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    OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    1.
    发明申请
    OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置的光学系统

    公开(公告)号：US20100201960A1

    公开(公告)日：2010-08-12

    申请号：US12765285

    申请日：2010-04-22

    申请人： Joerg Tschischgale ,  Toralf Gruner

    发明人： Joerg Tschischgale ,  Toralf Gruner

    IPC分类号： G03B27/68 ,  G01B9/00 ,  G01B9/02 ,  G03B27/54

    CPC分类号： G03F7/70591 ,  G03B13/00 ,  G03F7/70266

    摘要： In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the points, and the reflected or refracted beam is measured, e.g. using an interferometer. Based on deviations of the measured shape from a target shape, corrective measures are derived so that the imaging errors of the optical system are improved. The corrective measures may comprise a change in the position or the shape of the optical element being analyzed, or another optical element of the optical system. The target shape of the surface may, for example, be determined so that the optical element at least partially corrects imaging errors caused by other optical elements.

    摘要翻译： 在用于改善包括具有表面的光学元件的微光刻投影曝光装置的照明系统或投影物镜的成像特性的方法中，直接在各个点测量表面的形状。 为此，测量光束被引导到这些点上，并且测量反射或折射的光束。 使用干涉仪。 基于测量形状与目标形状的偏差，导出校正措施，使得光学系统的成像误差得到改善。 校正措施可以包括被分析的光学元件的位置或形状的改变，或光学系统的另一个光学元件的变化。 例如，可以确定表面的目标形状，使得光学元件至少部分地校正由其它光学元件引起的成像误差。

    Optical system of a microlithographic projection exposure apparatus
    2.
    发明授权
    Optical system of a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置的光学系统

    公开(公告)号：US07423765B2

    公开(公告)日：2008-09-09

    申请号：US11190555

    申请日：2005-07-27

    申请人： Joerg Tschischgale ,  Toralf Gruner

    发明人： Joerg Tschischgale ,  Toralf Gruner

    IPC分类号： G01B11/02 ,  G03B27/42

    CPC分类号： G03F7/70591 ,  G03B13/00 ,  G03F7/70266

    摘要： In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the points, and the reflected or refracted beam is measured, e.g. using an interferometer. Based on deviations of the measured shape from a target shape, corrective measures are derived so that the imaging errors of the optical system are improved. The corrective measures may comprise a change in the position or the shape of the optical element being analyzed, or another optical element of the optical system. The target shape of the surface may, for example, be determined so that the optical element at least partially corrects imaging errors caused by other optical elements.

    摘要翻译： 在用于改善包括具有表面的光学元件的微光刻投影曝光装置的照明系统或投影物镜的成像特性的方法中，直接在各个点测量表面的形状。 为此，测量光束被引导到这些点上，并且测量反射或折射的光束。 使用干涉仪。 基于测量形状与目标形状的偏差，导出校正措施，使得光学系统的成像误差得到改善。 校正措施可以包括被分析的光学元件的位置或形状的改变，或光学系统的另一个光学元件的变化。 例如，可以确定表面的目标形状，使得光学元件至少部分地校正由其它光学元件引起的成像误差。

    Optical system of a microlithographic projection exposure apparatus
    3.
    发明申请
    Optical system of a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置的光学系统

    公开(公告)号：US20060023179A1

    公开(公告)日：2006-02-02

    申请号：US11190555

    申请日：2005-07-27

    申请人： Joerg Tschischgale ,  Toralf Gruner

    发明人： Joerg Tschischgale ,  Toralf Gruner

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70591 ,  G03B13/00 ,  G03F7/70266

    摘要： In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the points, and the reflected or refracted beam is measured, e.g. using an interferometer. Based on deviations of the measured shape from a target shape, corrective measures are derived so that the imaging errors of the optical system are improved. The corrective measures may comprise a change in the position or the shape of the optical element being analyzed, or another optical element of the optical system. The target shape of the surface may, for example, be determined so that the optical element at least partially corrects imaging errors caused by other optical elements.

