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    Thin film transistor array substrate and method of fabricating the same
    1.
    发明授权
    Thin film transistor array substrate and method of fabricating the same 有权
    薄膜晶体管阵列基板及其制造方法

    公开(公告)号：US08994023B2

    公开(公告)日：2015-03-31

    申请号：US13115088

    申请日：2011-05-24

    申请人： Hye-Young Ryu ,  Woo-Geun Lee ,  Young-Joo Choi ,  Kyoung-Jae Chung ,  Jin-Won Lee ,  Seung-Ha Choi ,  Hee-Jun Byeon ,  Pil-Sang Yun

    发明人： Hye-Young Ryu ,  Woo-Geun Lee ,  Young-Joo Choi ,  Kyoung-Jae Chung ,  Jin-Won Lee ,  Seung-Ha Choi ,  Hee-Jun Byeon ,  Pil-Sang Yun

    IPC分类号： H01L47/00 ,  H01L29/10 ,  H01L29/04 ,  H01L29/15 ,  H01L27/12

    CPC分类号： H01L27/1214 ,  H01L27/1225 ,  H01L27/1255

    摘要： A thin film transistor array substrate capable of reducing degradation of a device due to degradation of an oxide semiconductor pattern and a method of fabricating the same are provided. The thin film transistor array substrate may include an insulating substrate on which a gate electrode is formed, a gate insulating film formed on the insulating substrate, an oxide semiconductor pattern disposed on the gate insulating film, an anti-etching pattern formed on the oxide semiconductor pattern, and a source electrode and a drain electrode formed on the anti-etching pattern. The oxide semiconductor pattern may include an edge portion positioned between the source electrode and the drain electrode, and the edge portion may include at least one conductive region and at least one non-conductive region.

    摘要翻译： 提供了能够降低由于氧化物半导体图案的劣化引起的器件劣化的薄膜晶体管阵列基板及其制造方法。 薄膜晶体管阵列基板可以包括其上形成有栅极的绝缘基板，形成在绝缘基板上的栅极绝缘膜，设置在栅极绝缘膜上的氧化物半导体图案，形成在氧化物半导体上的抗蚀刻图案 图案，以及形成在防蚀刻图案上的源电极和漏电极。 氧化物半导体图案可以包括位于源电极和漏电极之间的边缘部分，并且边缘部分可以包括至少一个导电区域和至少一个非导电区域。

    Thin film transistor display panel and manufacturing method of the same
    5.
    发明授权
    Thin film transistor display panel and manufacturing method of the same 有权
    薄膜晶体管显示面板及其制造方法相同

    公开(公告)号：US09184090B2

    公开(公告)日：2015-11-10

    申请号：US13151102

    申请日：2011-06-01

    申请人： Seung-Ha Choi ,  Kyoung-Jae Chung ,  Woo-Geun Lee

    发明人： Seung-Ha Choi ,  Kyoung-Jae Chung ,  Woo-Geun Lee

    IPC分类号： H01L21/00 ,  H01L21/768 ,  G02F1/1333 ,  G02F1/1362 ,  H01L27/12 ,  H01L29/49 ,  H01L29/786 ,  H01L29/66

    CPC分类号： H01L21/76804 ,  G02F1/133345 ,  G02F1/136227 ,  G02F1/136286 ,  H01L21/76816 ,  H01L27/1225 ,  H01L27/1244 ,  H01L27/1248 ,  H01L29/4908 ,  H01L29/66969 ,  H01L29/78606 ,  H01L29/7869

    摘要： A TFT display panel having a high charge mobility and making it possible to obtain uniform electric characteristics with respect to a large-area display is provided as well as a manufacturing method thereof. A TFT display panel includes a gate electrode formed on an insulation substrate, a first gate insulting layer formed of SiNx on the gate electrode, a second gate insulting layer formed of SiOx on the first gate insulting layer, an oxide semiconductor layer formed to overlap the gate electrode and having a channel part, and a passivation layer formed of SiOx on the oxide semiconductor layer and the gate electrode, and the passivation layer includes a contact hole exposing the drain electrode. The contact hole has a shape in which the passivation layer of a portion directly exposed together with a metal occupies an area smaller than the upper passivation layer.

    摘要翻译： 提供具有高电荷迁移率并且可以获得相对于大面积显示器的均匀电特性的TFT显示面板及其制造方法。 TFT显示面板包括形成在绝缘基板上的栅极电极，栅极上由SiNx形成的第一栅极绝缘层，在第一栅极绝缘层上由SiOx形成的第二栅极绝缘层，形成为与栅极电极重叠的氧化物半导体层 栅电极，并具有通道部分，以及由氧化物半导体层和栅电极上的SiO x形成的钝化层，钝化层包括暴露漏电极的接触孔。 接触孔具有直接与金属一起暴露的部分的钝化层占据比上钝化层小的形状。

    Display substrate, display device, and method of manufacturing the display substrate
    6.
    发明授权
    Display substrate, display device, and method of manufacturing the display substrate 有权
    显示基板，显示装置以及制造显示基板的方法

    公开(公告)号：US08836877B2

    公开(公告)日：2014-09-16

    申请号：US13277114

    申请日：2011-10-19

    申请人： Seung-Ha Choi ,  Kyoung-Jae Chung ,  Woo-Geun Lee

    发明人： Seung-Ha Choi ,  Kyoung-Jae Chung ,  Woo-Geun Lee

    IPC分类号： G02F1/136 ,  H01L29/786 ,  G02F1/1362 ,  H01L29/66 ,  H01L29/49 ,  H01L27/12

    CPC分类号： H01L21/3086 ,  G02F1/136227 ,  H01L27/1225 ,  H01L27/1288 ,  H01L29/4908 ,  H01L29/66742 ,  H01L29/66969 ,  H01L29/7869

    摘要： Provided are a display substrate, a display device, and a method of manufacturing the display substrate. The display substrate includes: a substrate in which a pixel region is defined; a gate electrode and a gate pad are formed on the substrate; a gate insulating layer formed on the gate electrode and the gate pad; a buffer layer pattern overlaps the gate electrode and is formed on the gate insulating layer; an insulating film pattern formed on the buffer layer pattern; an oxide semiconductor pattern formed on the insulating film pattern; a source electrode formed on the oxide semiconductor pattern; and a drain electrode formed on the oxide semiconductor pattern and is separated from the source electrode.

