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    Multiple working distance height sensor using multiple wavelengths
    1.
    发明授权
    Multiple working distance height sensor using multiple wavelengths 有权

    公开(公告)号：US11170971B2

    公开(公告)日：2021-11-09

    申请号：US16511197

    申请日：2019-07-15

    Applicant: KLA—Tencor Corporation

    Inventor： Donald Pettibone

    IPC: H01J37/28 ,  H01J37/20 ,  H01J37/244 ,  G01N15/02 ,  G02B21/00

    Abstract: A system is disclosed. The system includes a stage assembly configured to receive a specimen and maintain a height of the specimen at a first working distance height during a first characterization mode and an additional working distance height during an additional characterization mode. The system further includes an illumination source configured to generate an illumination beam. The system further includes an illumination arm including a set of optical elements configured to direct a portion of the illumination beam including illumination of a first wavelength to the specimen during the first characterization mode, and direct a portion of the illumination beam including illumination of an additional wavelength to the specimen during the additional characterization mode. The system further includes a detector assembly configured to receive illumination emanated from the specimen, and a controller configured to determine a specimen height value based on the illumination received by the detector assembly.

    System, method and apparatus for polarization control
    3.
    发明授权
    System, method and apparatus for polarization control 有权

    公开(公告)号：US10921488B2

    公开(公告)日：2021-02-16

    申请号：US16005333

    申请日：2018-06-11

    Applicant: KLA-Tencor Corporation

    Inventor： Ivan Maleev ,  Donald Pettibone

    IPC: G02B1/02 ,  G01N21/88 ,  G01N21/95 ,  G02B27/28 ,  G02B5/30

    Abstract: A polarization control device includes a first wave plate having a first surface profile and a second wave plate having a second surface profile complementary to the first surface profile. The optical axis of the first wave plate is orthogonal to the optical axis of the second wave plate. The first wave plate and the second wave plate are positioned to align the first surface profile with the second surface profile and maintain a constant thickness across the polarization control device. The first wave plate and the second wave plate may control polarization rotation as a continuous function of transverse position across a pupil plane of an optical system. The first wave plate and the second wave plate are separated by a sufficiently small distance so as to limit wave front distortion below a selected level.

    System and method for luminescent tag based wafer inspection
    5.
    发明授权
    System and method for luminescent tag based wafer inspection 有权

    公开(公告)号：US09970873B1

    公开(公告)日：2018-05-15

    申请号：US14939959

    申请日：2015-11-12

    Applicant: KLA-Tencor Corporation

    Inventor： Donald Pettibone ,  Chuanyong Huang ,  Kurt Haller

    IPC: G01N21/00 ,  G01N21/64 ,  G01N21/95

    CPC classification number: G01N21/643 ,  G01N21/9501 ,  G01N2021/6439

    Abstract: A luminescent tag based defect detection system comprises a luminescent tag attachment assembly, an illumination source, one or more detectors, and a set of optical elements. The luminescent tag attachment assembly exposes a sample to one or more luminescent tag materials selectively attached to one or more defects on the sample. The illumination source generates illumination including one or more wavelengths corresponding to the one or more absorption spectra associated with the one or more luminescent tags. At least a portion of the set of optical elements directs illumination from the illumination source to the sample, and at least a portion of the set of optical elements directs illumination emitted from the one or more luminescent tag materials to the one or more detectors. A luminescent tag based defect detection system may also include a luminescent tag removal assembly to remove the luminescent tags after detection.

    System and Method for Simultaneous Dark Field and Phase Contrast Inspection
    6.
    发明申请
    System and Method for Simultaneous Dark Field and Phase Contrast Inspection 有权
    同时进行暗场和相位对比检测的系统和方法

    公开(公告)号：US20160025645A1

    公开(公告)日：2016-01-28

    申请号：US14804296

    申请日：2015-07-20

    Applicant: KLA-Tencor Corporation

    Inventor： Chuanyong Huang ,  Qing Li ,  Donald Pettibone ,  Buzz Graves

    IPC: G01N21/88 ,  G01N21/95

    CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2021/8825

    Abstract: An inspection apparatus for simultaneous dark field (DF) and differential interference contrast (DIC) inspection includes an illumination source and a sample stage configured to secure a sample. The inspection apparatus includes a first sensor, a second sensor and an optical sub-system. The optical sub-system includes an objective, one or more optical elements arranged to direct, through the objective, illumination from the one or more illumination sources to a surface of the sample. The objective is configured to collect a signal from the surface of the sample, wherein the collected signal includes a scattering-based signal and/or a phase-based signal from the sample. The inspection apparatus includes one or more separation optical elements arranged to spatially separate the collected signal into a DF signal and a DIC signal by directing the DF signal and the DIC signal along a DF path and DIC path respectively.

    Abstract translation: 用于同时暗场（DF）和差分干涉对比（DIC）检查的检查装置包括照明源和被配置为固定样品的样品台。 检查装置包括第一传感器，第二传感器和光子系统。 光学子系统包括物镜，一个或多个光学元件，被布置成通过物镜引导从一个或多个照明源到样品表面的照明。 该目的被配置为从样品的表面收集信号，其中所收集的信号包括来自样品的基于散射的信号和/或基于相位的信号。 检查装置包括一个或多个分离光学元件，其被布置为通过分别沿DF路径和DIC路径引导DF信号和DIC信号来将收集的信号空间分离成DF信号和DIC信号。

    System, Method and Apparatus For Polarization Control
    7.
    发明申请
    System, Method and Apparatus For Polarization Control 审中-公开

    公开(公告)号：US20180292574A1

    公开(公告)日：2018-10-11

    申请号：US16005333

    申请日：2018-06-11

    Applicant: KLA-Tencor Corporation

    Inventor： Ivan Maleev ,  Donald Pettibone

    IPC: G02B1/02 ,  G02B27/28 ,  G02B5/30 ,  G01N21/88 ,  G01N21/95

    Abstract: A polarization control device includes a first wave plate having a first surface profile and a second wave plate having a second surface profile complementary to the first surface profile. The optical axis of the first wave plate is orthogonal to the optical axis of the second wave plate. The first wave plate and the second wave plate are positioned to align the first surface profile with the second surface profile and maintain a constant thickness across the polarization control device. The first wave plate and the second wave plate may control polarization rotation as a continuous function of transverse position across a pupil plane of an optical system. The first wave plate and the second wave plate are separated by a sufficiently small distance so as to limit wave front distortion below a selected level.

    System, method and apparatus for polarization control
    8.
    发明授权
    System, method and apparatus for polarization control 有权

    公开(公告)号：US09995850B2

    公开(公告)日：2018-06-12

    申请号：US14296425

    申请日：2014-06-04

    Applicant: KLA-Tencor Corporation

    Inventor： Ivan Maleev ,  Donald Pettibone

    IPC: G01N21/21 ,  G01N21/01 ,  G02B1/02 ,  G02B27/28 ,  G02B5/30 ,  G01N21/88 ,  G01N21/95

    CPC classification number: G02B1/02 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8848 ,  G02B5/3083 ,  G02B27/286

    Abstract: A polarization control device includes a first wave plate having a first surface profile and a second wave plate having a second surface profile complementary to the first surface profile. The optical axis of the first wave plate is orthogonal to the optical axis of the second wave plate. The first wave plate and the second wave plate are positioned to align the first surface profile with the second surface profile and maintain a constant thickness across the polarization control device. The first wave plate and the second wave plate may control polarization rotation as a continuous function of transverse position across a pupil plane of an optical system. The first wave plate and the second wave plate are separated by a sufficiently small distance so as to limit wave front distortion below a selected level.

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