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    Systems and methods for distinguishing reflections of multiple laser beams for calibration for semiconductor structure processing
    1.
    发明申请
    Systems and methods for distinguishing reflections of multiple laser beams for calibration for semiconductor structure processing 有权
    用于区分多个激光束的反射用于半导体结构处理的校准的系统和方法

    公开(公告)号：US20070008534A1

    公开(公告)日：2007-01-11

    申请号：US11499394

    申请日：2006-08-03

    申请人： Ho Lo ,  David Hemenway ,  Brady Nilsen ,  Kelly Bruland

    发明人： Ho Lo ,  David Hemenway ,  Brady Nilsen ,  Kelly Bruland

    IPC分类号： G01B11/00

    CPC分类号： H01L23/5258 ,  G11C17/14 ,  G11C17/143 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A system determines relative positions of a semiconductor substrate and a plurality of laser beam spots on or within the semiconductor substrate in a machine for selectively irradiating structures on or within the substrate using a plurality of laser beams. The system comprises a laser source, first and second laser beam propagation paths, first and second reflection sensors, and a processor. The laser source produces at least the first and second laser beams, which propagate toward the substrate along the first and second propagation paths, respectively, which have respective first and second axes that intersects the substrate at respective first and second spots. The reflection sensors are positioned to detect reflection of the spots, as the spots moves relative to the substrate, thereby generating reflection signals. The processor is configured to determine, based on the reflection signals, positions of the spots on or within the substrate.

    摘要翻译： 系统确定半导体衬底和机器中半导体衬底上或半导体衬底内的多个激光束点的相对位置，用于使用多个激光束选择性地照射衬底上或衬底内的结构。 该系统包括激光源，第一和第二激光束传播路径，第一和第二反射传感器以及处理器。 激光源至少产生第一和第二激光束，其分别沿着第一和第二传播路径朝着衬底传播，其具有在相应的第一和第二点处与衬底相交的相应的第一和第二轴。 反射传感器被定位成检测点的反射，因为光点相对于基板移动，从而产生反射信号。 处理器被配置为基于反射信号确定基板上或内部的斑点的位置。

    Efficient micro-machining apparatus and method employing multiple laser beams
    2.
    发明申请
    Efficient micro-machining apparatus and method employing multiple laser beams 审中-公开
    高效的微加工设备和采用多个激光束的方法

    公开(公告)号：US20050224469A1

    公开(公告)日：2005-10-13

    申请号：US11000333

    申请日：2004-11-29

    申请人： Donald Cutler ,  Brian Baird ,  Richard Harris ,  David Hemenway ,  Ho Lo ,  Brady Nilsen ,  Yasu Osako ,  Lei Sun ,  Yunlong Sun ,  Mark Unrath

    发明人： Donald Cutler ,  Brian Baird ,  Richard Harris ,  David Hemenway ,  Ho Lo ,  Brady Nilsen ,  Yasu Osako ,  Lei Sun ,  Yunlong Sun ,  Mark Unrath

    IPC分类号： B23K26/06 ,  B23K26/00

    CPC分类号： B23K26/06

    摘要： A laser beam switching system employs a laser coupled to a beam switching device that causes a laser beam to switch between first and second beam positioning heads such that while the first beam positioning head is directing the laser beam to process a workpiece target location, the second beam positioning head is moving to another target location and vice versa. A preferred beam switching device includes first and second AOMs positioned such that the laser beam passes through the AOMs without being deflected. When RF is applied to the first AOM, the laser beam is diffracted toward the first beam positioning head, and when RF is applied to the second AOM, the laser beam is diffracted toward the second beam positioning head.

