Method of distortion correction in shrink processes for fabrication of write poles
    1.
    发明申请
    Method of distortion correction in shrink processes for fabrication of write poles 失效
    用于制造写入极的收缩过程中的失真校正方法

    公开(公告)号:US20080000076A1

    公开(公告)日:2008-01-03

    申请号:US11478787

    申请日:2006-06-29

    IPC分类号: G11B5/127

    摘要: A method is presented for fabricating a write pole for a magnetic recording head, wherein a photoresist layer is formed on a wafer stack. A target P2 pole configuration is provided, and a photomask having a pattern is produced, and the pattern is transferred to the photoresist to create a patterned photoresist having at least one photoresist channel. A layer of photoresist channel shrinking film used to produce a reduced width photoresist channel in an expanded photoresist. A P2 pole tip is formed within the reduced width photoresist channel. The P2 pole tip is then compared to the target P2 pole configuration to identify distortions, which are then used to produce a distortion-corrected photomask. The distortion-corrected photomask is then used to produce a distortion-corrected expanded photoresist, which is then used to produce a distortion-corrected P2 pole tip.

    摘要翻译: 提出了一种用于制造用于磁记录头的写极的方法,其中在晶片叠层上形成光致抗蚀剂层。 提供目标P 2极结构,并且产生具有图案的光掩模,并且将图案转移到光致抗蚀剂以产生具有至少一个光致抗蚀剂通道的图案化光致抗蚀剂。 用于在扩展的光致抗蚀剂中产生减小宽度的光致抗蚀剂通道的光致抗蚀剂通道收缩膜层。 P 2极尖端形成在减小宽度的光致抗蚀剂通道内。 然后将P 2极尖与目标P 2极配置进行比较,以识别失真,然后将其用于产生失真校正光掩模。 然后使用失真校正的光掩模来产生失真校正的扩展光致抗蚀剂,然后将其用于产生失真校正的P 2极端。

    Method of distortion correction in shrink processes for fabrication of write poles
    2.
    发明授权
    Method of distortion correction in shrink processes for fabrication of write poles 失效
    用于制造写入极的收缩过程中的失真校正方法

    公开(公告)号:US07530159B2

    公开(公告)日:2009-05-12

    申请号:US11478787

    申请日:2006-06-29

    IPC分类号: G11B5/127 H04R31/00

    摘要: A method is presented for fabricating a write pole for a magnetic recording head, wherein a photoresist layer is formed on a wafer stack. A target P2 pole configuration is provided, and a photomask having a pattern is produced, and the pattern is transferred to the photoresist to create a patterned photoresist having at least one photoresist channel. A layer of photoresist channel shrinking film used to produce a reduced width photoresist channel in an expanded photoresist. A P2 pole tip is formed within the reduced width photoresist channel. The P2 pole tip is then compared to the target P2 pole configuration to identify distortions, which are then used to produce a distortion-corrected photomask. The distortion-corrected photomask is then used to produce a distortion-corrected expanded photoresist, which is then used to produce a distortion-corrected P2 pole tip.

    摘要翻译: 提出了一种用于制造用于磁记录头的写极的方法,其中在晶片叠层上形成光致抗蚀剂层。 提供目标P2极配置,并且产生具有图案的光掩模,并且将图案转移到光致抗蚀剂以产生具有至少一个光致抗蚀剂通道的图案化光致抗蚀剂。 用于在扩展的光致抗蚀剂中产生减小宽度的光致抗蚀剂通道的光致抗蚀剂通道收缩膜层。 在减小宽度的光致抗蚀剂通道内形成P2极端。 然后将P2极尖端与目标P2极配置进行比较,以识别失真,然后将其用于产生失真校正光掩模。 然后使用失真校正的光掩模来产生失真校正的扩展光致抗蚀剂,然后将其用于产生失真校正的P2极尖端。

    Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask
    3.
    发明授权
    Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask 有权
    使用电子束抗蚀剂掩模制造用于磁头的磁写磁极的方法

    公开(公告)号:US07716813B2

    公开(公告)日:2010-05-18

    申请号:US11634667

    申请日:2006-12-05

    IPC分类号: G11B5/187 B44C1/22

    摘要: A method is disclosed for independently controlling track width and bevel angle of a write pole tip of a magnetic recording head. The method includes establishing the track width in the pole tip layer material utilizing E-beam lithography. A portion of this pole tip material having the established track width is protected by providing a temporary masking material to make a protected portion. At least one unprotected portion is left exposed to be shaped. This unprotected portion is then beveled to produce at least one beveled portion. The protected portion produces an upper pole tip portion which together with the beveled portion produce an improved pole tip. Also disclosed is a magnetic head having the improved pole tip, and a disk drive having a magnetic head having the improved pole tip.

