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公开(公告)号：US09340561B2
公开(公告)日：2016-05-17
申请号：US14345002
申请日：2012-08-28
申请人： Makiko Umezaki , Daisuke Sakuma , Taito Nishino , Takahiro Kishioka , Yoshiomi Hiroi , Shigeo Kimura , Tomoya Ohashi , Yuki Usui
发明人： Makiko Umezaki , Daisuke Sakuma , Taito Nishino , Takahiro Kishioka , Yoshiomi Hiroi , Shigeo Kimura , Tomoya Ohashi , Yuki Usui
IPC分类号： C07F7/08 , A61L27/28 , A61L27/54 , A61L29/08 , A61L29/16 , A61L31/08 , A61L31/16 , C09D5/16 , C07F7/18
CPC分类号： C07F7/081 , A61L27/28 , A61L27/54 , A61L29/08 , A61L29/16 , A61L31/08 , A61L31/16 , A61L2300/424 , C07F7/1804 , C09D5/1625
摘要： There is provided a novel organic silicon compound that can be used for a silane coupling agent. An organic silicon compound of Formula (1): (where A− is Formula (2) or Formula (3): E is Formula (4) or Formula (5): R1 and R2 are each independently a C1-5 alkyl group, R3 is a hydrogen atom or a methyl group, R4 and R5 are each independently a C1-5 alkyl group, m, n, and p are each independently an integer of 1 to 5, and q is an integer of 1 to 3).
摘要翻译： 提供了可用于硅烷偶联剂的新型有机硅化合物。 式（1）的有机硅化合物：其中A-是式（2）或式（3）：E是式（4）或式（5）：R 1和R 2各自独立地为C 1-5烷基， R3是氢原子或甲基，R4和R5各自独立地为C1-5烷基，m，n和p各自独立地为1〜5的整数，q为1〜3的整数）。
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公开(公告)号：US20140370182A1
公开(公告)日：2014-12-18
申请号：US14345002
申请日：2012-08-28
申请人： Makiko Umezaki , Daisuke Sakuma , Taito Nishino , Takahiro Kishioka , Yoshiomi Hiroi , Shigeo Kimura , Tomoya Ohashi , Yuki Usui
发明人： Makiko Umezaki , Daisuke Sakuma , Taito Nishino , Takahiro Kishioka , Yoshiomi Hiroi , Shigeo Kimura , Tomoya Ohashi , Yuki Usui
CPC分类号： C07F7/081 , A61L27/28 , A61L27/54 , A61L29/08 , A61L29/16 , A61L31/08 , A61L31/16 , A61L2300/424 , C07F7/1804 , C09D5/1625
摘要： There is provided a novel organic silicon compound that can be used for a silane coupling agent. An organic silicon compound of Formula (1): (where A− is Formula (2) or Formula (3): E is Formula (4) or Formula (5): R1 and R2 are each independently a C1-5 alkyl group, R3 is a hydrogen atom or a methyl group, R4 and R5 are each independently a C1-5 alkyl group, m, n, and p are each independently an integer of 1 to 5, and q is an integer of 1 to 3).
摘要翻译： 提供了可用于硅烷偶联剂的新型有机硅化合物。 式（1）的有机硅化合物：其中A-是式（2）或式（3）：E是式（4）或式（5）：R 1和R 2各自独立地为C 1-5烷基， R3是氢原子或甲基，R4和R5各自独立地为C1-5烷基，m，n和p各自独立地为1〜5的整数，q为1〜3的整数）。
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公开(公告)号：US09140989B2
公开(公告)日：2015-09-22
申请号：US14111021
申请日：2012-04-11
申请人： Takahiro Kishioka , Makiko Umezaki , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
发明人： Takahiro Kishioka , Makiko Umezaki , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
IPC分类号： G03F7/004 , G03F7/32 , G03F7/20 , C08F220/54 , G03F7/038 , C08F220/20 , C08F220/30 , C08F220/56 , C08F220/58
CPC分类号： G03F7/20 , C08F220/20 , C08F220/30 , C08F220/54 , C08F220/56 , C08F220/58 , G03F7/004 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/038 , G03F7/0382 , G03F7/0388 , G03F7/32
摘要： A material forms a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition includes water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the water-soluble organic particles of the photosensitive composition includes a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further includes a photoacid generator. In addition, the water-soluble organic particles of the photosensitive composition includes a polymer which contains the unit structure (A) for forming organic particles, the unit structure (B) for forming interparticle crosslinkage, the unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group.
