公开(公告)号：US5365342A

公开(公告)日：1994-11-15

申请号：US29363

申请日：1993-03-10

申请人： Naoki Ayata ,  Mitsugu Yamamura ,  Bunei Hamasaki ,  Masao Kosugi ,  Kazuo Takahashi ,  Mitsuaki Seki

发明人： Naoki Ayata ,  Mitsugu Yamamura ,  Bunei Hamasaki ,  Masao Kosugi ,  Kazuo Takahashi ,  Mitsuaki Seki

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F9/7088 ,  G03F7/70058 ,  G03F7/70725 ,  G03F9/7023 ,  G03F9/7057 ,  H01L21/30

摘要： An alignment apparatus includes a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.

摘要翻译： 对准装置包括具有倍率的第一离轴对准光学系统和具有高于第一离轴对准光学系统的倍率的第二离轴对准光学系统，其中该装置可以全局对准 模式使用第二离轴对准光学系统。 在另一方面，一种对准装置，包括具有放大率的第一离轴对准光学系统，具有高于第一离轴对准光学系统的倍率的第二离轴对准光学系统，以及TTL对准光学 系统，其中所述对准装置可以使用所述第二离轴对准光学系统以全局对准模式操作，并且可以使用所述TTL光学对准系统在另一全局对准模式中操作。

公开(公告)号：US4617469A

公开(公告)日：1986-10-14

申请号：US552313

申请日：1983-11-16

申请人： Kazuo Takahashi ,  Hiroshi Sato ,  Masao Kosugi

发明人： Kazuo Takahashi ,  Hiroshi Sato ,  Masao Kosugi

IPC分类号： G03B27/32 ,  G03F7/20 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  G01N21/86

CPC分类号： G03F9/70 ,  H01L21/30

摘要： An exposure apparatus for aligning an original, having at least one alignment mark thereon, and radiation sensitive member, having at least one alignment mark thereon and adapted to receive the image of the original, with each other includes a first detecting device including a sensor retractable from the optical path of a light for illuminating the original, the sensor being adapted to sense the original and radiation sensitive member to detect a relative displacement (degree of misalignment) between the original and radiation sensitive member when the sensor is in the optical path; a second detecting device including a sensor set out of the optical path and adapted to detect the position of one of the original and radiation sensitive member in the absolute coordinates of the apparatus; and a driving mechanism for moving one of the original and radiation sensitive member in response to the output of the second detecting device to correct the above mentioned displacement.

摘要翻译： 用于对准在其上具有至少一个对准标记的原稿和其上具有至少一个对准标记并适于接收原稿的图像的辐射敏感元件的曝光设备包括：第一检测装置，包括可伸缩的传感器 从用于照射原稿的光的光路中，传感器适于感测原始和辐射敏感元件，以便在传感器处于光路时检测原始和辐射敏感元件之间的相对位移（未对准度）; 第二检测装置，其包括设置在所述光路中的传感器，并且适于检测所述原始和辐射敏感部件中的一个在所述装置的绝对坐标中的位置; 以及驱动机构，用于响应于第二检测装置的输出来移动原件和辐射敏感部件之一，以校正上述位移。

公开(公告)号：US4488806A

公开(公告)日：1984-12-18

申请号：US449825

申请日：1982-12-14

申请人： Kazuo Takahashi ,  Hiroshi Sato ,  Masao Kosugi

发明人： Kazuo Takahashi ,  Hiroshi Sato ,  Masao Kosugi

IPC分类号： H01L21/30 ,  B41J2/44 ,  G03F7/20 ,  H01L21/027 ,  H01L27/02 ,  G03B27/32 ,  G03B27/44

CPC分类号： G03F7/70425 ,  B41J2/44 ,  G03F7/70433 ,  H01L27/0207

摘要： In a divisional printing apparatus wherein the pattern of a mask is reduced and projected for printing onto a wafer and the mask and the wafer are moved relative to each other at each shot so that the exposed areas thereof do not overlap each other, and whereby the same pattern as that for collective printing is printed onto the effective area of the wafer by a plurality of shots, a shot arranging method in which, in the case of a so-called multichip shot in which a plurality of chips are exposed at a time at each shot, the special chip area of the wafer is not exposed, but the wafer is effectively exposed so that the creation of unusable chips is minimized.

