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公开(公告)号:US20250107095A1
公开(公告)日:2025-03-27
申请号:US18976999
申请日:2024-12-11
Applicant: Kioxia Corporation
Inventor: Tadashi IGUCHI , Murato KAWAI , Toru MATSUDA , Hisashi KATO , Megumi ISHIDUKI
IPC: H10B43/27 , G11C16/04 , H01L21/764 , H01L23/522 , H01L29/792 , H10B41/20 , H10B41/27 , H10B43/10 , H10B43/20 , H10B43/50
Abstract: A method of producing a semiconductor memory device includes, when three directions crossing each other are set to first, second, and third directions, respectively, laminating a plurality of first laminates and a plurality of second laminates on a semiconductor substrate in the third direction. The method further includes forming ends of the plurality of first laminates in shapes of steps extending in the first direction, and forming ends of the plurality of second laminates in shapes of steps extending in both directions of the first direction and the second direction.
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公开(公告)号:US20240120395A1
公开(公告)日:2024-04-11
申请号:US18537954
申请日:2023-12-13
Applicant: KIOXIA CORPORATION
Inventor: Megumi ISHIDUKI , Hiroshi NAKAKI , Takamasa ITO
IPC: H01L29/423 , H01L29/66 , H01L29/792 , H10B43/10 , H10B43/27 , H10B43/50
CPC classification number: H01L29/42344 , H01L29/66833 , H01L29/7926 , H10B43/10 , H10B43/27 , H10B43/50 , H01L23/528
Abstract: A semiconductor device includes a base body, a stacked body on the base body and a first columnar part. The base body includes a substrate, a first insulating film on the substrate, a first conductive film on the first insulating film, and a first semiconductor part on the first conductive film. The stacked body includes conductive layers and insulating layers stacked alternately in a stacking direction. The first columnar part is provided inside the stacked body and the first semiconductor part. The first columnar part includes a semiconductor body and a memory film between the semiconductor body and conductive layers. The semiconductor body extends in the stacking direction. The first columnar part has a first diameter and a second diameter in a first direction crossing the stacking direction. The first diameter inside the first semiconductor part is larger than the second diameter inside the stacked body.
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公开(公告)号:US20250079306A1
公开(公告)日:2025-03-06
申请号:US18755786
申请日:2024-06-27
Applicant: Kioxia Corporation
Inventor: Megumi ISHIDUKI
IPC: H01L23/528 , G11C16/04 , H01L23/522 , H01L23/532 , H10B43/10 , H10B43/27
Abstract: A semiconductor memory device includes conductive layers stacked in a stacking direction, a semiconductor column opposed to the conductive layers, a semiconductor member connected to the semiconductor column, a contact electrode connected to the semiconductor member, a first insulating member separating a part of the conductive layers in a first direction, and a second insulating member disposed inside the first insulating member. The contact electrode includes a first conductive region provided at an opposite side of the semiconductor column in the stacking direction with respect to a surface of the semiconductor member at the contact electrode side in the stacking direction and a second conductive region provided at a semiconductor column side in the stacking direction with respect to the surface of the semiconductor member between the semiconductor member and the second insulating member. The second conductive region is in contact with the second insulating member.
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公开(公告)号:US20230307323A1
公开(公告)日:2023-09-28
申请号:US17901812
申请日:2022-09-01
Applicant: KIOXIA CORPORATION
Inventor: Hiroshi NAKAKI , Megumi ISHIDUKI
IPC: H01L23/48 , G11C16/04 , H01L27/11519 , H01L27/11524 , H01L27/11556 , H01L27/11582 , H01L27/1157 , H01L27/11565
CPC classification number: H01L23/481 , G11C16/0483 , H01L27/11519 , H01L27/11524 , H01L27/11556 , H01L27/11582 , H01L27/1157 , H01L27/11565
Abstract: A semiconductor storage device includes a stacked body in which conductive and insulating layers are alternately stacked in a first direction, conductive lines extending along a second direction intersecting the first direction and arranged along a third direction intersecting the first and second directions, insulators extending along the first and third directions in the body, arranged along the second direction, and dividing conductive layers, columnar bodies extending along the first direction and arranged along the second direction between insulators, each columnar body including a semiconductor body forming memory cells, and vias each connected between a conductive line and a corresponding columnar body. The conductive lines include first through fourth lines, and the columnar bodies include first through fourth bodies, arranged in this order. When viewed from the first direction, the first through fourth columnar bodies respectively overlap and are electrically connected to the first, third, second, and fourth lines.
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公开(公告)号:US20220320138A1
公开(公告)日:2022-10-06
申请号:US17843320
申请日:2022-06-17
Applicant: KIOXIA CORPORATION
Inventor: Yoshiaki FUKUZUMI , Ryota KATSUMATA , Masaru KIDOH , Masaru KITO , Hiroyasu TANAKA , Yosuke KOMORI , Megumi ISHIDUKI , Hideaki AOCHI
IPC: H01L27/11582 , G11C16/04 , H01L27/11556 , H01L27/11573 , H01L27/11575 , H01L27/11578 , H01L27/105 , H01L29/51
Abstract: A non-volatile semiconductor storage device has a plurality of memory strings to each of which a plurality of electrically rewritable memory cells are connected in series. Each of the memory strings includes first semiconductor layers each having a pair of columnar portions extending in a vertical direction with respect to a substrate and a coupling portion formed to couple the lower ends of the pair of columnar portions; a charge storage layer formed to surround the side surfaces of the columnar portions; and first conductive layers formed to surround the side surfaces of the columnar portions and the charge storage layer. The first conductive layers function as gate electrodes of the memory cells.
