摘要:
A precursor to an electron source, having a capability for extending the life of an image display device by substantially preventing 1) a degradation in a degree of vacuum provided in an image display apparatus, 2) short-circuiting between adjacent wire electrodes via a getter, and 3) a degradation in performance characteristics of the electron source, even when used for a long time period. The electron source is for coupling to an image display member to form an image display apparatus, and the image display member is for displaying an image in response to being irradiated by electrons. The precursor preferably comprises a substrate, and an antistatic film provided on a surface of the substrate at a region where electron emitting devices are to be disposed on the precursor to form the electron source, but not on a region of that surface to be coupled to the image display member.
摘要:
An electron source includes a substrate, a coating layer provided on the substrate, plural electron emission elements disposed on the coating layer, and a metal for connecting the plural electron emission elements. The electron emission element includes a conductive film including the electron emission part disposed on the coating layer, with the conductive film being connected to a wiring line with a conductive member for blocking the metals contained in the wiring lines from being transferred to the conductive film.
摘要:
A matrix-type liquid crystal device is formed so as to have a matrix of pixels defined by and isolated from each other by an outside-pixel region. The liquid crystal in the outside-pixel region in placed in an alignment state, typically a homeotropic state or one close thereto, which is different from an alignment state, typically a homogeneous uniform alignment state, at the pixel region. As a result, the liquid crystal device is provided with improved display qualities due to suppression of irregularities at the outside-pixel region and/or a local pressure distribution.
摘要:
An aqueous mixture etchant containing hydroiodic acid and ferric chloride is suitable for etching ITO to form a minute electrode pattern as used in a liquid crystal display device. When the etchant has caused a decrease in etching performance due to a compositional change, it can be effectively regenerated by replenishing appropriate amounts of hydrochloric acid and pure water, or an appropriate amount of a dilute hydrochloric acid at a constant concentration, while minimizing the use of hydroiodic acid and ferric chloride which are rather expensive compared with hydrochloric acid and pure water.
摘要:
An ITO (indium tin oxide) film on a substrate is effectively etched by an etchant which is an aqueous solution containing hydrogen iodide and ferric chloride to form an electrode plate structure for liquid crystal display device. The etchant does not corrode an Mo or Mo alloy film and accordingly can selectively etch the ITO film already carrying thereon a pattern of Mo or Mo alloy forming an auxiliary electrode for compensating for the resistivity of the ITO film. The etchant is also effective for etching of the ITO film formed on an organic layer.
摘要:
An ITO (indium tin oxide) film on a substrate is effectively etched by an etchant which is an aqueous solution containing hydrogen iodide and ferric chloride to form an electrode plate structure for liquid crystal display device. The etchant does not corrode an Mo or Mo alloy film and accordingly can selectively etch the ITO film already carrying thereon a pattern of Mo or Mo alloy forming an auxiliary electrode for compensating for the resistivity of the ITO film. The etchant is also effective for etching of the ITO film formed on an organic layer.
摘要:
A superwide-angle lens system includes a negative first lens group, an aperture diaphragm, and a positive second lens group. The first lens group includes two negative meniscus lens elements, and a positive lens element. The second lens group includes a cemented lens having negative and positive lens elements; and a positive lens element. The following conditions (1) and (2) are satisfied: −1.45
摘要:
A method for etching a differential metal gate structure on a substrate is described. The differential metal gate structure includes a metal gate layer overlying a high dielectric constant (high-k) dielectric layer, wherein the metal gate layer comprises a different thickness at different regions on the substrate. The metal gate layer is patterned by using a plasma etching process, wherein at least one etch step includes forming plasma using a halogen-containing gas and at least one etch step includes forming plasma using an additive gas having as atomic constituents C, H, and F.
摘要:
A water-lifting pump apparatus which is free of a discharge valve and a check valve, is low in cost, and is capable of reducing vibration and noise due to a waterfall after the end of water pumping operation. The water-lifting pump apparatus has a suction tank (10), a discharge tank (20), a pump (30) for pumping water in the suction tank (10) into the discharge tank (20), and a discharge piping (50) connected to a discharge side of the pump, an actuator (60) for actuating the pump (50), a reverse flow preventing mechanism (80) for preventing a reverse flow of water pumped into the discharge tank (20) toward the discharge piping (50), and a back flow rate control (90) for controlling the flow rate of a waterfall falling from the discharge piping (50) into the suction tank (10) when pumping operation is finished.
摘要:
A vortex prevention device is capable of preventing creation of air entrained vortex and also provides a double suction vertical pump having such a vortex prevention device. The vortex prevention device is used in combination with the double suction vertical pump which is installed in an open channel and has an upper suction opening and a lower suction opening. The vortex prevention device includes a plate member as a vortex prevention structure arranged above the upper suction opening. The plate member is arranged away from the upper suction opening such that a passage is formed between the plate member and the upper suction opening.