 1 -C 10亚烃基或单 键，X为F，Cl，Br，I，As，SH，OH，C1-C10烷氧基，C1-C10烷硫基或C1-C10巯基烷硫基，m为1〜5的整数， 作为光学材料。 通过使用聚合调节剂，可以适当调节环硫化合物的聚合速度，得到缺陷少的固化树脂。 通过使用卤化物，可以防止在储存或铸造操作期间起始组合物的粘度的增加。

公开(公告)号：US08492695B2

公开(公告)日：2013-07-23

申请号：US12660728

申请日：2010-03-03

申请人： Hiroshi Horikoshi ,  Koji Kikuchi ,  Tomohiro Yamazaki

发明人： Hiroshi Horikoshi ,  Koji Kikuchi ,  Tomohiro Yamazaki

IPC分类号： H01L27/00 ,  H01L31/0232

CPC分类号： H01L27/14685 ,  H01L27/14621 ,  H01L27/14625 ,  H01L27/14627 ,  H01L27/14629 ,  H01L27/14636 ,  H01L27/14645

摘要： A solid-state image pickup apparatus includes a substrate, a wiring layer, and a waveguide. The substrate is provided with a pixel array portion constituted of a plurality of pixels each having a photoelectric converter that converts incident light into an electrical signal. The wiring layer includes a plurality of wirings and an insulating layer that covers the plurality of wirings that are laminated above the substrate. The waveguide guides light to each of the photoelectric converters of the plurality of pixels, the waveguide being formed in the wiring layer. The waveguide is formed to have a waveguide exit end from which light exits the waveguide so that a distance between the waveguide exit end and a surface of the photoelectric converter that receives light from the waveguide become shorter, as wavelengths of light guided by the waveguide are longer.

摘要翻译： 固体摄像装置包括基板，布线层和波导管。 基板设置有由多个像素构成的像素阵列部分，每个像素具有将入射光转换成电信号的光电转换器。 布线层包括多个布线和覆盖层叠在基板上方的多个布线的绝缘层。 波导将光引导到多个像素中的每个光电转换器，波导形成在布线层中。 波导形成为具有波导出口端，光从该波导出口离开波导，使得波导出口端和接收来自波导的光的光电转换器的表面之间的距离变短，因为由波导引导的光的波长为 更长

公开(公告)号：US20100130661A1

公开(公告)日：2010-05-27

申请号：US12529918

申请日：2008-03-11

申请人： Motoharu Takeuchi ,  Hiroshi Horikoshi ,  Hiroaki Tanaka ,  Hirohito Ishizuka

发明人： Motoharu Takeuchi ,  Hiroshi Horikoshi ,  Hiroaki Tanaka ,  Hirohito Ishizuka

IPC分类号： C08K3/30

CPC分类号： C08F12/30 ,  C08F212/08 ,  C08F212/14 ,  C08F212/36 ,  C08F216/1466 ,  C08F220/38 ,  C08F2222/1013 ,  C08G75/08 ,  G02B1/04 ,  C08L81/00

摘要： The present invention can provide a composition for optical members, which contains (a) a compound having one or more of any group selected from the group consisting of an acryloyl group, a methacryloyl group, an allyl group and a vinyl group and one or more β-epithiopropyl groups in a molecule. In a preferable embodiment of the present invention, the composition for optical members further contains at least one compound selected from (b) a compound having one or more β-epithiopropyl groups in a molecule while having no polymerizable unsaturated bond group, (c) an inorganic compound having a sulfur atom and/or a selenium atom, (d) a compound having one or more thiol groups in a molecule, (e) a compound having one or more amino groups in a molecule while having no heterocyclic ring, and (f) a compound having one or more of at least one group selected from the group consisting of a vinyl group, an acryloyl group, a methacryloyl group and an allyl group in a molecule.

摘要翻译： 本发明可以提供一种光学部件用组合物，其含有（a）具有选自丙烯酰基，甲基丙烯酰基，烯丙基和乙烯基中的一个或多个的一种或多种的化合物和一种或多种 一个分子中的β-二硫丙基。 在本发明的优选实施方案中，用于光学部件的组合物还含有至少一种选自（b）分子中具有一个或多个β-伯硫丙基的化合物中的化合物，同时不具有可聚合的不饱和键基，（c） 具有硫原子和/或硒原子的无机化合物，（d）分子中具有一个或多个硫醇基的化合物，（e）分子中具有一个或多个氨基但不具有杂环的化合物，以及 （f）在分子中具有一个或多个选自乙烯基，丙烯酰基，甲基丙烯酰基和烯丙基中的至少一个基团的化合物。

公开(公告)号：US07141501B2

公开(公告)日：2006-11-28

申请号：US10512745

申请日：2003-04-14

申请人： Hiroshi Horikoshi ,  Takeshi Nogami ,  Shuzo Sato ,  Shingo Takahashi ,  Naoki Komai ,  Kaori Tai ,  Hiizu Ohtorii

发明人： Hiroshi Horikoshi ,  Takeshi Nogami ,  Shuzo Sato ,  Shingo Takahashi ,  Naoki Komai ,  Kaori Tai ,  Hiizu Ohtorii

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： B24B53/017 ,  B24B53/001 ,  C25F3/16

摘要： A polishing method and a polishing apparatus by which excess portions of a metallic film 18 can be removed easily and efficiently in planarizing the metallic film 18 by polishing and which is high in accuracy of polishing, are provided. Also, a method of manufacturing a semiconductor device by use of the polishing method and the polishing apparatus is provided. A substrate 17 provided with the metallic film 18 and a counter electrode 15 are disposed oppositely to each other in an electrolytic solution E, an electric current is passed to the metallic film 18 through the electrolytic solution E, and the surface of the metallic film 18 is polished with a hard pad 14.

