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    Aromatic ring-containing compound for a resist underlayer and resist underlayer composition
    6.
    发明授权
    Aromatic ring-containing compound for a resist underlayer and resist underlayer composition 有权
    用于抗蚀剂底层和抗蚀剂下层组合物的芳香族环化合物

    公开(公告)号：US08637219B2

    公开(公告)日：2014-01-28

    申请号：US12980584

    申请日：2010-12-29

    申请人： Sung-Wook Cho ,  Hwan-Sung Cheon ,  Min-Soo Kim ,  Seung-Bae Oh ,  Jee-Yun Song

    发明人： Sung-Wook Cho ,  Hwan-Sung Cheon ,  Min-Soo Kim ,  Seung-Bae Oh ,  Jee-Yun Song

    IPC分类号： G03F7/004 ,  C07C13/24

    CPC分类号： C07C33/26 ,  C07C33/36 ,  C07C2601/14 ,  C07C2603/54 ,  G03F7/091

    摘要： An aromatic ring-containing compound for a resist underlayer and a resist underlayer composition, the aromatic ring-containing compound being represented by the following Chemical Formula 1: wherein, in Chemical Formula 1, R1 to R6 are each independently a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C5 to C20 aromatic ring group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C3 to C20 cycloalkenyl group, a substituted or unsubstituted C2 to C20 heteroaryl group, or a substituted or unsubstituted C2 to C20 heterocycloalkyl group, X1 to X6 are each independently hydrogen, a hydroxy group (—OH), a substituted or unsubstituted alkyl amine group, a substituted or unsubstituted alkoxy group, or an amino group (—NH2), n1 to n6 are each independently 0 or 1, and 1≦n1+n2+n3+n4+n5+n6≦6.

    摘要翻译： 用于抗蚀剂底层的芳香族含环化合物和抗蚀剂下层组合物，所述含芳环的化合物由以下化学式1表示：其中，在化学式1中，R 1〜R 6各自独立地为取代或未取代的C1〜 取代或未取代的C 3至C 20芳环，取代或未取代的C 3至C 20环烷基，取代或未取代的C 3至C 20环烯基，取代或未取代的C 2至C 20杂芳基，或取代或未取代的 C2〜C20杂环烷基，X1〜X6各自独立地为氢，羟基（-OH），取代或未取代的烷基胺基，取代或未取代的烷氧基或氨基（-NH2），n1〜n6分别为 各自独立地为0或1，以及1 @ n1 + n2 + n3 + n4 + n5 + n6 @ 6。