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公开(公告)号：US20220410146A1
公开(公告)日：2022-12-29
申请号：US17898155
申请日：2022-08-29
Applicant: ILLUMINA, INC.
Inventor： Tarun Kumar Khurana , Arnaud Rival , Lewis J. Kraft , Steven Barnard , M. Shane Bowen , Xi-Jun Chen , Yir-Shyuan Wu , Jeffrey S. Fisher , Dajun Yuan
Abstract: An example of a flow cell includes a substrate, which includes nano-depressions defined in a surface of the substrate, and interstitial regions separating the nano-depressions. A hydrophobic material layer has a surface that is at least substantially co-planar with the interstitial regions and is positioned to define a hydrophobic barrier around respective sub-sets of the nano-depressions.
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公开(公告)号：US11332788B2
公开(公告)日：2022-05-17
申请号：US17153379
申请日：2021-01-20
Applicant: Illumina, Inc.
Inventor： Yir-Shyuan Wu , Yan-You Lin , M. Shane Bowen , Cyril Delattre , Fabien Abeille , Tarun Khurana , Arnaud Rival , Poorya Sabounchi , Dajun Yuan , Maria Candelaria Rogert Bacigalupo
IPC: C12Q1/6874 , C12Q1/6806 , G03F7/00 , B05D3/06 , G03F7/20
Abstract: Embodiments provided herewith are directed to self-assembled methods of preparing a patterned surface for sequencing applications including, for example, a patterned flow cell or a patterned surface for digital fluidic devices. The methods utilize photolithography to create a patterned surface with a plurality of microscale or nanoscale contours, separated by hydrophobic interstitial regions, without the need of oxygen plasma treatment during the photolithography process. In addition, the methods avoid the use of any chemical or mechanical polishing steps after the deposition of a gel material to the contours.
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公开(公告)号：US20250108375A1
公开(公告)日：2025-04-03
申请号：US18979010
申请日：2024-12-12
Applicant: ILLUMINA, INC.
Inventor： Aathavan Karunakaran , Arnaud Rival , Ali Agah , Fabien Abeille , Steven Barnard , Craig Ciesla , Murali Venkatesan , Pargol Gheissari , Jennifer Wang , Dietrich Dehlinger
IPC: B01L3/00
Abstract: A method for reducing sequencing by synthesis cycle time using a microfluidic device is provided. The microfluidic device comprises a flow cell having an inlet port, an outlet port, and a flow channel extending between the inlet port and the outlet port, wherein the flow channel receives an analyte of interest and one or more reagents for analyzing and detecting molecules. To aid in the acceleration of the reactions, the microfluidic device comprises a mixing device to increase the rates of diffusion of the reagents from the fluid bulk to an active surface of the flow cell. The mixing device comprises at least one of an electrothermal mixing device, an active mechanical mixing device, and a vibrational mixing device.
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公开(公告)号：US12009352B2
公开(公告)日：2024-06-11
申请号：US17419385
申请日：2020-09-16
Applicant: ILLUMINA, INC.
Inventor： Arvin Emadi , Jon Aday , Ali Agah , Arnaud Rival
CPC classification number: H01L25/167 , G01N21/6454 , H01L21/304 , H01L21/56 , H01L21/78 , H01L23/3128 , H01L24/11 , H01L24/13 , H01L24/97 , H01L2224/02333 , H01L2224/02379 , H01L2224/13008 , H01L2224/13009 , H01L2224/97
Abstract: Provided herein include various examples of a method for manufacturing aspects of an apparatus, a sensor system. The method may include obtaining a first carrier bonded to an upper surface of the silicon wafer. This wafer includes through silicon vias (TSVs) extended through openings in a passivation stack, with electrical contacts coupled to portions of the TSVs exposed through these openings. The method may include de-bonding the first carrier from the upper surface of the silicon wafer. The method may include dicing the silicon wafer into subsections comprising dies.
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公开(公告)号：US20220275443A1
公开(公告)日：2022-09-01
申请号：US17662124
申请日：2022-05-05
Applicant: Illumina, Inc.
Inventor： Yir-Shyuan Wu , Yan-You Lin , M. Shane Bowen , Cyril Delattre , Fabien Abeille , Tarun Khurana , Arnaud Rival , Poorya Sabounchi , Dajun Yuan , Maria Candelaria Rogert Bacigalupo
IPC: C12Q1/6874 , B05D3/06 , C12Q1/6806 , G03F7/00 , G03F7/20
Abstract: Embodiments provided herewith are directed to self-assembled methods of preparing a patterned surface for sequencing applications including, for example, a patterned flow cell or a patterned surface for digital fluidic devices. The methods utilize photolithography to create a patterned surface with a plurality of microscale or nanoscale contours, separated by hydrophobic interstitial regions, without the need of oxygen plasma treatment during the photolithography process. In addition, the methods avoid the use of any chemical or mechanical polishing steps after the deposition of a gel material to the contours.
