公开(公告)号：US07422942B2

公开(公告)日：2008-09-09

申请号：US11798366

申请日：2007-05-14

申请人： Kousuke Suzuki ,  Katsuyuki Karakawa

发明人： Kousuke Suzuki ,  Katsuyuki Karakawa

IPC分类号： H01L21/8242 ,  H01L21/3205 ,  H01L21/4763

CPC分类号： H01L21/76897 ,  H01L21/02129 ,  H01L21/02164 ,  H01L21/02211 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/31612 ,  H01L21/31625 ,  H01L21/76832 ,  H01L21/76834 ,  H01L21/76895 ,  H01L29/665 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/7833

摘要： A semiconductor device having a self-aligned contact hole is formed by providing a side wall oxide film on a gate electrode, covering the gate electrode and the side wall oxide film by an oxide film and further covering the oxide film by a nitride film, wherein the oxide film is formed by a plasma CVD process with a reduced plasma power such that the H2O content in the oxide film is less than about 2.4 wt %.

摘要翻译： 具有自对准接触孔的半导体器件通过在栅电极上设置侧壁氧化膜形成，通过氧化膜覆盖栅电极和侧壁氧化膜，并通过氮化物膜进一步覆盖氧化膜，其中 氧化膜通过等离子体CVD工艺形成，其中等离子体功率降低，使得氧化物膜中的H 2 O 2含量小于约2.4重量％。

公开(公告)号：US20070287250A1

公开(公告)日：2007-12-13

申请号：US11798366

申请日：2007-05-14

申请人： Kousuke Suzuki ,  Katsuyuki Karakawa

发明人： Kousuke Suzuki ,  Katsuyuki Karakawa

IPC分类号： H01L21/3205

CPC分类号： H01L21/76897 ,  H01L21/02129 ,  H01L21/02164 ,  H01L21/02211 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/31612 ,  H01L21/31625 ,  H01L21/76832 ,  H01L21/76834 ,  H01L21/76895 ,  H01L29/665 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/7833

摘要： A semiconductor device having a self-aligned contact hole is formed by providing a side wall oxide film on a gate electrode, covering the gate electrode and the side wall oxide film by an oxide film and further covering the oxide film by a nitride film, wherein the oxide film is formed by a plasma CVD process with a reduced plasma power such that the H2O content in the oxide film is less than about 2.4 wt %.

摘要翻译： 具有自对准接触孔的半导体器件通过在栅电极上设置侧壁氧化膜形成，通过氧化膜覆盖栅电极和侧壁氧化膜，并通过氮化物膜进一步覆盖氧化膜，其中 氧化膜通过等离子体CVD工艺形成，其中等离子体功率降低，使得氧化物膜中的H 2 O 2含量小于约2.4重量％。

公开(公告)号：US07232720B2

公开(公告)日：2007-06-19

申请号：US10793862

申请日：2004-03-08

申请人： Kousuke Suzuki ,  Katsuyuki Karakawa

发明人： Kousuke Suzuki ,  Katsuyuki Karakawa

IPC分类号： H01L21/3205 ,  H01L21/4763

CPC分类号： H01L21/76897 ,  H01L21/02129 ,  H01L21/02164 ,  H01L21/02211 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/31612 ,  H01L21/31625 ,  H01L21/76832 ,  H01L21/76834 ,  H01L21/76895 ,  H01L29/665 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/7833

摘要： A semiconductor device having a self-aligned contact hole is formed by providing a side wall oxide film on a gate electrode, covering the gate electrode and the side wall oxide film by an oxide film and further covering the oxide film by a nitride film, wherein the oxide film is formed by a plasma CVD process with a reduced plasma power such that the H2O content in the oxide film is less than about 2.4 wt %.

公开(公告)号：US06878594B2

公开(公告)日：2005-04-12

申请号：US09045118

申请日：1998-03-20

申请人： Kousuke Suzuki ,  Katsuyuki Karakawa

发明人： Kousuke Suzuki ,  Katsuyuki Karakawa

IPC分类号： H01L21/28 ,  H01L21/316 ,  H01L21/318 ,  H01L21/336 ,  H01L21/60 ,  H01L21/768 ,  H01L29/78 ,  H01L29/76 ,  H01L29/94 ,  H01L31/062 ,  H01L31/113 ,  H01L31/119

CPC分类号： H01L21/76897 ,  H01L21/02129 ,  H01L21/02164 ,  H01L21/02211 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/31612 ,  H01L21/31625 ,  H01L21/76832 ,  H01L21/76834 ,  H01L21/76895 ,  H01L29/665 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/7833

摘要： A semiconductor device having a self-aligned contact hole is formed by providing a side wall oxide film on a gate electrode, covering the gate electrode and the side wall oxide film by an oxide film and further covering the oxide film by a nitride film, wherein the oxide film is formed by a plasma CVD process with a reduced plasma power such that the H2O content in the oxide film is less than about 2.4 wt %.

