公开(公告)号：US07140201B2

公开(公告)日：2006-11-28

申请号：US10169191

申请日：2000-12-28

申请人： Kunio Sugiyama ,  Shuichi Tada ,  Jinichi Omi ,  Tadahiro Nakada ,  Hiroshi Morita ,  Masaki Kusuhara ,  Hiroyuki Watanabe ,  Hirofumi Uehara ,  Keiko Sanpei

发明人： Kunio Sugiyama ,  Shuichi Tada ,  Jinichi Omi ,  Tadahiro Nakada ,  Hiroshi Morita ,  Masaki Kusuhara ,  Hiroyuki Watanabe ,  Hirofumi Uehara ,  Keiko Sanpei

IPC分类号： C03B8/02 ,  C01B33/113

CPC分类号： C03B19/1065 ,  C01B33/16 ,  C03B2201/03 ,  C03B2201/04 ,  C03C1/006

摘要： A hydrous silica gel is dehydrated by freezing, thawing, and removing water separated by thawing, thereby yielding silica particles. In addition, the silica particles thus formed is washed and fired, thereby producing a synthetic quartz glass power.A water glass is dealkalized, an oxidizing agent and an acid are added, the mixture thus formed is passed through a hydrogen type cation exchange resin, the aqueous silica solution thus formed is then gelled, and the gelled material is then washed and fired, thereby producing a synthetic quartz powder.Silica is sequentially held for a predetermined time at each temperature range of 150 to 400° C., 500 to 700° C., and 1,100 to 1,300° C., thereby producing a quartz glass.

摘要翻译： 通过冷冻，解冻和除去通过解冻分离的水来脱水水合硅胶，从而产生二氧化硅颗粒。 此外，将由此形成的二氧化硅颗粒进行洗涤和烧制，从而产生合成石英玻璃粉末。 将水玻璃脱碱，加入氧化剂和酸，使形成的混合物通过氢型阳离子交换树脂，然后将由此形成的二氧化硅水溶液凝胶化，然后将凝胶材料洗涤并烧制，由此 生产合成石英粉。 在150〜400℃，500〜700℃，1100〜1300℃的各温度范围内依次保持二氧化硅预定时间，生成石英玻璃。

公开(公告)号：US08211619B2

公开(公告)日：2012-07-03

申请号：US12742557

申请日：2008-11-12

申请人： Hiroshi Morita ,  Hiromi Sato ,  Atsushi Kobayashi ,  Jinichi Omi ,  Seiichi Saito

发明人： Hiroshi Morita ,  Hiromi Sato ,  Atsushi Kobayashi ,  Jinichi Omi ,  Seiichi Saito

IPC分类号： G03F7/075 ,  G03F7/16 ,  G03F7/20 ,  G03F7/30 ,  G03F7/40

CPC分类号： C08G77/50 ,  C08G77/14 ,  C08G77/80 ,  C08K5/235 ,  C08K5/5419 ,  C08L83/06 ,  G03F7/0233 ,  G03F7/0758 ,  G03F7/40 ,  H01L23/296 ,  H01L2924/0002 ,  H01L2924/12044 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/124 ,  H01L2924/00

摘要： The present invention provides: a positive photosensitive composition that yields an insulation layer superior not only in high transparency, but also in heat resistance enduring a temperature during the production of a substrate, solvent resistance, and anti-aging property as a permanent resist; a positive permanent resist utilizing the positive photosensitive composition; and a method for producing the positive permanent resist. The present invention provides: a positive photosensitive composition containing (A) a curable silicone resin having a silanol group, which resin has a structure obtained by a reaction between one or more cyclic siloxane compounds represented by the following general formula (1): and one or more arylalkoxysilane compounds represented by the following general formula (2): (B) diazonaphthoquinones, and (C) a solvent; a positive permanent resist using the positive photosensitive composition; and a method for producing the positive permanent resist.