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Patent Agency Ranking
公开(公告)号：US11318462B2
公开(公告)日：2022-05-03
申请号：US16750930
申请日：2020-01-23
Applicant: ILLUMINA, INC.
Inventor： Tarun Kumar Khurana , Arnaud Rival , Lewis J. Kraft , Steven Barnard , M. Shane Bowen , Xi-Jun Chen , Yir-Shyuan Wu , Jeffrey S. Fisher , Dajun Yuan
Abstract: An example of a flow cell includes a substrate, which includes nano-depressions defined in a surface of the substrate, and interstitial regions separating the nano-depressions. A hydrophobic material layer has a surface that is at least substantially co-planar with the interstitial regions and is positioned to define a hydrophobic barrier around respective sub-sets of the nano-depressions.
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公开(公告)号：US20210362151A1
公开(公告)日：2021-11-25
申请号：US17255819
申请日：2020-02-07
Applicant: ILLUMINA, INC.
Inventor： Aathavan Karunakaran , Arnaud Rival , Ali Agah , Fabien Abeille , Steven Barnard , Craig Ciesla , Murali Venkatesan , Pargol Gheissari , Jennifer Wang , Dietrich Dehlinger
IPC: B01L3/00
Abstract: A method for reducing sequencing by synthesis cycle time using a microfluidic device is provided. The microfluidic device comprises a flow cell having an inlet port, an outlet port, and a flow channel extending between the inlet port and the outlet port, wherein the flow channel receives an analyte of interest and one or more reagents for analyzing and detecting molecules. To aid in the acceleration of the reactions, the microfluidic device comprises a mixing device to increase the rates of diffusion of the reagents from the fluid bulk to an active surface of the flow cell. The mixing device comprises at least one of an electrothermal mixing device, an active mechanical mixing device, and a vibrational mixing device.
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公开(公告)号：US20210139979A1
公开(公告)日：2021-05-13
申请号：US17153379
申请日：2021-01-20
Applicant: Illumina, Inc.
Inventor： Yir-Shyuan Wu , Yan-You Lin , M. Shane Bowen , Cyril Delattre , Fabien Abeille , Tarun Khurana , Arnaud Rival , Poorya Sabounchi , Dajun Yuan , Maria Candelaria Rogert Bacigalupo
IPC: C12Q1/6874 , B05D3/06 , C12Q1/6806 , G03F7/00 , G03F7/20
Abstract: Embodiments provided herewith are directed to self-assembled methods of preparing a patterned surface for sequencing applications including, for example, a patterned flow cell or a patterned surface for digital fluidic devices. The methods utilize photolithography to create a patterned surface with a plurality of microscale or nanoscale contours, separated by hydrophobic interstitial regions, without the need of oxygen plasma treatment during the photolithography process. In addition, the methods avoid the use of any chemical or mechanical polishing steps after the deposition of a gel material to the contours.
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公开(公告)号：US10900076B2
公开(公告)日：2021-01-26
申请号：US16096669
申请日：2017-05-17
Applicant: Illumina, Inc.
Inventor： Yir-Shyuan Wu , Yan-You Lin , M. Shane Bowen , Cyril Delattre , Fabien Abeille , Tarun Khurana , Arnaud Rival , Poorya Sabounchi , Dajun Yuan , Maria Candelaria Rogert Bacigalupo
IPC: G03F7/20 , C12Q1/6874 , B05D3/06 , C12Q1/6806 , G03F7/00
Abstract: Embodiments provided herewith are directed to self-assembled methods of preparing a patterned surface for sequencing applications including, for example, a patterned flow cell or a patterned surface for digital fluidic devices. The methods utilize photolithography to create a patterned surface with a plurality of microscale or nanoscale contours, separated by hydrophobic interstitial regions, without the need of oxygen plasma treatment during the photolithography process. In addition, the methods avoid the use of any chemical or mechanical polishing steps after the deposition of a gel material to the contours.
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公开(公告)号：US20250091042A1
公开(公告)日：2025-03-20
申请号：US18965657
申请日：2024-12-02
Applicant: ILLUMINA, INC.
Inventor： Lewis J. Kraft , Tarun Kumar Khurana , Yir-Shyuan Wu , Xi-Jun Chen , Arnaud Rival , Justin Fullerton , M. Shane Bowen , Hui Han , Jeffrey S. Fisher , Yasaman Farshchi , Mathieu Lessard-Viger
Abstract: An example of a flow cell includes a substrate, a plurality of chambers defined on or in the substrate, and a plurality of depressions defined in the substrate and within a perimeter of each of the plurality of chambers. The depressions are separated by interstitial regions. Primers are attached within each of the plurality of depressions, and a capture site is located within each of the plurality of chambers.
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