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    MEASURING ETCHING RATES USING LOW COHERENCE INTERFEROMETRY
    3.
    发明申请
    MEASURING ETCHING RATES USING LOW COHERENCE INTERFEROMETRY 审中-公开
    使用低相干干涉测量测量速率

    公开(公告)号：US20090065478A1

    公开(公告)日：2009-03-12

    申请号：US11853398

    申请日：2007-09-11

    申请人： Kevin P. Dockery ,  Michael A. Marcus ,  Kurt D. Sieber

    发明人： Kevin P. Dockery ,  Michael A. Marcus ,  Kurt D. Sieber

    IPC分类号： C03C15/00

    CPC分类号： G01B11/0675 ,  H01L22/12 ,  H01L22/26

    摘要： Measuring thickness and the rate of change of thickness of a material having a surface while the material is being etched, comprising: illuminating the material with low coherence light, a portion of the which transmits through the material and a portion of which is reflected; etching the material surface and while etching, collecting a portion of the reflected light from each optical interface of the material with a low coherence light interferometer; calculating the thickness and rate of change of thickness of the material or part of the material according to the obtained interferometric data; and storing or displaying the resultant thickness and rate of change of thickness of the material. The present invention provides a unique way of calculating the thermo optic coefficient of a material. This method can be used simultaneously with etching the material so that changes to the etching rate can be made in real time.

    摘要翻译： 在材料被蚀刻时测量具有表面的材料的厚度和厚度的变化率，包括：以低相干光照射材料，其一部分透过材料并且其一部分被反射; 蚀刻材料表面并且在蚀刻时，用低相干光干涉仪从材料的每个光学界面收集一部分反射光; 根据获得的干涉测量数据计算材料或材料部分厚度的厚度和变化率; 并存储或显示所得材料的厚度和厚度变化率。 本发明提供了一种计算材料的热光学系数的独特方法。 该方法可以与蚀刻材料同时使用，使得可以实时地进行蚀刻速率的改变。

    PATTERNING FOR SELECTIVE AREA DEPOSITION
    5.
    发明申请
    PATTERNING FOR SELECTIVE AREA DEPOSITION 有权
    选择区域沉积的方法

    公开(公告)号：US20140377963A1

    公开(公告)日：2014-12-25

    申请号：US13923401

    申请日：2013-06-21

    申请人： Carolyn R. Ellinger ,  Shelby F. Nelson ,  Kurt D. Sieber

    发明人： Carolyn R. Ellinger ,  Shelby F. Nelson ,  Kurt D. Sieber

    IPC分类号： H01L21/02

    CPC分类号： H01L21/02642 ,  C23C16/042 ,  C23C16/403 ,  C23C16/407 ,  C23C16/45551 ,  H01L21/0228 ,  H01L21/02422 ,  H01L21/02554 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/31138 ,  H01L21/32

    摘要： A method of producing a patterned inorganic thin film element includes providing a substrate. A thin layer of polymeric inhibitor is uniformly depositing on the substrate. A patterned mask having open areas is provided on the thin layer of polymeric inhibitor. The thin layer of polymeric inhibitor is patterned by removing inhibitor from areas exposed by the open areas of the patterned mask using a highly reactive oxygen process. An inorganic thin film layer is deposited on the substrate in the areas exposed by the removal of the thin layer of polymeric inhibitor using an atomic layer deposition process.

    摘要翻译： 制造图案化无机薄膜元件的方法包括提供基板。 聚合物抑制剂的薄层均匀地沉积在基底上。 具有开放区域的图案化掩模设置在聚合物抑制剂的薄层上。 使用高活性氧气工艺，通过从图案化掩模的开放区域暴露的区域除去抑制剂来图案化该薄层的聚合物抑制剂。 通过使用原子层沉积工艺去除聚合物抑制剂的薄层而暴露在的区域中，在衬底上沉积无机薄膜层。

    High-efficiency plasma treatment of polyolefins
    6.
    发明授权
    High-efficiency plasma treatment of polyolefins 失效
    高效等离子体处理聚烯烃

