Generating capacitance look-up tables for wiring patterns in the presence of metal fills
    3.
    发明授权
    Generating capacitance look-up tables for wiring patterns in the presence of metal fills 失效
    在存在金属填充物的情况下为布线图生成电容查找表

    公开(公告)号:US08495540B2

    公开(公告)日:2013-07-23

    申请号:US13449009

    申请日:2012-04-17

    IPC分类号: G06F17/50 G06F9/455

    摘要: A computer system selects a signal conductor from an electronic circuit design layout and assigns a first potential to the selected signal conductor. Next, the computer system assigns a second potential to other signal conductors included in the electronic circuit design layout. The computer system then selects a metal fill from the electronic circuit design layout, which is void from carrying an electrical signal, and generates a zero charge equation for the selected metal fill. The zero charge equation establishes that a total charge residing on the selected metal fill is equal to zero. The computer system includes the zero charge equation in a system of equations, which includes grid point potential equations, and solves the system of equations. In turn, the computer system computes capacitance values for the signal conductors based upon the system of equation solutions, and simulates the electronic circuit design layout using the computed capacitance values.

    摘要翻译: 计算机系统从电子电路设计布局中选择信号导体,并将第一电位分配给所选择的信号导体。 接下来,计算机系统向包括在电子电路设计布局中的其它信号导体分配第二电位。 然后,计算机系统从电子电路设计布局中选择一个金属填充物,该电子设备布局无法携带电信号,并为所选择的金属填充产生零电荷方程。 零电荷方程式确定驻留在所选金属填充上的总电荷等于零。 计算机系统包括方程组中的零电荷方程,其包括网格点电位方程,并求解方程组。 反过来,计算机系统基于方程解的系统来计算信号导体的电容值,并使用计算的电容值来模拟电子电路设计布局。

    Detecting dose and focus variations during photolithography
    4.
    发明授权
    Detecting dose and focus variations during photolithography 失效
    在光刻期间检测剂量和聚焦变化

    公开(公告)号:US08407632B2

    公开(公告)日:2013-03-26

    申请号:US12881548

    申请日:2010-09-14

    IPC分类号: G06F17/50

    CPC分类号: G03F7/705 G03F7/70658

    摘要: A method, system, and computer usable program product for detecting dose and focus variations during photolithography are provided in the illustrative embodiments. A test shape is formed on a wafer, the wafer being used to manufacture integrated circuits, the test shape being formed using a dose value and a focus value that are predetermined for the manufacturing. A capacitance of the test shape is measured. The capacitance is resolved to a second dosing value and a second focus value using an extraction model. A difference between the dosing value and the second dosing value is computed. A recommendation is made for dosing adjustment in the manufacturing based on the difference.

    摘要翻译: 在说明性实施例中提供了用于在光刻期间检测剂量和聚焦变化的方法,系统和计算机可用程序产品。 在晶片上形成测试形状,该晶片用于制造集成电路,该测试形状使用为制造预定的剂量值和聚焦值形成。 测量测试形状的电容。 使用提取模型将电容解析为第二计量值和第二焦点值。 计算给药值和第二给药值之间的差异。 基于差异,建议制造中的剂量调整。

    INCREASED CAPACITY HETEROGENEOUS STORAGE ELEMENTS
    5.
    发明申请
    INCREASED CAPACITY HETEROGENEOUS STORAGE ELEMENTS 有权
    增加容量异质存储元素

    公开(公告)号:US20120290778A1

    公开(公告)日:2012-11-15

    申请号:US13557294

    申请日:2012-07-25

    IPC分类号: G06F12/00 G06F12/02

    摘要: Providing increased capacity in heterogeneous storage elements including a method for storing data in a heterogeneous memory that includes receiving a write message and a write address corresponding to a block of memory cells where at least two of the memory cells support different data levels, determining physical characteristics of the memory cells, and identifying virtual memories associated with the block of memory cells in response to the physical characteristics. The following is performed for each of the virtual memories: generating a constraint vector that describes the virtual cells in the virtual memory; and calculating a virtual write vector in response to the constraint vector and the write data, the calculating including writing the write data, bit by bit, in order, into the virtual memory, skipping locations known to be stuck to a particular value as indicated by the constraint vector. The virtual write vectors are combined into a write word and the write word is output to the block of memory cells.

    摘要翻译: 提供异构存储元件中的增加的容量,包括用于在异构存储器中存储数据的方法,该方法包括接收对应于其中至少两个存储器单元支持不同数据电平的存储器单元块的写入消息和写入地址,确定物理特性 并且响应于物理特性识别与存储器单元块相关联的虚拟存储器。 对每个虚拟存储器执行以下操作:生成描述虚拟存储器中的虚拟单元的约束向量; 以及响应于所述约束向量和所述写入数据计算虚拟写入向量,所述计算包括按顺序将所述写入数据逐位写入到所述虚拟存储器中,跳过已知被粘附到特定值的位置,如 约束向量。 虚拟写入向量被组合成写入字,并将写入字输出到存储器单元块。

