IMPRINTING APPARATUS
    2.
    发明申请

    公开(公告)号:US20180178416A1

    公开(公告)日:2018-06-28

    申请号:US15847150

    申请日:2017-12-19

    摘要: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.

    CURABLE RESIN COMPOSITIONS
    4.
    发明申请

    公开(公告)号:US20230102870A1

    公开(公告)日:2023-03-30

    申请号:US17934394

    申请日:2022-09-22

    IPC分类号: C08G77/445

    摘要: Some of the resin compositions are ultraviolet light or thermally curable, while others are ultraviolet light curable. One example of the ultraviolet light or thermally curable resin composition consists of a predetermined mass ratio of a (meth)acrylate cyclosiloxane monomer and a non-siloxane (meth)acrylate based monomer ranging from about >0:

    FLOW CELLS
    6.
    发明申请

    公开(公告)号:US20210339457A1

    公开(公告)日:2021-11-04

    申请号:US17235244

    申请日:2021-04-20

    发明人: Alexandre Richez

    摘要: An example of a flow cell includes a substrate and a cured, patterned resin on the substrate. The cured, patterned resin has nano-depressions separated by interstitial regions. Each nano-depression has a largest opening dimension ranging from about 10 nm to about 1000 nm. The cured, patterned resin also includes an interpenetrating polymer network. The interpenetrating polymer network of the cured, patterned resin includes an epoxy-based polymer and a (meth)acryloyl-based polymer.

    IMPRINTING APPARATUS
    9.
    发明申请

    公开(公告)号:US20220088834A1

    公开(公告)日:2022-03-24

    申请号:US17541089

    申请日:2021-12-02

    摘要: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.