    公开(公告)号：US06399159B1

    公开(公告)日：2002-06-04

    申请号：US09575490

    申请日：2000-05-19

    申请人： Jeremy M. Grace ,  Louis J. Gerenser ,  Kurt D. Sieber ,  Michael J. Heinsler ,  Hengzhong K. Zhuang ,  Dennis R. Freeman ,  Mark M. Romach

    发明人： Jeremy M. Grace ,  Louis J. Gerenser ,  Kurt D. Sieber ,  Michael J. Heinsler ,  Hengzhong K. Zhuang ,  Dennis R. Freeman ,  Mark M. Romach

    IPC分类号： H05H100

    CPC分类号： G03C1/915 ,  B29C59/14 ,  B29K2067/00 ,  B29L2031/7644 ,  B41M5/508

    摘要： A method and apparatus are taught for treating polyolefin containing or polyolefin-coated webs or laminates for obtaining the proper surface characteristics to promote adhesion of photosensitive coating materials and/or layers typically coated thereon. The web is passed through a high-voltage sheath region or dark space of the plasma generated by a powered electrode residing in a discharge zone. The frequency of the driving voltage must be above a lower bound dictated by the properties of the paper support and the plasma, and it must be below an upper bound beyond which the sheath voltages drop significantly and it is observed that the benefits of this approach diminish. The dark space is generated by a treatment electrode in a treatment zone. There is a counter electrode having a surface area in said treatment zone which is at least as great as the surface area of the treatment electrode. A power supply is included for driving the treatment electrode with an oscillating high voltage at a frequency less than about 2 MHz and greater than 1/tc where tc is the charging time of a web surface exposed to a rms ion current in the plasma.

    摘要翻译： 教导了一种用于处理含聚烯烃或聚烯烃涂布的卷筒纸或层压板以获得适当的表面特性以促进通常涂覆在其上的感光涂层材料和/或层的粘合的方法和装置。 纸幅通过位于放电区域的动力电极产生的等离子体的高压鞘区域或暗空间。 驱动电压的频率必须高于由纸支架和等离子体的性质决定的下限，并且必须低于上限，超过该上限，护套电压显着下降，并且观察到该方法的好处减少了 。 黑暗空间由处理区域中的处理电极产生。 在所述处理区域中具有至少与处理电极的表面积一样大的对电极。 包括用于以小于约2MHz和大于1 / tc的频率的振荡高电压驱动处理电极的电源，其中tc是暴露于等离子体中的有效电离离子电流的幅材表面的充电时间。

    Patterning for selective area deposition
    8.
    发明授权
    Patterning for selective area deposition 有权
    图案选择性区域沉积

    公开(公告)号：US08921236B1

    公开(公告)日：2014-12-30

    申请号：US13923401

    申请日：2013-06-21

    申请人： Carolyn R. Ellinger ,  Shelby F. Nelson ,  Kurt D. Sieber

    发明人： Carolyn R. Ellinger ,  Shelby F. Nelson ,  Kurt D. Sieber

    IPC分类号： H01L21/04 ,  H01L21/02

    CPC分类号： H01L21/02642 ,  C23C16/042 ,  C23C16/403 ,  C23C16/407 ,  C23C16/45551 ,  H01L21/0228 ,  H01L21/02422 ,  H01L21/02554 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/31138 ,  H01L21/32

    摘要： A method of producing a patterned inorganic thin film element includes providing a substrate. A thin layer of polymeric inhibitor is uniformly depositing on the substrate. A patterned mask having open areas is provided on the thin layer of polymeric inhibitor. The thin layer of polymeric inhibitor is patterned by removing inhibitor from areas exposed by the open areas of the patterned mask using a highly reactive oxygen process. An inorganic thin film layer is deposited on the substrate in the areas exposed by the removal of the thin layer of polymeric inhibitor using an atomic layer deposition process.

