利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

17 条记录 (耗时 0.026 秒)

    Plasma processing method and apparatus
    2.
    发明授权
    Plasma processing method and apparatus 失效
    等离子体处理方法和装置

    公开(公告)号：US5651867A

    公开(公告)日：1997-07-29

    申请号：US591935

    申请日：1990-10-02

    申请人： Yuichi Kokaku ,  Hiroyuki Kataoka ,  Makoto Kitoh ,  Shigehiko Fujimaki ,  Satoshi Matsunuma ,  Kenji Furusawa ,  Nobuo Nakagawa ,  Katsuo Abe ,  Masaaki Hayashi

    发明人： Yuichi Kokaku ,  Hiroyuki Kataoka ,  Makoto Kitoh ,  Shigehiko Fujimaki ,  Satoshi Matsunuma ,  Kenji Furusawa ,  Nobuo Nakagawa ,  Katsuo Abe ,  Masaaki Hayashi

    IPC分类号： C23C14/34 ,  C23C14/56 ,  C23C16/509 ,  G11B5/84 ,  G11B5/851 ,  H01J37/32

    CPC分类号： H01J37/32623 ,  C23C14/566 ,  C23C16/5096 ,  G11B5/84 ,  G11B5/851 ,  H01J37/32743

    摘要： A plasma processing apparatus comprising: a vacuum container; an evacuation means for keeping the interior of the vacuum container at a pressure not higher than atmospheric pressure; a substrate support device for supporting a substrate to be subjected to plasma processing; an electrode for generating plasma in cooperation with the substrate support; a voltage supply for applying a voltage to the electrode; a gas introducing system for introducing a gaseous material into a space where the plasma is produced; a surrounding member for enclosing the space above the substrate support, and a drive for relatively moving the surrounding member to space an end of the surrounding member proximate from the substrate from at least one of the substrate support and the substrate supported thereon by a distance which is short enough to suppress plasma leakage during the plasma processing and to position the end of the surrounding member away from said at least one of the substrate support and the substrate thereon for charging and discharging of the substrate.

    摘要翻译： 一种等离子体处理装置，包括：真空容器; 用于将真空容器的内部保持在不高于大气压的压力的排气装置; 用于支撑待进行等离子体处理的基板的基板支撑装置; 用于与衬底支撑件协作产生等离子体的电极; 用于向电极施加电压的电压源; 用于将气态物质引入制造等离子体的空间中的气体导入系统; 用于封闭衬底支撑件上方的空间的周围构件以及用于相对移动周围构件的驱动器，用于将基板支撑件和支撑在其上的衬底中的至少一个上的衬底附近的邻近基板的一端远离一定距离， 足够短以抑制等离子体处理期间的等离子体泄漏并且使周围部件的端部远离所述至少一个基板支撑件和其上的基板，以对基板进行充电和放电。

    Multi-layered magnetic recording medium and magnetic recording system employing the same
    4.
    发明授权
    Multi-layered magnetic recording medium and magnetic recording system employing the same 失效
    多层磁记录介质和采用该磁记录介质的磁记录系统

    公开(公告)号：US5723198A

    公开(公告)日：1998-03-03

    申请号：US258923

    申请日：1994-06-13

    申请人： Yuzuru Hosoe ,  Yoshihiro Shiroishi ,  Akira Ishikawa ,  Futoshi Tomiyama ,  Kazuetsu Yoshida ,  Tomoo Yamamoto ,  Yotsuo Yahisa ,  Akira Osaki ,  Katsuo Abe ,  Shinji Narishige ,  Naoki Kodama ,  Kiwamu Tanahashi ,  Emi Mangyo

    发明人： Yuzuru Hosoe ,  Yoshihiro Shiroishi ,  Akira Ishikawa ,  Futoshi Tomiyama ,  Kazuetsu Yoshida ,  Tomoo Yamamoto ,  Yotsuo Yahisa ,  Akira Osaki ,  Katsuo Abe ,  Shinji Narishige ,  Naoki Kodama ,  Kiwamu Tanahashi ,  Emi Mangyo

    IPC分类号： G11B5/66

    CPC分类号： G11B5/66 ,  Y10S428/90 ,  Y10T428/24355 ,  Y10T428/24942 ,  Y10T428/265

    摘要： In a magnetic recording system including magnetic recording media, a rotation driving unit for driving these magnetic recording media, read/write magnetic heads, driving apparatus for driving these read/write magnetic heads, and a read/write signal processing apparatus, a reading portion of the respective magnetic heads is arranged by a magnetoresistive head. The magnetic recording media are constructed of multi-layered magnetic media having a plurality of magnetic layers fabricated directly, or via underlayers on a non-magnetic disk substrate, and of non-magnetic intermediate layers arranged among these non-magnetic layers. Furthermore, one coercivity which is measured by applying a magnetic field along a circumferential direction of the magnetic recording media, is selected to be larger than the other coercivity which is measured by applying a magnetic field along a radial direction of the magnetic recording media, so that a higher signal-to-noise ratio is achieved, as compared with that of the conventional magnetic recording system. Since the thickness of the non-magnetic intermediate layers is smaller than or equal to 5 nm, and also the total layer is smaller than or equal to 5 nm, and also the total layer number of the plural magnetic layers is selected to be odd, better characteristics can be achieved. Accordingly, since the MTBF (Mean Time Before Failure) is longer than or equal to 0.15 million hours with high recording density, and the disk substrate and the magnetic head sliders can be mounted at high packaging density, a compact and high-capacity magnetic recording system can be obtained.