摘要翻译： 在一种分割印刷装置中，其中掩模的图案被减小并投影以印刷到晶片上，并且掩模和晶片在每次拍摄时相对于彼此移动，使得其曝光区域彼此不重叠，并且由此 通过多次拍摄将与集体印刷相同的图案印刷在晶片的有效区域上，其中，在一次所谓的多芯片拍摄的情况下，其中多个芯片被曝光， 在每次拍摄时，晶片的特殊芯片面积都不会露出，但是晶片被有效地暴露，使得不可用的芯片的产生被最小化。

公开(公告)号：US5050111A

公开(公告)日：1991-09-17

申请号：US542653

申请日：1990-06-25

申请人： Naoki Ayata ,  Mitsugu Yamamura ,  Bunei Hamasaki ,  Masao Kosugi ,  Kazuo Takahashi ,  Mitsuaki Seki

发明人： Naoki Ayata ,  Mitsugu Yamamura ,  Bunei Hamasaki ,  Masao Kosugi ,  Kazuo Takahashi ,  Mitsuaki Seki

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7088 ,  G03F7/70058 ,  G03F7/70725 ,  G03F9/7023 ,  G03F9/7057

摘要： An alignment apparatus includes a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, an alignment apparatus includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.

公开(公告)号：US4910679A

公开(公告)日：1990-03-20

申请号：US337654

申请日：1989-04-13

申请人： Kazuo Takahashi ,  Masao Kosugi

发明人： Kazuo Takahashi ,  Masao Kosugi

IPC分类号： G03F9/00 ,  H01L21/30

CPC分类号： G03F9/70 ,  G03F9/00 ,  H01L21/30

摘要： An exposure apparatus usable in the manufacture of semiconductor devices, for transferring a pattern of a reticle onto each of discrete areas of a semiconductor wafer in a step-and-repeat manner. The apparatus has a laser interferometer for precisely measuring the amount of displacement of the wafer and a memory for storing positional errors of the shot areas, relative to respective target positions, established at the time of completion of the stepwise movements of the wafer. In accordance with the stored positional errors and with the result of measurement by the laser interferometer, the amount of stepwise movement of the wafer is corrected, whereby the accuracy of step-feed for the wafer is improved without decreasing the throughput. In another aspect, the exposure apparatus is provided with a TTL detection system for detecting the positional error of each of the shot areas relative to a target or reference shot area established at the time of completion of stepwise movement of the wafer. If a variation component of the positional error detected by way of the TTL detecting system is not less than a predetermined level, the positioning of the wafer is effected for each of the shot areas, by use of the TTL detecting system. If the variation component is less than the predetermined level, the positioning of the wafer or each shot area is effected on the basis of the measurement by the laser interferometer.

公开(公告)号：US4937618A

公开(公告)日：1990-06-26

申请号：US368881

申请日：1989-06-20

申请人： Naoki Ayata ,  Mitsugu Yamamura ,  Bunei Hamasaki ,  Masao Kosugi ,  Kazuo Takahashi ,  Mitsuaki Seki

发明人： Naoki Ayata ,  Mitsugu Yamamura ,  Bunei Hamasaki ,  Masao Kosugi ,  Kazuo Takahashi ,  Mitsuaki Seki

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7088 ,  G03F7/70058 ,  G03F7/70725 ,  G03F9/7023 ,  G03F9/7057

摘要： An alignment apparatus including a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, there is provided an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.

