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16 条记录 (耗时 0.029 秒)

    Production of resist images, and a suitable dry film resist
    5.
    发明授权
    Production of resist images, and a suitable dry film resist 失效

    公开(公告)号：US4649100A

    公开(公告)日：1987-03-10

    申请号：US675428

    申请日：1984-11-27

    申请人： Reinhold J. Leyrer ,  Gerhard Wegner ,  Michael Mueller

    发明人： Reinhold J. Leyrer ,  Gerhard Wegner ,  Michael Mueller

    IPC分类号： G03F7/039 ,  G03C1/495 ,  G03C5/16 ,  G03F7/26

    CPC分类号： G03F7/039 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S438/949

    摘要： In the production of resist images by application of a radiation-sensitive positive-working resist layer based on degradable polymers onto a substrate, imagewise exposure of the resist layer to actinic radiation and removal of the irradiated parts of the layer with development of the resist image, the radiation-sensitive resist layer used is composed of poly(diacetylenes), in particular soluble ones. Preferably, the radiation-sensitive resist layer based on the poly(diacetylenes) contains sensitizers which can be activated by actinic radiation and which, after being activated, induce or accelerate molecular degradation of the poly(diacetylenes). Dry film resists comprise a temporary dimensionally stable base and a radiation-sensitive resist layer which is applied on the base, can be degraded by exposure to actinic radiation and is based on poly(diacetylenes), in particular soluble ones, with or without a cover sheet on top of the said resist layer.

    Capacitively measuring chemical sensor system
    6.
    发明授权
    Capacitively measuring chemical sensor system 失效
    电容式测量化学传感器系统

    公开(公告)号：US5304290A

    公开(公告)日：1994-04-19

    申请号：US907990

    申请日：1992-07-02

    申请人： Bernd F. W. Hoffmann ,  Rainer Erbach ,  Gerhard Wegner ,  Harald Fuchs ,  Wolfgang Schrepp ,  Matthias Schaub

    发明人： Bernd F. W. Hoffmann ,  Rainer Erbach ,  Gerhard Wegner ,  Harald Fuchs ,  Wolfgang Schrepp ,  Matthias Schaub

    IPC分类号： G01N27/414 ,  G01N27/22 ,  G01N27/333 ,  G01N27/26

    CPC分类号： G01N27/221

    摘要： In a miniaturizable, capacitively measuring chemical semiconductor-based sensor system consisting of a sensor and a reference element which are to be brought into contact with the electrolyte to be measured, the reference element being connected in series with the sensor, the reference element consists of a highly doped semiconductor substrate or metal/semiconductor substrate which is covered with a membrane, and the sensor consists of an insulator/semiconductor substrate which is coated with a sensitive membrane, and the sensitive membrane of the sensor is more sensitive than that of the reference element.The sensor and the reference element of this sensor system may either be applied to one and the same chip or consist of individual components which are readily interchangeable with one another.

    摘要翻译： 在由可与要测量的电解质接触的传感器和参考元件组成的可小型化，电容性测量的基于化学半导体的传感器系统中，参考元件与传感器串联连接，参考元件由 被膜覆盖的高掺杂半导体衬底或金属/半导体衬底，并且传感器由涂覆有敏感膜的绝缘体/半导体衬底组成，并且传感器的敏感膜比参考的敏感膜更敏感 元件。 该传感器系统的传感器和参考元件可以应用于同一个芯片，也可以由彼此容易互换的各个部件组成。

    Polymers having phthalocyanine units and their use as optically transparent films
    7.
    发明授权
    Polymers having phthalocyanine units and their use as optically transparent films 失效
    具有苯甲酰胺单体的聚合物及其作为光学透明膜的使用

    公开(公告)号：US5120610A

    公开(公告)日：1992-06-09

    申请号：US489897

    申请日：1990-03-07

    申请人： Gerhard Wegner ,  Walter Caseri ,  Thomas Sauer

    发明人： Gerhard Wegner ,  Walter Caseri ,  Thomas Sauer

    IPC分类号： G02B5/30 ,  C08G77/48 ,  C08G77/50 ,  C08G77/58 ,  C08J5/18 ,  C09B69/10 ,  G02B1/04 ,  G02B1/10 ,  H01J61/35

    CPC分类号： H01J61/35 ,  C08G77/48 ,  C08G77/58 ,  C09B69/108 ,  G02B1/04 ,  G02B1/10 ,  Y10T428/26 ,  Y10T428/261 ,  Y10T428/31663

    摘要： Novel polymers contain phthalocyanine ring systems bonded via axial bonds to a central metal atom in the polymer chain and consist of repeating units of the general formula (I) ##STR1## In the general formula (I), Pc.sup.s is a phthalocyanine ring system having peripheral substituents, Me is the central atom of the phthalocyanine ring system, which atom is bonded in the polymer main chain, suitable central metal atoms Me being silicon and germanium, R is alkylene, R' and R" are each alkyl, cycloalkyl, aryl or alkoxy and Z is a silicon-carbon bond or further Si-containing groups. The novel polymers can be particularly advantageously used for the production of ultrathin layers by the LB technique, optically transparent films having high optical anisotropy and a high volume concentration of phthalocyanine radicals being formed.

