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1.发明申请Particle detection device, lithographic apparatus and device manufacturing method 失效粒子检测装置，光刻设备及器件制造方法公开(公告)号：US20060072107A1
公开(公告)日：2006-04-06
申请号：US10957752
申请日：2004-10-05
IPC分类号： G01N21/00
CPC分类号： G03F7/70916 , G01N21/94 , G01N21/956 , G03F7/7085
摘要： To enable differentiation between a particle and a ghost particle, a detector system is presented. The detector system is configured to output at least two detector signals corresponding to an intensity of radiation being incident on the detector system. If radiation is received from a ghost particle, not all of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a contaminating particle results in all signals having a level above a threshold level. Thus, it may be determined with a high accuracy whether a particle or a ghost particle is redirecting radiation towards the detector system.
摘要翻译： 为了实现粒子和鬼粒子之间的区分，提出了一种检测器系统。 检测器系统被配置为输出对应于入射在检测器系统上的辐射强度的至少两个检测器信号。 如果从重影颗粒接收到辐射，则并非所有至少两个检测器信号都具有高于预定阈值水平的水平，而从污染颗粒接收的辐射导致所有信号具有高于阈值水平的水平。 因此，可以高精度地确定颗粒或重影颗粒是否朝向检测器系统重定向辐射。
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2.发明申请Particle detection device, lithographic apparatus and device manufacturing method 失效粒子检测装置，光刻设备及器件制造方法公开(公告)号：US20060072108A1
公开(公告)日：2006-04-06
申请号：US11242146
申请日：2005-10-04
IPC分类号： G01N21/88
CPC分类号： G03F7/70916 , G01N21/94 , G01N21/956 , G03F7/7085
摘要： To enable differentiation between a particle and a ghost particle, a detector system resolves radiation from a ghost particle from radiation from an actual particle. The detector system outputs at least two detector signals corresponding to intensities of radiation being incident on different parts of the detector system or the detector system outputs at least two detector signals corresponding to intensities of radiation with different wavelengths being incident on the detector system. If radiation is received from a ghost particle, not each of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a particle results in the signals having substantially a same level above a threshold level. The detector system may include a radiation detector device configured to generate the first detector signal in response to radiation incident on at least one predetermined part of the radiation detector device and a radiation blocking assembly configured to prevent radiation not originating from a particle from being incident on the predetermined part of the detector device.
摘要翻译： 为了能够区分粒子和重影粒子，检测器系统从实际粒子的辐射中解析来自重影粒子的辐射。 检测器系统输出对应于入射在检测器系统的不同部分上的辐射强度的至少两个检测器信号，或者检测器系统输出对应于不同波长的辐射强度入射在检测器系统上的至少两个检测器信号。 如果从重影粒子接收到辐射，则并非所述至少两个检测器信号中的每一个具有高于预定阈值电平的电平，而从粒子接收的辐射导致信号具有高于阈值电平的基本上相同的电平。 检测器系统可以包括辐射检测器装置，其被配置为响应于入射到辐射检测器装置的至少一个预定部分上的辐射而产生第一检测器信号;以及辐射阻挡组件，其被配置为防止不是源自颗粒的辐射被入射 检测器装置的预定部分。
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公开(公告)号：US08576374B2
公开(公告)日：2013-11-05
申请号：US12393805
申请日：2009-02-26
申请人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
发明人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
CPC分类号： G03F9/7084 , G03F7/70633 , G03F9/7076 , G03F9/708 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.
摘要翻译： 根据本发明的第一方面，提供了一种在设置在基板上的层上提供对准标记的光刻方法，所述方法包括在所述层的一定范围内定向的区域上提供对准标记 相对于其上设置有该层的基板的表面。
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公开(公告)号：US07714981B2
公开(公告)日：2010-05-11
申请号：US11589300
申请日：2006-10-30
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F1/42 , G03F1/44 , G03F7/707 , G03F9/7011
摘要： In a lithographic apparatus, a slip of a patterning device relative to a support, the support being constructed to support the patterning device, may be provided by: measuring a position of the support relative to a structure of the lithographic apparatus; measuring a position of the patterning device relative to the structure of the lithographic apparatus; determining a correlation between the position of the patterning device and the position of the support; and deriving from the correlation a slip of the patterning device relative to the support. The structure may include a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. The projection system may be connected to a frame, such as a metrology frame of the lithographic apparatus.
