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1.发明申请公开(公告)号：US20210407763A1
公开(公告)日：2021-12-30
申请号：US17279039
申请日：2019-08-09
申请人： Hitachi, Ltd.
发明人： Takafumi MIWA , Hirokazu TAMAKI , Momoyo ENYAMA , Makoto SAKAKIBARA , Sayaka KURATA , Atsuko SHINTANI , Takashi DOBASHI , Kotoko URANO , Akiko KAGATSUME , Minseok PARK , Yasuhiro SHIRASAKI , Thantip KRASIENAPIBAL
摘要： A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.
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公开(公告)号：US20200257937A1
公开(公告)日：2020-08-13
申请号：US16712568
申请日：2019-12-12
申请人： HITACHI, LTD.
摘要： An information processing system creates a teacher database configured to train an analysis model from an observation image and labeling information corresponding to the observation image using an information processor. This system includes a storage unit, an image processing unit, and a teacher database creating unit. The storage unit stores image processing data formed of information showing a relationship between an observation condition and a parameter relating to the observation image. Further stores a first observation image, a first observation condition, and first labeling information. The image processing unit accepts the first observation image and the first observation condition as inputs, performs image processing corresponding to the parameter to the first observation image based on the image processing data, and creates a second observation image corresponding to a second observation condition. The teacher database creating unit creates the teacher database from the second observation image and the first labeling information.
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公开(公告)号：US20190131104A1
公开(公告)日：2019-05-02
申请号：US16089269
申请日：2016-03-31
申请人： HITACHI, LTD.
发明人： Yasuhiro SHIRASAKI , Momoyo ENYAMA
IPC分类号： H01J37/05 , H01J37/147 , H01J37/28 , H01J37/153
摘要： A charged particle beam device that detects a secondary charged particle beam generated by irradiation of a sample by a primary charged particle beam, includes: an image shift deflector that shifts an irradiation region for irradiation of the sample by the primary charged particle beam; a magnetic sector that separates the primary charged particle beam passing therein from the secondary charged particle beam from the sample using a magnetic field generated therein; a correction mechanism that is placed off of a trajectory of the primary charged particle beam but on a trajectory of the secondary charged particle beam inside the magnetic sector, the correction mechanism deflecting the secondary charged particle beam passing through; and a controller that controls the correction mechanism according to a defined relationship between a shift amount by the image shift deflector and a correction amount by the correction mechanism.
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公开(公告)号：US20190287757A1
公开(公告)日：2019-09-19
申请号：US16276195
申请日：2019-02-14
申请人： HITACHI, LTD.
发明人： Yasunari SOHDA , Momoyo ENYAMA , Megumi KIMURA , Koichi HAMADA
IPC分类号： H01J37/22 , H01J37/285 , H01J37/147 , H01J37/28
摘要： An electron beam device suitable for observing the bottom of a deep groove or hole with a high degree of accuracy under a large current condition includes: an electron optical system having an irradiation optical system to irradiate a first aperture with an electron beam emitted from an electron source and a reduction projection optical system to project and form an aperture image of the first aperture on a sample, detectors to detect secondary electrons emitted by irradiating the sample with the electron beam through the electron optical system. An image processing unit generates a two-dimensional image from detection signals obtained by irradiating the sample while the electron beam scans the sample two-dimensionally by scanning deflectors of the electron optical system. Further, generates a reconstructed image by deconvoluting electron beam intensity distribution information of an ideal aperture image of the first aperture from the generated two-dimensional image information.
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公开(公告)号：US20190035597A1
公开(公告)日：2019-01-31
申请号：US16043958
申请日：2018-07-24
申请人： HITACHI, LTD.
CPC分类号： H01J37/222 , G06K9/0014 , G06K9/3233 , G06K9/4661 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/20207 , H01J2237/20214 , H01J2237/20235 , H01J2237/2804 , H01J2237/2806 , H01J2237/2813 , H01J2237/282
摘要： In this invention, information of material composition, process conditions and candidates of crystal structure either known or imported from material database is used to determine sample stage tilt angle and working distance (WD). Under these determined tilt angle and WD, the intensity of the electrons emitted at different angles and with different energies is measured using a scanning electron microscope (SEM) system comprising: a use of materials database containing materials composition, formation process, crystal structure and its electron yield; a sample stage that is able to move, rotate and tilt; an processing section for calculating optimum working distance for an observation from material database and measurement condition; means for acquiring an image of crystal information of a desired area of a sample based on an image obtained from SEM observation.