    摘要翻译： 激光束切换系统采用耦合到光束切换装置的激光器，其使激光束在第一和第二光束定位头之间切换，使得当第一光束定位头引导激光束来处理工件目标位置时，第二 光束定位头正在移动到另一个目标位置，反之亦然。 优选的光束切换装置包括第一和第二AOM，其被定位成使得激光束不经偏转地穿过AOM。 当RF施加到第一AOM时，激光束朝向第一光束定位头衍射，并且当RF施加到第二AOM时，激光束被朝向第二光束定位头衍射。

    OPTICAL COMPONENT CLEANLINESS AND DEBRIS MANAGEMENT IN LASER MICROMACHINING APPLICATIONS
    4.
    发明申请
    OPTICAL COMPONENT CLEANLINESS AND DEBRIS MANAGEMENT IN LASER MICROMACHINING APPLICATIONS 有权
    光学组件清洁和清洁管理在激光微型应用中

    公开(公告)号：US20070127122A1

    公开(公告)日：2007-06-07

    申请号：US11565356

    申请日：2006-11-30

    申请人： Bryan Bolt ,  David Hemenway ,  Mark Kosmowski ,  A. Lerner ,  Brady Nilsen ,  Richard Pope

    发明人： Bryan Bolt ,  David Hemenway ,  Mark Kosmowski ,  A. Lerner ,  Brady Nilsen ,  Richard Pope

    IPC分类号： B60R1/06

    CPC分类号： B23K26/12 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/128 ,  B23K26/14 ,  B23K26/142

    摘要： Preferred embodiments of a purge gas port, laser beam attenuating input window, and laser shutter constitute subsystems of a UV laser optical system in which a laser beam is completely enclosed to reduce contamination of the optical system components. Purge gas is injected through multiple locations in a beam tube assembly to ensure that the optical component surfaces sensitive to contamination are in the flow path of the purge gas. The input window functions as a fixed level attenuator to limit photopolymerization of airborne molecules and particles. Periodically rotating optical elements asymmetrically in their holders reduces burn damage to the optics.

    摘要翻译： 吹扫气体端口，激光束衰减输入窗口和激光快门的优选实施例构成UV激光光学系统的子系统，其中激光束被完全封闭以减少光学系统部件的污染。 吹扫气体通过射束管组件中的多个位置注入，以确保对污染敏感的光学部件表面位于吹扫气体的流动路径中。 输入窗口用作固定电平衰减器，以限制空气传播的分子和颗粒的光聚合。 在其支架中不对称地定期旋转的光学元件减少了对光学元件的烧伤。

    HIGH ENERGY PULSE SUPPRESSION METHOD
    5.
    发明申请
    HIGH ENERGY PULSE SUPPRESSION METHOD 有权
    高能量脉冲抑制方法

    公开(公告)号：US20100046561A1

    公开(公告)日：2010-02-25

    申请号：US12605989

    申请日：2009-10-26

    申请人： Keith Grant ,  Steve Stone ,  Brady Nilsen

    发明人： Keith Grant ,  Steve Stone ,  Brady Nilsen

    IPC分类号： H01S3/11 ,  H01S3/10

    CPC分类号： H01S3/117 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/0853 ,  B23K26/40 ,  B23K2101/36 ,  B23K2103/50 ,  H01S3/10 ,  H01S3/10038 ,  H01S3/10069 ,  H01S3/1024 ,  H01S3/1611 ,  H01S3/1673 ,  H05K3/0026 ,  H05K3/0038

    摘要： A laser processes a workpiece with laser pulses delivered at random time intervals and at substantially constant energy levels by characterizing the laser cavity discharge behavior and utilizing that information for adjusting dummy pulse time periods to compensate for the energy errors. Dummy pulses are laser pulses that are blocked from reaching a workpiece. A second way for providing constant pulse energies employs an AOM for varying amounts of laser energy passed to the workpiece. A third way of providing constant pulse energies entails extending the pulse period of selected pulses to allow additional laser cavity charging time whenever a dummy pulse is initiated.

