公开(公告)号：US5144199A

公开(公告)日：1992-09-01

申请号：US637636

申请日：1991-01-04

申请人： Masakazu Taki ,  Kenji Yoshizawa ,  Junichi Nishimae

发明人： Masakazu Taki ,  Kenji Yoshizawa ,  Junichi Nishimae

IPC分类号： C23C16/48 ,  H01J65/04

CPC分类号： H01J65/044 ,  C23C16/482

摘要： A microwave discharge light source device in which one side of a discharge space in which a plasma emission takes place is defined by a transparent dielectric member. A transparent microwave reflecting member is disposed in a position such as to face the discharge space through the dielectric member. A microwave having an electric field component in the direction of thickness of the dielectric member is introduced into the dielectric member through the coupling at an end surface of the dielectric member so that a microwave electric field is formed in the discharge space, and so that the plasma emission medium emits light by electric discharge. The light thus emitted is extracted through the transparent microwave reflecting member.

摘要翻译： 其中发生等离子体发射的放电空间的一侧由透明电介质构件限定的微波放电光源装置。 透明微波反射部件设置在通过电介质部件与放电空间相对的位置。 具有电介质部件厚度方向的电场成分的微波通过电介质部件的端面的耦合引入电介质部件，使得在放电空间内形成微波电场， 等离子体发射介质通过放电发光。 通过透明微波反射部件提取发出的光。

公开(公告)号：US5048048A

公开(公告)日：1991-09-10

申请号：US564517

申请日：1990-08-09

申请人： Junichi Nishimae ,  Kenji Yoshizawa ,  Masakazu Taki

发明人： Junichi Nishimae ,  Kenji Yoshizawa ,  Masakazu Taki

IPC分类号： H01S3/03 ,  H01S3/08 ,  H01S3/0975 ,  H01S3/23

CPC分类号： H01S3/03 ,  H01S3/0315 ,  H01S3/0975 ,  H01S3/08068 ,  H01S3/0818

摘要： A gas laser device comprises a discharge space in which a laser gas is excited by electric discharge, the discharge space being in the form of a slab whose section perpendicular to a laser optical axis has a longer side and a shorter side; and laser resonator mirrors disposed at both ends of the discharge space, respectively. The laser resonant mirrors constitute a negative branch unstable resonator in a first dimension of longer side of the discharge space section, and a laser beam is obtained at one end of the longer side of the discharge space section.

公开(公告)号：US5359177A

公开(公告)日：1994-10-25

申请号：US778569

申请日：1991-10-17

申请人： Masakazu Taki ,  Kenji Yoshizawa ,  Junichi Nishimae ,  Keisuke Namba

发明人： Masakazu Taki ,  Kenji Yoshizawa ,  Junichi Nishimae ,  Keisuke Namba

IPC分类号： H01J37/32 ,  B23K9/00 ,  H05H1/46

CPC分类号： H01J37/32229 ,  H01J37/32192

摘要： A microwave plasma apparatus comprises a discharge chamber for generating a plasma. A dielectric plate is placed on a surface of the discharge chamber. A microwave circuit surrounds the longitudinal side surface of the dielectric plate and the microwave circuit is adapted to couple the signal propagating therein to the dielectric plate, whereby a microwave electric field is formed within the discharge chamber to generate a plasma therein. The microwave circuit may comprise a rectangular waveguide, and a part of a wall surface of the rectangular waveguide is utilized as a terminal portion.

摘要翻译： 微波等离子体装置包括用于产生等离子体的放电室。 电介质板放置在放电室的表面上。 微波电路围绕电介质板的纵向侧表面，并且微波电路适于将在其中传播的信号耦合到电介质板，由此在放电室内形成微波电场以在其中产生等离子体。 微波电路可以包括矩形波导，矩形波导的壁表面的一部分用作端子部分。

公开(公告)号：US4890294A

公开(公告)日：1989-12-26

申请号：US147726

申请日：1988-01-25

申请人： Junichi Nishimae ,  Kenji Yoshizawa ,  Masakazu Taki ,  Yoshihiro Ueda ,  Tadashi Yanagi ,  Akihiko Iwata

发明人： Junichi Nishimae ,  Kenji Yoshizawa ,  Masakazu Taki ,  Yoshihiro Ueda ,  Tadashi Yanagi ,  Akihiko Iwata

IPC分类号： H01J37/32 ,  H01S3/03 ,  H01S3/0975 ,  H05H1/46

CPC分类号： H01J37/32192 ,  H01J37/32339 ,  H01S3/0315 ,  H01S3/0975 ,  H05H1/46

摘要： The invention relates to a plasma apparatus where plasma is generated utilizing microwave discharge and laser excitation is performed and plasma processing is performed. More specifically, in a plasma apparatus where a microwave from a microwave oscillator is transmitted through a microwave transmission path to a microwave circuit, and plasma is generated by a microwave discharge within the microwave circuit, a plasma generating medium for generating the plasma is filled in a space formed between a conductor wall constituting a part of the microwave circuit and a dielectric installed opposite to the conductor wall, and the microwave circuit forms microwave mode having an electric field component orthogonal to the boundary between the dielectric and the plasma.

