公开(公告)号：US06852299B2

公开(公告)日：2005-02-08

申请号：US09959505

申请日：2001-04-26

申请人： Kazuo Kohmura ,  Akihiro Okabe ,  Takeshi Kubota ,  Yoshito Kurano ,  Masami Murakami

发明人： Kazuo Kohmura ,  Akihiro Okabe ,  Takeshi Kubota ,  Yoshito Kurano ,  Masami Murakami

IPC分类号： B01J20/10 ,  C01B33/12 ,  C01B33/159 ,  C01B33/18 ,  C08J9/00 ,  C09C1/30 ,  C09D183/02 ,  C09D183/08 ,  H01L21/316 ,  C08G77/24

CPC分类号： C01B33/124 ,  B01J20/103 ,  B01J20/2809 ,  B82Y30/00 ,  C01P2002/70 ,  C01P2004/61 ,  C01P2004/64 ,  C01P2006/16 ,  C01P2006/17 ,  C01P2006/60 ,  C01P2006/80 ,  C01P2006/90 ,  C08J9/0004 ,  C08J2300/14 ,  C09C1/3045 ,  C09D183/02 ,  C09D183/08 ,  H01L21/31695 ,  Y10T428/264 ,  Y10T428/265

摘要： Water-repellent porous silica having uniform pores, which comprises silica skeleton wherein fluorine atoms are fixed through covalent bonds and which has an alkali metal content of not more than 10 ppb, is synthesized. By the water-repellent porous silica, a water-repellent porous silica film having uniform pores, which is applicable to a light functional material or an electron functional material, a process for preparing the same and uses thereof can be provided.

摘要翻译： 合成具有均匀孔隙的疏水性多孔二氧化硅，其包含二氧化硅骨架，其中氟原子通过共价键固定并且碱金属含量不超过10ppb。 通过防水多孔二氧化硅，可以提供适用于光功能材料或电子功能材料的具有均匀孔隙的防水多孔二氧化硅膜，其制备方法及其用途。

公开(公告)号：US20060040110A1

公开(公告)日：2006-02-23

申请号：US10526688

申请日：2003-09-08

申请人： Kazuo Kohmura ,  Shunsuke Oike ,  Takeshi Kubota ,  Masami Murakami ,  Yoshito Kurano

发明人： Kazuo Kohmura ,  Shunsuke Oike ,  Takeshi Kubota ,  Masami Murakami ,  Yoshito Kurano

IPC分类号： B05D1/40 ,  B32B13/04

CPC分类号： H01L21/02126 ,  C09D183/04 ,  C09D183/14 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/31695 ,  Y10T428/31663

摘要： The present invention relates to a method for modifying a porous film mainly having Si—O bonds wherein a thermal treatment is conducted without using a metal catalyst by bringing an organic silicon compound into contact with the porous film. The organic silicon compound includes one or more Si—X—Si bond unit (wherein X represents O, NR, CnH2n, or C6H4; R represents CmH2m+1 or C6H5; m is an integer between 1 and 6; and n is 1 or 2) and two or more Si-A bond units (wherein A represents H, OH, OCeH2e+1 or a halogen atom and can be the same or different within a single molecule; and e is an integer between 1 and 6). Since the porous film obtained by this method is excellent in the hydrophobic property and the mechanical strength, it can be used as an optically functional material or an electronically functional material. The porous film is especially useful as a semiconductor material, and can be preferably used as an interlayer insulating film in a semiconductor device.

摘要翻译： 本发明涉及一种用于改性主要具有Si-O键的多孔膜的方法，其中通过使有机硅化合物与多孔膜接触而不使用金属催化剂进行热处理。 有机硅化合物包括一个或多个Si-X-Si键单元（其中X表示O，NR，C n H 2n H 2n或C 6， R 4表示C m H 2 m + 1或C 6 H 5， m是1和6之间的整数; n是1或2）和两个或更多个Si-A键单元（其中A表示H，OH，OC 2e + 1或卤素原子，并且可以在单分子内相同或不同; e为1至6之间的整数）。 由于通过该方法获得的多孔膜的疏水性和机械强度优异，因此可以用作光学功能材料或电子功能材料。 多孔膜特别可用作半导体材料，并且可以优选用作半导体器件中的层间绝缘膜。

公开(公告)号：US07807267B2

公开(公告)日：2010-10-05

申请号：US10526688

申请日：2003-09-08

申请人： Kazuo Kohmura ,  Shunsuke Oike ,  Takeshi Kubota ,  Masami Murakami ,  Yoshito Kurano

发明人： Kazuo Kohmura ,  Shunsuke Oike ,  Takeshi Kubota ,  Masami Murakami ,  Yoshito Kurano