摘要翻译： 本发明提供一种阳光敏组合物，其不仅具有高透明性，耐热性，耐碱性，耐溶剂性，耐老化性，耐久性优异的优异的绝缘层， 利用正性光敏组合物的正永久抗蚀剂; 和正永久抗蚀剂的制造方法。 本发明提供：含有（A）具有硅烷醇基的可固化有机硅树脂的正型感光性组合物，该树脂具有通过一种或多种由以下通式（1）表示的环状硅氧烷化合物之间的反应获得的结构：和 或更多的由以下通式（2）表示的芳基烷氧基硅烷化合物：（B）重氮萘醌，和（C）溶剂; 使用正性光敏组合物的正永久抗蚀剂; 和正永久抗蚀剂的制造方法。

公开(公告)号：US20090012256A1

公开(公告)日：2009-01-08

申请号：US11815564

申请日：2006-02-14

申请人： Jinichi Omi ,  Koichi Sakamaki ,  Hiroshi Morita ,  Masako Saito

发明人： Jinichi Omi ,  Koichi Sakamaki ,  Hiroshi Morita ,  Masako Saito

IPC分类号： C08G77/12

CPC分类号： C08G77/52 ,  C08G77/045 ,  C08G77/12 ,  C08G77/20 ,  C08G77/70 ,  C08K5/56 ,  C08L83/04 ,  C08L83/14 ,  C08L83/00 ,  C08L2666/52

摘要： A silicon-containing curable composition, comprising: a prepolymer (A) containing two or more Si—H groups per molecule obtained by hydrosilylation reaction of one kind or more selected from each of components (α) and components (β) described below; a cyclic siloxane compound (B) containing per molecule two or more carbon-carbon double bonds that have reactivity to the Si—H groups; and a hydrosilylation catalyst (C); wherein the component (α) is a cyclic siloxane compound represented by formula (1) and contains two or more Si—H groups per molecule, wherein R1, R2 and R3 each are an alkyl group having 1 to 6 carbon atoms or a phenyl group, may be the same or different, a is any number of 2 to 10, b is any number of 0 to 8, and a+b≧2, and wherein the component (β) is a compound containing per molecule two or more carbon-carbon double bonds that have reactivity to the Si—H groups.

摘要翻译： 一种含硅可固化组合物，其包含：每分子含有两个或更多个Si-H基团的预聚物（A），其通过以下描述的每种组分（α）和组分（β）中的一种或多种的氢化硅烷化反应获得; 每分子含有与Si-H基具有反应性的两个以上碳 - 碳双键的环状硅氧烷化合物（B） 和氢化硅烷化催化剂（C）; 其中组分（α）是由式（1）表示的环状硅氧烷化合物，每分子含有两个或更多个Si-H基团，其中R 1，R 2和R 3各自为具有1至6个碳原子的烷基或苯基 可以相同或不同，a为任意数2〜10，b为0〜8的任意数，a + b> = 2，其中，成分（β）为每分子含有2个以上的化合物 与Si-H基团具有反应性的碳 - 碳双键。

公开(公告)号：US07799887B2

公开(公告)日：2010-09-21

申请号：US11815564

申请日：2006-02-14

申请人： Jinichi Omi ,  Koichi Sakamaki ,  Hiroshi Morita ,  Masako Saito

发明人： Jinichi Omi ,  Koichi Sakamaki ,  Hiroshi Morita ,  Masako Saito

IPC分类号： C08G77/50

CPC分类号： C08G77/52 ,  C08G77/045 ,  C08G77/12 ,  C08G77/20 ,  C08G77/70 ,  C08K5/56 ,  C08L83/04 ,  C08L83/14 ,  C08L83/00 ,  C08L2666/52

摘要： A silicon-containing curable composition, comprising: a prepolymer (A) containing two or more Si—H groups per molecule obtained by hydrosilylation reaction of one kind or more selected from each of components (α) and components (β) described below; a cyclic siloxane compound (B) containing per molecule two or more carbon-carbon double bonds that have reactivity to the Si—H groups; and a hydrosilylation catalyst (C); wherein the component (α) is a cyclic siloxane compound represented by formula (1) and contains two or more Si—H groups per molecule, wherein R1, R2 and R3 each are an alkyl group having 1 to 6 carbon atoms or a phenyl group, may be the same or different, a is any number of 2 to 10, b is any number of 0 to 8, and a+b≧2, and wherein the component (β) is a compound containing per molecule two or more carbon-carbon double bonds that have reactivity to the Si—H groups.

