公开(公告)号：US07479362B2

公开(公告)日：2009-01-20

申请号：US11116265

申请日：2005-04-28

申请人： Hitoshi Fukushima ,  Hiroshi Takiguchi ,  Tatsuya Shimoda ,  Takashi Masuda ,  Richard James Bushby ,  Stephan Evans ,  J.P. Jeyadevan ,  Kevin Critchley

发明人： Hitoshi Fukushima ,  Hiroshi Takiguchi ,  Tatsuya Shimoda ,  Takashi Masuda ,  Richard James Bushby ,  Stephan Evans ,  J.P. Jeyadevan ,  Kevin Critchley

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： C07D207/404 ,  B82Y30/00 ,  G03F7/0045 ,  G03F7/165 ,  Y10S430/116 ,  Y10S430/136

摘要： Aspects of the invention provide a method of controlling the solid-state property of the solid-phase surface or controlling forming reactive region. The method can be attained by using a device for ejecting droplets and a molecule for inclusion in a SAM which can be photo-patterned in a short period of time using low energy UV radiation, that is TV radiation having a relatively long wavelength. The invention can provide monomolecular film that is formed from molecules comprising a structural component (B) which is hydrophobic and/or lipophobic, and a structural component (A) which decomposes when irradiated with UV light having a wavelength in the range 254-400 nm to cleave away a part of the molecule having the structural component (B) leaving a residual hydrophilic structural component (C). Further, the invention can provide a method of forming a film pattern comprising; at least a step of ejecting a droplet, which includes a compound represented as the following Formula (0), on a solid-phase surface having a functional moiety: X—Y-Z   (0) where, X represents a structure having reactivity to a functional moiety which exists at the solid-phase surface, Y represents a decomposable structure by itself and Z represents a structure which is capable of changing solid-state properties on the solid-phase surface or a reactive structure.

摘要翻译： 本发明的方面提供了一种控制固相表面的固态特性或控制成形反应区的方法。 该方法可以通过使用用于喷射液滴的装置和用于包含在SAM中的分子来实现，该SAM可以使用低能量UV辐射（即具有相对长的波长的电视辐射）在短时间内进行光刻图案化。 本发明可以提供由分子构成的单分子膜，该分子包含疏水性和/或疏水性的结构成分（B）和当波长为254-400nm的紫外线照射时分解的结构成分（A） 以除去具有结构组分（B）的分子的一部分，留下残留的亲水结构组分（C）。 此外，本发明可以提供一种形成膜图案的方法，包括： 在具有功能部分的固相表面上至少喷射包含下述式（0）表示的化合物的液滴的步骤：<？in-line-formula description =“In-line Formulas”end = “lead”？> XYZ（0）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中，X表示与固相存在的功能部分具有反应性的结构 表面，Y表示本身可分解的结构，Z表示能够改变固相表面或反应性结构的固态性质的结构。

公开(公告)号：US20050245739A1

公开(公告)日：2005-11-03

申请号：US11116265

申请日：2005-04-28

申请人： Hitoshi Fukushima ,  Hiroshi Takiguchi ,  Tatsuya Shimoda ,  Takashi Masuda ,  Richard Bushby ,  Stephan Evans ,  J.P. Jeyadevan ,  Kevin Critchley

发明人： Hitoshi Fukushima ,  Hiroshi Takiguchi ,  Tatsuya Shimoda ,  Takashi Masuda ,  Richard Bushby ,  Stephan Evans ,  J.P. Jeyadevan ,  Kevin Critchley

IPC分类号： C07D207/40 ,  C07D207/404 ,  G03F7/004 ,  G03F7/16 ,  C07D487/04

CPC分类号： C07D207/404 ,  B82Y30/00 ,  G03F7/0045 ,  G03F7/165 ,  Y10S430/116 ,  Y10S430/136

摘要： Aspects of the invention provide a method of controlling the solid-state property of the solid-phase surface or controlling forming reactive region. The method can be attained by using a device for ejecting droplets and a molecule for inclusion in a SAM which can be photo-patterned in a short period of time using low energy UV radiation, that is TV radiation having a relatively long wavelength. The invention can provide monomolecular film that is formed from molecules comprising a structural component (B) which is hydrophobic and/or lipophobic, and a structural component (A) which decomposes when irradiated with UV light having a wavelength in the range 254-400 nm to cleave away a part of the molecule having the structural component (B) leaving a residual hydrophilic structural component (C). Further, the invention can provide a method of forming a film pattern comprising; at least a step of ejecting a droplet, which includes a compound represented as the following Formula (0), on a solid-phase surface having a functional moiety: X—Y—Z   (0) where, X represents a structure having reactivity to a functional moiety which exists at the solid-phase surface, Y represents a decomposable structure by itself and Z represents a structure which is capable of changing solid-state properties on the solid-phase surface or a reactive structure.