摘要翻译： 一种对准装置，包括具有倍率的第一离轴对准光学系统和具有高于第一离轴对准光学系统的倍率的第二离轴对准光学系统，其中该装置可以全局对准 模式使用第二离轴对准光学系统。 在另一方面，提供了一种对准装置，其包括具有倍率的第一离轴对准光学系统，具有比第一离轴对准光学系统的放大率高的倍率的第二离轴对准光学系统，以及 TTL对准光学系统，其中对准装置可以使用第二离轴对准光学系统以全局对准模式操作，并且可以使用TTL光学对准系统以另一全局对准模式操作。

公开(公告)号：US4843563A

公开(公告)日：1989-06-27

申请号：US237620

申请日：1988-08-24

申请人： Kazuo Takahashi ,  Masao Kosugi

发明人： Kazuo Takahashi ,  Masao Kosugi

IPC分类号： G03F9/00 ,  H01L21/30

CPC分类号： G03F9/70 ,  G03F9/00 ,  H01L21/30

摘要： An exposure apparatus usable in the manufacture of semiconductor devices, for transferring a pattern of a reticle onto each of discrete areas of a semiconductor wafer in a step-and-repeat manner. The apparatus has a laser interferometer for precisely measuring the amount of displacement of the wafer and a memory for storing positional errors of the shot areas, relative to respective target positions, established at the time of completion of the stepwise movements of the wafer. In accordance with the stored positional errors and with the result of measurement by the laser interferometer, the amount of stepwise movement of the wafer is corrected, whereby the accuracy of step-feed for the wafer is improved without decreasing the throughput. In another aspect, the exposure apparatus is provided with a TTL detection system for detecting the positional error of each of the shot areas relative to a target or reference shot area established at the time of completion of stepwise movement of the wafer. If a variation component of the positional error detected by way of the TTL detecting system is not less than a predetermined level, the positioning of the wafer is effected for each of the shot areas, by use of the TTL detecting system. If the variation component is less than the predetermined level, the positioning of the wafer or each shot area is effected on the basis of the measurement by the laser interferometer.

摘要翻译： 一种可用于制造半导体器件的曝光装置，用于以分步重复的方式将半导体晶片的图案转印到半导体晶片的离散区域中。 该装置具有用于精确测量晶片的位移量的激光干涉仪和用于存储在晶片的逐步移动完成时建立的相对于各个目标位置的拍摄区域的位置误差的存储器。 根据存储的位置误差和激光干涉仪的测量结果，校正晶片的逐步移动量，从而提高晶片的分步进给精度，而不降低生产量。 在另一方面，曝光装置设置有TTL检测系统，用于检测每个拍摄区域相对于在晶片的逐步移动完成时建立的目标或参考拍摄区域的位置误差。 如果通过TTL检测系统检测到的位置误差的变化分量不小于预定水平，则通过使用TTL检测系统对每个拍摄区域进行晶片的定位。 如果变化分量小于预定水平，则基于激光干涉仪的测量来实现晶片或每个照射区域的定位。

公开(公告)号：US4479711A

公开(公告)日：1984-10-30

申请号：US446366

申请日：1982-12-02

申请人： Masao Kosugi ,  Hiroshi Sato ,  Kazuo Takahashi ,  Ichiro Ishiyama ,  Shuichi Yabu

发明人： Masao Kosugi ,  Hiroshi Sato ,  Kazuo Takahashi ,  Ichiro Ishiyama ,  Shuichi Yabu

IPC分类号： G03F9/00 ,  G03B27/52

CPC分类号： G03F9/7076

摘要： In a mask aligner, the actual element pattern of a mask is transferred onto a resist applied to the surface of a wafer, while the alignment pattern of the mask is not transferred onto said resist. That is, the line width of the alignment pattern of the mask is a line width which is not transferred to the wafer. If the pattern of the mask is formed so that the line width of the alignment pattern is thin as compared with that of the actual element pattern, the exposure amount in the alignment pattern portion on the resist applied to the surface of the wafer becomes excessive due to the diffraction phenomenon and thus, the alignment pattern of the mask is not transferred onto the wafer.