摘要翻译： 本发明涉及一种使用微波放电产生等离子体并进行激光激发并进行等离子体处理的等离子体装置。 更具体地，在微波振荡器的微波通过微波传输路径传输到微波电路的等离子体装置中，并且通过微波电路内的微波放电产生等离子体，用于产生等离子体的等离子体产生介质被填充 在构成微波电路的一部分的导体壁与与导体壁相对设置的电介质之间形成的空间，微波电路形成具有与电介质和等离子体之间的边界正交的电场分量的微波模式。

公开(公告)号：US4988922A

公开(公告)日：1991-01-29

申请号：US329786

申请日：1989-03-17

申请人： Isao Shoda ,  Hitoshi Kodama ,  Kazuo Magome ,  Akihiko Iwata ,  Kenji Yoshizawa ,  Masakazu Taki

发明人： Isao Shoda ,  Hitoshi Kodama ,  Kazuo Magome ,  Akihiko Iwata ,  Kenji Yoshizawa ,  Masakazu Taki

IPC分类号： H01J65/04 ,  H05B41/24 ,  H05B41/282 ,  H05B41/392

CPC分类号： H01J65/044 ,  H05B41/24

摘要： A power supply circuit for a magnetron adapted to supply microwave energy to an electrodeless discharge bulb is disclosed. The circuit comprises a rectifier coupled across a commercial AC voltage source, a filter for smoothing the output of the rectifier, an inverter for converting the DC voltage supplied from the filter into a high frequency AC voltage, a step-up transformer for stepping up the high frequency AC voltage outputted from the inverter, and a rectifier which rectifies the high voltage AC output of the transformer into a unidirectional voltage which is supplied to the magnetron. The inverter switching is controlled by a pulse width modulation control circuit to maintain the magnetron output power at a predetermined level. According to one aspect, an inductance is provided in the circuit which supresses high frequency components in the currents flowing through the windings of the transformer; according to another aspect, the inverter switching frequency (expressed in kHz) is set at a value not less than 1500/D, wherein D represents the diameter of the electrodeless bulb expressed in millimeters; according to still another aspect, the peak to the mean value ratio of the magnetron current is limited under 3.75 inclusive.

摘要翻译： PCT No.PCT / JP88 / 00753 Sec。 371日期：1989年3月17日 102（e）日期1989年3月17日PCT Filed 1988年7月27日PCT公开号 出版物WO89 / 01234 日期：1989年2月9日。公开了一种用于向无电极放电灯提供微波能量的磁控管的电源电路。 该电路包括跨越商用交流电压源耦合的整流器，用于平滑整流器输出的滤波器，将从滤波器提供的直流电压转换成高频交流电压的逆变器，用于加速 从逆变器输出的高频交流电压，以及将变压器的高压交流输出整流为提供给磁控管的单向电压的整流器。 逆变器切换由脉宽调制控制电路控制，以将磁控管输出功率维持在预定水平。 根据一个方面，在电路中提供电感，其抑制流过变压器绕组的电流中的高频分量; 根据另一方面，逆变器开关频率（以kHz表示）设定为不小于1500 / D的值，其中D表示以毫米表示的无电极灯泡的直径; 根据另一方面，磁控管电流的平均值比的峰值被限制在3.75以下。

公开(公告)号：US5115168A

公开(公告)日：1992-05-19

申请号：US616244

申请日：1990-11-20

申请人： Isao Shoda ,  Hitoshi Kodama ,  Kazuo Magome ,  Akihiko Iwata ,  Kenji Yoshizawa ,  Masakazu Taki

发明人： Isao Shoda ,  Hitoshi Kodama ,  Kazuo Magome ,  Akihiko Iwata ,  Kenji Yoshizawa ,  Masakazu Taki

