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49 条记录 (耗时 0.03 秒)

    Heating cooker with a space-efficient ventilating arrangement
    1.
    发明授权
    Heating cooker with a space-efficient ventilating arrangement 失效
    加热炊具具有节省空间的通风装置

    公开(公告)号：US5981929A

    公开(公告)日：1999-11-09

    申请号：US52943

    申请日：1998-04-01

    申请人： Kazunori Maeda ,  Satoru Kodama ,  Hisahiro Nishitani

    发明人： Kazunori Maeda ,  Satoru Kodama ,  Hisahiro Nishitani

    IPC分类号： H05B6/80 ,  H05B6/64

    CPC分类号： H05B6/6429 ,  H05B6/6423

    摘要： The present invention relates to heating cookers, particularly to a structure for ventilation and cooling of microwave ovens employing a range hood. The structure according to the present invention enhances the ventilation airflow and capacity of a heating chamber by enlarging diameter of a ventilating fan by forming a recess on an upper wall of the heating chamber and by disposing the ventilating fan in the recess. Also, an improvement in ventilation efficiency is achieved by disposing the ventilating fan of a larger diameter at either or both ends of a wave-guide, and dividing the airflow path into an evenly well balanced plurality of airflow paths. Moreover, an openable door is attached to either or both of an exhaust opening and an intake opening for the air to pass through an inner surface of the door, thereby keeping the soiled surface inconspicuous. Furthermore, a cooling fan for a machinery compartment is disposed on an upper part of the machinery compartment in order to widen the airflow path for further improvement of the cooling and ventilation efficiency.

    摘要翻译： 本发明涉及加热烹调器，特别涉及采用抽油烟机的微波炉的通风和冷却结构。 根据本发明的结构通过在加热室的上壁上形成凹槽并且将通风扇布置在凹槽中来扩大通风扇的直径来增强加热室的通风气流和容量。 此外，通过在波导的两端或两端布置较大直径的通风扇，并将气流路径分成均匀平衡的多个气流路径，可以实现通气效率的提高。 此外，可打开的门连接到排气口和进气口中的一个或两个，以使空气通过门的内表面，从而保持污染的表面不显眼。 此外，为了进一步提高冷却和通风效率，在机械室的上部设置用于机械室的冷却风扇，以加宽气流路径。

    Drum type washing machine with angled door opening
    2.
    发明授权
    Drum type washing machine with angled door opening 失效
    滚筒式洗衣机带门开门

    公开(公告)号：US07430885B2

    公开(公告)日：2008-10-07

    申请号：US11107879

    申请日：2005-04-18

    申请人： Satoshi Maeda ,  Hiroshi Kajihara ,  Kazunori Maeda ,  Tadashi Inuzuka

    发明人： Satoshi Maeda ,  Hiroshi Kajihara ,  Kazunori Maeda ,  Tadashi Inuzuka

    IPC分类号： D06F37/04 ,  D06F37/10

    CPC分类号： D06F39/12 ,  D06F23/06 ,  D06F37/26

    摘要： A drum type washing machine includes a housing, a rotary drum, a water tub accommodating the rotary drum therein, a door for opening and closing a housing opening for allowing laundry to be loaded into or unloaded from the rotary drum therethrough, a water tub opening communicating with the housing opening, a rotary drum opening communicating with the housing opening and the water tub opening; and an elastic connection member for connecting the housing opening and water tub opening, and having a portion that makes a pressurized contact with the door when the door is closed. A center of the housing opening is displaced upward with respect to a center of the rotary drum opening, and an angle of inclination of the housing opening with respect to a vertical plane is set to be greater than that of the rotary drum opening with respect to the vertical plane.

    摘要翻译： 滚筒式洗衣机包括壳体，旋转滚筒，容纳旋转滚筒的水桶，用于打开和关闭用于允许衣物装载到旋转滚筒或从其中卸载的外壳开口的门，水桶开口 与所述壳体开口连通，与所述壳体开口和所述水桶开口连通的旋转鼓开口; 以及用于连接壳体开口和水桶开口的弹性连接构件，并且具有当门关闭时与门加压接触的部分。 壳体开口的中心相对于旋转鼓开口的中心向上移位，并且壳体开口相对于垂直平面的倾斜角度被设定为大于旋转鼓开口相对于垂直平面的倾斜角 垂直平面。

    Resist composition and patterning process
    5.
    发明授权
    Resist composition and patterning process 有权
    抗蚀剂组成和图案化工艺

    公开(公告)号：US06949323B2

    公开(公告)日：2005-09-27

    申请号：US10283263

    申请日：2002-10-30

    申请人： Takanobu Takeda ,  Osamu Watanabe ,  Kazunori Maeda ,  Hiroshi Miyakoshi

    发明人： Takanobu Takeda ,  Osamu Watanabe ,  Kazunori Maeda ,  Hiroshi Miyakoshi

    IPC分类号： G03F7/032 ,  C08F12/22 ,  G03F7/039 ,  H01L21/027 ,  G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

    摘要： Resist compositions comprising as the base resin a polymer using tert-amyloxystyrene as a reactive group which is decomposable under the action of an acid to increase solubility in alkali have advantages including a significantly enhanced contrast of alkali dissolution rate before and after exposure, a high sensitivity, and a high resolution in the baking temperature range of 100-110° C. which is unachievable with tert-butoxystyrene. The compositions are best suited as a chemically amplified resist material for micropatterning in the manufacture of VLSI.