摘要翻译： 在光刻设备中，图案形成装置相对于支撑件的滑动可以通过以下方式来提供：测量支撑件相对于光刻设备的结构的位置; 测量所述图案形成装置相对于所述光刻设备的结构的位置; 确定图案形成装置的位置与支撑件的位置之间的相关性; 并且从相关性导出图案形成装置相对于支撑件的滑移。 该结构可以包括投影系统，以将由图案形成装置图案化的辐射束投影到基板的目标部分上。 投影系统可以连接到诸如光刻设备的计量框架的框架。
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公开(公告)号：US07633600B2
公开(公告)日：2009-12-15
申请号：US11262963
申请日：2005-11-01
申请人： Johannes Onvlee , Dirk-Jan Bijvoet
发明人： Johannes Onvlee , Dirk-Jan Bijvoet
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70716 , G03F9/7011
摘要： A lithographic apparatus has a patterning support holding a patterning device. At least one position sensor measures a position of the patterning device relative to the patterning support, and generates a measuring signal. A positioning device controls a position of the patterning support on the basis of the measuring signal input to the positioning device. In a corresponding device manufacturing method a patterning support is provided. A patterning device is held on the patterning support. The patterning support is moved along a line of movement. A position of the patterning device relative to the patterning support is measured, and a position of the patterning support is controlled on the basis of the measurement of the position of the patterning device relative to the patterning support. Thus, the controlling of the position of the patterning support compensates for a slip of the patterning device relative to the patterning support.
摘要翻译： 光刻设备具有保持图案形成装置的图案形成支撑。 至少一个位置传感器测量图案形成装置相对于图案形成支撑件的位置，并产生测量信号。 定位装置基于输入到定位装置的测量信号来控制图案形成支撑件的位置。 在相应的器件制造方法中，提供了图案形成支撑。 图案形成装置被保持在图案形成支撑件上。 图形支撑沿着移动线移动。 测量图案形成装置相对于图案形成支撑件的位置，并且基于图案形成装置相对于图案形成支撑件的位置的测量来控制图案形成支撑件的位置。 因此，图案形成支撑件的位置的控制补偿图案形成装置相对于图案形成支撑件的滑动。
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6.发明授权Particle detection device, lithographic apparatus and device manufacturing method 失效粒子检测装置，光刻设备及器件制造方法公开(公告)号：US07349082B2
公开(公告)日：2008-03-25
申请号：US10957752
申请日：2004-10-05
IPC分类号： G01N21/00
CPC分类号： G03F7/70916 , G01N21/94 , G01N21/956 , G03F7/7085
摘要： To enable differentiation between a particle and a ghost particle, a detector system is presented. The detector system is configured to output at least two detector signals corresponding to an intensity of radiation being incident on the detector system. If radiation is received from a ghost particle, not all of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a contaminating particle results in all signals having a level above a threshold level. Thus, it may be determined with a high accuracy whether a particle or a ghost particle is redirecting radiation towards the detector system.
摘要翻译： 为了实现粒子和鬼粒子之间的区分，提出了一种检测器系统。 检测器系统被配置为输出对应于入射在检测器系统上的辐射强度的至少两个检测器信号。 如果从重影颗粒接收到辐射，则并非所有至少两个检测器信号都具有高于预定阈值水平的水平，而从污染颗粒接收的辐射导致所有信号具有高于阈值水平的水平。 因此，可以高精度地确定颗粒或重影颗粒是否朝向检测器系统重定向辐射。
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7.发明授权Method of planning tasks in a machine, method of controlling a machine, supervisory machine control system, lithographic apparatus, lithographic processing cell and computer program 失效计算机中的任务的方法，机器的控制方法，监控机器控制系统，光刻设备，光刻处理单元和计算机程序公开(公告)号：US07184849B2
公开(公告)日：2007-02-27
申请号：US10852678
申请日：2004-05-25
申请人： Norbertus Josephus Martinus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen , Henricus Petrus Johannus Van Lierop , Robert Jozef Dumont , Jacobus Eelkman Rooda
发明人： Norbertus Josephus Martinus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen , Henricus Petrus Johannus Van Lierop , Robert Jozef Dumont , Jacobus Eelkman Rooda
IPC分类号： G06F19/00
CPC分类号： G05B19/41865 , G03F7/70533 , G05B2219/32298 , G05B2219/32423 , G05B2219/45028 , Y02P90/20 , Y02P90/86
摘要： A method of planning tasks to be performed in a machine derives a precedence graph by linking subsidiary tasks to a sequence of key tasks to create a scheduling problem that can be solved by an automated scheduler.