IPC分类号： H01J65/04 ,  H05B41/24 ,  H05B41/282 ,  H05B41/392

CPC分类号： H01J65/044 ,  H05B41/24

摘要： A power supply circuit for a magnetron adapted to supply microwave energy to an electrodeless discharge bulb is disclosed. The circuit includes a rectifier coupled across a commerical AC voltage source, a filter for smoothing the output of the rectifier, an inverter for converting the DC voltage supplied from the filter into a high frequency AC voltage, a step-up transformer for stepping up the high frequency AC voltage outputted from the inverter, and a rectifier which rectifies the high voltage AC output of the transformer into a unidirectional voltage which is supplied to the magnetron. The inverter switching is controlled by a pulse width modulation control circuit to maintain the magnetron output power at a predetermined level. According to one aspect, an inductance is provided in the circuit which supresses high frquency components in the current flowing through the windings of the transformer; according to another aspect, the inverter switching frequency (expressed in kHz) is set at a value not less than 1500/D, wherein D represents the diameter of the electrodeless bulb expressed in millimeters; according to still another aspect, the peak to the mean value ratio of the magnetron current is limited under 3.75 inclusive.

公开(公告)号：US4571479A

公开(公告)日：1986-02-18

申请号：US588418

申请日：1984-03-12

申请人： Susumu Maeda ,  Masakazu Taki ,  Kenji Yoshizawa

发明人： Susumu Maeda ,  Masakazu Taki ,  Kenji Yoshizawa

IPC分类号： B23K9/127 ,  B23Q35/13 ,  B23K9/12

CPC分类号： B23Q35/13 ,  B23K9/1276

摘要： An automatic tracking welding machine includes a pair of rotatably mounted sensors 6a, 6b disposed in advance of a welding torch 3 and coaxial therewith for detecting magnetic leakage flux across a weld line gap 10. The sensors are driven to equalize their outputs by a reversible stepping motor 15 supplied with drive pulses whose frequency is proportional to the sensor output difference up to a fixed limit, thereby implementing slowdown as the center or zero differential point is approached. Alternatively, a greater number of fixed sensors may be peripherally spaced around the torch housing and their outputs sequentially scanned and peak detected to track the weld line gap. In another embodiment a spaced pair of sensors 116a, 116b is laterally and bidirectionally driven by a reversible d.c. motor 123 supplied with a voltage proportional to the off-center distance detected by the sensors, thus also implementing slowdown as the zero point approaches. Hall effect sensor elements encased in a non-magnetic metal housing may be used to avoid sputtering damage. A single leakage flux sensor may also be employed and periodically scanned laterally across the weld line gap, whereby a peak or zero slope in its output would indicate centering.

摘要翻译： 自动跟踪焊机包括一对可旋转地安装的传感器6a，6b，其设置在焊枪3之前并且与其同轴，用于检测穿过焊缝间隙10的漏磁通量。传感器被驱动以通过可逆步进来均衡其输出 电动机15提供的驱动脉冲的频率与传感器输出差异成正比，达到固定极限，从而在接近中心或零点差时实现减速。 或者，更多数量的固定传感器可以围绕焊炬壳体周边间隔开，并且其输出被顺序地扫描并且被检测到峰值以跟踪焊缝间隙。 在另一个实施例中，间隔开的一对传感器116a，116b由可逆的直流侧向和双向驱动。 电动机123被提供与由传感器检测到的离心距离成比例的电压，因此也随着零点接近而实现减速。 可以使用封装在非磁性金属壳体中的霍尔效应传感器元件来避免溅射损坏。 也可以采用单个漏磁通传感器并且横向跨越焊缝间隙周期性扫描，由此其输出中的峰值或零斜率将指示居中。

公开(公告)号：US08474403B2

公开(公告)日：2013-07-02

申请号：US13237001

申请日：2011-09-20

申请人： Mutsumi Tsuda ,  Masakazu Taki

发明人： Mutsumi Tsuda ,  Masakazu Taki

IPC分类号： C23C16/00

CPC分类号： H01L21/0262 ,  C23C16/24 ,  C23C16/45523 ,  C23C16/515 ,  H01L21/02532 ,  H01L31/202 ,  Y02E10/50 ,  Y02P70/521

摘要： An apparatus including a vacuum chamber having a substrate holding unit that holds a substrate and a plasma electrode facing the substrate, a first gas supply unit that supplies a H2 gas to the vacuum chamber at a constant flow rate, a second gas supply unit that opens or closes a valve to turn on or off the supply of a SiH4 gas, a high-frequency power source that applies a high frequency voltage to the plasma electrode, a shield box that is connected to a ground so as to surround the plasma electrode outside the vacuum chamber, and a control unit that controls the valve such that the SiH4 gas is periodically supplied to the vacuum chamber and modulates the amplitude of high frequency power in synchronization with the opening or closing of the valve, and the valve is provided in the shield box.

