Dissolved-Oxygen Sensor Utilizing Ionic Oxygen Motion

    公开(公告)号:US20170370879A1

    公开(公告)日:2017-12-28

    申请号:US15195731

    申请日:2016-06-28

    Abstract: An apparatus includes an oxide layer having ion transport channels that facilitate the migration of oxygen ions from a first side to a second side of the layer. Specifically, molecular oxygen is decomposed into oxygen ions at the first side, and oxygen ions recombine into molecular oxygen at the second side. The apparatus includes a first chamber having a polarizable medium located on the second side of the oxide layer; a second chamber having an analyte that includes dissolved oxygen is located on the first side. The apparatus further includes a gate electrode that is in contact with, and applies a voltage to, the polarizable medium; in this manner, an electric field is applied to the second side of the oxide layer, which drives oxygen ions across the oxide layer. The apparatus can be used as an oxygen sensor, e.g., for detecting oxygen in a liquid such as blood.

    UNDERLAYERS FOR TEXTURED FILMS OF HEUSLER COMPOUNDS
    9.
    发明申请
    UNDERLAYERS FOR TEXTURED FILMS OF HEUSLER COMPOUNDS 有权
    高分子化合物薄膜的底层

    公开(公告)号:US20160217842A1

    公开(公告)日:2016-07-28

    申请号:US14605908

    申请日:2015-01-26

    Abstract: A structure includes a tetragonal Heusler of the form Mn1+cX, in which X includes an element selected from the group consisting of Ge and Ga, with 0≦c≦3. The tetragonal Heusler is grown directly on (or more generally, over) a substrate oriented in the direction (001) and of the form YMn1+d, wherein Y includes an element selected from the group consisting of Ir and Pt, with 0≦d≦4. The tetragonal Heusler and the substrate are in proximity with each other, thereby allowing spin-polarized current to pass from one through the other. This structure may form part of a magnetic tunnel junction magnetoresistive device, and an array of such magnetoresistive devices may together form an MRAM.

    Abstract translation: 结构包括Mn1 + cX形式的四方Heusler,其中X包括选自Ge和Ga的元素,其中0≤c≤3。 正方形Heusler直接在(或更一般地,更上面)方向(001)和YMn1 + d方向取向的衬底上生长,其中Y包括选自Ir和Pt的元素,其中0≤d ≤4。 四边形Heusler和衬底彼此靠近,从而允许自旋极化电流从一个通过另一个通过。 该结构可以形成磁性隧道结磁阻器件的一部分,并且这种磁阻器件的阵列可以一起形成MRAM。

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