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1.发明授权公开(公告)号：US06914664B2
公开(公告)日：2005-07-05
申请号：US10365603
申请日：2003-02-13
申请人： Keith Frank Best , Alexander Friz , Joseph J. Consolini , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui
发明人： Keith Frank Best , Alexander Friz , Joseph J. Consolini , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42
CPC分类号： G03F9/7069 , G03F9/7076 , G03F9/7084
摘要： To align between layers having a large Z separation, an alignment system which illuminates reference markers with normally incident radiation is used. The alignment system has an illumination system that is telecentric on the substrate side.
摘要翻译： 为了在具有大Z分离的层之间进行对准，使用以正常入射辐射照亮参考标记的对准系统。 对准系统具有在基板侧上是远心的照明系统。
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公开(公告)号：US08576374B2
公开(公告)日：2013-11-05
申请号：US12393805
申请日：2009-02-26
申请人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
发明人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
CPC分类号： G03F9/7084 , G03F7/70633 , G03F9/7076 , G03F9/708 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.
摘要翻译： 根据本发明的第一方面，提供了一种在设置在基板上的层上提供对准标记的光刻方法，所述方法包括在所述层的一定范围内定向的区域上提供对准标记 相对于其上设置有该层的基板的表面。
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公开(公告)号：US20090237635A1
公开(公告)日：2009-09-24
申请号：US12393805
申请日：2009-02-26
申请人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
发明人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
CPC分类号： G03F9/7084 , G03F7/70633 , G03F9/7076 , G03F9/708 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.
摘要翻译： 根据本发明的第一方面，提供了一种在设置在基板上的层上提供对准标记的光刻方法，所述方法包括在所述层的一定范围内定向的区域上提供对准标记 相对于其上设置有该层的基板的表面。
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4.发明授权Alignment tool, a lithographic apparatus, an alignment method, a device manufacturing method and device manufactured thereby 失效对准工具，光刻设备，对准方法，器件制造方法和由此制造的器件公开(公告)号：US07193231B2
公开(公告)日：2007-03-20
申请号：US10648785
申请日：2003-08-27
申请人： Joeri Lof , Fransiscus Godefridus Casper Bijnen , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui
发明人： Joeri Lof , Fransiscus Godefridus Casper Bijnen , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui
IPC分类号： G01B11/00
CPC分类号： G03F9/7084 , G03F9/7076
摘要： An optical element is placed in the alignment beam during alignment. The optical element serves to focus the alignment beam onto the substrate alignment mark when it is at a different focal length from the front surface of the substrate.
摘要翻译： 在对准期间将光学元件放置在对准光束中。 当光学元件处于与衬底的前表面不同的焦距时，该光学元件用于将对准光束聚焦到衬底对准标记上。
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5.发明授权Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods 失效校准方法，校准基板，光刻设备和器件制造方法公开(公告)号：US06936385B2
公开(公告)日：2005-08-30
申请号：US10374510
申请日：2003-02-27
申请人： Joeri Lof , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Fransiscus Godefridus Casper Bijnen
发明人： Joeri Lof , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Fransiscus Godefridus Casper Bijnen
CPC分类号： G03F9/7019 , G03F9/7011 , G03F9/7084
摘要： To calibrate a front-to-backside alignment system a transparent calibration substrate with reference markers on opposite sides is used. A plane plate is inserted to displace the focal position of the alignment system from the top to bottom surface of the calibration substrate.
摘要翻译： 为了校准前后对齐系统，使用带有相对侧的参考标记的透明校准基板。 插入平板以从校准基板的顶面到底面移动对准系统的焦点位置。
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6.发明授权Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method 失效光刻设备的校准方法，校准方法，计算机程序，数据存储介质，光刻设备和器件制造方法公开(公告)号：US07253884B2
公开(公告)日：2007-08-07
申请号：US10845521
申请日：2004-05-14
CPC分类号： G03F9/7019 , G03F9/7003 , G03F9/7011 , G03F9/7084
摘要： In one method of compensating for the distortion of front-to-backside alignment optics, a displacement vector between the estimated position of a substrate mark and the actual position of a substrate mark is calculated. An optical correction array is also calculated by moving a reference substrate by a fixed amount and comparing how far an image of a point on the back side of a reference substrate moves to how far a corresponding point on the front side of the substrate moves. The displacement vector and optical correction array may then be used to accurately calculate the position of further substrates.