摘要翻译： 一种含硅可固化组合物，其包含：每分子含有两个或更多个Si-H基团的预聚物（A），其通过以下所述的每种组分（α）和组分（＆bgr;）中的一种或多种的氢化硅烷化反应获得; 每分子含有与Si-H基具有反应性的两个以上碳 - 碳双键的环状硅氧烷化合物（B） 和氢化硅烷化催化剂（C）; 其中组分（α）是由式（1）表示的环状硅氧烷化合物，每分子含有两个或更多个Si-H基团，其中R 1，R 2和R 3各自为具有1至6个碳原子的烷基或苯基 可以相同或不同，a为任意数2〜10，b为0〜8的任意数，a +b≥2，其中，成分（＆amp; bgr）为每分子含有2个以上的化合物 与Si-H基团具有反应性的碳 - 碳双键。

公开(公告)号：US20100273104A1

公开(公告)日：2010-10-28

申请号：US12742557

申请日：2008-11-12

申请人： Hiroshi Morita ,  Hiromi Sato ,  Atsushi Kobayashi ,  Jinichi Omi ,  Seiichi Saito

发明人： Hiroshi Morita ,  Hiromi Sato ,  Atsushi Kobayashi ,  Jinichi Omi ,  Seiichi Saito

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： C08G77/50 ,  C08G77/14 ,  C08G77/80 ,  C08K5/235 ,  C08K5/5419 ,  C08L83/06 ,  G03F7/0233 ,  G03F7/0758 ,  G03F7/40 ,  H01L23/296 ,  H01L2924/0002 ,  H01L2924/12044 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/124 ,  H01L2924/00

摘要： The present invention provides: a positive photosensitive composition that yields an insulation layer superior not only in high transparency, but also in heat resistance enduring a temperature during the production of a substrate, solvent resistance, and anti-aging property as a permanent resist; a positive permanent resist utilizing the positive photosensitive composition; and a method for producing the positive permanent resist. The present invention provides: a positive photosensitive composition containing (A) a curable silicone resin having a silanol group, which resin has a structure obtained by a reaction between one or more cyclic siloxane compounds represented by the following general formula (1): and one or more arylalkoxysilane compounds represented by the following general formula (2): (B) diazonaphthoquinones, and (C) a solvent; a positive permanent resist using the positive photosensitive composition; and a method for producing the positive permanent resist.

摘要翻译： 本发明提供一种阳光敏组合物，其不仅具有高透明性，耐热性，耐碱性，耐溶剂性，耐老化性，耐久性优异的优异的绝缘层， 利用正性光敏组合物的正永久抗蚀剂; 和正永久抗蚀剂的制造方法。 本发明提供：含有（A）具有硅烷醇基的可固化有机硅树脂的正型感光性组合物，该树脂具有通过一种或多种由以下通式（1）表示的环状硅氧烷化合物之间的反应获得的结构：和 或更多的由以下通式（2）表示的芳基烷氧基硅烷化合物：（B）重氮萘醌，和（C）溶剂; 使用正性光敏组合物的正永久抗蚀剂; 和正永久抗蚀剂的制造方法。

公开(公告)号：US09105397B2

公开(公告)日：2015-08-11

申请号：US13880895

申请日：2011-10-11

申请人： Yuichiro Yoshitake ,  Shuji Katoh ,  Hiroshi Morita ,  Atsushi Ootake

发明人： Yuichiro Yoshitake ,  Shuji Katoh ,  Hiroshi Morita ,  Atsushi Ootake

IPC分类号： H02M7/537 ,  H01G4/002 ,  H02M7/00 ,  H01G7/06 ,  H01G4/33 ,  H01G4/40

CPC分类号： H01G4/002 ,  H01G2/06 ,  H01G4/1218 ,  H01G4/33 ,  H01G4/40 ,  H01G7/06 ,  H01L25/16 ,  H01L2924/0002 ,  H02M7/003 ,  H01L2924/00

摘要： The present invention provides an inter-bus-bar built-in capacitor capable of reducing the size of a capacitor used in an inverter or the like or downsizing the capacitor, and provides power equipment as well as a power converting apparatus. The inter-bus-bar built-in capacitor is provided between a pair of opposing bus bars and includes a high-dielectric-constant material which has a relative dielectric constant of at least 50 when a voltage of 1,000 V is applied at a temperature of 25° C. Thus, it is possible to provide the inter-bus-bar built-in capacitor capable of reducing the size of a capacitor used in an inverter or the like or downsizing the capacitor and provide the power equipment as well as the power converting apparatus.