    摘要翻译： 提供了显示基板，显示装置和制造显示基板的方法。 显示基板包括：限定像素区域的基板; 在基板上形成栅电极和栅极焊盘; 形成在栅极电极和栅极焊盘上的栅极绝缘层; 缓冲层图案与栅电极重叠并形成在栅极绝缘层上; 形成在缓冲层图案上的绝缘膜图案; 形成在所述绝缘膜图案上的氧化物半导体图案; 形成在所述氧化物半导体图案上的源电极; 以及形成在氧化物半导体图案上并与源电极分离的漏电极。

    THIN FILM DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME
    9.
    发明申请
    THIN FILM DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME 有权
    薄膜显示面板及其制造方法

    公开(公告)号：US20110114940A1

    公开(公告)日：2011-05-19

    申请号：US12818047

    申请日：2010-06-17

    申请人： Do-Hyun Kim ,  Kyoung-Jae Chung ,  Seung-Ha Choi ,  Dong-Hoon Lee ,  Chang-Oh Jeong ,  Suk-Won Jung

    发明人： Do-Hyun Kim ,  Kyoung-Jae Chung ,  Seung-Ha Choi ,  Dong-Hoon Lee ,  Chang-Oh Jeong ,  Suk-Won Jung

    IPC分类号： H01L29/786 ,  H01L21/36

    CPC分类号： H01L27/1225 ,  H01L21/02554 ,  H01L21/02565 ,  H01L21/02664 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/1288 ,  H01L27/3262

    摘要： A thin film transistor array panel includes: a substrate; a gate line disposed on the substrate and including a gate electrode; a gate insulating layer disposed on the gate line; an semiconductive oxide layer disposed on the gate insulating layer; a data line disposed on the semiconductive oxide layer and including a source electrode; a drain electrode facing the source electrode on the semiconductive oxide layer; and a passivation layer disposed on the data line. The semiconductive oxide layer is patterned with chlorine (Cl) containing gas which alters relative atomic concentrations of primary semiconductive characteristic-providing elements of the semiconductive oxide layer at least at a portion where a transistor channel region is defined.

    摘要翻译： 薄膜晶体管阵列面板包括：基板; 栅极线，设置在所述基板上并且包括栅电极; 设置在栅极线上的栅极绝缘层; 设置在所述栅极绝缘层上的半导体氧化物层; 数据线，设置在所述半导体氧化物层上并包括源电极; 在半导体氧化物层上面对源电极的漏电极; 以及设置在数据线上的钝化层。 至少在限定了晶体管沟道区域的部分，半导体氧化物层用含氯（Cl）的气体构图，该气体改变半导体氧化物层的初级半导体特性提供元件的相对原子浓度。

    Thin film display panel and method of manufacturing the same
    10.
    发明授权
    Thin film display panel and method of manufacturing the same 有权
    薄膜显示面板及其制造方法

    公开(公告)号：US08470623B2

    公开(公告)日：2013-06-25

    申请号：US12818047

    申请日：2010-06-17

    申请人： Do-Hyun Kim ,  Kyoung-Jae Chung ,  Seung-Ha Choi ,  Dong-Hoon Lee ,  Chang-Oh Jeong ,  Suk-Won Jung

    发明人： Do-Hyun Kim ,  Kyoung-Jae Chung ,  Seung-Ha Choi ,  Dong-Hoon Lee ,  Chang-Oh Jeong ,  Suk-Won Jung

    IPC分类号： H01L21/00

    CPC分类号： H01L27/1225 ,  H01L21/02554 ,  H01L21/02565 ,  H01L21/02664 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/1288 ,  H01L27/3262

    摘要： A thin film transistor array panel includes: a substrate; a gate line disposed on the substrate and including a gate electrode; a gate insulating layer disposed on the gate line; an semiconductive oxide layer disposed on the gate insulating layer; a data line disposed on the semiconductive oxide layer and including a source electrode; a drain electrode facing the source electrode on the semiconductive oxide layer; and a passivation layer disposed on the data line. The semiconductive oxide layer is patterned with chlorine (Cl) containing gas which alters relative atomic concentrations of primary semiconductive characteristic-providing elements of the semiconductive oxide layer at least at a portion where a transistor channel region is defined.

    摘要翻译： 薄膜晶体管阵列面板包括：基板; 栅极线，设置在所述基板上并且包括栅电极; 设置在栅极线上的栅极绝缘层; 设置在所述栅极绝缘层上的半导体氧化物层; 数据线，设置在所述半导体氧化物层上并包括源电极; 在半导体氧化物层上面对源电极的漏电极; 以及设置在数据线上的钝化层。 至少在限定了晶体管沟道区域的部分，半导体氧化物层用含氯（Cl）的气体构图，该气体改变半导体氧化物层的初级半导体特性提供元件的相对原子浓度。