公开(公告)号：US06541354B1

公开(公告)日：2003-04-01

申请号：US09701647

申请日：2000-11-30

申请人： Tatsuya Shimoda ,  Satoru Miyashita ,  Shunichi Seki ,  Masahiro Furusawa ,  Ichio Yudasaka ,  Yasumasa Takeuchi ,  Yasuo Matsuki

发明人： Tatsuya Shimoda ,  Satoru Miyashita ,  Shunichi Seki ,  Masahiro Furusawa ,  Ichio Yudasaka ,  Yasumasa Takeuchi ,  Yasuo Matsuki

IPC分类号： H01L2120

CPC分类号： H01L21/0242 ,  C30B7/00 ,  C30B7/005 ,  C30B29/06 ,  H01L21/0237 ,  H01L21/02532 ,  H01L21/02592 ,  H01L21/02595 ,  H01L21/02628 ,  H01L21/02675

摘要： A solution containing a cyclic silane compound, which does not contain carbon, and/or a silane compound modified by boron or phosphorus is applied onto a substrate and a silicon precursor film is formed, and the film is then transformed into semiconductor silicon by heat and/or light treatment. Thereby, it is possible to easily produce a silicon film having satisfactory characteristics as an electronic material at low costs, differing from the vacuum process, such as by CVD methods.

摘要翻译： 将含有不含碳的环状硅烷化合物和/或通过硼或磷改性的硅烷化合物的溶液施加到基板上，形成硅前体膜，然后通过加热将膜转变成半导体硅， /或轻度治疗。 由此，与真空工艺不同，例如通过CVD方法，可以以低成本容易地制造具有令人满意的特性的硅膜作为电子材料。

公开(公告)号：US06514801B1

公开(公告)日：2003-02-04

申请号：US09701511

申请日：2000-11-30

申请人： Ichio Yudasaka ,  Tatsuya Shimoda ,  Shunichi Seki

发明人： Ichio Yudasaka ,  Tatsuya Shimoda ,  Shunichi Seki

IPC分类号： H01L2100

CPC分类号： H01L29/66757 ,  H01L21/02126 ,  H01L21/02222 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02628 ,  H01L21/3124 ,  H01L21/31695

摘要： All or a part of the thin films such as a silicon film, an insulation film and a conductive film constituting the thin film transistor is formed using a liquid material. The method mainly consist of the steps of: foaming a coating film by coating a substrate with the liquid material; and forming a thin film with a desired thickness by heat-treating the coating film.

摘要翻译： 使用液体材料形成全部或一部分薄膜，例如硅膜，绝缘膜和构成薄膜晶体管的导电膜。 该方法主要包括以下步骤：通过用液体材料涂覆基材来使涂膜发泡; 并通过热处理涂膜来形成具有所需厚度的薄膜。

公开(公告)号：US06767775B1

公开(公告)日：2004-07-27

申请号：US09701648

申请日：2000-11-30

申请人： Ichio Yudasaka ,  Tatsuya Shimoda ,  Shunichi Seki

发明人： Ichio Yudasaka ,  Tatsuya Shimoda ,  Shunichi Seki

IPC分类号： H01L2100

CPC分类号： H01L29/66765 ,  G02F1/1368 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02628 ,  H01L21/288 ,  H01L21/316 ,  H01L27/1292 ,  H01L29/66757

摘要： All or a part of the thin films such as the silicon film, insulation film and conductive film are formed using liquid materials. The main method includes the steps of forming a coating film by coating the liquid material on the substrate, and heat-treating the coating film for converting it into a desired thin film, thereby enabling the thin film transistor to be manufactured using a cheap manufacturing equipment.

