UNDERLAYERS FOR TEXTURED FILMS OF HEUSLER COMPOUNDS
    3.
    发明申请
    UNDERLAYERS FOR TEXTURED FILMS OF HEUSLER COMPOUNDS 有权
    高分子化合物薄膜的底层

    公开(公告)号:US20160217842A1

    公开(公告)日:2016-07-28

    申请号:US14605908

    申请日:2015-01-26

    Abstract: A structure includes a tetragonal Heusler of the form Mn1+cX, in which X includes an element selected from the group consisting of Ge and Ga, with 0≦c≦3. The tetragonal Heusler is grown directly on (or more generally, over) a substrate oriented in the direction (001) and of the form YMn1+d, wherein Y includes an element selected from the group consisting of Ir and Pt, with 0≦d≦4. The tetragonal Heusler and the substrate are in proximity with each other, thereby allowing spin-polarized current to pass from one through the other. This structure may form part of a magnetic tunnel junction magnetoresistive device, and an array of such magnetoresistive devices may together form an MRAM.

    Abstract translation: 结构包括Mn1 + cX形式的四方Heusler,其中X包括选自Ge和Ga的元素,其中0≤c≤3。 正方形Heusler直接在(或更一般地,更上面)方向(001)和YMn1 + d方向取向的衬底上生长,其中Y包括选自Ir和Pt的元素,其中0≤d ≤4。 四边形Heusler和衬底彼此靠近,从而允许自旋极化电流从一个通过另一个通过。 该结构可以形成磁性隧道结磁阻器件的一部分,并且这种磁阻器件的阵列可以一起形成MRAM。

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