    摘要翻译： 激光通过表征激光腔排放行为并利用该信息调整虚拟脉冲时间周期来补偿能量误差，以随机时间间隔和基本上恒定的能量级别递送的激光脉冲来处理工件。 虚拟脉冲是被阻止到达工件的激光脉冲。 提供恒定脉冲能量的第二种方法使用AOM来改变传递给工件的激光能量。 提供恒定脉冲能量的第三种方式需要延长所选脉冲的脉冲周期，以便每当启动虚拟脉冲时，允许额外的激光腔充电时间。

    Photonic clock stabilized laser comb processing
    7.
    发明授权
    Photonic clock stabilized laser comb processing 失效
    光子时钟稳定激光梳状加工

    公开(公告)号：US08358671B2

    公开(公告)日：2013-01-22

    申请号：US13186323

    申请日：2011-07-19

    申请人： Brian W. Baird ,  Kelly J. Bruland ,  Clint R. Vandergiessen ,  Mark A. Unrath ,  Brady Nilsen ,  Steve Swaringen

    发明人： Brian W. Baird ,  Kelly J. Bruland ,  Clint R. Vandergiessen ,  Mark A. Unrath ,  Brady Nilsen ,  Steve Swaringen

    IPC分类号： H01S3/10 ,  B23K26/00

    CPC分类号： H01S3/0007 ,  B23K26/042 ,  B23K26/0622 ,  B23K26/0853

    摘要： Processing a workpiece with a laser includes generating laser pulses at a first pulse repetition frequency. The first pulse repetition frequency provides reference timing for coordination of a beam positioning system and one or more cooperating beam position compensation elements to align beam delivery coordinates relative to the workpiece. The method also includes, at a second pulse repetition frequency that is lower than the first pulse repetition frequency, selectively amplifying a subset of the laser pulses. The selection of the laser pulses included in the subset is based on the first pulse repetition frequency and position data received from the beam positioning system. The method further includes adjusting the beam delivery coordinates using the one or more cooperating beam position compensation elements so as to direct the amplified laser pulses to selected targets on the workpiece.

    摘要翻译： 用激光加工工件包括以第一脉冲重复频率产生激光脉冲。 第一脉冲重复频率提供用于协调光束定位系统和一个或多个配合光束位置补偿元件的参考定时，以相对于工件对准光束传送坐标。 该方法还包括在低于第一脉冲重复频率的第二脉冲重复频率下，选择性地放大激光脉冲的子集。 包括在子集中的激光脉冲的选择基于从波束定位系统接收的第一脉冲重复频率和位置数据。 该方法还包括使用一个或多个配合光束位置补偿元件来调整光束传送坐标，以便将放大的激光脉冲引导到工件上的选定目标。

    Method and system for preventing excessive energy build-up in a laser cavity
    8.
    发明申请
    Method and system for preventing excessive energy build-up in a laser cavity 失效
    用于防止激光腔内过多能量积聚的方法和系统

    公开(公告)号：US20060029113A1

    公开(公告)日：2006-02-09

    申请号：US10931460

    申请日：2004-08-31

    申请人： Brady Nilsen ,  Steve Stone

    发明人： Brady Nilsen ,  Steve Stone

    IPC分类号： H01S3/11 ,  H01S3/10

    CPC分类号： B23K26/0853 ,  B23K26/032 ,  B23K26/042 ,  B23K26/046 ,  B23K26/0622 ,  H01S3/0085

    摘要： A method and system decrease the amount of undesired laser radiation reaching a workpiece from a laser having a laser cavity and a Q-switch. The laser operates at any given time in one of at least two modes. In a first mode the laser emits pulses at a PRF (pulse repetition frequency) for selectively irradiating targets on or within a workpiece, and the pulses propagate along a propagation path to the workpiece. In a second mode less or no laser radiation desirably reaches the workpiece. The method is operable during the second mode. The method opens the Q switch more than the Q switch is open in the first mode, thereby limiting the amount of energy that builds up in the laser cavity and decreasing the peak energy of the laser radiation emitted in the second mode.