摘要翻译： 使用液体材料形成全部或一部分薄膜，例如硅膜，绝缘膜和导电膜。 主要方法包括以下步骤：通过将液体材料涂覆在基材上形成涂膜，并对涂膜进行热处理以将其转化为所需的薄膜，从而使薄膜晶体管能够使用便宜的制造设备 。

公开(公告)号：US06518087B1

公开(公告)日：2003-02-11

申请号：US09701646

申请日：2000-11-30

申请人： Masahiro Furusawa ,  Shunichi Seki ,  Satoru Miyashita ,  Tatsuya Shimoda ,  Ichio Yudasaka ,  Yasuo Matsuki ,  Yasumasa Takeuchi

发明人： Masahiro Furusawa ,  Shunichi Seki ,  Satoru Miyashita ,  Tatsuya Shimoda ,  Ichio Yudasaka ,  Yasuo Matsuki ,  Yasumasa Takeuchi

IPC分类号： H01L2100

CPC分类号： H01L31/202 ,  H01L31/046 ,  H01L31/077 ,  H01L31/1872 ,  Y02E10/50 ,  Y02P70/521

摘要： A solar battery is provided having a structure in which at least two semiconductor thin-films are disposed one over the other between a pair of electrodes, each semiconductor thin-film differing from the other in the impurity concentration thereof and/or the type of semiconductor. Formation of at least one of the semiconductor thin-films consists of coating a liquid coating composition containing a silicon compound so as to form a coating film and a step of converting the coating film into a silicon film by heat treatment and/or light treatment.

摘要翻译： 提供了一种太阳能电池，其具有这样的结构，其中至少两个半导体薄膜彼此之间设置在一对电极之间，每个半导体薄膜在其杂质浓度和/或半导体的类型中彼此不同 。 至少一个半导体薄膜的形成包括涂覆含有硅化合物的液体涂料组合物以形成涂膜和通过热处理和/或光处理将涂膜转化为硅膜的步骤。

公开(公告)号：US07273801B2

公开(公告)日：2007-09-25

申请号：US11094692

申请日：2005-03-31

申请人： Shunichi Seki ,  Hiroshi Kiguchi ,  Ichio Yudasaka ,  Hiroo Miyajima

发明人： Shunichi Seki ,  Hiroshi Kiguchi ,  Ichio Yudasaka ,  Hiroo Miyajima

IPC分类号： H01L21/36

CPC分类号： H05B33/22 ,  G02B5/201 ,  H01L27/322 ,  H01L27/3246 ,  H01L51/0005 ,  H01L51/0014 ,  H01L51/5284 ,  H01L2251/558 ,  H05B33/10 ,  Y10T428/24802

摘要： Display devices such as EL elements or LED elements, are formed from thin film elements having banks of prescribed height and a thin film layer formed by an ink jet method in areas to be coated that are partitioned by those banks. The banks may be formed of an organic material on a bank formation surface configured of an inorganic material, plasma treatment is performed under conditions that the induction gas is fluorine-based and that fluorine is present excessively, and the areas enclosed by the banks subjected to surface treatment are filled with the liquid thin film material to form the thin film layer or layers.

摘要翻译： 诸如EL元件或LED元件的显示装置由具有规定高度的堤的薄膜元件形成，并且通过喷墨法形成由被这些堤分隔的被涂覆区域的薄膜层。 堤可以由无机材料构成的堤岸形成面上的有机材料形成，等离子体处理是在感应气体为氟基的情况下进行的，氟的存在过度，并且被堤岸包围的区域 用液体薄膜材料填充表面处理以形成薄膜层。

公开(公告)号：US20050170550A1

公开(公告)日：2005-08-04

申请号：US11094692

申请日：2005-03-31

申请人： Shunichi Seki ,  Hiroshi Kiguchi ,  Ichio Yudasaka ,  Hiroo Miyajima

发明人： Shunichi Seki ,  Hiroshi Kiguchi ,  Ichio Yudasaka ,  Hiroo Miyajima

IPC分类号： G02B5/20 ,  G09F9/00 ,  G09F9/30 ,  G09F9/33 ,  H01L27/32 ,  H01L33/26 ,  H01L33/42 ,  H01L33/48 ,  H01L51/00 ,  H01L51/40 ,  H01L51/50 ,  H01L51/52 ,  H01L51/56 ,  H05B33/10 ,  H05B33/12 ,  H05B33/14 ,  H05B33/22 ,  H01L21/00 ,  B01D17/00