摘要翻译： 本发明提供一种能够减小逆变器等中使用的电容器的尺寸的集成电路的内置电容器，或者使电容器小型化，并且提供电力设备以及电力转换装置。 母线间内置电容器设置在一对相对的母线之间，并且包括高介电常数材料，当在1000V的温度下施加1,000V的电压时，其具有至少50的相对介电常数 因此，可以提供能够减小逆变器等中使用的电容器的尺寸的母线间内置的电容器，或者使电容器的尺寸缩小，并提供电力设备以及功率 转换装置。

公开(公告)号：US08975506B2

公开(公告)日：2015-03-10

申请号：US13273056

申请日：2011-10-13

申请人： Shuichi Fujii ,  Yosuke Inomata ,  Tomonari Sakamoto ,  Koichiro Niira ,  Yuko Fukawa ,  Hiroshi Morita ,  Koji Nishi ,  Tatsuya Yashiki ,  Mitsuo Yamashita ,  Kenji Fukui

发明人： Shuichi Fujii ,  Yosuke Inomata ,  Tomonari Sakamoto ,  Koichiro Niira ,  Yuko Fukawa ,  Hiroshi Morita ,  Koji Nishi ,  Tatsuya Yashiki ,  Mitsuo Yamashita ,  Kenji Fukui

IPC分类号： H01L31/042 ,  H01L31/02 ,  H01L31/05 ,  H01L31/0224 ,  H01L31/048

CPC分类号： H01L31/0201 ,  H01L31/02013 ,  H01L31/022433 ,  H01L31/048 ,  H01L31/049 ,  H01L31/0504 ,  H01L31/0508 ,  Y02E10/50

摘要： A surface electrode (5) is installed on the light receiving surface of a solar cell element, the surface electrode (5) comprises three bus bar electrodes (5a) for extracting light-produced at the solar cell element to the outside and collecting finger electrodes (5b) connected to these bus bar electrodes (5a), and the bus bar electrodes (5a) are not less than 0.5 mm and not more than 2 mm in width and the finger electrodes (5b) are not less than 0.05 mm and not more than 0.1 mm in width. A high-efficient solar cell module can be obtained with substantially lowered resistance by increasing the number of bus bar electrode (5a) and thereby decreasing the lengths of the finger electrodes (5b).

摘要翻译： 表面电极（5）安装在太阳能电池元件的光接收表面上，表面电极（5）包括三个汇流条电极（5a），用于将在太阳能电池元件处产生的光提取到外部并收集指状电极 （5b），汇流条电极（5a）的宽度不小于0.5mm且不大于2mm，手指电极（5b）不小于0.05mm，而不是 宽度大于0.1mm。 通过增加汇流条电极（5a）的数量，从而减小手指电极（5b）的长度，可以获得具有显着降低的电阻的高效太阳能电池模块。

公开(公告)号：US20140106576A1

公开(公告)日：2014-04-17

申请号：US14113305

申请日：2012-04-09

申请人： Hiroshi Morita ,  Atsushi Kobayashi ,  Hiroo Yokota ,  Yasuhisa Furihata

发明人： Hiroshi Morita ,  Atsushi Kobayashi ,  Hiroo Yokota ,  Yasuhisa Furihata

IPC分类号： H01L21/02 ,  C09D1/00 ,  C01B21/087

CPC分类号： H01L21/02164 ,  C01B21/087 ,  C08G77/62 ,  C08L83/16 ,  C09D1/00 ,  H01L21/02282 ,  H01L31/02167 ,  Y02E10/50

摘要： Disclosed is an inorganic polysilazane that undergoes less shrinkage during a calcination step in an oxidizing agent such as water vapor and is less prone to allow a silica film to suffer from the formation of cracks or peel off from a semiconductor substrate, and a silica film-forming coating liquid containing the inorganic polysilazane, and also provides an inorganic polysilazane and a silica film-forming coating liquid containing the same. The value of A/(B+C) is 0.9-1.5 and the value of (A+B)/C is 4.2-50. A=peak area within the range of from 4.75 ppm to less than 5.4 ppm. B=peak area within the range of from 4.5 ppm to less than 4.75 ppm. Peak area within the range of from 4.2 ppm to less than 4.5 ppm is represented by C in a 1H-NMR spectrum; and the polystyrene-equivalent mass average molecular weight is 2000 to 20000.