    摘要翻译： 在用于改善包括具有表面的光学元件的微光刻投影曝光装置的照明系统或投影物镜的成像特性的方法中，直接在各个点测量表面的形状。 为此，测量光束被引导到这些点上，并且测量反射或折射的光束。 使用干涉仪。 基于测量形状与目标形状的偏差，导出校正措施，使得光学系统的成像误差得到改善。 校正措施可以包括被分析的光学元件的位置或形状的改变，或光学系统的另一个光学元件的变化。 例如，可以确定表面的目标形状，使得光学元件至少部分地校正由其它光学元件引起的成像误差。

    Method of manufacturing a miniaturized device
    5.
    发明授权
    Method of manufacturing a miniaturized device 有权
    制造小型化装置的方法

    公开(公告)号：US08542342B2

    公开(公告)日：2013-09-24

    申请号：US12408577

    申请日：2009-03-20

    申请人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

    发明人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

    IPC分类号： G03B27/42 ,  G03B27/54 ,  G03B27/32

    CPC分类号： G03B27/42 ,  G03F7/70258

    摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system involves illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.

    摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在成像光学器件的物平面的区域中; 在所述成像光学元件的像面的区域中设置携带抗蚀剂的基板，并且利用所述投影曝光系统以调节的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。

    METHOD FOR STRESS-ADJUSTED OPERATION OF A PROJECTION EXPOSURE SYSTEM AND CORRESPONDING PROJECTION EXPOSURE SYSTEM
    6.
    发明申请
    METHOD FOR STRESS-ADJUSTED OPERATION OF A PROJECTION EXPOSURE SYSTEM AND CORRESPONDING PROJECTION EXPOSURE SYSTEM 有权
    投影曝光系统和相关投影曝光系统的应力调整方法

    公开(公告)号：US20130044303A1

    公开(公告)日：2013-02-21

    申请号：US13590673

    申请日：2012-08-21

    申请人： Bernhard Kneer ,  Markus Deguenther ,  Toralf Gruner

    发明人： Bernhard Kneer ,  Markus Deguenther ,  Toralf Gruner

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70191 ,  G03F7/70116 ,  G03F7/70341 ,  G03F7/70558 ,  G03F7/7085

    摘要： A projection exposure system and a method for operating a projection exposure system for microlithography with an illumination system are disclosed. The illumination system includes at least one variably adjustable pupil-defining element. The illumination stress of at least one optical element of the projection exposure system is determined automatically in the case of an adjustment of the at least one variably adjustable pupil-defining element. From the automatically determined illumination stress, the maximum radiant power of the light source is set or determined and/or in which an illumination system is provided with which different illumination settings can be made. Usage of the projection exposure system is recorded and, from the history of the usage, at least one state parameter of at least one optical element of the projection exposure system is determined.

    摘要翻译： 公开了一种用于利用照明系统操作用于微光刻的投影曝光系统的投影曝光系统和方法。 所述照明系统包括至少一个可变地调整的光瞳限定元件。 在调整至少一个可变瞳孔限定元件的情况下，自动确定投影曝光系统的至少一个光学元件的照明应力。 根据自动确定的照明应力，设置或确定光源的最大辐射功率，和/或其中提供可以进行不同照明设置的照明系统。 记录投影曝光系统的使用，并且根据使用历史确定投影曝光系统的至少一个光学元件的至少一个状态参数。

    METHOD OF MANUFACTURING A PROJECTION OBJECTIVE AND PROJECTION OBJECTIVE
    9.
    发明申请
    METHOD OF MANUFACTURING A PROJECTION OBJECTIVE AND PROJECTION OBJECTIVE 有权
    制作投影目标和投影目标的方法

    公开(公告)号：US20120134016A1

    公开(公告)日：2012-05-31

    申请号：US13364565

    申请日：2012-02-02

    申请人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

    发明人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

    IPC分类号： G02B17/08

    CPC分类号： G03F7/70891 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/705 ,  G03F7/70983

    摘要： The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

    摘要翻译： 本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。 该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。 该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。