公开(公告)号：US20180261425A1

公开(公告)日：2018-09-13

申请号：US15918464

申请日：2018-03-12

申请人： Hitachi, Ltd.

发明人： Yasuhiro SHIRASAKI ,  Momoyo ENYAMA ,  Kaori SHIRAHATA ,  Makoto SAKAKIBARA

IPC分类号： H01J37/244 ,  H01J37/20 ,  H01J37/10 ,  H01J37/28

CPC分类号： H01J37/244 ,  H01J37/10 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/28

摘要： A charged particle detector including a scintillator that is irradiated with charged particles, a fluorescent film being in contact with a first surface facing a second surface of the scintillator, the second surface being irradiated with the charged particles, and a photodetector that detects luminescence of the fluorescent film, wherein the fluorescent film has a plurality of regions, the plurality of regions respectively have phosphors that absorb luminescence of the scintillator and emit light with different wavelengths from one another, and a charged particle beam device using the charged particle detector.

公开(公告)号：US20170213695A1

公开(公告)日：2017-07-27

申请号：US15329638

申请日：2014-07-28

申请人： HITACHI, LTD.

发明人： Daisuke BIZEN ,  Makoto SAKAKIBARA ,  Hiroya OHTA ,  Junichi TANAKA

IPC分类号： H01J37/244 ,  H01J37/26 ,  H01J37/24

CPC分类号： H01J37/244 ,  H01J37/222 ,  H01J37/24 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/226

摘要： A simulation device calculates a detection number of electrons generated by charged particles radiated to a sample by a simulation and generates a simulation image of the sample. The simulation device holds penetration length information (272) in which incidence conditions of the charged particles and a penetration length are associated with each other, sample configuration information (271) which shows a configuration of a sample, and emission electron number information in which the incidence conditions of the charged particles and an emission electron number are associated with each other. The simulation device calculates the number of electrons emitted from a predetermined incidence point, on the basis of incidence conditions at the predetermined incidence point, the penetration length information (272), the sample configuration information (271), and the emission electron number information.

公开(公告)号：US20210407763A1

公开(公告)日：2021-12-30

申请号：US17279039

申请日：2019-08-09

申请人： Hitachi, Ltd.

发明人： Takafumi MIWA ,  Hirokazu TAMAKI ,  Momoyo ENYAMA ,  Makoto SAKAKIBARA ,  Sayaka KURATA ,  Atsuko SHINTANI ,  Takashi DOBASHI ,  Kotoko URANO ,  Akiko KAGATSUME ,  Minseok PARK ,  Yasuhiro SHIRASAKI ,  Thantip KRASIENAPIBAL

IPC分类号： H01J37/26 ,  H01J37/28 ,  H01J37/22

摘要： A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.

公开(公告)号：US20190295805A1

公开(公告)日：2019-09-26

申请号：US16269345

申请日：2019-02-06

申请人： HITACHI, LTD.

发明人： Yasunari SOHDA ,  Daisuke BIZEN ,  Makoto SAKAKIBARA

IPC分类号： H01J37/12 ,  H01J37/28

摘要： The present invention provides an electron beam device suitable for observing the bottom of a deep groove or a deep hole with a high degree of accuracy under a large current condition. The electron beam device has: an electron optical system having an irradiation optical system to irradiate an aperture 153 with an electron beam 116 emitted from an electron source 100 and a reduction projection optical system to project and form an aperture image of the aperture on a sample 114; and a control unit 146 to control a projection magnification of the aperture image of the aperture projected and formed on the sample and an aperture angle 402 of the electron beam emitted to the sample by the electron optical system.

公开(公告)号：US20180261426A1

公开(公告)日：2018-09-13

申请号：US15916968

申请日：2018-03-09

申请人： HITACHI, LTD.

发明人： Megumi KIMURA ,  Momoyo ENYAMA ,  Makoto SAKAKIBARA

IPC分类号： H01J37/28 ,  H01J37/147

CPC分类号： H01J37/28 ,  H01J37/1474

摘要： To reduce the risk of measurement accuracy degradation and information lost due to adhesion of contamination that occurs by irradiation with charged particle beam.The charged particle beam device includes: a deflector for scanning a charged particle beam; a detector for detecting secondary charged particles generated by the interaction of the charged particle beam with a sample; and a system control unit including a calculation part, a measurement part, and a storage part. The measurement part measures a feature amount from an image formed based on a signal output from the detector after a charged particle beam is scanned on the sample by the deflector (S303). The calculation part calculates an amount of contamination adhering to a surface of the sample by irradiation of the sample with the charged particle beam, from a change in the feature amount measured by the measurement part (S304). Then, the storage part adds the information of the contamination amount to the image and stores the image information (S313).

公开(公告)号：US20180232869A1

公开(公告)日：2018-08-16

申请号：US15894605

申请日：2018-02-12

申请人： HITACHI, LTD.

发明人： Momoyo ENYAMA ,  Yasuhiro SHIRASAKI ,  Michio HATANO ,  Makoto SAKAKIBARA

IPC分类号： G06T5/50 ,  G06T1/00 ,  G06T5/00

摘要： An image forming apparatus includes an observation image input section in which a plurality of observation images is input, an emphasis information input section that inputs information to be emphasized, a storage section that defines a plurality of conversion functions that converts the plurality of observation images into a converted image on the basis of a function for conversion and takes, as a parameter, a gradation value of each pixel in the plurality of observation images and a plurality of emphasis functions that takes, as a parameter, a gradation value of each pixel in the conversion functions, an image calculation section that calculates an image in which information to be emphasized is emphasized on the basis of the plurality of input observation images, the input information of the information to be emphasized, the conversion functions, and the emphasis functions, and an emphasized image output section that outputs the emphasized image.