    摘要翻译： 包含作为基础树脂的聚合物的抗蚀剂组合物使用在酸的作用下可分解的叔淀粉氧基苯乙烯作为反应性基团以增加在碱中的溶解度的优点包括显着增强曝光前后碱溶解速率的对比度，高灵敏度 ，并且在100-110℃的烘烤温度范围内具有高分辨率，其不能用叔丁氧基苯乙烯进行。 组合物最适合用作VLSI制造中的微图案化学放大抗蚀剂材料。

    Sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process
    7.
    发明授权
    Sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process 有权
    磺酰基重氮甲烷，光酸代，抗蚀剂组合物和图案化工艺

    公开(公告)号：US06689530B2

    公开(公告)日：2004-02-10

    申请号：US10255770

    申请日：2002-09-27

    申请人： Youichi Ohsawa ,  Katsuhiro Kobayashi ,  Kazunori Maeda

    发明人： Youichi Ohsawa ,  Katsuhiro Kobayashi ,  Kazunori Maeda

    IPC分类号： G03F7004

    CPC分类号： C07C317/28 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/143

    摘要： A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of formula (1) wherein R is H or C1-4 alkyl or alkoxy, G is SO2 or CO, R3 is C1-10 alkyl or C6-14 aryl, p is 1 or 2, q is 0 or 1, p+q=2, n is 0 or 1, m is 3 to 11, and k is 0 to 4. The composition is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution and improved pattern profile after development.

    摘要翻译： 化学放大型抗蚀剂组合物含有式（1）的磺酰基二氮甲烷化合物，其中R为H或C 1-4烷基或烷氧基，G为SO 2或CO，R 3为C 1-10烷基或C 6-14 芳基，p为1或2，q为0或1，p + q = 2，n为0或1，m为3至11，k为0至4.该组合物适用于微细加工，特别是深紫外 由于许多优点，包括改进的分辨率和改进的图案轮廓，开发后的光刻。

    Cooking apparatus
    8.
    发明授权
    Cooking apparatus 有权
    烹饪器具

    公开(公告)号：US06662711B2

    公开(公告)日：2003-12-16

    申请号：US10354399

    申请日：2003-01-30

    申请人： Kazunori Maeda

    发明人： Kazunori Maeda

    IPC分类号： A23L100

    CPC分类号： H05B6/6414 ,  Y10S99/14

    摘要： A protective screen (5) is provided near a peephole part (7) of a door main body (2) and has its heat resisting temperature higher than the heat resisting temperature of a window frame. Even when a material to be cooked ignites, flame hardly goes outside from the peephole part (7). A temperature switch (3) does not need to be provided in a heating chamber (1). Accordingly, the cooking apparatus can be easily designed.

    摘要翻译： 在门主体（2）的窥视孔部（7）附近设有保护屏（5），其耐热温度高于窗框的耐热温度。 即使要烹饪的材料点燃，火焰几乎不从窥视孔部分（7）出来。 温度开关（3）不需要设置在加热室（1）中。 因此，可以容易地设计烹饪设备。

    Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition
    10.
    发明授权
    Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition 有权
    具有这种化学放大抗蚀剂组合物的半导体集成电路器件的化学放大抗蚀剂组合物和制造方法

    公开(公告)号：US07534554B2

    公开(公告)日：2009-05-19

    申请号：US12128039

    申请日：2008-05-28

    申请人： Seiji Nagahara ,  Satoshi Watanabe ,  Kazunori Maeda

    发明人： Seiji Nagahara ,  Satoshi Watanabe ,  Kazunori Maeda

    IPC分类号： G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0045 ,  G03F7/0392 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/122

    摘要： With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the via hole (as well as in its vicinity) may remain even after the exposure and the development are carried out. The present invention relates to a chemically amplified resist composition comprising, at least, a photo acid generator, a quencher and a salt having a buffering function for an acid which is generated from the acid generator by irradiation, wherein the salt having the buffering function for the acid generated from the acid generator is a salt derived from a long chain alkylbenzenesulfonic acid or a long chain alkoxybenzenesulfonic acid and an organic amine that is a basic compound.

    摘要翻译： 在使用常规的化学放大型正性光致抗蚀剂组合物形成互连的镶嵌工艺的情况下，存在即使在曝光和显影进行之后，通孔（以及其附近）内的光致抗蚀剂也可能保留的问题 。 本发明涉及一种化学放大抗蚀剂组合物，其至少包含光酸产生剂，猝灭剂和具有由酸产生剂通过照射产生的酸的缓冲功能的盐，其中具有缓冲功能的盐 由酸产生剂产生的酸是衍生自长链烷基苯磺酸或长链烷氧基苯磺酸的盐和作为碱性化合物的有机胺。