IPC分类号： B32B9/04

CPC分类号： H01L21/02126 ,  C09D183/04 ,  C09D183/14 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/31695 ,  Y10T428/31663

摘要： The present invention relates to a method for modifying a porous film mainly having Si—O bonds wherein a thermal treatment is conducted without using a metal catalyst by bringing an organic silicon compound into contact with the porous film. The organic silicon compound includes one or more Si—X—Si bond unit (wherein X represents O, NR, CnH2n, or C6H4; R represents CmH2m+1 or C6H5; m is an integer between 1 and 6; and n is 1 or 2) and two or more Si-A bond units (wherein A represents H, OH, OCeH2e+1 or a halogen atom and can be the same or different within a single molecule; and e is an integer between 1 and 6). Since the porous film obtained by this method is excellent in the hydrophobic property and the mechanical strength, it can be used as an optically functional material or an electronically functional material. The porous film is especially useful as a semiconductor material, and can be preferably used as an interlayer insulating film in a semiconductor device.

摘要翻译： 本发明涉及一种用于改性主要具有Si-O键的多孔膜的方法，其中通过使有机硅化合物与多孔膜接触而不使用金属催化剂进行热处理。 有机硅化合物包括一个或多个Si-X-Si键单元（其中X表示O，NR，C n H 2n或C 6 H 4; R表示C m H 2n + 1或C 6 H 5; m为1至6的整数; n为1或 2）和两个或更多个Si-A键单元（其中A表示H，OH，OCeH 2e + 1或卤素原子，并且在单分子内可以相同或不同; e为1至6之间的整数）。 由于通过该方法获得的多孔膜的疏水性和机械强度优异，因此可以用作光学功能材料或电子功能材料。 多孔膜特别可用作半导体材料，并且可以优选用作半导体器件中的层间绝缘膜。

公开(公告)号：US20090206453A1

公开(公告)日：2009-08-20

申请号：US11884358

申请日：2006-02-15

申请人： Nobutoshi Fujii ,  Kazuo Kohmura ,  Hidenori Miyoshi ,  Hirofumi Tanaka ,  Shunsuke Oike ,  Masami Murakami ,  Takeshi Kubota ,  Yoshito Kurano

发明人： Nobutoshi Fujii ,  Kazuo Kohmura ,  Hidenori Miyoshi ,  Hirofumi Tanaka ,  Shunsuke Oike ,  Masami Murakami ,  Takeshi Kubota ,  Yoshito Kurano

IPC分类号： H01L29/00 ,  B05D7/22 ,  B32B3/26

CPC分类号： H01L21/76826 ,  C01B33/12 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02214 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/31608 ,  H01L21/31695 ,  Y10T428/249994

摘要： A hydrophobic compound having at least one each of hydrophobic group (an alkyl group having 1 to 6 carbon atoms or a —C6H5 group) and polymerizable group (a hydrogen atom, a hydroxyl group or a halogen atom) is allowed to undergo a gas-phase polymerization reaction, under reduced pressure (of not more than 30 kPa), in the presence of a raw porous silica film and to thus form a modified porous silica film wherein a hydrophobic polymer thin film is formed on the inner walls of holes present in the raw porous silica film. The resulting porous silica film has a low relative dielectric constant and a low refractive index and the silica film is likewise improved in the mechanical strength and hydrophobicity. A semiconductor device is produced using the porous silica film.

摘要翻译： 具有疏水性基团（具有1〜6个碳原子的烷基或-C 6 H 5基团）和可聚合基团（氢原子，羟基或卤素原子）中的至少一种的疏水化合物被允许进行气 - 在减压（不大于30kPa）的条件下，在原料多孔二氧化硅膜的存在下进行相聚合反应，从而形成改性多孔二氧化硅膜，其中在存在于孔中的孔的内壁上形成疏水性聚合物薄膜 原料多孔二氧化硅膜。 所得到的多孔二氧化硅膜的相对介电常数低，折射率低，二氧化硅膜的机械强度和疏水性同样提高。 使用多孔二氧化硅膜制造半导体器件。