摘要翻译： 本发明的方面提供了一种控制固相表面的固态特性或控制成形反应区的方法。 该方法可以通过使用用于喷射液滴的装置和用于包含在SAM中的分子来实现，该SAM可以使用低能量UV辐射（即具有相对长的波长的电视辐射）在短时间内进行光刻图案化。 本发明可以提供由分子构成的单分子膜，该分子包含疏水性和/或疏水性的结构成分（B）和当波长为254-400nm的紫外线照射时分解的结构成分（A） 以除去具有结构组分（B）的分子的一部分，留下残留的亲水结构组分（C）。 此外，本发明可以提供一种形成膜图案的方法，包括： 在具有功能部分的固相表面上至少喷射包含下述式（0）表示的化合物的液滴的步骤：<？in-line-formula description =“In-line Formulas”end = “lead”？> XYZ（0）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中，X表示与固相存在的功能部分具有反应性的结构 表面，Y表示本身可分解的结构，Z表示能够改变固相表面或反应性结构的固态性质的结构。

公开(公告)号：US20050146588A1

公开(公告)日：2005-07-07

申请号：US11068303

申请日：2005-02-28

申请人： Hiroshi Kiguchi ,  Hitoshi Fukushima ,  Satoshi Nebashi ,  Tatsuya Shimoda

发明人： Hiroshi Kiguchi ,  Hitoshi Fukushima ,  Satoshi Nebashi ,  Tatsuya Shimoda

IPC分类号： B41J2/01 ,  H01L21/00 ,  H01L21/3205 ,  H01L21/768 ,  H01L51/00 ,  H01L51/40 ,  H05K3/12

CPC分类号： H01L21/6715 ,  H01L21/288 ,  H01L21/768 ,  H01L21/76838 ,  H01L27/1292 ,  H01L51/0005 ,  H05K3/125

摘要： A pattern formation method for discharging a prescribed fluid onto a substrate form an ink-jet head and forming an arbitrary pattern. The method including the steps of discharging the fluid onto the substrate from an ink jet head and defining a pattern-forming region by subjecting the substrate to a specific treatment to prevent the fluid from spreading. The pattern forming region is formed after the fluid has been ejected so that the arbitrary pattern is formed in the fluid corresponding to the pattern-forming region. The treatment is one in which banks for preventing the fluid from flowing out are formed around the pattern-forming region. The method also includes removing the banks following the formation of the pattern.

公开(公告)号：US07029841B2

公开(公告)日：2006-04-18

申请号：US09163199

申请日：1998-09-30

申请人： Hitoshi Fukushima ,  Tatsuya Shimoda ,  Hywel Morgan

发明人： Hitoshi Fukushima ,  Tatsuya Shimoda ,  Hywel Morgan

IPC分类号： C12Q1/68

CPC分类号： G01N33/54366 ,  B01J2219/00378 ,  B01J2219/00653 ,  B01J2219/00659 ,  B41J2/01 ,  C12Q1/6834 ,  C40B60/14

摘要： The object of this invention is to provide a method by which to form molecule recognizing films on sensor electrodes efficiently, within a short period, uniformly and in a high quality state. Another object of this invention is to provide a method by which to accurately introduce a vast number of biological samples for evaluation to the plural minute sensor electrode dots within a short period and efficiently.In order to form organic thin films on electrodes, a solution of a material for the organic thin film is accurately printed via an ink-jet onto the surface of microelectrodes as required, thereby producing a high density array of microelectrodes. Further, a solution of a sample substance or a liquid substance to be sensed is ejected into air via an ink-jet nozzle to fall to the surface of organic thin membranes on the microelectrodes so that the sample is evaluated.

公开(公告)号：US06762050B2

公开(公告)日：2004-07-13

申请号：US09870588

申请日：2001-06-01

申请人： Hitoshi Fukushima ,  Tatsuya Shimoda ,  Hywel Morgan

发明人： Hitoshi Fukushima ,  Tatsuya Shimoda ,  Hywel Morgan

IPC分类号： C12M136

CPC分类号： G01N33/54366 ,  B01J2219/00378 ,  B01J2219/00653 ,  B01J2219/00659 ,  B41J2/01 ,  C12Q1/6834 ,  C40B60/14

摘要： In order to form organic thin films on electrodes, a solution of a material for the organic thin film is accurately printed via an ink-jet onto the surface of microelectrodes as required, thereby producing a high density array of microelectrodes. Further, a solution of a sample substance or a liquid substance to be sensed is ejected into air via an ink-jet nozzle to fall to the surface of organic thin membranes on the microelectrodes so that the sample can be evaluated.