CPC分类号： H05B33/22 ,  G02B5/201 ,  H01L27/322 ,  H01L27/3246 ,  H01L51/0005 ,  H01L51/0014 ,  H01L51/5284 ,  H01L2251/558 ,  H05B33/10 ,  Y10T428/24802

摘要： Display devices such as EL elements or LED elements, are formed from thin film elements having banks of prescribed height and a thin film layer formed by an ink jet method in areas to be coated that are partitioned by those banks. The banks may be formed of an organic material on a bank formation surface configured of an inorganic material, plasma treatment is performed under conditions that the induction gas is fluorine-based and that fluorine is present excessively, and the areas enclosed by the banks subjected to surface treatment are filled with the liquid thin film material to form the thin film layer or layers.

摘要翻译： 诸如EL元件或LED元件的显示装置由具有规定高度的堤的薄膜元件形成，并且通过喷墨法形成由被这些堤分隔的被涂覆区域的薄膜层。 堤可以由无机材料构成的堤岸形成面上的有机材料形成，等离子体处理是在感应气体为氟基的情况下进行的，氟的存在过度，并且被堤岸包围的区域 用液体薄膜材料填充表面处理以形成薄膜层。

公开(公告)号：US20050186403A1

公开(公告)日：2005-08-25

申请号：US11094569

申请日：2005-03-31

申请人： Shunichi Seki ,  Hiroshi Kiguchi ,  Ichio Yudasaka ,  Hiroo Miyajima

发明人： Shunichi Seki ,  Hiroshi Kiguchi ,  Ichio Yudasaka ,  Hiroo Miyajima

IPC分类号： G02B5/20 ,  G09F9/00 ,  G09F9/30 ,  G09F9/33 ,  H01L27/32 ,  H01L33/26 ,  H01L33/42 ,  H01L33/48 ,  H01L51/00 ,  H01L51/40 ,  H01L51/50 ,  H01L51/52 ,  H01L51/56 ,  H05B33/10 ,  H05B33/12 ,  H05B33/14 ,  H05B33/22 ,  B32B3/00

CPC分类号： H05B33/22 ,  G02B5/201 ,  H01L27/322 ,  H01L27/3246 ,  H01L51/0005 ,  H01L51/0014 ,  H01L51/5284 ,  H01L2251/558 ,  H05B33/10 ,  Y10T428/24802

摘要： Display devices such as EL elements or LED elements, are formed from thin film elements having banks of prescribed height and a thin film layer formed by an ink jet method in areas to be coated that are partitioned by those banks. The banks may be formed of an organic material on a bank formation surface configured of an inorganic material, plasma treatment is performed under conditions that the induction gas is fluorine-based and that fluorine is present excessively, and the areas enclosed by the banks subjected to surface treatment are filled with the liquid thin film material to form the thin film layer or layers.

公开(公告)号：US20050170076A1

公开(公告)日：2005-08-04

申请号：US11094767

申请日：2005-03-31

申请人： Shunichi Seki ,  Hiroshi Kiguchi ,  Ichio Yudasaka ,  Hiroo Miyajima

发明人： Shunichi Seki ,  Hiroshi Kiguchi ,  Ichio Yudasaka ,  Hiroo Miyajima

IPC分类号： G02B5/20 ,  G09F9/00 ,  G09F9/30 ,  G09F9/33 ,  H01L27/32 ,  H01L33/26 ,  H01L33/42 ,  H01L33/48 ,  H01L51/00 ,  H01L51/40 ,  H01L51/50 ,  H01L51/52 ,  H01L51/56 ,  H05B33/10 ,  H05B33/12 ,  H05B33/14 ,  H05B33/22 ,  B05D5/12 ,  H05B33/00