公开(公告)号：US20070006776A1

公开(公告)日：2007-01-11

申请号：US10554233

申请日：2004-04-26

申请人： Shunsuke Oike ,  Kazuo Kohmura ,  Masami Murakami ,  Takeshi Kubota

发明人： Shunsuke Oike ,  Kazuo Kohmura ,  Masami Murakami ,  Takeshi Kubota

IPC分类号： C09D183/04

CPC分类号： H01L21/02216 ,  C09D183/04 ,  H01L21/02203 ,  H01L21/02282 ,  H01L21/31695

摘要： The coating liquid for forming porous silica according to the present invention is characterized by preferably containing a partial hydrolysis-condensation product of an alkoxysilane compound, a surfactant and an organic ampholyte, and by having a metal content of not more than 50 ppb. Conventional coating liquids for forming porous silica have such a problem that porous silica films formed therefrom may have poor regularity in micropore alignment when the shelf life of the coating liquids are long. On the contrary, the coating liquid for forming porous silica of the present invention is excellent in self-life stability. Namely, the quality of porous silica formed therefrom is hardly affected by the length of self-life period of the coating liquid. Consequently, the coating liquid is expected to contribute to the stable preparation of porous silica films which cause no shift in capacitance or voltage when exposed to an electric field, have regularly aligned uniform micropores, and are preferably used as an optically functional material or an electronically functional material.

公开(公告)号：US07291215B2

公开(公告)日：2007-11-06

申请号：US10554233

申请日：2004-04-26

申请人： Shunsuke Oike ,  Kazuo Kohmura ,  Masami Murakami ,  Takeshi Kubota

发明人： Shunsuke Oike ,  Kazuo Kohmura ,  Masami Murakami ,  Takeshi Kubota

IPC分类号： C09D183/02 ,  C01B33/12

CPC分类号： H01L21/02216 ,  C09D183/04 ,  H01L21/02203 ,  H01L21/02282 ,  H01L21/31695

摘要： The coating liquid for forming porous silica according to the present invention is characterized by preferably containing a partial hydrolysis-condensation product of an alkoxysilane compound, a surfactant and an organic ampholyte, and by having a metal content of not more than 50 ppb. Conventional coating liquids for forming porous silica have such a problem that porous silica films formed therefrom may have poor regularity in micropore alignment when the shelf life of the coating liquids are long. On the contrary, the coating liquid for forming porous silica of the present invention is excellent in self-life stability. Namely, the quality of porous silica formed therefrom is hardly affected by the length of self-life period of the coating liquid. Consequently, the coating liquid is expected to contribute to the stable preparation of porous silica films which cause no shift in capacitance or voltage when exposed to an electric field, have regularly aligned uniform micropores, and are preferably used as an optically functional material or an electronically functional material.

摘要翻译： 根据本发明的用于形成多孔二氧化硅的涂布液的特征在于优选含有烷氧基硅烷化合物，表面活性剂和有机两性电解质的部分水解缩合产物，并且金属含量不超过50ppb。 用于形成多孔二氧化硅的常规涂布液具有这样的问题，即当涂布液的保质期长时，由其形成的多孔二氧化硅膜在微孔对准中的规则性差。 相反，本发明的多孔二氧化硅的形成用涂布液的自身寿命稳定性优异。 也就是说，由其形成的多孔二氧化硅的质量几乎不受涂布液的自身寿命期的影响。 因此，期望涂料液体有助于多孔二氧化硅膜的稳定制备，其在暴露于电场时不会发生电容或电压偏移，具有规则排列的均匀微孔，并且优选用作光学功能材料或电子 功能材料。

公开(公告)号：US09579701B2

公开(公告)日：2017-02-28

申请号：US13813862

申请日：2011-07-29

申请人： Takeshi Kubota ,  Masahiro Fujikura

发明人： Takeshi Kubota ,  Masahiro Fujikura

IPC分类号： B21B15/00 ,  C21D8/12 ,  C21D6/00 ,  C21D9/46 ,  C22C38/00 ,  C22C38/04 ,  C22C38/06 ,  C22C38/16 ,  C22C38/18 ,  C22C38/34 ,  H01F1/16 ,  C22C38/02

CPC分类号： B21B15/00 ,  C21D6/008 ,  C21D8/1222 ,  C21D8/1233 ,  C21D8/1266 ,  C21D8/1272 ,  C21D9/46 ,  C21D2201/05 ,  C22C38/002 ,  C22C38/004 ,  C22C38/008 ,  C22C38/02 ,  C22C38/04 ,  C22C38/06 ,  C22C38/16 ,  C22C38/18 ,  C22C38/34 ,  H01F1/16

摘要： A steel having a predetermined composition is hot-rolled so as to form a steel strip, the steel strip is subjected to first cold-rolling, the steel strip is subjected to intermediate annealing, the steel strip is subjected to second cold-rolling, and the steel strip is subjected to finish annealing. A finish temperature in the hot-rolling is 900° C. or less, annealing is not performed between the hot-rolling and the first cold-rolling, and a rolling reduction in the second cold-rolling is not less than 40% nor more than 85%.