摘要翻译： 公开了一种无机聚硅氮烷，其在诸如水蒸气的氧化剂中在煅烧步骤中经历较少的收缩，并且不容易使二氧化硅膜发生裂纹或从半导体衬底剥离而形成二氧化硅膜 - 形成含有无机聚硅氮烷的涂布液，并且还提供无机聚硅氮烷和含有该聚硅氮烷的二氧化硅成膜涂布液。 A /（B + C）的值为0.9-1.5，（A + B）/ C的值为4.2〜50。 A = 4.75ppm至小于5.4ppm范围内的峰面积。 B = 4.5ppm至小于4.75ppm范围内的峰面积。 在4.2ppm至小于4.5ppm的范围内的峰面积在1H-NMR光谱中由C表示; 聚苯乙烯当量的质均分子量为2000〜20000。

公开(公告)号：US20130291891A1

公开(公告)日：2013-11-07

申请号：US13884350

申请日：2011-11-11

申请人： Takaaki Chuuman ,  Takahiro Kawakatsu ,  Katsunobu Kitami ,  Hiroshi Morita

发明人： Takaaki Chuuman ,  Takahiro Kawakatsu ,  Katsunobu Kitami ,  Hiroshi Morita

IPC分类号： H01L21/02

CPC分类号： H01L21/02052 ,  B08B3/00 ,  B08B3/02 ,  B08B3/04 ,  H01L21/67057

摘要： A silicon wafer after being cleaned by using a cleaning liquid is rinsed by using carbonic water. According to such a silicon wafer cleaning method, generation of static due to a rinsing treatment is not caused, so that an electrostatic breakdown is not caused, adhesion of dirt to a cleaned silicon wafer surface due to the static is not caused, adhesion of metal impurities can be prevented in the rinsing treatment of the silicon wafer and, while giving consideration to the cost, furthermore, a rinsing treatment using a clean rinsing liquid free from causing any residue can be performed.

摘要翻译： 通过使用清洗液清洗后的硅晶片通过使用碳酸水进行冲洗。 根据这样的硅晶片清洗方法，不会产生由于进行漂洗处理而产生的静电，所以不会产生静电击穿，不会引起由静电引起的污物对清洗过的硅晶片表面的附着，金属的附着 可以防止在硅晶片的漂洗处理中产生杂质，并且在考虑成本的同时，可以进行使用不产生任何残留物的清洁冲洗液的漂洗处理。

公开(公告)号：US08342911B2

公开(公告)日：2013-01-01

申请号：US12158465

申请日：2006-12-20

申请人： Hiroshi Morita ,  Tomoyuki Kasuga ,  Takafumi Furutate ,  Akira Makiuchi

发明人： Hiroshi Morita ,  Tomoyuki Kasuga ,  Takafumi Furutate ,  Akira Makiuchi

IPC分类号： B24B21/18

CPC分类号： B24B53/053 ,  B24B5/35

摘要： A wheel truing apparatus adapted for use in a cylindrical grinding machine wherein a work head with a work spindle for support of a workpiece and a wheel head with a grinding wheel for grinding the workpiece are mounted on a bed for relative movement in a Z-axis direction parallel with the rotation axis of the work spindle and in an X-axis direction crossing the Z-axis direction, characterized in that the wheel truing apparatus comprises a rotary drive portion mounted on the work head or a member united therewith, and a wheel truing tool supported on the rotary drive portion for rotation therewith, the wheel truing tool being provided at its outer periphery with a truing portion for truing a grinding surface of the wheel brought into contact therewith, wherein the rotary drive portion is placed in a position adjacent to said work head in a tooling area defined by a stroke of the relative movements of said wheel head and said work head in the Z-axis direction and apart from said work spindle radially outward and is arranged in such a manner that the rotation axis line of said truing tool is oriented toward the rotation axis line of said grinding wheel in a condition where said truing portion is retained in contact with the grinding surface of said wheel, whereby the truing portion of said tool is brought into contact with the grinding surface of said wheel by relative movement of said wheel head to said work head for truing the grinding surface.

摘要翻译： 一种适用于圆柱形磨床的车轮修整装置，其中具有用于支撑工件的工作主轴的工作头和具有用于研磨工件的砂轮的砂轮头安装在床上以在Z轴上相对运动 方向平行于工作主轴的旋转轴线并且在与Z轴方向交叉的X轴方向上，其特征在于，所述车轮修整装置包括安装在工作头上的旋转驱动部分或与其结合的构件，以及轮 修整工具支撑在旋转驱动部分上以与其一起旋转，轮修整工具在其外周设置有用于修整与其接触的轮的研磨表面的修整部分，其中旋转驱动部分被放置在相邻的位置 在由所述轮头和所述工作头在Z轴方向上的相对运动的行程限定的加工区域中的所述工作头部，并且与所述工件sp 以径向向外的方式设置，使得所述修整工具的旋转轴线在所述修整部保持与所述轮的研磨表面接触的状态下朝向所述砂轮的旋转轴线定向，由此 所述工具的修整部分通过所述轮头相对于所述工作头的相对移动而与所述车轮的磨削表面接触，用于修整研磨表面。