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    Novel method of screening
    4.
    发明申请
    Novel method of screening 失效
    新型筛选方法

    公开(公告)号：US20070009513A1

    公开(公告)日：2007-01-11

    申请号：US10554234

    申请日：2004-04-22

    申请人： Makoto Kobayashi ,  Yugo Habata ,  Ryo Fujii ,  Shuji Hinuma

    发明人： Makoto Kobayashi ,  Yugo Habata ,  Ryo Fujii ,  Shuji Hinuma

    IPC分类号： A61K39/395 ,  G01N33/567 ,  G01N33/53

    CPC分类号： G01N33/74 ,  A61K38/177 ,  G01N2333/726 ,  G01N2500/04

    摘要： The use of a G-protein coupled receptor protein comprising the same or substantially the same amino acid sequence as the amino acid sequence represented by SEQ ID NO: 1, or a salt thereof and a ligand peptide comprising the amino acid sequence represented by any of SEQ ID NO: 3 to 7, or a salt thereof, enables efficient screening of an agonist or antagonist for the above receptor protein or a salt thereof.

    摘要翻译： 使用包含与SEQ ID NO：1所示的氨基酸序列相同或基本相同的氨基酸序列的G蛋白偶联受体蛋白或其盐和配体肽，所述配体肽包含由SEQ ID NO： SEQ ID NO：3至7或其盐能够有效筛选上述受体蛋白质的激动剂或拮抗剂或其盐。

    Methods of screening for ligands for FPRL2
    6.
    发明授权
    Methods of screening for ligands for FPRL2 失效
    筛选FPRL2配体的方法

    公开(公告)号：US07517661B2

    公开(公告)日：2009-04-14

    申请号：US10554234

    申请日：2004-04-22

    申请人： Makoto Kobayashi ,  Yugo Habata ,  Ryo Fujii ,  Shuji Hinuma

    发明人： Makoto Kobayashi ,  Yugo Habata ,  Ryo Fujii ,  Shuji Hinuma

    IPC分类号： G01N33/567 ,  C07K14/705

    CPC分类号： G01N33/74 ,  A61K38/177 ,  G01N2333/726 ,  G01N2500/04

    摘要： The use of a G-protein coupled receptor protein comprising the same or substantially the same amino acid sequence as the amino acid sequence represented by SEQ ID NO: 1, or a salt thereof and a ligand peptide comprising the amino acid sequence represented by any of SEQ ID NO: 3 to 7, or a salt thereof, enables efficient screening of an agonist or antagonist for the above receptor protein or a salt thereof.

    摘要翻译： 使用包含与SEQ ID NO：1所示的氨基酸序列相同或基本相同的氨基酸序列的G蛋白偶联受体蛋白或其盐和配体肽，所述配体肽包含由SEQ ID NO： SEQ ID NO：3至7或其盐能够有效筛选上述受体蛋白质的激动剂或拮抗剂或其盐。

    Substrate processing apparatus
    10.
    发明授权
    Substrate processing apparatus 有权
    基板加工装置

    公开(公告)号：US09455125B2

    公开(公告)日：2016-09-27

    申请号：US13070115

    申请日：2011-03-23

    申请人： Akihiro Yoshimura ,  Tetsuji Sato ,  Masato Horiguchi ,  Nobuhiro Wada ,  Makoto Kobayashi ,  Hiroshi Tsujimoto ,  Jun Tamura ,  Mamoru Naoi

    发明人： Akihiro Yoshimura ,  Tetsuji Sato ,  Masato Horiguchi ,  Nobuhiro Wada ,  Makoto Kobayashi ,  Hiroshi Tsujimoto ,  Jun Tamura ,  Mamoru Naoi

    IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01J37/32

    CPC分类号： H01J37/32091 ,  H01J37/32568

    摘要： Disclosed is a substrate processing apparatus capable of suppressing generation of plasma in the space between a moving electrode and an end wall at one side of a cylindrical chamber. The substrate processing apparatus includes a cylindrical chamber to receive a wafer, a shower head movable along a central axis of the chamber inside the chamber, a susceptor opposing the shower head in the chamber, and a flexible bellows connecting the shower head to a cover of the chamber, wherein a high frequency power is applied to a processing space presented between the shower head and the susceptor, processing gas is introduced into the processing space, the shower head and the side wall of the chamber are non-contact to each other, and a bypass member is installed electrically connecting the shower head and the cover or the side wall of the chamber.

    摘要翻译： 公开了一种能够抑制在圆筒形室的一侧的移动电极与端壁之间的空间中产生等离子体的基板处理装置。 基板处理装置包括用于容纳晶片的圆柱形室，可沿着室内的室的中心轴线移动的喷头，与腔室中的淋浴喷头相对的基座，以及柔性波纹管，其将淋浴头连接到 所述室，其中向所述淋浴喷头和所述基座之间呈现的处理空间施加高频功率，将处理气体引入所述处理空间中，所述淋浴喷头和所述室的侧壁彼此不接触， 并且旁路部件被安装成电连接淋浴头和盖子或室的侧壁。