摘要翻译： 将具有预定组成的钢热轧成钢带，对钢带进行第一次冷轧，对钢带进行中间退火，对钢带进行第二次冷轧， 对钢带进行最终退火。 热轧时的终轧温度为900℃以下，在热轧和第一次冷轧之间不进行退火，第二次冷轧的轧制压下率也不低于40％ 超过85％。

公开(公告)号：US08934794B2

公开(公告)日：2015-01-13

申请号：US13433611

申请日：2012-03-29

申请人： Takeshi Kubota

发明人： Takeshi Kubota

IPC分类号： G03G15/00 ,  G03G15/08 ,  G03G21/20

CPC分类号： G03G15/0846 ,  G03G15/0848 ,  G03G15/0887 ,  G03G15/0889 ,  G03G21/206

摘要： A developer stirring unit is rotated and driven without driving an electrophotographic photosensitive drum according to output information of a temperature detection unit of an image forming apparatus during a non-image formation period, thereby cooling a developer near a developing roller.

摘要翻译： 根据图像形成装置的温度检测单元的输出信息，在非图像形成期间，显影剂搅拌单元被旋转驱动而不驱动电子照相感光鼓，从而冷却显影辊附近的显影剂。

公开(公告)号：US08742758B2

公开(公告)日：2014-06-03

申请号：US12952903

申请日：2010-11-23

申请人： Miho Nagasawa ,  Yoshihiro Oda ,  Antoine Choppin ,  Takeshi Kubota

发明人： Miho Nagasawa ,  Yoshihiro Oda ,  Antoine Choppin ,  Takeshi Kubota

IPC分类号： G01V3/00 ,  G01R33/44

CPC分类号： G01R33/3415 ,  G01R33/3664 ,  G01R33/4833

摘要： A magnetic resonance imaging apparatus includes a plurality of coil elements for receiving magnetic resonance signals of a subject in a plurality of selectable combinations. The magnetic resonance imaging apparatus also includes a sensitive region storage device for storing respective sensitive regions for the combinations of the coil elements, a setting device for setting scan regions, a calculation device for calculating a scan volume rate indicating each of proportions of overlap regions between the scan regions and the sensitive regions to the scan regions, and a sensitivity volume rate indicating each of proportions of the overlap regions to the sensitive regions, and a selection device for selecting each combination of the coil elements used to receive the magnetic resonance signals of the subject, out of the combinations of the coil elements, based on the scan volume rate and the sensitivity volume rate.

摘要翻译： 磁共振成像装置包括用于以多个可选组合接收被检体的磁共振信号的多个线圈元件。 磁共振成像装置还包括敏感区域存储装置，用于存储用于线圈元件的组合的各个敏感区域，用于设置扫描区域的设置装置，用于计算扫描体积率的计算装置，该计算装置指示每个扫描体积率之间的重叠区域的比例 扫描区域和扫描区域的敏感区域以及指示与敏感区域的重叠区域的比例的每一个的灵敏度体积率，以及用于选择用于接收磁共振信号的线圈元件的每个组合的选择装置 基于扫描体积率和灵敏度体积率，线圈元件的组合中的受试者。

公开(公告)号：US20130070188A1

公开(公告)日：2013-03-21

申请号：US13549834

申请日：2012-07-16

申请人： Yoshimitsu ISHIKAWA ,  Takeshi Kubota

发明人： Yoshimitsu ISHIKAWA ,  Takeshi Kubota

IPC分类号： G02F1/1335

CPC分类号： G02F1/133512 ,  H04N13/31

摘要： In a multiple view liquid crystal display, occurrence of a reverse view phenomenon and a reverse view crosstalk are suppressed. A black matrix is formed on the opposed surface of a counter substrate to a TFT substrate in a liquid crystal panel, and a parallax barrier is provided on the black matrix with a gap layer having a predetermined thickness interposed therebetween. The black matrix includes a first light blocking part disposed immediately below an opening in the parallax barrier, and a second light blocking part with a portion immediate thereabove covered by the parallax barrier. The second light blocking part includes a low refractive-index film (reverse view preventive film), having a lower refractive index than that of a liquid crystal, at the end thereof which is in contact with a pixel opening between the second light blocking part and the adjacent first light blocking part.

摘要翻译： 在多视图液晶显示器中，抑制了反向视图现象和反向视图串扰的发生。 在液晶面板的TFT基板的对置面上形成有黑色矩阵，并且在黑矩阵上设有间隔层，并具有规定厚度的间隙层。 该黑色矩阵包括位于视差屏障中的开口正下方的第一遮光部分和具有由该视差屏障覆盖的其上的部分的第二遮光部分。 第二遮光部包括在与第二遮光部和第二遮光部之间的像素开口接触的端部具有比液晶低的折射率的低折射率膜（防反射膜） 相邻的第一遮光部分。