    摘要翻译： 一种方法和系统减少从具有激光腔和Q开关的激光到达工件的不需要的激光辐射的量。 激光在任何​​给定的时间以至少两种模式之一操作。 在第一模式中，激光器以PRF（脉冲重复频率）发射脉冲，用于选择性地在工件上或在工件上照射靶，并且脉冲沿着传播路径传播到工件。 在第二模式中，较少或根本没有激光辐射到达工件。 该方法在第二模式期间可操作。 该方法比第一模式中的Q开关更多地打开Q开关，从而限制在激光腔中积聚的能量的量并且降低在第二模式中发射的激光辐射的峰值能量。

    High energy pulse suppression method
    9.
    发明申请
    High energy pulse suppression method 有权
    高能脉冲抑制方法

    公开(公告)号：US20050100062A1

    公开(公告)日：2005-05-12

    申请号：US10997586

    申请日：2004-11-24

    申请人： Keith Grant ,  Steve Stone ,  Brady Nilsen

    发明人： Keith Grant ,  Steve Stone ,  Brady Nilsen

    IPC分类号： H01S3/11

    CPC分类号： H01S3/117 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/0853 ,  B23K26/40 ,  B23K2101/36 ,  B23K2103/50 ,  H01S3/10 ,  H01S3/10038 ,  H01S3/10069 ,  H01S3/1024 ,  H01S3/1611 ,  H01S3/1673 ,  H05K3/0026 ,  H05K3/0038

    摘要： A laser processes a workpiece with laser pulses delivered at random time intervals and at substantially constant energy levels by characterizing the laser cavity discharge behavior and utilizing that information for adjusting dummy pulse time periods to compensate for the energy errors. Dummy pulses are laser pulses that are blocked from reaching a workpiece. A second way for providing constant pulse energies employs an AOM for varying amounts of laser energy passed to the workpiece. A third way of providing constant pulse energies entails extending the pulse period of selected pulses to allow additional laser cavity charging time whenever a dummy pulse is initiated.

    摘要翻译： 激光通过表征激光腔排放行为并利用该信息调整虚拟脉冲时间周期来补偿能量误差，以随机时间间隔和基本上恒定的能量级别递送的激光脉冲处理工件。 虚拟脉冲是被阻止到达工件的激光脉冲。 提供恒定脉冲能量的第二种方法使用AOM来改变传递给工件的激光能量。 提供恒定脉冲能量的第三种方式需要延长所选脉冲的脉冲周期，以便每当启动虚拟脉冲时，允许额外的激光腔充电时间。

    High energy pulse suppression method
    10.
    发明授权
    High energy pulse suppression method 有权
    高能脉冲抑制方法

    公开(公告)号：US08081668B2

    公开(公告)日：2011-12-20

    申请号：US12605989

    申请日：2009-10-26

    申请人： Keith Grant ,  Steve Stone ,  Brady Nilsen

    发明人： Keith Grant ,  Steve Stone ,  Brady Nilsen

    IPC分类号： H01S3/10

    CPC分类号： H01S3/117 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/0853 ,  B23K26/40 ,  B23K2101/36 ,  B23K2103/50 ,  H01S3/10 ,  H01S3/10038 ,  H01S3/10069 ,  H01S3/1024 ,  H01S3/1611 ,  H01S3/1673 ,  H05K3/0026 ,  H05K3/0038

    摘要： A laser processes a workpiece with laser pulses delivered at random time intervals and at substantially constant energy levels by characterizing the laser cavity discharge behavior and utilizing that information for adjusting dummy pulse time periods to compensate for the energy errors. Dummy pulses are laser pulses that are blocked from reaching a workpiece. A second way for providing constant pulse energies employs an AOM for varying amounts of laser energy passed to the workpiece. A third way of providing constant pulse energies entails extending the pulse period of selected pulses to allow additional laser cavity charging time whenever a dummy pulse is initiated.

    摘要翻译： 激光通过表征激光腔排放行为并利用该信息调整虚拟脉冲时间周期来补偿能量误差，以随机时间间隔和基本上恒定的能量级别递送的激光脉冲来处理工件。 虚拟脉冲是被阻止到达工件的激光脉冲。 提供恒定脉冲能量的第二种方法使用AOM来改变传递给工件的激光能量。 提供恒定脉冲能量的第三种方式需要延长所选脉冲的脉冲周期，以便每当启动虚拟脉冲时，允许额外的激光腔充电时间。