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公开(公告)号:US20220028892A1
公开(公告)日:2022-01-27
申请号:US17499357
申请日:2021-10-12
Applicant: KIOXIA CORPORATION
Inventor: Yoshiaki FUKUZUMI , Ryota KATSUMATA , Masaru KIDOH , Masaru KITO , Hiroyasu TANAKA , Yosuke KOMORI , Megumi ISHIDUKI , Hideaki AOCHI
IPC: H01L27/11582 , H01L27/11573
Abstract: A non-volatile semiconductor storage device has a plurality of memory strings to each of which a plurality of electrically rewritable memory cells are connected in series. Each of the memory strings includes first semiconductor layers each having a pair of columnar portions extending in a vertical direction with respect to a substrate and a coupling portion formed to couple the lower ends of the pair of columnar portions a charge storage layer formed to surround the side surfaces of the columnar portions: and first conductive layers formed to surround the side surfaces of the columnar portions and the charge storage layer. The first conductive layers function as gate electrodes of the memory cells.
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公开(公告)号:US20250040135A1
公开(公告)日:2025-01-30
申请号:US18913023
申请日:2024-10-11
Applicant: KIOXIA CORPORATION
Inventor: Megumi ISHIDUKI
Abstract: According to one embodiment, a semiconductor memory device includes a stacked layer body including conductive layers stacked to be apart from each other in a first direction, and including a stair-like end with rising parts and terrace parts, wherein successive first conductive layers including an uppermost conductive layer function as select gate lines for a NAND string, and a first contact connected to the uppermost conductive layer provided to correspond to a first rising part which is an uppermost one of the rising parts. The first contact passes through the uppermost conductive layer to be further connected to a first conductive layer adjacent to the uppermost conductive layer.
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公开(公告)号:US20220093633A1
公开(公告)日:2022-03-24
申请号:US17201064
申请日:2021-03-15
Applicant: Kioxia Corporation
Inventor: Megumi ISHIDUKI
IPC: H01L27/11578 , H01L27/11524 , H01L27/11519 , H01L27/11551 , H01L27/11565 , H01L27/1157
Abstract: According to one embodiment, a semiconductor memory device includes a stacked layer body including conductive layers stacked to be apart from each other in a first direction, and including a stair-like end with rising parts and terrace parts, wherein successive first conductive layers including an uppermost conductive layer function as select gate lines for a NAND string, and a first contact connected to the uppermost conductive layer provided to correspond to a first rising part which is an uppermost one of the rising parts. The first contact passes through the uppermost conductive layer to be further connected to a first conductive layer adjacent to the uppermost conductive layer.
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公开(公告)号:US20230146470A1
公开(公告)日:2023-05-11
申请号:US18091728
申请日:2022-12-30
Applicant: KIOXIA CORPORATION
Inventor: Yoshiaki FUKUZUMI , Ryota KATSUMATA , Masaru KIDOH , Masaru KITO , Hiroyasu TANAKA , Yosuke KOMORI , Megumi ISHIDUKI , Hideaki AOCHI
CPC classification number: H01L27/11582 , G11C16/0483 , H01L27/11556 , H01L27/11573 , H01L27/11575 , H01L27/11578 , H01L27/1052 , H01L29/513 , H01L27/11551
Abstract: A non-volatile semiconductor storage device has a plurality of memory strings to each of which a plurality of electrically rewritahle memory cells are connected in series. Each of the memory strings includes first semiconductor layers each having a pair of columnar portions extending in a vertical direction with respect to a substrate and a coupling portion formed to couple the lower ends of the pair of colunmar portions a charge storage layer formed to surround the side surfaces of the columnar portions: and first conductive layers formed to surround the side surfaces of the columnar portions and the charge storage layer. The first conductive layers function as gate electrodes of the memory cells.
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公开(公告)号:US20220139955A1
公开(公告)日:2022-05-05
申请号:US17576164
申请日:2022-01-14
Applicant: Kioxia Corporation
Inventor: Yoshiaki FUKUZUMI , Ryota KATSUMATA , Masaru KITO , Masaru KIDOH , Hiroyasu TANAKA , Yosuke KOMORI , Megumi ISHIDUKI , Junya MATSUNAMI , Tomoko FUJIWARA , Hideaki AOCHI , Ryouhei KIRISAWA , Yoshimasa MIKAJIRI , Shigeto OOTA
IPC: H01L27/11582 , H01L29/66 , H01L29/792 , H01L27/11578 , H01L21/223 , H01L21/265 , H01L29/78 , H01L29/04 , H01L29/16 , H01L29/423 , H01L29/49 , H01L29/10
Abstract: A nonvolatile semiconductor memory device, includes: a stacked structural unit including a plurality of insulating films alternately stacked with a plurality of electrode films in a first direction; a selection gate electrode stacked on the stacked structural unit in the first direction; an insulating layer stacked on the selection gate electrode in the first direction; a first semiconductor pillar piercing the stacked structural unit, the selection gate electrode, and the insulating layer in the first direction, a first cross section of the first semiconductor pillar having an annular configuration, the first cross section being cut in a plane orthogonal to the first direction; a first core unit buried in an inner side of the first semiconductor pillar, the first core unit being recessed from an upper face of the insulating layer; and a first conducting layer of the first semiconductor pillar provided on the first core unit to contact the first core unit.
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