摘要翻译： 具有自对准接触孔的半导体器件通过在栅电极上设置侧壁氧化膜形成，通过氧化膜覆盖栅电极和侧壁氧化膜，并通过氮化物膜进一步覆盖氧化膜，其中 氧化膜通过等离子体CVD工艺形成，其中等离子体功率降低，使得氧化膜中的H 2 O含量小于约2.4重量％。

公开(公告)号：US11079700B2

公开(公告)日：2021-08-03

申请号：US16811483

申请日：2020-03-06

申请人： Keiji Makabe ,  Tsuneyasu Nagatomo ,  Kohsuke Satoh ,  Daichi Hisakuni ,  Kousuke Suzuki ,  Shintaro Akiyama

发明人： Keiji Makabe ,  Tsuneyasu Nagatomo ,  Kohsuke Satoh ,  Daichi Hisakuni ,  Kousuke Suzuki ,  Shintaro Akiyama

IPC分类号： G03G9/00 ,  G03G15/08 ,  G03G9/08 ,  G03G9/087 ,  G03G9/097

摘要： An image forming apparatus is provided that includes: an image bearer; a charger; an irradiator; a developing device containing a toner; and a transfer device. The image bearer has a Martens hardness of from 185 to 250 N/m2. The toner satisfies a relation 0.13≤X/Dn≤0.16, where X [μm] represents an average value of an amount of deformation of the toner by micro-indentation at when a load reaches 3.00×10−4 N at a loading rate of 3.0×10−5 N/sec under an environment of 32 degrees C. and 40% RH, and Dn [μm] represents a number average particle diameter of the toner. The toner contains an external additive comprising silica particles and particles composed mainly of strontium titanate. The particles composed mainly of strontium titanate further contain a third element M selected from the group consisting of La, Mg, Ca, Sn, and Si.

公开(公告)号：US08647804B2

公开(公告)日：2014-02-11

申请号：US13483494

申请日：2012-05-30

申请人： Yuuki Mizutani ,  Shinichiro Yagi ,  Kousuke Suzuki ,  Masato Taikoji

发明人： Yuuki Mizutani ,  Shinichiro Yagi ,  Kousuke Suzuki ,  Masato Taikoji

IPC分类号： G03G5/00 ,  G03G9/00

CPC分类号： G03G9/1131 ,  G03G9/1132

摘要： A method of preparing carrier for electrophotography, which includes a core material and a coating material layer formed on the surface of the core material, including coating a coating material of the coating material layer on the core material; and burning the coating material by an induction heater, wherein the induction heater applies an alternative current to parallely-located plural coil circuits including a conductive wire including the shape of a coil to generate a magnetic line changing its direction and intensity for inductively heating the core material to heat the coating material.

摘要翻译： 一种制备电子照相载体的方法，其包括在芯材表面上形成的芯材和涂层材料层，包括在芯材上涂覆涂层材料层的涂层材料; 并且通过感应加热器燃烧涂层材料，其中感应加热器向平行放置的多个线圈电路施加替代电流，所述多个线圈电路包括包括线圈形状的导线，以产生改变其方向和强度的磁线，用于感应加热芯 材料加热涂料。

公开(公告)号：US08253924B2

公开(公告)日：2012-08-28

申请号：US11919669

申请日：2006-05-23

申请人： Yusaku Uehara ,  Kousuke Suzuki ,  Katsushi Nakano ,  Yasuhiro Omura

发明人： Yusaku Uehara ,  Kousuke Suzuki ,  Katsushi Nakano ,  Yasuhiro Omura

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70341 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/70558

摘要： An exposure apparatus is provided with an optical system including a liquid, a sensor system for acquiring energy information of an energy beam which is incident on the liquid, and a controller which predicts variation of optical properties of the optical system including the liquid due to energy absorption of the liquid based on the energy information acquired using the sensor system and controls exposure operation with respect to an object based on the prediction results. According to the exposure apparatus, exposure operation without being influenced by the variation of the optical properties of the optical system including the liquid due to the energy absorption of the liquid becomes possible.

