Localized plasma processing
    6.
    发明授权
    Localized plasma processing 失效
    局部等离子体处理

    公开(公告)号:US5302237A

    公开(公告)日:1994-04-12

    申请号:US835293

    申请日:1992-02-13

    摘要: An apparatus and method for down-stream plasma processing (both etching and plasma enhanced deposition) are disclosed wherein only a portion of the surface area of a substrate is exposed to the low pressure, reactive gaseous processing environment. The remainder of the substrate remains outside a small enclosed processing area, thus leaving these areas unexposed to the processing agents and providing physical access for monitoring equipment or the like, for example when in-situ monitoring during processing is desired. Etch rates of up to 6 .mu.m/h have been obtained.

    摘要翻译: 公开了用于下游等离子体处理(蚀刻和等离子体增强沉积两者)的装置和方法,其中只有一部分基板的表面积暴露于低压反应性气体处理环境。 衬底的其余部分保持在小的封闭处理区域的外部,从而使这些区域未暴露于处理剂并提供用于监测设备等的物理访问,例如当期望在处理期间的原位监测时。 蚀刻速率高达6(我)m / h。

    Fast optical stokes polarimeter
    7.
    发明授权
    Fast optical stokes polarimeter 失效
    快速光学斯科克斯偏振计

    公开(公告)号:US06765672B1

    公开(公告)日:2004-07-20

    申请号:US09947147

    申请日:2001-09-05

    申请人: David L. Veasey

    发明人: David L. Veasey

    IPC分类号: G01J400

    摘要: Methods and apparatus for optical Stokes polarimetry are provided. A polarimeter according to this invention includes a rotatable waveplate, including a variable birefringent material, and a polarizer optically downstream from the waveplate. The polarimeter can be integrated into a guided wave structure.

    摘要翻译: 提供了光学斯托克斯偏振法的方法和装置。 根据本发明的偏振计包括可旋转波片,包括可变双折射材料,以及在波片上光学下游的偏振片。 旋光仪可以集成到导波结构中。