CPC分类号： H05B33/22 ,  G02B5/201 ,  H01L27/322 ,  H01L27/3246 ,  H01L51/0005 ,  H01L51/0014 ,  H01L51/5284 ,  H01L2251/558 ,  H05B33/10 ,  Y10T428/24802

摘要： Display devices such as EL elements or LED elements, are formed from thin film elements having banks of prescribed height and a thin film layer formed by an ink jet method in areas to be coated that are partitioned by those banks. The banks may be formed of an organic material on a bank formation surface configured of an inorganic material, plasma treatment is performed under conditions that the induction gas is fluorine-based and that fluorine is present excessively, and the areas enclosed by the banks subjected to surface treatment are filled with the liquid thin film material to form the thin film layer or layers.

公开(公告)号：US07932518B2

公开(公告)日：2011-04-26

申请号：US12232421

申请日：2008-09-17

申请人： Shunichi Seki ,  Hiroshi Kiguchi ,  Ichio Yudasaka ,  Hiroo Miyajima

发明人： Shunichi Seki ,  Hiroshi Kiguchi ,  Ichio Yudasaka ,  Hiroo Miyajima

IPC分类号： H01L29/04

CPC分类号： H05B33/22 ,  G02B5/201 ,  H01L27/322 ,  H01L27/3246 ,  H01L51/0005 ,  H01L51/0014 ,  H01L51/5284 ,  H01L2251/558 ,  H05B33/10 ,  Y10T428/24802

摘要： Display devices such as EL elements or LED elements, are formed from thin film elements having banks of prescribed height and a thin film layer formed by an ink jet method in areas to be coated that are partitioned by those banks. The banks may be formed of an organic material on a bank formation surface configured of an inorganic material, plasma treatment is performed under conditions that the induction gas is fluorine-based and that fluorine is present excessively, and the areas enclosed by the banks subjected to surface treatment are filled with the liquid thin film material to form the thin film layer or layers.

摘要翻译： 诸如EL元件或LED元件的显示装置由具有规定高度的堤的薄膜元件形成，并且通过喷墨法形成由被这些堤分隔的被涂覆区域的薄膜层。 堤可以由无机材料构成的堤岸形成面上的有机材料形成，等离子体处理是在感应气体为氟基的情况下进行的，氟的存在过度，并且被堤岸包围的区域 用液体薄膜材料填充表面处理以形成薄膜层。

公开(公告)号：US07442955B2

公开(公告)日：2008-10-28

申请号：US11094569

申请日：2005-03-31

申请人： Shunichi Seki ,  Hiroshi Kiguchi ,  Ichio Yudasaka ,  Hiroo Miyajima

发明人： Shunichi Seki ,  Hiroshi Kiguchi ,  Ichio Yudasaka ,  Hiroo Miyajima

IPC分类号： H01L29/08

CPC分类号： H05B33/22 ,  G02B5/201 ,  H01L27/322 ,  H01L27/3246 ,  H01L51/0005 ,  H01L51/0014 ,  H01L51/5284 ,  H01L2251/558 ,  H05B33/10 ,  Y10T428/24802

摘要： Display devices such as EL elements or LED elements, are formed from thin film elements having banks of prescribed height and a thin film layer formed by an ink jet method in areas to be coated that are partitioned by those banks. The banks may be formed of an organic material on a bank formation surface configured of an inorganic material, plasma treatment is performed under conditions that the induction gas is fluorine-based and that fluorine is present excessively, and the areas enclosed by the banks subjected to surface treatment are filled with the liquid thin film material to form the thin film layer or layers.

摘要翻译： 诸如EL元件或LED元件的显示装置由具有规定高度的堤的薄膜元件形成，并且通过喷墨法形成由被这些堤分隔的被涂覆区域的薄膜层。 堤可以由无机材料构成的堤岸形成面上的有机材料形成，等离子体处理是在感应气体为氟基的情况下进行的，氟的存在过度，并且被堤岸包围的区域 用液体薄膜材料填充表面处理以形成薄膜层。