摘要翻译： 在掩模对准器中，掩模的实际元件图案被转移到施加到晶片表面的抗蚀剂上，同时掩模的对准图案不被转印到所述抗蚀剂上。 也就是说，掩模的对准图案的线宽是不传送到晶片的线宽。 如果掩模的图案形成为使得对准图案的线宽与实际元件图案相比较薄，则施加到晶片表面的抗蚀剂上的对准图案部分中的曝光量变得过大 因此，掩模的对准图案不会转印到晶片上。

公开(公告)号：US20150171705A1

公开(公告)日：2015-06-18

申请号：US14412488

申请日：2012-08-03

申请人： Noriaki Hino ,  Naohiro Kusumi ,  Kazuo Takahashi ,  Tomomichi Ito

发明人： Noriaki Hino ,  Naohiro Kusumi ,  Kazuo Takahashi ,  Tomomichi Ito

IPC分类号： H02K7/18 ,  H02P3/02 ,  F02C3/04

CPC分类号： H02J13/0006 ,  F01D15/10 ,  F02C3/04 ,  F02C3/10 ,  F02C7/057 ,  F02C7/36 ,  F02C9/00 ,  F02C9/20 ,  F02C9/54 ,  F05D2220/7642 ,  F05D2270/053 ,  F05D2270/335 ,  H02J3/34 ,  H02K7/1823 ,  H02P3/02

摘要： The dual-shaft gas turbine power generation system includes: a high-pressure gas turbine; a first rotating shaft connecting a compressor and the high-pressure gas turbine; an electric motor connected to the first rotating shaft; a governor which adjusts the amount of air taken into the compressor; a low-pressure gas turbine; a second rotating shaft connected to the low-pressure gas turbine; a synchronous power generator connected to the second rotating shaft; a frequency converter which converts the frequency of power transmitted between the synchronous power generator and the electric motor; and a control device which controls a frequency converter control device for controlling the frequency converter, and the governor, on the basis of a power output command value indicating the power to be outputted to an external grid.

摘要翻译： 双轴燃气轮机发电系统包括：高压燃气轮机; 连接压缩机和高压燃气轮机的第一旋转轴; 连接到第一旋转轴的电动马达; 调节进入压缩机的空气量的调速器; 低压燃气轮机; 连接到低压燃气轮机的第二旋转轴; 连接到所述第二旋转轴的同步发电机; 变频器，其转换同步发电机与电动机之间传递的动力频率; 以及控制装置，其基于指示要输出到外部电网的电力的功率输出指令值，控制用于控制变频器的变频器控制装置和调速器。

公开(公告)号：US20150034039A1

公开(公告)日：2015-02-05

申请号：US14384999

申请日：2013-03-15

申请人： Kazuo Takahashi ,  Yoshihiko Soga ,  Tsuyoshi Misaizu

发明人： Kazuo Takahashi ,  Yoshihiko Soga ,  Tsuyoshi Misaizu

IPC分类号： F02D35/02 ,  F02B23/00

CPC分类号： F02D35/023 ,  F02B23/00 ,  F16J15/0881 ,  G01L9/008 ,  G01L19/0672 ,  G01L23/10 ,  G01L23/22

摘要： An internal combustion engine fitted with a combustion pressure detection device includes: an internal combustion engine having a combustion chamber, a pressure detection device having a housing, a diaphragm, and a detection member, and having a shoulder part. The diaphragm is provided on the front end side of the housing and the detection member arranged inside the housing and behind the diaphragm, allowing it to detect the pressure working via the diaphragm. Also provided is a second seal member in a ring shape that seals the opening in the combustion chamber and the housing in the shoulder part of the housing in the pressure detection device.

摘要翻译： 配备有燃烧压力检测装置的内燃机包括：具有燃烧室的内燃机，具有壳体的压力检测装置，隔膜和检测部件，具有肩部。 隔膜设置在壳体的前端侧，并且检测构件设置在壳体内部和隔膜后方，允许其检测通过隔膜工作的压力。 还提供了一种环形的第二密封构件，其密封燃烧室中的开口和壳体在压力检测装置中的肩部中的壳体。