    摘要翻译: 公开了一种用于独立地控制磁记录头的写极尖的轨道宽度和斜角的方法。 该方法包括利用电子束平版印刷法在极尖层材料中建立轨道宽度。 通过提供临时掩蔽材料来制造具有已建立的轨道宽度的该极尖材料的一部分,以形成受保护的部分。 至少一个未保护的部分被暴露以成形。 然后将该未保护部分倾斜以产生至少一个倾斜部分。 受保护部分产生上极尖部分,其与斜面部分一起产生改进的极尖。 还公开了具有改进的极尖的磁头和具有具有改进的极尖的磁头的磁盘驱动器。

    Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask
    5.
    发明申请
    Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask 有权
    使用电子束抗蚀剂掩模制造用于磁头的磁写磁极的方法

    公开(公告)号:US20080127481A1

    公开(公告)日:2008-06-05

    申请号:US11634667

    申请日:2006-12-05

    IPC分类号: G11B5/127

    摘要: A method is disclosed for independently controlling track width and bevel angle of a write pole tip of a magnetic recording head. The method includes establishing the track width in the pole tip layer material utilizing E-beam lithography. A portion of this pole tip material having the established track width is protected by providing a temporary masking material to make a protected portion. At least one unprotected portion is left exposed to be shaped. This unprotected portion is then beveled to produce at least one beveled portion. The protected portion produces an upper pole tip portion which together with the beveled portion produce an improved pole tip. Also disclosed is a magnetic head having the improved pole tip, and a disk drive having a magnetic head having the improved pole tip.

    摘要翻译: 公开了一种用于独立地控制磁记录头的写极尖的轨道宽度和斜角的方法。 该方法包括利用电子束平版印刷法在极尖层材料中建立轨道宽度。 通过提供临时掩蔽材料来制造具有已建立的轨道宽度的该极尖材料的一部分,以形成受保护的部分。 至少一个未保护的部分被暴露以成形。 然后将该未保护部分倾斜以产生至少一个倾斜部分。 受保护部分产生上极尖部分,其与斜面部分一起产生改进的极尖。 还公开了具有改进的极尖的磁头和具有具有改进的极尖的磁头的磁盘驱动器。

    Process for fabricating patterned magnetic recording media
    6.
    发明申请
    Process for fabricating patterned magnetic recording media 有权
    制造图案化磁记录介质的方法

    公开(公告)号:US20080093336A1

    公开(公告)日:2008-04-24

    申请号:US11583845

    申请日:2006-10-20

    IPC分类号: B44C1/22 C03C25/68

    CPC分类号: G11B5/855 G11B5/667 G11B5/732

    摘要: A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.

    摘要翻译: 一种制造图案化磁记录介质的方法,包括以下步骤:(a)提供包括最上面的非磁性中间层的层堆叠; (b)在所述中间层上形成抗蚀剂层; (c)形成第一图案,其包括延伸穿过抗蚀剂层的第一组凹槽,并暴露出中间层的第一组间隔开的表面部分; (d)用一层硬掩模材料填充第一组凹槽; (e)选择性地去除所述抗蚀剂层以形成第二图案,所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和(f)用形成磁记录层的磁性硬质材料层填充第二组凹部。

    Method for fabricating patterned perpendicular magnetic recording media
    7.
    发明申请
    Method for fabricating patterned perpendicular magnetic recording media 有权
    图案化垂直磁记录介质的制造方法

    公开(公告)号:US20080085362A1

    公开(公告)日:2008-04-10

    申请号:US11542129

    申请日:2006-10-04

    IPC分类号: B05D5/12 B05D1/32

    摘要: A method of fabricating a patterned perpendicular magnetic recording medium comprises steps of: (a) providing a layer stack including a magnetically soft underlayer (“SUL”) and an overlying non-magnetic interlayer; (b) forming a masking layer on the non-magnetic interlayer; (c) forming a resist layer on the masking layer; (d) forming a pattern of recesses extending through the resist layer and exposing spaced apart surface portions of the masking layer; (e) extending the pattern of recesses through the masking layer to expose spaced apart surface portions of the interlayer; and (f) at least partially filling the pattern of recesses with a magnetically hard material to form a perpendicular magnetic recording layer.