摘要翻译： 为了在电极上形成有机薄膜，根据需要，通过喷墨将有机薄膜的材料溶液精确地印刷到微电极的表面上，从而产生高密度的微电极阵列。 此外，待检测的样品物质或液体物质的溶液通过喷墨嘴喷射到空气中以落在微电极上的有机薄膜表面上，从而可以评估样品。

公开(公告)号：US07114802B2

公开(公告)日：2006-10-03

申请号：US11068303

申请日：2005-02-28

申请人： Hiroshi Kiguchi ,  Hitoshi Fukushima ,  Satoshi Nebashi ,  Tatsuya Shimoda

发明人： Hiroshi Kiguchi ,  Hitoshi Fukushima ,  Satoshi Nebashi ,  Tatsuya Shimoda

IPC分类号： B41J2/01

CPC分类号： H01L21/6715 ,  H01L21/288 ,  H01L21/768 ,  H01L21/76838 ,  H01L27/1292 ,  H01L51/0005 ,  H05K3/125

摘要： A pattern formation method for discharging a prescribed fluid onto a substrate form an ink-jet head and forming an arbitrary pattern. The method including the steps of discharging the fluid onto the substrate from an ink jet head and defining a pattern-forming region by subjecting the substrate to a specific treatment to prevent the fluid from spreading. The pattern forming region is formed after the fluid has been ejected so that the arbitrary pattern is formed in the fluid corresponding to the pattern-forming region. The treatment is one in which banks for preventing the fluid from flowing out are formed around the pattern-forming region. The method also includes removing the banks following the formation of the pattern.

摘要翻译： 用于将规定流体排放到基板上的图案形成方法形成喷墨头并形成任意图案。 该方法包括以下步骤：从喷墨头将流体排放到基底上，并通过对衬底进行特定处理以限制流体的扩散来限定图案形成区域。 图案形成区域在流体喷射之后形成，使得在对应于图案形成区域的流体中形成任意图案。 处理是在图案形成区域周围形成用于防止流体流出的堤。 该方法还包括在形成图案之后去除堤。

公开(公告)号：US06877853B2

公开(公告)日：2005-04-12

申请号：US10445621

申请日：2003-05-27

申请人： Hiroshi Kiguchi ,  Hitoshi Fukushima ,  Satoshi Nebashi ,  Tatsuya Shimoda

发明人： Hiroshi Kiguchi ,  Hitoshi Fukushima ,  Satoshi Nebashi ,  Tatsuya Shimoda

IPC分类号： B41J2/01 ,  H01L21/00 ,  H01L21/3205 ,  H01L21/768 ,  H01L51/00 ,  H01L51/40 ,  H05K3/12 ,  B41J2/17

CPC分类号： H01L21/6715 ,  H01L21/288 ,  H01L21/768 ,  H01L21/76838 ,  H01L27/1292 ,  H01L51/0005 ,  H05K3/125

摘要： A pattern formation method for discharging a prescribed fluid onto a substrate form an ink-jet head and forming an arbitrary pattern. The method including the steps of discharging the fluid onto the substrate from an ink jet head and defining a pattern-forming region by subjecting the substrate to a specific treatment to prevent the fluid from spreading. The pattern forming region is formed after the fluid has been ejected so that the arbitrary pattern is formed in the fluid corresponding to the pattern-forming region. The treatment is one in which banks for preventing the fluid from flowing out are formed around the pattern-forming region. The method also includes removing the banks following the formation of the pattern.

摘要翻译： 用于将规定流体排放到基板上的图案形成方法形成喷墨头并形成任意图案。 该方法包括以下步骤：从喷墨头将流体排放到基底上，并通过对衬底进行特定处理以限制流体的扩散来限定图案形成区域。 图案形成区域在流体喷射之后形成，使得在对应于图案形成区域的流体中形成任意图案。 处理是在图案形成区域周围形成用于防止流体流出的堤。 该方法还包括在形成图案之后去除堤。

公开(公告)号：US06599582B2

公开(公告)日：2003-07-29

申请号：US09232682

申请日：1999-01-19

申请人： Hiroshi Kiguchi ,  Hitoshi Fukushima ,  Satoshi Nebashi ,  Tatsuya Shimoda

发明人： Hiroshi Kiguchi ,  Hitoshi Fukushima ,  Satoshi Nebashi ,  Tatsuya Shimoda

IPC分类号： B05D104

CPC分类号： H01L21/6715 ,  H01L21/288 ,  H01L21/768 ,  H01L21/76838 ,  H01L27/1292 ,  H01L51/0005 ,  H05K3/125

摘要： Provided is a substrate manufacturing technique for forming patterns on substrates with the aid of an ink-jet systems. Relates to a substrate manufacturing apparatus for forming arbitrary patterns on a substrate 1 from a fluid 11. This apparatus comprises an ink-jet print head 2 configured to allow the fluid 11 to be ejected onto the substrate 1; treatment means 3 for performing a specific treatment on the substrate 1; drive means 4 configured to allow the relative positions of the ink-jet print head 2, the treatment means 3, and the substrate 1 to be varied; and control means 5 for controlling the ejection of the fluid 11 from the ink-jet print head 2, the treatment performed by the treatment means 3, and the drive effected by the drive means 4. The control means 5 is configured to allow the treatment by the treatment means to be performed prior to the ejection of fluid from the ink-jet print head 2.

