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    Polishing pad having a surface texture and method and apparatus for fabricating the same
    3.
    发明申请
    Polishing pad having a surface texture and method and apparatus for fabricating the same 审中-公开
    具有表面纹理的抛光垫及其制造方法和装置

    公开(公告)号：US20070202780A1

    公开(公告)日：2007-08-30

    申请号：US11360412

    申请日：2006-02-24

    申请人： Chung-Ching Feng ,  Chen-Hsiang Chao ,  I-Peng Yao ,  Yung-Chang Hung

    发明人： Chung-Ching Feng ,  Chen-Hsiang Chao ,  I-Peng Yao ,  Yung-Chang Hung

    IPC分类号： B24B1/00 ,  B24D11/00

    CPC分类号： B24D18/00 ,  B23K26/355 ,  B24B37/26

    摘要： The present invention relates to a polishing pad having a surface texture and a method for fabricating the same. The fabricating method comprises the following steps: (a) providing a substrate which has a surface for polishing an object to be polished; (b) providing a freely movable high-energy laser; and (c) forming a surface texture on the surface of the substrate by using the high-energy laser. Thereby, burrs and deformation of fabricated polishing pad may not occur, and when the polishing pad is used, the slurry can maintain good flowage without scraping the object to be polished. Moreover, the desired surface texture can be fabricated rapidly and correctly by using a high-energy laser with extremely high reproducibility.

    摘要翻译： 本发明涉及具有表面纹理的抛光垫及其制造方法。 制造方法包括以下步骤：（a）提供具有用于抛光待抛光物体的表面的基板; （b）提供可自由移动的高能激光器; 和（c）通过使用高能激光在基板的表面上形成表面纹理。 因此，可能不会发生制造的抛光垫的毛刺和变形，并且当使用抛光垫时，浆料可以保持良好的流动性而不刮擦待抛光的物体。 此外，可以通过使用具有非常高的再现性的高能激光器来快速且正确地制造所需的表面纹理。

    Polishing Pad and Method for Making the Same
    5.
    发明申请
    Polishing Pad and Method for Making the Same 审中-公开
    抛光垫及其制作方法

    公开(公告)号：US20080220701A1

    公开(公告)日：2008-09-11

    申请号：US12123558

    申请日：2008-05-20

    申请人： Chung-Ching Feng ,  Chen-Hsiang Chao ,  I-Peng Yao ,  Yung-Chang Hung

    发明人： Chung-Ching Feng ,  Chen-Hsiang Chao ,  I-Peng Yao ,  Yung-Chang Hung

    IPC分类号： B32B33/00 ,  B05D5/00 ,  B24D13/00 ,  B24D11/00 ,  B24D3/32 ,  B24D3/28 ,  B24D18/00

    CPC分类号： B32B5/18 ,  B24B37/24 ,  B24D3/32 ,  B24D11/02 ,  B24D18/00 ,  B32B5/24 ,  B32B27/12 ,  Y10T428/23914

    摘要： A method for making a polishing pad includes providing a non-woven fabric made of a plurality of fibers. The non-woven fabric is submerged with a polymer resin solution. The polymer resin submerged in non-woven fabric is cured to form a porous polymer having an outer face adapted for polishing a workpiece. The outer face of the porous polymer is finished to form a polishing pad with a plurality of naps on the outer face. The plurality of naps on the outer face have a density ranging from 1.0 to 2.0 g/cm3, and the plurality of naps on the outer face have a length ranging from 50 to 600 μm.

    摘要翻译： 制造抛光垫的方法包括提供由多根纤维制成的无纺布。 将无纺布浸入聚合物树脂溶液中。 浸没在无纺布中的聚合物树脂被固化以形成具有适于抛光工件的外表面的多孔聚合物。 多孔聚合物的外表面被完成以形成在外表面上具有多个绒毛的抛光垫。 外表面上的多个绒毛的密度范围为1.0至2.0g / cm 3，外表面上的多个绒毛的长度范围为50至600μm。

    Structure with luminous and visual effects and light transmissive sheet thereof and method for making the same
    7.
    发明授权
    Structure with luminous and visual effects and light transmissive sheet thereof and method for making the same 失效
    具有发光和视觉效果的结构及其透光片及其制造方法

    公开(公告)号：US08585941B2

    公开(公告)日：2013-11-19

    申请号：US12962970

    申请日：2010-12-08

    申请人： Chung-Chih Feng ,  Chun-Yi Kuo ,  Kai-Feng Kang ,  Ko-Feng Wang ,  I-Peng Yao

    发明人： Chung-Chih Feng ,  Chun-Yi Kuo ,  Kai-Feng Kang ,  Ko-Feng Wang ,  I-Peng Yao

    IPC分类号： B29D11/00

    CPC分类号： G02B1/14 ,  G02B1/04 ,  G02B1/105 ,  Y10T428/24802 ,  Y10T428/24884 ,  C08L75/04

    摘要： The present invention relates to a structure with luminous and visual effects, a light transmissive sheet thereof, and a method for making the same. The light transmissive sheet includes a first layer, a light transmissive intermediate layer and a second layer. The material of the first layer, the light transmissive intermediate layer and the second layer is polyurethane resin. The light transmissive intermediate layer is disposed on the first layer, and the second layer is disposed on the light transmissive intermediate layer. At least one pattern is formed on the first layer or the second layer, and the pattern penetrates the first layer or the second layer. When light irradiates the light transmissive sheet, the pattern is shown, so the light transmissive sheet has luminous and visual effects.