摘要翻译： 一种包括具有保持基板的基板保持单元和面向基板的等离子体电极的真空室的设备，以恒定流量向真空室供给H2气体的第一气体供给单元，打开的第二气体供给单元 或关闭阀门以接通或关闭向等离子体电极施加高频电压的高频电源的SiH 4气体的供给，连接到地面以围绕等离子体电极外部的屏蔽盒 真空室和控制单元，其控制阀，使得SiH4气体周期性地供给到真空室，并且与阀的打开或关闭同步地调制高频功率的振幅，并且阀设置在 屏蔽盒。

公开(公告)号：US07773408B2

公开(公告)日：2010-08-10

申请号：US12085664

申请日：2006-11-17

申请人： Takashi Takenaga ,  Takeharu Kuroiwa ,  Taisuke Furukawa ,  Masakazu Taki

发明人： Takashi Takenaga ,  Takeharu Kuroiwa ,  Taisuke Furukawa ,  Masakazu Taki

IPC分类号： G11C11/00

CPC分类号： H01L43/08 ,  B82Y25/00 ,  G11C11/155 ,  G11C11/161 ,  G11C11/1655 ,  G11C11/1657 ,  G11C11/1659 ,  G11C11/1675 ,  H01F10/132 ,  H01F10/3254 ,  H01F10/3272 ,  H01L27/228

摘要： Ferromagnetic layers have magnetizations oriented to such directions as to cancel each other, so that the net magnetization of the ferromagnetic layers is substantially zero. That is, the ferromagnetic layers are exchange-coupled with a nonmagnetic layer interposed therebetween, thereby forming an SAF structure. Since the net magnetization of the ferromagnetic layers forming the SAF structure is substantially zero, the magnetization of a recording layer is determined by the magnetization of a ferromagnetic layer. Therefore, the ferromagnetic layer is made of a CoFeB alloy having high uniaxial magnetic anisotropy, and the ferromagnetic layers are made of a CoFe alloy having a high exchange-coupling force.

摘要翻译： 铁磁层具有朝向彼此抵消的方向取向的磁化，使得铁磁层的净磁化基本上为零。 也就是说，铁磁层与插入其间的非磁性层交换耦合，从而形成SAF结构。 由于形成SAF结构的铁磁层的净磁化基本上为零，记录层的磁化由铁磁层的磁化决定。 因此，铁磁层由具有高的单轴磁各向异性的CoFeB合金制成，铁磁层由具有高交换耦合力的CoFe合金制成。

公开(公告)号：US20070047152A1

公开(公告)日：2007-03-01

申请号：US11509609

申请日：2006-08-25

申请人： Taisuke Furukawa ,  Hiroshi Kobayashi ,  Takashi Takenaga ,  Takeharu Kuroiwa ,  Sadeh Beysen ,  Masakazu Taki

发明人： Taisuke Furukawa ,  Hiroshi Kobayashi ,  Takashi Takenaga ,  Takeharu Kuroiwa ,  Sadeh Beysen ,  Masakazu Taki

IPC分类号： G11B5/33

CPC分类号： G01R33/093 ,  B82Y25/00 ,  G01R15/205

摘要： A magnetic field detection apparatus capable of changing the detection range and detection sensitivity as desired for a specific application is disclosed. A magnetoresistance effect element is applied a bias magnetic field and an external magnetic field. The bias magnetic field and the external magnetic field are generated on the same straight line, and therefore the bias magnetic field functions to hamper the external magnetic field applied to the magnetoresistance effect element. Thus, the magnetization of the free layer of the magnetoresistance effect element is suppressed, and the rotational angle of the magnetized vector is reduced. As a result, the characteristic of the resistance value of the magnetoresistance effect element to the external magnetic field is shifted by an amount equivalent to the bias magnetic field.

摘要翻译： 公开了能够根据具体应用需要改变检测范围和检测灵敏度的磁场检测装置。 磁阻效应元件施加偏置磁场和外部磁场。 在相同的直线上产生偏置磁场和外部磁场，因此偏置磁场用于阻止施加到磁阻效应元件的外部磁场。 因此，磁阻效应元件的自由层的磁化被抑制，并且磁化矢量的旋转角度减小。 结果，磁阻效应元件对外部磁场的电阻值的特性偏移与偏置磁场相当的量。