摘要翻译： 计划在机器中执行的任务的方法通过将辅助任务链接到一系列关键任务来产生优先图，以创建可由自动调度器解决的调度问题。
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8.发明授权Lithographic projection assembly, substrate handling apparatus and substrate handling method 失效平版印刷组件，基板处理装置和基板处理方法公开(公告)号：US07123349B2
公开(公告)日：2006-10-17
申请号：US10797657
申请日：2004-03-11
申请人： Pieter Johannes Marius Van Groos , Pieter Renaat Maria Hennus , Jan Frederik Hoogkamp , Albert Jan Hendrik Klomp , Johannes Onvlee , Raimond Visser
发明人： Pieter Johannes Marius Van Groos , Pieter Renaat Maria Hennus , Jan Frederik Hoogkamp , Albert Jan Hendrik Klomp , Johannes Onvlee , Raimond Visser
CPC分类号： H01L21/67225 , G03F7/70733 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F7/70858 , G03F7/70875 , G03F7/70991 , H01L21/67201
摘要： The invention relates to a lithographic projection assembly, having at least two load locks for transferring substrates between a first environment and a lower pressure second environment, a substrate handler with a handler chamber within the second environment and a lithographic projection apparatus including a projection chamber. The handler chamber and the projection chamber communicate via a load position for entering a substrate from the handler chanter into the projection chamber and an unload position for removing the substrate from the projection chamber into the handler chamber. The handler chamber also includes pre-processing means for pre-processing of the substrates and transport means for transferring substrates between the load locks and pre-processing means.
摘要翻译： 本发明涉及一种光刻投影组件，其具有至少两个用于在第一环境和较低压力的第二环境之间传送衬底的负载锁，在第二环境内具有处理室的衬底处理器以及包括投影室的光刻投影设备。 处理器室和投影室通过负载位置连通，用于从处理器进入投影室进入基板，以及卸载位置，用于将基板从投影室移除到处理室中。 处理室还包括用于预处理基板的预处理装置和用于在装载锁和预处理装置之间传送基板的传送装置。
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9.发明申请Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing cell, and computer program 有权控制光刻处理单元的方法，器件制造方法，光刻设备，轨道单元，光刻处理单元和计算机程序公开(公告)号：US20060197929A1
公开(公告)日：2006-09-07
申请号：US11418146
申请日：2006-05-05
IPC分类号： G03B27/42
CPC分类号： G03D5/00 , G03F7/70525 , G03F7/70991 , Y10S414/135 , Y10S414/14
摘要： A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus.
摘要翻译： 本文提出了一种控制光刻设备装置中的轨道装置的方法。 光刻池包括被配置为暴露衬底的光刻曝光装置和配置成在曝光之前制备衬底并在曝光之后显影衬底的轨道装置。 该方法包括预测光刻曝光装置将可用于接收用于从轨道装置曝光的准备的基板的时间，以及调整轨道装置准备基板的速率，使得基板准备在时间上被光刻接受 曝光装置
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10.发明申请Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit lithographic processing cell, and computer program 有权控制光刻处理单元的方法，器件制造方法，光刻设备，轨道单元光刻处理单元和计算机程序公开(公告)号：US20050185952A1
公开(公告)日：2005-08-25
申请号：US10781945
申请日：2004-02-20
IPC分类号： H01L21/027 , G03D5/00
CPC分类号： G03D5/00 , G03F7/70525 , G03F7/70991 , Y10S414/135 , Y10S414/14
摘要： A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method comprises predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.
摘要翻译： 本文提出了一种控制光刻设备装置中的轨道装置的方法。 光刻池包括被配置为暴露衬底的光刻曝光装置和配置成在曝光之前制备衬底并在曝光之后显影衬底的轨道装置。 该方法包括预测光刻曝光装置将可用于接收用于从轨道装置曝光的准备的基板的时间，以及调整轨道装置准备基板的速率，使得基板准备在时间上被光刻接受 曝光装置 通过调整轨迹速率使得基板准备就绪，就像平版印刷曝光设备所需要的那样，轨迹中的缓冲器的使用可以被大大地避免甚至完全消除。
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