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公开(公告)号：US20180261426A1
公开(公告)日：2018-09-13
申请号：US15916968
申请日：2018-03-09
申请人： HITACHI, LTD.
发明人： Megumi KIMURA , Momoyo ENYAMA , Makoto SAKAKIBARA
IPC分类号： H01J37/28 , H01J37/147
CPC分类号： H01J37/28 , H01J37/1474
摘要： To reduce the risk of measurement accuracy degradation and information lost due to adhesion of contamination that occurs by irradiation with charged particle beam.The charged particle beam device includes: a deflector for scanning a charged particle beam; a detector for detecting secondary charged particles generated by the interaction of the charged particle beam with a sample; and a system control unit including a calculation part, a measurement part, and a storage part. The measurement part measures a feature amount from an image formed based on a signal output from the detector after a charged particle beam is scanned on the sample by the deflector (S303). The calculation part calculates an amount of contamination adhering to a surface of the sample by irradiation of the sample with the charged particle beam, from a change in the feature amount measured by the measurement part (S304). Then, the storage part adds the information of the contamination amount to the image and stores the image information (S313).
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公开(公告)号：US20180232869A1
公开(公告)日：2018-08-16
申请号：US15894605
申请日：2018-02-12
申请人： HITACHI, LTD.
摘要： An image forming apparatus includes an observation image input section in which a plurality of observation images is input, an emphasis information input section that inputs information to be emphasized, a storage section that defines a plurality of conversion functions that converts the plurality of observation images into a converted image on the basis of a function for conversion and takes, as a parameter, a gradation value of each pixel in the plurality of observation images and a plurality of emphasis functions that takes, as a parameter, a gradation value of each pixel in the conversion functions, an image calculation section that calculates an image in which information to be emphasized is emphasized on the basis of the plurality of input observation images, the input information of the information to be emphasized, the conversion functions, and the emphasis functions, and an emphasized image output section that outputs the emphasized image.
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公开(公告)号：US20200225175A1
公开(公告)日：2020-07-16
申请号：US16603663
申请日：2018-03-16
申请人： HITACHI, LTD.
IPC分类号： G01N23/2206 , G01N23/2204
摘要： The purpose of the present invention is to provide a multi-coordinated analyzing device that makes it possible to readily observe the same visual field by using a plurality of different kinds of analyzing device and in which observation results for the same visual field are recorded collectively. An analyzing system according to the present invention includes: a first analyzing unit that obtains first observation data by analyzing a sample and that also obtains position information about the analyzed sample; a position setting unit that performs position alignment of the sample on the basis of the position information obtained by the first analyzing unit; and a second analyzing unit that obtains second observation data by analyzing, by using a method different from the method used by the first analyzing unit, the sample placed at the position aligned by the position setting unit (see FIG. 1).
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公开(公告)号：US20180261425A1
公开(公告)日：2018-09-13
申请号：US15918464
申请日：2018-03-12
申请人： Hitachi, Ltd.
IPC分类号： H01J37/244 , H01J37/20 , H01J37/10 , H01J37/28
CPC分类号： H01J37/244 , H01J37/10 , H01J37/20 , H01J37/28 , H01J2237/2443 , H01J2237/2446 , H01J2237/2448 , H01J2237/28
摘要： A charged particle detector including a scintillator that is irradiated with charged particles, a fluorescent film being in contact with a first surface facing a second surface of the scintillator, the second surface being irradiated with the charged particles, and a photodetector that detects luminescence of the fluorescent film, wherein the fluorescent film has a plurality of regions, the plurality of regions respectively have phosphors that absorb luminescence of the scintillator and emit light with different wavelengths from one another, and a charged particle beam device using the charged particle detector.
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公开(公告)号：US20180033587A1
公开(公告)日：2018-02-01
申请号：US15664131
申请日：2017-07-31
申请人： HITACHI, LTD.
发明人： Momoyo ENYAMA , Yasuhiro SHIRASAKI , Natsuki TSUNO
IPC分类号： H01J37/08
CPC分类号： H01J37/08 , H01J2237/15
摘要： A charged particle beam apparatus includes a charged particle source, a separator, a charged particle beam irradiation switch, and a control device. The separator is inserted into a charged particle optical system and deflects a traveling direction of a charged particle beam out of an optical axis of the charged particle optical system or deflects the traveling direction in the optical axis of the charged particle optical system. The charged particle beam irradiation switch absorbs the charged particle beam deflected out of the optical axis of the charged particle optical system or reflects the charged particle beam toward the separator. The control device controls a charged particle beam irradiation switch.
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