摘要翻译： 曝光装置设置有包括液体的光学系统，用于获取入射在液体上的能量束的能量信息的传感器系统，以及控制器，其预测由于能量而包括液体的光学系统的光学特性的变化 基于使用传感器系统获取的能量信息来吸收液体，并且基于预测结果控制相对于物体的曝光操作。 根据曝光装置，不会受到由液体的能量吸收引起的包括液体的光学系统的光学特性的变化的影响的曝光操作成为可能。

公开(公告)号：US07553598B2

公开(公告)日：2009-06-30

申请号：US11378424

申请日：2006-03-20

申请人： Kousuke Suzuki ,  Tomio Kondoh ,  Shinichiro Yagi ,  Hitoshi Iwatsuki

发明人： Kousuke Suzuki ,  Tomio Kondoh ,  Shinichiro Yagi ,  Hitoshi Iwatsuki

IPC分类号： G03G9/113

CPC分类号： G03G9/1139 ,  G03G9/10 ,  G03G9/1138

摘要： A carrier contains a core; and a cover layer located overlying the core, wherein the cover layer comprises a binder resin, a first particulate material and a second particulate material, wherein the following relationships are satisfied: 1

摘要翻译： 载体包含核心; 覆盖层位于芯的上方，其中覆盖层包括粘合剂树脂，第一颗粒材料和第二颗粒材料，其中满足以下关系：1 <（D1 / h）<10和0.001 <（D2 / h）<1，其中D1（mum）表示第一颗粒材料的体积平均粒径，D2（母体）表示第二颗粒材料的体积平均粒径，h（mum）表示覆盖物的厚度 层，并且其中所述第二颗粒材料具有不大于1.0×10 12Ω·cm的体积电阻率。

公开(公告)号：US20070291243A1

公开(公告)日：2007-12-20

申请号：US11785715

申请日：2007-04-19

申请人： Kousuke Suzuki

发明人： Kousuke Suzuki

IPC分类号： G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70783

摘要： An exposure apparatus includes a projection optical system, which projects a pattern of a mask onto a prescribed exposure area on a substrate at a prescribed projection magnification. The optical axis center of the projection optical system is set to a position different from that of the center of the projection area onto which the pattern is projected. The exposure apparatus further includes a magnification modification device, which modifies the projection magnification of the projection optical system; a calculation device, which calculates a shift length of the center of the projection area associated with modification of the projection magnification; and a correction device, which corrects the position information of the exposure area based on the shift length of the center of the projection area.

摘要翻译： 曝光装置包括投影光学系统，其以规定的投影倍率将掩模的图案投影到基板上的规定的曝光区域上。 将投影光学系统的光轴中心设定为与投影图案的投影区域的中心不同的位置。 所述曝光装置还具备能够改变所述投影光学系统的投影倍率的倍率变更装置， 计算装置，其计算与投影倍率的修改相关联的投影区域的中心的移动长度; 以及校正装置，其基于投影区域的中心的移动长度校正曝光区域的位置信息。

公开(公告)号：US07230682B2

公开(公告)日：2007-06-12

申请号：US10901209

申请日：2004-07-29

申请人： Yasuo Shimizu ,  Shigeru Hirukawa ,  Kousuke Suzuki ,  Tomoyuki Matsuyama

发明人： Yasuo Shimizu ,  Shigeru Hirukawa ,  Kousuke Suzuki ,  Tomoyuki Matsuyama

IPC分类号： G03B27/32 ,  G03B27/68

CPC分类号： G03B21/18 ,  G03B27/42 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/706

摘要： An exposure method of forming pattern on object via projection optical system, including deciding optimal adjustment amount of adjustment device which adjusts image forming property of the projection optical system to optimize the image forming property under pattern to be formed and exposure condition of the pattern, based on information related to wavefront aberration of the projection optical system, Zernike Sensitivity Chart corresponding to the pattern and the exposure condition, wavefront aberration variation table that denotes relation between adjustment amount of the adjustment device and change in coefficients of terms in the Zernike polynomial, and restraint condition with respect to the adjustment amount of the adjustment device, and exposing the pattern on the object under the exposure condition via the projection optical system of which the image forming property is adjusted by the adjustment device based on the decided optimal adjustment amount.

摘要翻译： 一种通过投影光学系统在物体上形成图案的曝光方法，包括确定调整投影光学系统的图像形成特性的调整装置的最佳调节量，以优化待形成的图案下的图像形成特性和图案的曝光条件 关于与投影光学系统的波前像差相关的信息，对应于图案和曝光条件的Zernike感光度图，表示调节装置的调整量与Zernike多项式中的项的系数的变化之间的关系的波前像差变化表，以及 基于调整装置的调整量，通过调整装置调整图像形成特性的投影光学系统，根据所确定的最佳调整量，在曝光条件下将图案曝光在物体上。