    摘要翻译： 本发明涉及具有发光和视觉效果的结构及其透光片及其制造方法。 透光片包括第一层，透光中间层和第二层。 第一层，透光中间层和第二层的材料是聚氨酯树脂。 透光中间层设置在第一层上，第二层设置在透光中间层上。 在第一层或第二层上形成至少一个图案，并且图案穿透第一层或第二层。 当光照射透光片时，示出了图案，因此透光片具有发光和视觉效果。

    Ultra fine fiber polishing pad
    8.
    发明授权
    Ultra fine fiber polishing pad 有权
    超细纤维抛光垫

    公开(公告)号：US07762873B2

    公开(公告)日：2010-07-27

    申请号：US12119580

    申请日：2008-05-13

    申请人： Chung-Chih Feng ,  Chen-Hsiang Chao ,  I-Peng Yao

    发明人： Chung-Chih Feng ,  Chen-Hsiang Chao ,  I-Peng Yao

    IPC分类号： B24D11/00

    CPC分类号： B24D11/003 ,  B24B37/24 ,  Y10T428/24612

    摘要： A polishing pad includes a body having a polymer layer and a polishing layer. The polymer layer has opposite first and second faces. The polymer layer includes a plurality of first ultrafine fibers and a polymer bonding the first ultrafine fibers together. The polishing layer is formed on the first face of the polymer layer. The polishing layer includes a plurality of second ultrafine fibers and is free of the polymer. The first and second ultrafine fibers are identical to each other. The second ultrafine fibers have a first concentration of ultrafine fibers by volume higher than 80% a total volume of the polishing layer. The first ultrafine fibers of the polymer layer have a second concentration of ultrafine fibers by volume to a total volume of the polymer layer. The first concentration is higher than the second concentration.

    摘要翻译： 抛光垫包括具有聚合物层和抛光层的主体。 聚合物层具有相对的第一和第二面。 聚合物层包括多个第一超细纤维和将第一超细纤维结合在一起的聚合物。 抛光层形成在聚合物层的第一面上。 抛光层包括多个第二超细纤维，并且不含聚合物。 第一和第二超细纤维彼此相同。 第二超细纤维的第一浓度的超细纤维的体积高于抛光层的总体积的80％。 聚合物层的第一超细纤维具有体积至聚合物层的总体积的超细纤维的第二浓度。 第一浓度高于第二浓度。

    SHEET FOR MOUNTING POLISHING WORKPIECE AND METHOD FOR MAKING THE SAME
    9.
    发明申请
    SHEET FOR MOUNTING POLISHING WORKPIECE AND METHOD FOR MAKING THE SAME 审中-公开
    安装抛光工具的表格及其制作方法

    公开(公告)号：US20090252876A1

    公开(公告)日：2009-10-08

    申请号：US12482330

    申请日：2009-06-10

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Chen-Hsiang Chao

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Chen-Hsiang Chao

    IPC分类号： B05D5/02

    CPC分类号： B24B37/30 ,  B24B41/068

    摘要： The present invention relates to a sheet for mounting a polishing workpiece. The sheet comprises a substrate and a surface layer. The substrate has a surface. The surface layer is located on the surface of the substrate, with no hole structure existing in the interior thereof, and has a surface and a slightly rough layer. The slightly rough layer is located on the surface of the surface layer to carry and mount the polishing workpiece, with no hole structure existing in the interior thereof. Accordingly, when the polishing workpiece contacts the slightly rough layer, the air therebetween is easily vented out via the slightly rough layer, without the phenomenon of air wrapping, which increases the adsorption force between the polishing workpiece and the sheet.

    摘要翻译： 本发明涉及一种用于安装抛光工件的片材。 片材包括基底和表面层。 基板具有表面。 表面层位于基板的表面上，其内部没有孔结构，并且具有表面和稍微粗糙的层。 稍微粗糙的层位于表层的表面上，以承载和安装抛光工件，其内部没有孔结构。 因此，当研磨工件接触稍微粗糙的层时，它们之间的空气容易通过稍微粗糙的层排出，而没有空气缠绕现象，这增加了研磨工件和片材之间的吸附力。

    Method for manufacturing polishing pad and polishing pad
    10.
    发明授权
    Method for manufacturing polishing pad and polishing pad 有权

    公开(公告)号：US09862071B2

    公开(公告)日：2018-01-09

    申请号：US12887363

    申请日：2010-09-21

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Yung-Chang Hung ,  Lyang-Gung Wang

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Yung-Chang Hung ,  Lyang-Gung Wang

    IPC分类号： C09K3/14 ,  B24B37/24

    CPC分类号： B24B37/24

    摘要： The present invention relates to a method for manufacturing a polishing pad. The method of the invention includes the steps of forming a polishing layer from a polyurethane solution has a solid content more than about 90 wt % and drying the polyurethane solution at a temperature from about 130° C. to about 170° C. The invention also provides a polishing pad manufactured by the method mentioned above. The defect of scraping the surface of the substrate to be polished due to polishing particles remaining is avoided when applying the polishing pad according to the invention, and the flatness of the substrate to be polished is raised and the defective rate is eliminated also.