    Generating capacitance look-up tables for wiring patterns in the presence of metal fills
    6.
    发明授权
    Generating capacitance look-up tables for wiring patterns in the presence of metal fills 有权
    在存在金属填充物的情况下为布线图生成电容查找表

    公开(公告)号:US08245169B2

    公开(公告)日:2012-08-14

    申请号:US12648456

    申请日:2009-12-29

    IPC分类号: G06F17/50 G06F9/455

    摘要: A computer system selects a signal conductor from an electronic circuit design layout and assigns a first potential to the selected signal conductor. Next, the computer system assigns a second potential to other signal conductors included in the electronic circuit design layout. The computer system then selects a metal fill from the electronic circuit design layout, which is void from carrying an electrical signal, and generates a zero charge equation for the selected metal fill. The zero charge equation establishes that a total charge residing on the selected metal fill is equal to zero. The computer system includes the zero charge equation in a system of equations, which includes grid point potential equations, and solves the system of equations. In turn, the computer system computes capacitance values for the signal conductors based upon the system of equation solutions, and simulates the electronic circuit design layout using the computed capacitance values.

    摘要翻译: 计算机系统从电子电路设计布局中选择信号导体,并将第一电位分配给所选择的信号导体。 接下来,计算机系统向包括在电子电路设计布局中的其它信号导体分配第二电位。 然后,计算机系统从电子电路设计布局中选择一个金属填充物,该电子设备布局无法携带电信号,并为所选择的金属填充产生零电荷方程。 零电荷方程式确定驻留在所选金属填充上的总电荷等于零。 计算机系统包括方程组中的零电荷方程,其包括网格点电位方程,并求解方程组。 反过来,计算机系统基于方程解的系统来计算信号导体的电容值,并使用计算的电容值来模拟电子电路设计布局。

    Methods and apparatus for analyzing transmission lines with decoupling of connectors and other circuit elements
    8.
    发明授权
    Methods and apparatus for analyzing transmission lines with decoupling of connectors and other circuit elements 有权
    用于分析连接器和其他电路元件去耦的传输线的方法和装置

    公开(公告)号:US07921004B2

    公开(公告)日:2011-04-05

    申请号:US12061269

    申请日:2008-04-02

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5036

    摘要: Methods and apparatus are provided for analyzing transmission lines with decoupling of connectors and other circuit elements. According to one aspect of the invention, circuits with one or more parasitic elements are analyzed by partitioning at least one of the parasitic elements in a transverse manner; identifying a plurality of subcircuits each comprised of partitioned circuit elements from the plurality of transmission lines and one or more parasitic elements in a given path; wherein each of the subcircuits is associated with a path in the circuit; performing a waveform relaxation analysis between each of the subcircuits; and repeating the step of performing the waveform relaxation analysis using waveforms determined in a previous iteration until convergence to a resultant waveform has occurred. The circuit can optionally further comprise one or more transmission lines which would also be partitioned in a transverse manner.

    摘要翻译: 提供了用于分析连接器和其他电路元件去耦的传输线的方法和装置。 根据本发明的一个方面,通过以横向方式分隔至少一个寄生元件来分析具有一个或多个寄生元件的电路; 识别多个子电路,每个子电路由来自所述多个传输线的分隔电路元件和给定路径中的一个或多个寄生元件组成; 其中每个子电路与电路中的路径相关联; 在每个子电路之间进行波形弛豫分析; 并且重复使用在前一次迭代中确定的波形执行波形弛豫分析的步骤,直到发生对所得波形的收敛。 电路可以可选地进一步包括一个或多个也将以横向分隔的传输线。

    Method for Calculating Capacitance Gradients in VLSI Layouts Using A Shape Processing Engine
    9.
    发明申请
    Method for Calculating Capacitance Gradients in VLSI Layouts Using A Shape Processing Engine 有权
    使用形状处理引擎计算VLSI布局中的电容梯度的方法

    公开(公告)号:US20110078642A1

    公开(公告)日:2011-03-31

    申请号:US12570418

    申请日:2009-09-30

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5036

    摘要: Computing the gradients of capacitances in an integrated circuit chip layout with respect to design and process parameters is described. Included is a shape processing engine in the form of a variational mapping engine and a capacitance calculation engine that includes a gradient calculation engine. The variational mapping engine translates physical parameter variations into variations on the edges of the elementary patterns to which the layout of the integrated circuit is decomposed. The gradient calculation engine computes capacitance gradients by combining information from two sources. The first source consists of pre-existing gradients in a capacitance lookup table. The second source consists of analytical expressions of capacitance correction factors.

    摘要翻译: 描述了关于设计和工艺参数的集成电路芯片布局中的电容梯度的计算。 包括变形映射引擎形式的形状处理引擎和包括梯度计算引擎的电容计算引擎。 变分映射引擎将物理参数变化转换为集成电路的布局分解到的基本图案的边缘上的变化。 梯度计算引擎通过组合来自两个来源的信息来计算电容梯度。 第一个源包括电容查找表中预先存在的梯度。 第二个来源包括电容校正因子的解析表达式。