    摘要翻译： 在包括磁记录介质的磁记录系统中，用于驱动这些磁记录介质的旋转驱动单元，读/写磁头，用于驱动这些读/写磁头的驱动装置以及读/写信号处理装置，读/ 相应的磁头由磁阻头安排。 磁记录介质由具有直接制造的多个磁性层或通过非磁盘基板上的底层以及布置在这些非磁性层之间的非磁性中间层的多层磁性介质构成。 此外，通过沿着磁记录介质的圆周方向施加磁场来测量的一个矫顽力被选择为大于通过沿着磁记录介质的径向方向施加磁场而测量的其他矫顽力，因此， 与常规磁记录系统相比，实现了更高的信噪比。 由于非磁性中间层的厚度小于或等于5nm，并且总层小于或等于5nm，并且多个磁性层的总层数也被选择为奇数， 可以实现更好的特性。 因此，由于MTBF（平均故障间隔时间）长于或等于0.15万小时，具有高记录密度，并且盘基板和磁头滑块可以以高封装密度安装，紧凑且高容量的磁记录 系统可以得到。

    Apparatus for performing continuous treatment in vacuum
    8.
    发明授权
    Apparatus for performing continuous treatment in vacuum 失效
    用于在真空中进行连续处理的装置

    公开(公告)号：US4405435A

    公开(公告)日：1983-09-20

    申请号：US296314

    申请日：1981-08-26

    申请人： Hideki Tateishi ,  Tsuneaki Kamei ,  Katsuo Abe ,  Shigeru Kobayashi ,  Susumu Aiuchi ,  Masashi Nakatsukasa ,  Nobuyuki Takahashi ,  Ryuji Sugimoto

    发明人： Hideki Tateishi ,  Tsuneaki Kamei ,  Katsuo Abe ,  Shigeru Kobayashi ,  Susumu Aiuchi ,  Masashi Nakatsukasa ,  Nobuyuki Takahashi ,  Ryuji Sugimoto

    IPC分类号： B01J3/00 ,  C23C14/56 ,  C23C15/00

    CPC分类号： B01J3/006 ,  C23C14/566 ,  Y10S414/137 ,  Y10S414/139

    摘要： An apparatus for performing continuous treatment in vacuum including an inlet chamber, a first intermediate chamber, at least one vacuum treating chamber, a second intermediate chamber and a withdrawing chamber arranged in the indicated order in a direction in which base plates are successively transferred. An opening device normally closed and opened when a base plate is transferred therethrough is mounted on a wall at the inlet of the inlet chamber, between the adjacent chambers and on a wall at the outlet side of the withdrawing chamber. A conveyor device for conveying each base plate in a horizontal direction through the opening device is mounted in each of the chambers, and an evacuating device is also mounted in each chamber. A base plate storing device for storing a plurality of base plates in a magazine is mounted in the first and second intermediate chambers. At least one vacuum treating device is mounted in the vacuum treating chamber.

    摘要翻译： 一种用于在真空中进行连续处理的装置，包括入口室，第一中间室，至少一个真空处理室，第二中间室和排出室，其按照依次传送基板的方向以指示的顺序排列。 安装在入口室入口的壁上，在相邻的室之间和在抽出室的出口侧的壁上的壁上安装有一个通常关闭和打开底板的打开装置。 用于通过打开装置沿水平方向输送每个基板的输送装置安装在每个室中，并且排气装置也安装在每个室中。 在第一和第二中间室中安装有用于将多个基板存储在盒中的基板存储装置。 至少一个真空处理装置安装在真空处理室中。

    Low temperature-sinterable dielectric composition and thick film capacitor using the same
    9.
    发明授权
    Low temperature-sinterable dielectric composition and thick film capacitor using the same 失效
    低温烧结电介质组合物和使用其的厚膜电容器

    公开(公告)号：US4308571A

    公开(公告)日：1981-12-29

    申请号：US134281

    申请日：1980-03-26

    申请人： Hirayoshi Tanei ,  Akira Ikegami ,  Noriyuki Taguchi ,  Katsuo Abe ,  Hiroshi Ohtsu ,  Tokio Isogai

    发明人： Hirayoshi Tanei ,  Akira Ikegami ,  Noriyuki Taguchi ,  Katsuo Abe ,  Hiroshi Ohtsu ,  Tokio Isogai

    IPC分类号： C04B35/46 ,  C04B35/472 ,  C04B35/499 ,  H01B3/12 ,  H01G4/12

    CPC分类号： H01G4/1263 ,  C04B35/472 ,  C04B35/499

    摘要： A low temperature-sinterable dielectric composition is provided, whose sintered composition when prepared by firing a uniform mixture consisting of lead ferrotungstate, lead titanate and manganese dioxide at a temperature of not higher than 1,000.degree. C. has the general formula A.Pb(Fe.sub.2/3 W.sub.1/3).sub.1-x Ti.sub.x O.sub.3 +B.MnO.sub.2, wherein 0.005.ltoreq..times..ltoreq.0.65, A=0.95-0.9995, and B=0.0005-0.05, a relative dielectric constant of at least 2,000 at 25.degree. C., a dissipation factor (tan .delta.) of not more than 5% at 25.degree. C., and a specific resistance of at least 10.sup.9 .OMEGA..cm at 25.degree. C. Also provided is a thick film capacitor having a dielectric layer prepared from said composition.

    摘要翻译： 提供了一种低温可烧结电介质组合物，其烧结组合物通过在不高于1000℃的温度下焙烧由钨酸铅，钛酸铅和二氧化锰组成的均匀混合物制备，具有通式A.Pb（Fe2 其中0.005≤x≤0.65，A = 0.95-0.9995和B = 0.0005-0.05，在25℃下的相对介电常数至少为2000。 ，在25℃下的损耗因子（tanδ）不超过5％，在25℃下的电阻率为至少为10Ω.EGEGA·cm。还提供了一种厚膜电容器，其具有由所述 组成。