    摘要翻译： 制造图案化无机薄膜元件的方法包括提供基板。 聚合物抑制剂的薄层均匀地沉积在基底上。 具有开放区域的图案化掩模设置在聚合物抑制剂的薄层上。 使用高活性氧气工艺，通过从图案化掩模的开放区域暴露的区域除去抑制剂来图案化该薄层的聚合物抑制剂。 通过使用原子层沉积工艺去除聚合物抑制剂的薄层而暴露在的区域中，在衬底上沉积无机薄膜层。

    Microfluidic device with multilayer coating
    9.
    发明授权
    Microfluidic device with multilayer coating 有权
    具有多层涂层的微流体装置

    公开(公告)号：US08840981B2

    公开(公告)日：2014-09-23

    申请号：US13228919

    申请日：2011-09-09

    申请人： Kurt D. Sieber

    发明人： Kurt D. Sieber

    IPC分类号： B32B3/10 ,  B32B3/30

    CPC分类号： B41J2/14129 ,  Y10T428/24322 ,  Y10T428/24612

    摘要： A microfluidic device comprised of a material layer and a fluid transport feature having at least one characteristic dimension of less than 500 micrometers formed in or on the material layer. A chemically resistant, thermally stable and biocompatible multilayer coating is provided onto and in contact with the microfluidic device, wherein the multilayer coating includes one or more thin film layers comprised primarily of hafnium oxide or zirconium oxide and one or more thin film layers comprised primarily of tantalum oxide, the multilayer coating being located on a surface of the fluid transport feature. The corrosion resistant film can be formed on the surfaces of fluid transport features of microfluidic devices using atomic layer deposition film forming methods that produce conformal films that cover complex geometries, thereby enabling the corrosion resistant film to be formed on all surfaces of the fluid transport features of the microfluidic device.

    摘要翻译： 微流体装置由材料层和流体输送特征组成，其具有在材料层中或材料层上形成的至少一个小于500微米的特征尺寸。 在微流体装置上并与微流体装置接触的是耐化学性，热稳定和生物相容的多层涂层，其中多层涂层包括主要由氧化铪或氧化锆组成的一个或多个薄膜层和主要由 氧化钽，多层涂层位于流体输送特征的表面上。 可以使用原子层沉积膜形成方法在微流体装置的流体输送特征的表面上形成耐腐蚀膜，所述方法产生覆盖复杂几何形状的保形膜，从而使耐腐蚀膜能够形成在流体输送特征的所有表面上 的微流体装置。

    Printhead for inkjet printing device
    10.
    发明授权
    Printhead for inkjet printing device 有权
    喷墨打印机的打印头

    公开(公告)号：US08567909B2

    公开(公告)日：2013-10-29

    申请号：US13228881

    申请日：2011-09-09

    申请人： Kurt D. Sieber

    发明人： Kurt D. Sieber

    IPC分类号： B41J2/14 ,  B41J2/05

    CPC分类号： B41J2/1606 ,  B41J2/03 ,  B41J2/14129 ,  B41J2/1601 ,  B41J2/1642 ,  B41J2/1646 ,  B41J2202/22 ,  C23C16/405

    摘要： An inkjet printhead is provided for a digitally controlled inkjet printing apparatus wherein the inkjet printhead is comprised of a material layer and a drop formation mechanism positioned in or on the material layer, that is substantially improved in chemical resistance and thermally stability. A chemically resistant and thermally stable multilayer coating is provided onto and in contact with the inkjet printhead, wherein the multilayer coating includes one or more thin film layers comprised primarily of hafnium oxide or zirconium oxide and one or more thin film layers comprised primarily of tantalum oxide, the multilayer coating being located on the material layer. The corrosion resistant film of the invention is particularly beneficial because it can be formed on the printhead using atomic layer deposition film forming methods that produce conformal films that cover complex geometries, thereby enabling the corrosion resistant film to be formed on all surfaces of the printhead that come in contact with inks or other fluids employed in the printing system.

    摘要翻译： 为数字控制的喷墨打印设备提供喷墨打印头，其中喷墨打印头包括位于材料层中或材料层上的材料层和液滴形成机构，其基本上改善了耐化学性和热稳定性。 在喷墨打印头上提供耐化学性和热稳定性的多层涂层，其中多层涂层包括主要由氧化铪或氧化锆组成的一个或多个薄膜层和主要由氧化钽组成的一个或多个薄膜层 ，多层涂层位于材料层上。 本发明的耐腐蚀膜是特别有益的，因为它可以使用产生覆盖复杂几何形状的保形膜的原子层沉积膜形成方法在打印头上形成，从而使耐腐蚀膜能够形成在打印头的所有表面上， 与印刷系统中使用的油墨或其他液体接触。