Chemical vapor deposition of hydrogel films
    1.
    发明申请
    Chemical vapor deposition of hydrogel films 有权
    水凝胶膜的化学气相沉积

    公开(公告)号:US20070032620A1

    公开(公告)日:2007-02-08

    申请号:US11198932

    申请日:2005-08-05

    IPC分类号: C08F4/00

    CPC分类号: C09D4/00 B05D1/60

    摘要: In one embodiment of the invention, iCVD is used to form linear thin films using a radical initiator and an alkene. In another embodiment, iCVD is used to form crosslinked thin films by the addition of a crosslinking agent (e.g., a diacrylate or a dimethyacrylate). The incorporation of a crosslinking agent into the thin films is shown to increase systematically with its partial pressure. In one embodiment, when the crosslinker is EDGA and the monomer is HEMA it results in crosslinked P(HEMA-co-EGDA) copolymer. In another embodiment, when the crosslinker is EDGA and the monomer is VP, it results in crosslinked P(VP-co-EGDA). Disclosed are the effects of crosslinker incorporation on the thermal and the wetting properties of the polymers. The unique swelling properties of these films are also described; certain films of the present invention are hydrogels when soaked in water.

    摘要翻译: 在本发明的一个实施方案中,iCVD用于使用自由基引发剂和烯烃形成线性薄膜。 在另一个实施方案中,iCVD用于通过加入交联剂(例如二丙烯酸酯或二甲基丙烯酸酯)形成交联的薄膜。 显示出将交联剂引入薄膜中的系统地增加其分压。 在一个实施方案中,当交联剂为EDGA且单体为HEMA时,其导致交联的P(HEMA-co-EGDA)共聚物。 在另一个实施方案中,当交联剂为EDGA且单体为VP时,其导致交联的P(VP-co-EGDA)。 公开了交联剂掺入对聚合物的热和润湿性能的影响。 还描述了这些膜的独特溶胀特性; 本发明的某些薄膜在水中浸泡时是水凝胶。

    Preparation of asymmetric membranes using hot-filament chemical vapor deposition
    3.
    发明申请
    Preparation of asymmetric membranes using hot-filament chemical vapor deposition 审中-公开
    使用热丝化学气相沉积制备不对称膜

    公开(公告)号:US20060040053A1

    公开(公告)日:2006-02-23

    申请号:US10513880

    申请日:2003-05-09

    IPC分类号: C23C16/00

    摘要: One aspect of the present invention relates to a method for modifying one side of a PTFE membrane by using HFCVD to deposit a PTFE film on one side of the PTFE membrane. The precursor fluorocarbon gas is preferably hexafluoropropylene oxide, which upon pyrolysis under HFCVD conditions forms reactive CF2 species. The present invention also relates to a modified PTFE membrane having a PTFE film on only one side, wherein the PTFE film has a porosity of greater than about 30% and a dangling bond density of less than about 1018 spins/cm3. The invention further provides a method of filtering a liquid or gas or a mixture of the two, comprising passing the liquid or gas or mixture of the two through the modified PTFE membrane of the present invention.

    摘要翻译: 本发明的一个方面涉及通过使用HFCVD在PTFE膜的一侧上淀积PTFE膜来改变PTFE膜的一面的方法。 前体碳氟化合物气体优选为六氟环氧丙烷,其在HFCVD条件下热解形成反应性CF 2物质。 本发明还涉及仅在一侧具有PTFE膜的改性PTFE膜,其中PTFE膜的孔隙率大于约30%,悬挂键密度小于约1018自旋/ cm3。 本发明还提供一种过滤液体或气体或二者的混合物的方法,包括使液体或气体或其混合物通过本发明的改性PTFE膜。

    Oxidative chemical vapor deposition of electrically conductive and electrochromic polymers

    公开(公告)号:US20060269664A1

    公开(公告)日:2006-11-30

    申请号:US11141353

    申请日:2005-05-31

    IPC分类号: C23C16/00

    摘要: Remarkably, disclosed herein is a solvent-less chemical vapor deposition (CVD) method for the oxidative polymerization and deposition of thin films of electrically-conducting polymers. In a preferred embodiment, the method provides poly-3,4-ethylenedioxythiophene (PEDOT) thin films. In other embodiments, the method is applicable to polymerization to give other conducting polymers, such as polyanilines, polypyrroles, polythiophenes and their derivatives. The all-vapor technique uses a moderate substrate temperature, making it compatible with a range of materials, including as fabric and paper. In addition, this method allows for the coating of high surface-area substrates with fibrous, porous and/or particulate morphologies. The coated substrates may be used in organic semiconductor devices, including organic light-emitting diodes (OLEDs), photovoltaics, electrochromics, and supercapacitors.

    Initiated chemical vapor deposition of vinyl polymers for the encapsulation of particles
    7.
    发明申请
    Initiated chemical vapor deposition of vinyl polymers for the encapsulation of particles 有权
    乙烯基聚合物的起始化学气相沉积用于颗粒的包封

    公开(公告)号:US20070104860A1

    公开(公告)日:2007-05-10

    申请号:US11589683

    申请日:2006-10-30

    摘要: One aspect of the present invention relates to an all-dry encapsulation method that enables well-defined polymers to be applied around particles of sizes down to the nanoscale. In certain embodiments, the methods are modified forms of initiated chemical vapor deposition (iCVD) using a thermally-initiated radical polymerization to create conformal coatings around individual particles while avoiding agglomeration. The present invention also enables the coating of particle surfaces with a range of functional groups via direct incorporation of the functionality into the monomers used or indirectly through a subsequent modification of the surface of a coated particle. In certain embodiments, the method produces high quality functional polymer coatings.

    摘要翻译: 本发明的一个方面涉及全干封装方法,其使得能够将明确定义的聚合物施加在尺寸低至纳米级的颗粒周围。 在某些实施方案中,所述方法是使用热引发的自由基聚合来引发化学气相沉积(iCVD)的修饰形式,以在避免团聚的同时产生围绕各个颗粒的保形涂层。 本发明还能够通过将官能团直接引入所使用的单体或间接通过随后的涂覆颗粒表面的改性来涂覆具有一定范围的官能团的颗粒表面。 在某些实施方案中,该方法产生高质量的功能性聚合物涂层。