    摘要翻译： 新型聚合物含有通过轴向键连接到聚合物链中的中心金属原子的酞菁环体系，并由通式（I）的重复单元组成。在通式（I）中，Pcs是酞菁环 具有外围取代基的体系Me是酞菁环体系的中心原子，该原子键合在聚合物主链中，合适的中心金属原子Me是硅和锗，R是亚烷基，R'和R“各自是烷基， 环烷基，芳基或烷氧基，Z是硅 - 碳键或其它含Si基团。 新型聚合物可以特别有利地用于通过LB技术生产超薄层，形成具有高光学各向异性和高体积浓度的酞菁基团的光学透明膜。

    Production of thin films
    9.
    发明授权
    Production of thin films 失效
    生产薄膜

    公开(公告)号：US5035762A

    公开(公告)日：1991-07-30

    申请号：US223017

    申请日：1988-07-22

    申请人： Gerhard Wegner ,  Arend J. Schouten ,  Gisela Duda ,  Thomas Arndt

    发明人： Gerhard Wegner ,  Arend J. Schouten ,  Gisela Duda ,  Thomas Arndt

    IPC分类号： B29C41/12 ,  B05C3/00 ,  B05D1/20 ,  B32B27/00 ,  C08J5/18

    CPC分类号： B05D1/202 ,  B82Y30/00 ,  B82Y40/00

    摘要： Thin films are produced by a process in which organic polymers having long-chain side groups are dissolved in an organic solvent, the solution is spread at the water/air interface by the Langmuir-Blodgett technique and the film is transferred onto a solid base material after evaporation of the organic solvent, and the organic polymers used are those which contain long-chain n-alkyl side groups bonded to the main chain of the polymer via polar groups, and some of these long-chain n-alkyl side groups are replaced by shorter-chain n-alkyl side groups, by branched alkyl side groups having the same or a smaller number of carbon atoms or by equally long or shorter side groups having one or more C-C multiple bonds.This process can be used to produce film elements, for example for optical filters.

    摘要翻译： 通过将具有长链侧基的有机聚合物溶解在有机溶剂中的方法制造薄膜，通过Langmuir-Blodgett技术将溶液在水/空气界面扩散，并将膜转移到固体基材上 有机溶剂蒸发后，使用的有机聚合物是含有通过极性基团键合到聚合物主链的长链正烷基侧基的那些，并且这些长链正烷基侧基中的一些被替换 由短链正烷基侧基，具有相同或少数碳原子的支链烷基侧基或具有一个或多个CC多重键的同等长或短侧基组成。 该过程可以用于制造膜元件，例如用于滤光器。

    Production of resist images, and a suitable dry film resist
    10.
    发明授权
    Production of resist images, and a suitable dry film resist 失效
    生产抗蚀剂图像和合适的干膜抗蚀剂

    公开(公告)号：US4789622A

    公开(公告)日：1988-12-06

    申请号：US886177

    申请日：1986-07-16

    申请人： Reinhold J. Leyrer ,  Gerhard Wegner ,  Michael Mueller

    发明人： Reinhold J. Leyrer ,  Gerhard Wegner ,  Michael Mueller

    IPC分类号： G03F7/039 ,  G03C1/495

    CPC分类号： G03F7/039 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S438/949

    摘要： In the production of resist images by application of a radiation-sensitive positive-working resist layer based on degradable polymers onto a substrate, imagewise exposure of the resist layer to actinic radiation and removal of the irradiated parts of the layer with development of the resist image, the radiation-sensitive resist layer used is composed of poly(diacetylenes), in particular soluble ones. Preferably, the radiation-sensitive resist layer based on the poly(diacetylenes) contains sensitizers which can be activated by actinic radiation and which, after being activated, induce or accelerate molecular degradation of the poly(diacetylenes). Dry film resists comprise a temporary dimensionally stable base and a radiation-sensitive resist layer which is applied on the base, can be degraded by exposure to actinic radiation and is based on poly(diacetylenes), in particular soluble ones, with or without a cover sheet on top of the said resist layer.

    摘要翻译： 在通过将基于可降解聚合物的辐射敏感的正性抗蚀剂层应用于基底上来制备抗蚀剂图像时，抗蚀剂层成像曝光于光化辐射并且随着抗蚀剂图像的显影而去除被照射部分 所用的辐射敏感抗蚀剂层由聚（二乙炔），特别是可溶性抗蚀剂层组成。 优选地，基于聚（二乙炔）的辐射敏感抗蚀剂层包含可以通过光化辐射活化的敏化剂，并且在被激活后，引发或加速聚（二乙炔）的分子降解。 干膜抗蚀剂包括临时尺寸稳定的基底和施加在基底上的辐射敏感抗蚀剂层，可以通过暴露于光化辐射而降解，并且基于聚（​​二乙炔），特别是可溶性的，具有或不具有覆盖物 在所述抗蚀剂层的顶部上。