    摘要翻译: 制造图案化的垂直磁记录介质的方法包括以下步骤:(a)提供包括磁软底层(“SUL”)和上覆非磁性中间层的层堆叠; (b)在非磁性中间层上形成掩模层; (c)在掩模层上形成抗蚀剂层; (d)形成延伸穿过抗蚀剂层并露出掩模层的间隔开的表面部分的凹陷图案; (e)将凹槽的图案延伸穿过掩模层以暴露中间层的间隔开的表面部分; 和(f)至少部分地用磁性硬的材料填充凹槽的图案以形成垂直的磁记录层。

    Silicon microlens cleaning system
    8.
    发明授权
    Silicon microlens cleaning system 失效
    硅微透镜清洗系统

    公开(公告)号:US6077417A

    公开(公告)日:2000-06-20

    申请号:US195843

    申请日:1998-11-19

    CPC分类号: B82Y15/00

    摘要: A method and system for cleaning the silicon microlenses in an electron-beam microcolumn in situ. The microlenses individually are heated by passing a current through each microlens. The current is utilized to heat the microlens to at least two hundred degrees Centigrade to prevent contamination and occasionally to a temperature on the order of six to seven hundred degrees Centigrade to remove any builtup or potential contamination.

    摘要翻译: 一种电子束微柱原位清洗硅微透镜的方法和系统。 通过使电流通过每个微透镜来单独地加热微透镜。 该电流用于将微透镜加热至至少二百摄氏度以防止污染,并且偶尔达到六至七百摄氏度的温度以除去任何积聚或潜在的污染物。

    Method for fabricating patterned magnetic recording device
    9.
    发明授权
    Method for fabricating patterned magnetic recording device 有权
    图案化磁记录装置的制造方法

    公开(公告)号:US08900655B2

    公开(公告)日:2014-12-02

    申请号:US11542129

    申请日:2006-10-04

    摘要: A method of fabricating a patterned perpendicular magnetic recording medium comprises steps of: (a) providing a layer stack including a magnetically soft underlayer (“SUL”) and an overlying non-magnetic interlayer; (b) forming a masking layer on the non-magnetic interlayer; (c) forming a resist layer on the masking layer; (d) forming a pattern of recesses extending through the resist layer and exposing spaced apart surface portions of the masking layer; (e) extending the pattern of recesses through the masking layer to expose spaced apart surface portions of the interlayer; and (f) at least partially filling the pattern of recesses with a magnetically hard material to form a perpendicular magnetic recording layer.

    摘要翻译: 制造图案化的垂直磁记录介质的方法包括以下步骤:(a)提供包括磁软底层(“SUL”)和上覆非磁性中间层的层堆叠; (b)在非磁性中间层上形成掩模层; (c)在掩模层上形成抗蚀剂层; (d)形成延伸穿过抗蚀剂层并露出掩模层的间隔开的表面部分的凹陷图案; (e)将凹槽的图案延伸穿过掩模层以暴露中间层的间隔开的表面部分; 和(f)至少部分地用磁性硬的材料填充凹槽的图案以形成垂直的磁记录层。

    Discrete track magnetic media with domain wall pinning sites
    10.
    发明授权
    Discrete track magnetic media with domain wall pinning sites 失效
    具有畴壁钉扎位置的离散轨道磁性介质

    公开(公告)号:US07986493B2

    公开(公告)日:2011-07-26

    申请号:US11946535

    申请日:2007-11-28

    IPC分类号: G11B5/82

    摘要: A magnetic recording medium with domain wall pinning sites including a substrate, a soft magnetic underlayer, and a magnetic recording layer overlying the soft magnetic underlayer. In one embodiment the magnetic recording layer has at least two grooves providing a track having first and second sidewalls formed by the grooves. The sidewalls provide a plurality of pinning sites formed between the sidewalls for pinning magnetic domain walls in the track. At least one of the pinning sites includes a first indentation in the first sidewall and a paired second indentation in the second sidewall. In one embodiment data can be stored within the magnetic recording layer by positioning a write head adjacent the track and inducing at least two magnetic domains defining a domain wall. The domain wall migrates to one of the pinning sites in the track.

    摘要翻译: 具有域壁钉扎位置的磁记录介质,包括衬底,软磁性底层和覆盖软磁性底层的磁记录层。 在一个实施例中,磁记录层具有至少两个沟槽,提供具有由凹槽形成的第一和第二侧壁的轨道。 侧壁提供在侧壁之间形成的多个钉扎位置,用于钉住轨道中的磁畴壁。 钉扎位置中的至少一个包括第一侧壁中的第一凹陷和第二侧壁中的成对的第二凹陷。 在一个实施例中,数据可以通过将写头定位在轨道附近并且诱导限定域壁的至少两个磁畴来存储在磁记录层内。 域墙迁移到轨道中的一个钉扎位置。