摘要翻译： 在补偿前后对准光学元件的失真的一种方法中，计算衬底标记的估计位置与衬底标记的实际位置之间的位移矢量。 还通过将参考基板移动固定量并且比较参考基板的背面上的点的图像移动到基板的正面上的对应点移动多远的距离来计算光学校正阵列。 然后可以使用位移矢量和光学校正阵列来精确地计算另外的衬底的位置。
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公开(公告)号：US07064807B2
公开(公告)日：2006-06-20
申请号：US10840360
申请日：2004-05-07
申请人： Cheng-Qun Gui , Henricus Wilhelmus Maria Van Buel , Maurits Van Der Schaar , Arie Jeffrey Den Boef
发明人： Cheng-Qun Gui , Henricus Wilhelmus Maria Van Buel , Maurits Van Der Schaar , Arie Jeffrey Den Boef
CPC分类号： G03F7/70691 , G03F7/70216 , G03F9/7084
摘要： A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system.
摘要翻译： 光刻投影装置设置有内置在晶片台中的光学系统，用于产生设置在晶片背面的晶片标记的图像。 图像位于晶片正面的平面上，并且可以通过对准系统从晶片的正面观察。 可以使用预先存在的对准系统来执行晶片背面和前面的标记与掩模之间的同时对准。
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公开(公告)号：US07567340B2
公开(公告)日：2009-07-28
申请号：US11529732
申请日：2006-09-29
CPC分类号： G03F7/70333 , G03F7/703
摘要： A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.
摘要翻译： 公开了一种器件制造方法，其包括在衬底台上提供衬底，所述衬底具有包括多个大体上平坦的表面的目标区域，每个表面相对于衬底台具有不同的高度，确定每个大致平面的相对高度 将图案化的辐射束投影到基板的目标区域上，使得光束的焦平面基本上与大体上平坦的表面之一的平面重合，使基板台沿基本上平行于基板平面的方向移动 并且将所述图案化的辐射束投影到所述基板的目标区域上，使得所述光束的焦平面基本上与所述大体上平坦的表面中的另一个的平面重合。
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公开(公告)号：US20080085462A1
公开(公告)日：2008-04-10
申请号：US11529732
申请日：2006-09-29
IPC分类号： G03C5/00
CPC分类号： G03F7/70333 , G03F7/703
摘要： A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.
摘要翻译： 公开了一种器件制造方法，其包括在衬底台上提供衬底，所述衬底具有包括多个大体上平坦的表面的目标区域，每个表面相对于衬底台具有不同的高度，确定每个大致平面的相对高度 将图案化的辐射束投影到基板的目标区域上，使得光束的焦平面基本上与大体上平坦的表面之一的平面重合，使基板台沿基本上平行于基板平面的方向移动 并且将所述图案化的辐射束投影到所述基板的目标区域上，使得所述光束的焦平面基本上与所述大体上平坦的表面中的另一个的平面重合。
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公开(公告)号：US20080083818A1
公开(公告)日：2008-04-10
申请号：US11544000
申请日：2006-10-06
IPC分类号： B23K31/00
CPC分类号： B23K31/02 , B23K2101/40
摘要： A method of measuring bonding quality of a bonded substrate having an upper substrate on top of a lower substrate, the method comprising etching one or more windows in the upper substrate such that overlay measurement alignment marks on the upper substrate may be seen by a measurement system and overlay measurement alignment marks on the lower substrate may be seen by the measurement system, using the measurement system to measure the positions of the overlay measurement alignment marks, determining the distance between corresponding overlay measurement alignment marks on the upper and lower substrates, and adjusting the determined distance to take into account an offset between the overlay measurement alignment marks on the upper substrate and the overlay measurement alignment marks on the lower substrate.
摘要翻译： 一种在下基板的顶部测量具有上基板的键合衬底的接合质量的方法，所述方法包括蚀刻上衬底中的一个或多个窗口，使得可通过测量系统看到上衬底上的覆盖测量对准标记 并且通过测量系统可以看到下部基板上的覆盖测量对准标记，使用测量系统来测量覆盖测量对准标记的位置，确定上和下基板上相应的覆盖测量对准标记之间的距离，以及调整 考虑到上基板上的覆盖测量对准标记与下基板上的覆盖测量对准标记之间的偏移的确定的距离。
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