摘要翻译： 材料通过将光敏组合物施加到基材上并干燥以形成感光涂层并进行曝光和显影，形成图案，以及形成图案的方法。 光敏组合物包括水溶性有机颗粒和溶剂，其中溶剂是水溶性有机颗粒的不良溶剂。 优选地，感光性组合物的水溶性有机颗粒包括含有形成有机颗粒的单元结构（A），用于形成颗粒间交联的单元结构（B）和赋予分散性的单元结构（C））的聚合物， 并且光敏组合物还包括光致酸产生剂。 另外，感光性组合物的水溶性有机粒子包含含有形成有机粒子的单元结构（A），用于形成粒子间交联的单元结构（B），赋予分散性的单位结构（C） 和具有光酸产生基团的单元结构（D）。
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公开(公告)号：US20140045119A1
公开(公告)日：2014-02-13
申请号：US14111021
申请日：2012-04-11
申请人： Takahiro Kishioka , Makiko Umezaki , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
发明人： Takahiro Kishioka , Makiko Umezaki , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
CPC分类号： G03F7/20 , C08F220/20 , C08F220/30 , C08F220/54 , C08F220/56 , C08F220/58 , G03F7/004 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/038 , G03F7/0382 , G03F7/0388 , G03F7/32
摘要： A material forms a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition includes water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the water-soluble organic particles of the photosensitive composition includes a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further includes a photoacid generator. In addition, the water-soluble organic particles of the photosensitive composition includes a polymer which contains the unit structure (A) for forming organic particles, the unit structure (B) for forming interparticle crosslinkage, the unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group.
摘要翻译： 材料通过将光敏组合物施加到基材上并干燥以形成感光涂层并进行曝光和显影，形成图案，以及形成图案的方法。 光敏组合物包括水溶性有机颗粒和溶剂，其中溶剂是水溶性有机颗粒的不良溶剂。 优选地，感光性组合物的水溶性有机颗粒包括含有形成有机颗粒的单元结构（A），用于形成颗粒间交联的单元结构（B）和赋予分散性的单元结构（C））的聚合物， 并且光敏组合物还包括光致酸产生剂。 另外，感光性组合物的水溶性有机粒子包含含有形成有机粒子的单元结构（A），用于形成粒子间交联的单元结构（B），赋予分散性的单位结构（C） 和具有光酸产生基团的单元结构（D）。
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公开(公告)号：US09023583B2
公开(公告)日：2015-05-05
申请号：US13879125
申请日：2011-10-07
申请人： Takahiro Kishioka , Daisuke Sakuma , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
发明人： Takahiro Kishioka , Daisuke Sakuma , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
CPC分类号： G03F7/0752 , C07F7/1804 , C08G77/28 , C09D183/08 , G03F7/0751 , G03F7/165 , G03F7/20 , G03F7/30
摘要： There is provided a composition for forming a monolayer or a multilayer on the substrate. A composition for forming a monolayer or a multilayer containing a silane compound of Formula (1A) or Formula (1B): [where R1s are independently a methyl group or an ethyl group; Xs are independently a C1-10 linking group; and Zs are independently a C1-10 alkyl group or a phenyl group optionally having a substituent, where X optionally contains at least one oxygen atom or sulfur atom in the main chain thereof, and when Z is an alkyl group, at least one hydrogen atom of the alkyl group is optionally substituted with a fluorine atom] and an organic solvent.
摘要翻译： 提供了在基材上形成单层或多层的组合物。 用于形成单层的组合物或含有式（1A）或式（1B）的硅烷化合物的多层：[其中R 1独立地是甲基或乙基; X独立地为C1-10连接基团; 并且Z独立地为C1-10烷基或任选具有取代基的苯基，其中X任选地在其主链中含有至少一个氧原子或硫原子，当Z为烷基时，至少一个氢原子 的烷基任选被氟原子取代]和有机溶剂。
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公开(公告)号：US20130216956A1
公开(公告)日：2013-08-22
申请号：US13879125
申请日：2011-10-07
申请人： Takahiro Kishioka , Daisuke Sakuma , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
发明人： Takahiro Kishioka , Daisuke Sakuma , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
CPC分类号： G03F7/0752 , C07F7/1804 , C08G77/28 , C09D183/08 , G03F7/0751 , G03F7/165 , G03F7/20 , G03F7/30
摘要： There is provided a composition for forming a monolayer or a multilayer on the substrate. A composition for forming a monolayer or a multilayer containing a silane compound of Formula (1A) or Formula (1B): [where R1s are independently a methyl group or an ethyl group; Xs are independently a C1-10 linking group; and Zs are independently a C1-10 alkyl group or a phenyl group optionally having a substituent, where X optionally contains at least one oxygen atom or sulfur atom in the main chain thereof, and when Z is an alkyl group, at least one hydrogen atom of the alkyl group is optionally substituted with a fluorine atom] and an organic solvent.