摘要翻译： 提供了一种用于在喷墨系统的帮助下在基板上形成图案的基板制造技术。 关于用于从流体11在基板1上形成任意图案的基板制造装置。该装置包括喷墨打印头2，其被配置为允许流体11被喷射到基板1上; 用于对基板1进行特定处理的处理装置3; 驱动装置4，被配置为允许喷墨打印头2，处理装置3和基板1的相对位置改变; 以及用于控制来自喷墨打印头2的流体11的喷射，由处理装置3进行的处理以及由驱动装置4进行的驱动的控制装置5.控制装置5被配置为允许处理 通过在从喷墨打印头2喷射流体之前执行的处理装置。

公开(公告)号：US20120064302A1

公开(公告)日：2012-03-15

申请号：US13263805

申请日：2010-04-09

申请人： Tatsuya Shimoda ,  Yasuo Matsuki ,  Ryo Kawajiri ,  Takashi Masuda ,  Toshihiko Kaneda

发明人： Tatsuya Shimoda ,  Yasuo Matsuki ,  Ryo Kawajiri ,  Takashi Masuda ,  Toshihiko Kaneda

IPC分类号： B32B3/30 ,  B05D3/12

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C01B33/02 ,  C01B33/027 ,  C01B33/18 ,  C01P2004/01 ,  C01P2004/20 ,  C23C18/06 ,  C23C18/08 ,  C23C18/1208 ,  C23C18/1279 ,  C23C18/14 ,  H01L21/02164 ,  H01L21/02282 ,  H01L21/0237 ,  H01L21/02532 ,  H01L21/02623 ,  H01L21/02656 ,  H01L21/31 ,  Y10T428/24612

摘要： A patterning method comprising the steps of:the first step of disposing at least one silane compound selected from the group consisting of a silicon hydride compound and a silicon halide compound in the space between a substrate and a patterned mold; andthe second step of subjecting the silane compound to at least one treatment selected from a heat treatment and an ultraviolet exposure treatment.A pattern composed of silicon can be formed by carrying out the second step in an inert atmosphere or a reducing atmosphere and a pattern composed of silicon oxide can be formed by carrying out at least part of the second step in an oxygen-containing atmosphere.

摘要翻译： 一种图案化方法，包括以下步骤：在衬底和图案化模具之间的空间中设置选自由硅化合物和硅卤化物组成的组中的至少一种硅烷化合物的第一步骤; 以及对硅烷化合物进行选自热处理和紫外线曝光处理中的至少一种处理的第二步骤。 可以通过在惰性气氛或还原气氛中进行第二步骤形成由硅构成的图案，并且可以通过在含氧气氛中进行至少一部分第二步骤来形成由氧化硅组成的图案。

公开(公告)号：US10461337B2

公开(公告)日：2019-10-29

申请号：US15903092

申请日：2018-02-23

申请人： Tatsuya Shimoda ,  Takashi Masuda ,  Toshiya Saito ,  Shingo Ohta

发明人： Tatsuya Shimoda ,  Takashi Masuda ,  Toshiya Saito ,  Shingo Ohta

IPC分类号： H01B1/06 ,  H01B1/08 ,  H01M4/38 ,  H01M4/134 ,  H01M10/052 ,  H01M10/0562 ,  H01M10/0585 ,  H01M6/18 ,  H01M4/04 ,  H01M4/1395 ,  H01M10/058

摘要： An oxide all-solid-state battery excellent in lithium ion conductivity and joint strength between an anode active material layer and solid electrolyte layer thereof. In the oxide all-solid-state battery, the solid electrolyte layer is a layer mainly containing a garnet-type oxide solid electrolyte sintered body represented by the following formula (1): (Lix-3y-z, Ey, Hz)LαMβOγ; a solid electrolyte interface layer is disposed between the anode active material layer and the solid electrolyte layer; the solid electrolyte interface layer contains at least a Si element and an O element; and a laminate containing at least the anode active material layer, the solid electrolyte interface layer and the solid electrolyte layer has peaks at positions where 2θ=32.3°±0.5°, 37.6°±0.5°, 43.8°±0.5°, and 57.7°±0.5° in a XRD spectrum obtained by XRD measurement using CuKα irradiation.