摘要翻译： 提供了抛光方法和抛光装置，其通过抛光对金属膜18进行平面化并且抛光精度高而容易且有效地除去金属膜18的多余部分。 此外，提供了通过使用抛光方法和抛光装置制造半导体器件的方法。 设置有金属膜18的基板17和对置电极15在电解液E中相对配置，电流通过电解液E通过金属膜18，金属膜18的表面 用硬垫抛光14。

公开(公告)号：US20060105474A1

公开(公告)日：2006-05-18

申请号：US11298195

申请日：2005-12-09

申请人： Hiroshi Horikoshi

发明人： Hiroshi Horikoshi

IPC分类号： H01L21/00

CPC分类号： H01L27/222 ,  G11C11/16 ,  H01L21/76852 ,  H01L21/76865 ,  H01L21/76885 ,  H01L43/12

摘要： In bit line cladding structure formation, stability and margin of the process are secured and further shrinking is achieved, and the magnetic memory device is improved in speed, reliability and yield. Method for manufacturing a magnetic memory device, comprising the steps of: forming a word line; forming a magnetoresistance effect memory element comprising a tunnel insulating layer disposed between a ferromagnetic material and being electrically insulated from the word line; forming an insulating film for covering the memory element; and forming a bit line so that it is buried in the insulating film wherein the bit line is electrically connected to the memory element and spatially crosses the word line through the memory element disposed therebetween, wherein the method has steps of removing the insulating film on the bit line side to expose the bit line and forming a soft magnetic material layer selectively only on the bit line surface.

摘要翻译： 在位线包层结构形成中，确保了工艺的稳定性和裕度，并且进一步收缩，并且磁存储器件的速度，可靠性和产量都得到了提高。 一种用于制造磁存储器件的方法，包括以下步骤：形成字线; 形成磁阻效应存储元件，其包括设置在铁磁材料之间并与所述字线电绝缘的隧道绝缘层; 形成用于覆盖存储元件的绝缘膜; 并且形成位线，使得其被埋在绝缘膜中，其中位线电连接到存储元件并且通过设置在其间的存储元件空间地跨越字线，其中该方法具有以下步骤：去除绝缘膜上的绝缘膜 位线侧以暴露位线并且仅在位线表面上选择性地形成软磁性材料层。

公开(公告)号：US20050070110A1

公开(公告)日：2005-03-31

申请号：US10919580

申请日：2004-08-17

申请人： Hiizu Ohtorii ,  Kaori Tai ,  Hiroshi Horikoshi ,  Naoki Komai ,  Shuzo Sato

发明人： Hiizu Ohtorii ,  Kaori Tai ,  Hiroshi Horikoshi ,  Naoki Komai ,  Shuzo Sato

IPC分类号： H01L21/3205 ,  C09K13/06 ,  C09K13/08 ,  C23F1/26 ,  H01L21/306 ,  H01L21/3105 ,  H01L21/321 ,  H01L21/768 ,  H01L21/4763 ,  H01L21/311

CPC分类号： H01L21/31053 ,  C09K13/06 ,  C09K13/08 ,  C23F1/26 ,  H01L21/3212 ,  H01L21/7684

摘要： An etching solution includes an anticorrosive for copper or a benzotriazole based anticorrosive in a hydrofluoric acid aqueous solution. An etching method makes use of the etching solution set out above. Moreover, a method for manufacturing a semiconductor device which should include the step of removing copper by the etching method. The method includes the steps of forming copper through a barrier layer made of a metal or metal compound, which is greater in ionization tendency than copper, so as to bury a wiring groove formed in an insulating film with the copper, followed by polishing additional copper and barrier layer formed on the insulating film, and etching a surface layer of the insulating film by use of the etching solution to remove an insulating defective layer made mainly of the barrier layer on the insulating film along with the surface layer of the insulating film.

摘要翻译： 蚀刻溶液包括在氢氟酸水溶液中对铜或苯并三唑类防腐蚀剂的防锈剂。 蚀刻方法利用上述蚀刻溶液。 此外，一种制造半导体器件的方法，其应包括通过蚀刻方法去除铜的步骤。 该方法包括通过由金属或金属化合物制成的阻挡层形成铜的步骤，其电离度比铜更大，以便用铜掩埋形成在绝缘膜中的布线槽，然后抛光附加的铜 以及形成在绝缘膜上的阻挡层，并且通过使用蚀刻溶液来蚀刻绝缘膜的表面层，以除去绝缘膜上的主要由绝缘膜上的阻挡层形成的绝缘缺陷层以及绝缘膜的表面层。