摘要翻译： 提供了在基材上形成单层或多层的组合物。 用于形成单层的组合物或含有式（1A）或式（1B）的硅烷化合物的多层：[其中R 1独立地是甲基或乙基; X独立地为C1-10连接基团; 并且Z独立地为C1-10烷基或任选具有取代基的苯基，其中X任选地在其主链中含有至少一个氧原子或硫原子，当Z为烷基时，至少一个氢原子 的烷基任选被氟原子取代]和有机溶剂。
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7.发明申请COMPOSITION FOR FORMATION OF PHOTOSENSITIVE RESIST UNDERLAYER FILM AND METHOD FOR FORMATION OF RESIST PATTERN 审中-公开用于形成感光性电阻膜的组合物和形成电阻图案的方法公开(公告)号：US20120288795A1
公开(公告)日：2012-11-15
申请号：US13522392
申请日：2010-11-16
申请人： Makiko Umezaki , Takahiro Kishioka , Yusuke Horiguchi , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
发明人： Makiko Umezaki , Takahiro Kishioka , Yusuke Horiguchi , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
CPC分类号： G03F7/0397 , G03F7/0392 , G03F7/0955
摘要： A composition for forming a photosensitive resist underlayer film and a method for forming a resist pattern. The composition for forming a photosensitive resist underlayer film includes a polymer having a structural unit of Formula (1), a compound having at least two vinyl ether groups, a photo-acid generator; and a solvent: where R1 is a hydrogen atom or a methyl group, R2 is a C1-4 alkyl group, and i is an integer of 0 to 4.
摘要翻译： 用于形成光致抗蚀剂下层膜的组合物和形成抗蚀剂图案的方法。 用于形成光敏抗蚀剂下层膜的组合物包括具有式（1）结构单元的聚合物，具有至少两个乙烯基醚基团的化合物，光酸产生剂; 和溶剂：其中R1是氢原子或甲基，R2是C1-4烷基，i是0-4的整数。
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公开(公告)号：US08685615B2
公开(公告)日：2014-04-01
申请号：US12817648
申请日：2010-06-17
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/091 , G03F7/095
摘要： A resist underlayer film forming composition used in a lithography process includes: a polymer (A) containing a unit structure having a hydroxy group, a unit structure having a carboxy group, or combination thereof; a crosslinkable compound (B) having at least two vinyl ether groups; a photoacid generator (C); a C4-20 fluoroalkylcarboxylic acid or a salt of the fluoroalkylcarboxylic acid (D); and a solvent (E). The polymer (A) includes a unit structure selected from unit structures of Formula (1), Formula (2), and Formula (3);
摘要翻译： 在光刻工艺中使用的抗蚀剂下层膜形成组合物包括：含有具有羟基的单元结构的聚合物（A），具有羧基的单元结构或其组合; 具有至少两个乙烯基醚基团的交联性化合物（B） 光致酸发生器（C）; C4-20氟代烷基羧酸或氟烷基羧酸（D）的盐; 和溶剂（E）。 聚合物（A）包括选自式（1），式（2）和式（3）的单元结构的单元结构;
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公开(公告)号：US20110311915A1
公开(公告)日：2011-12-22
申请号：US12817648
申请日：2010-06-17
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/091 , G03F7/095
摘要： A resist underlayer film forming composition used in a lithography process includes: a polymer (A) containing a unit structure having a hydroxy group, a unit structure having a carboxy group, or combination thereof; a crosslinkable compound (B) having at least two vinyl ether groups; a photoacid generator (C); a C4-20 fluoroalkylcarboxylic acid or a salt of the fluoroalkylcarboxylic acid (D); and a solvent (E). The polymer (A) includes a unit structure selected from unit structures of Formula (1), Formula (2), and Formula (3);
摘要翻译： 在光刻工艺中使用的抗蚀剂下层膜成膜组合物包括：含有具有羟基的单元结构的聚合物（A），具有羧基的单元结构或其组合; 具有至少两个乙烯基醚基团的交联性化合物（B） 光致酸发生器（C）; C4-20氟代烷基羧酸或氟烷基羧酸（D）的盐; 和溶剂（E）。 聚合物（A）包括选自式（1），式（2）和式（3）的单元结构的单元结构;
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公开(公告)号：US07501229B2
公开(公告)日：2009-03-10
申请号：US10592805
申请日：2005-03-15
IPC分类号： G03F7/11 , C08L101/00 , H01L21/027
CPC分类号： G03F7/091 , C08G75/00 , C09D181/00 , C09D181/02 , H01L21/0276
摘要： There is provided an anti-reflective coating forming composition comprising a solid content and a solvent, wherein a proportion of sulfur atom in the solid content is 5 to 25 mass %. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as F2 excimer laser beam (wavelength 157 nm) or ArF excimer laser beam (wavelength 193 nm), etc.
摘要翻译： 提供了包含固体含量和溶剂的抗反射涂层形成组合物，其中固体含量中硫原子的比例为5〜25质量％。 由组合物获得的抗反射涂层对反射光具有很高的防止效果，不会与光致抗蚀剂混合，并且可以在光刻工艺中使用具有短波长的光，例如F2准分子激光束（波长157nm） 或ArF准分子激光束（波长193nm）等
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