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1.发明申请OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION AND AN OPTICAL SYSTEM WITH AT LEAST ONE OPTICAL ELEMENT 有权在欧盟和/或软X射线区域辐射的光学元件和具有至少一个光学元件的光学系统公开(公告)号：US20100067653A1
公开(公告)日：2010-03-18
申请号：US12625336
申请日：2009-11-24
申请人： Marco Wedowski , Markus Weiss , Stephan Mûllender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa , Nadyeh Shariloo
发明人： Marco Wedowski , Markus Weiss , Stephan Mûllender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa , Nadyeh Shariloo
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
摘要： An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
摘要翻译： 描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。 元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。 多层涂层的至少一层用作第一电容器电极。 在两个电容器电极之间提供至少一个电介质层。 还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。
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2.发明授权Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element 有权用于EUV和/或软X射线区域中的辐射的光学元件以及具有至少一个光学元件的光学系统公开(公告)号：US08164077B2
公开(公告)日：2012-04-24
申请号：US12625336
申请日：2009-11-24
申请人： Marco Wedowski , Nadyeh Shariloo, legal representative , Markus Weiss , Stephan Muellender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , Hubert Adriaan van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
发明人： Marco Wedowski , Markus Weiss , Stephan Muellender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , Hubert Adriaan van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
IPC分类号： G01J3/10
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
摘要： An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
摘要翻译： 描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。 元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。 多层涂层的至少一层用作第一电容器电极。 在两个电容器电极之间提供至少一个电介质层。 还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。
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3.发明授权Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element 有权用于EUV和/或软X射线区域中的辐射的光学元件以及具有至少一个光学元件的光学系统公开(公告)号：US07646004B2
公开(公告)日：2010-01-12
申请号：US11439854
申请日：2006-05-24
申请人： Marco Wedowski , Nadyeh Shariloo, legal representative , Markus Weiss , Stephan Müllender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H. A. van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
发明人： Marco Wedowski , Markus Weiss , Stephan Müllender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H. A. van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
IPC分类号： G01J3/10
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
摘要： An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
摘要翻译： 描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。 元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。 多层涂层的至少一层用作第一电容器电极。 在两个电容器电极之间提供至少一个电介质层。 还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。
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4.发明申请Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least on optical element 有权用于EUV和/或软X射线区域中的辐射的光学元件以及至少具有光学元件的光学系统公开(公告)号：US20070114466A1
公开(公告)日：2007-05-24
申请号：US11439854
申请日：2006-05-24
申请人： Marco Wedowski , Markus Weiss , Stephan Mullender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel Nijkerk , Fokko Wieringa , Nadyeh Shariloo
发明人： Marco Wedowski , Markus Weiss , Stephan Mullender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel Nijkerk , Fokko Wieringa , Nadyeh Shariloo
IPC分类号： G01J3/10
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
摘要： An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
摘要翻译： 描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。 元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。 多层涂层的至少一层用作第一电容器电极。 在两个电容器电极之间提供至少一个电介质层。 还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。
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公开(公告)号：US20090015951A1
公开(公告)日：2009-01-15
申请号：US12196618
申请日：2008-08-22
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译： 一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。 投影物镜（22）包括至少一个镜子（M1至M6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。 测量预组装的投影物镜的第一成像像差。 在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。 如果反射镜（M1至M6）对于没有涂层（26）的投影光不反射，则使用具有另一波长的测量光。 或者，可以提供两个相同的反射镜支撑件（246）。 具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。 另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。
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公开(公告)号：US07429116B2
公开(公告)日：2008-09-30
申请号：US11014537
申请日：2004-12-16
IPC分类号： G02B7/182
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译： 一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。 投影物镜（22）包括至少一个镜子（M 1至M 6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。 测量预组装的投影物镜的第一成像像差。 在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。 如果反射镜（M 1至M 6）对于没有涂层（26）的投射光不反射，则使用具有另一波长的测量光。 或者，可以提供两个相同的反射镜支撑件（246）。 具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。 另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。
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公开(公告)号：US20050134980A1
公开(公告)日：2005-06-23
申请号：US11014537
申请日：2004-12-16
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10) is described. The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译： 描述了制造微光刻投影曝光装置（10）的投影物镜（22）的方法。 投影物镜（22）包括至少一个镜子（M 1至M 6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。 测量预组装的投影物镜的第一成像像差。 在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。 如果反射镜（M 1至M 6）对于没有涂层（26）的投射光不反射，则使用具有另一波长的测量光。 或者，可以提供两个相同的反射镜支撑件（246）。 具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。 另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。
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8.发明授权Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system 有权用于清洁光刻投影装置的部件的表面的方法，光刻投影装置，装置制造方法和清洁系统公开(公告)号：US07116394B2
公开(公告)日：2006-10-03
申请号：US10738976
申请日：2003-12-19
申请人： Levinus Pieter Bakker , Ralph Kurt , Bastiaan Matthias Mertens , Markus Weiss , Johann Trenkler , Wolfgang Singer
发明人： Levinus Pieter Bakker , Ralph Kurt , Bastiaan Matthias Mertens , Markus Weiss , Johann Trenkler , Wolfgang Singer
CPC分类号： G03F7/70916 , B08B6/00 , B08B7/0035 , G03F7/70925
摘要： A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.
摘要翻译： 公开了一种用于去除光刻投影装置中的部件表面的至少一部分的污染物的清洁系统。 清洁系统包括产生电场以在组件的表面附近提供清洁颗粒的电场发生器。
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公开(公告)号：US07952797B2
公开(公告)日：2011-05-31
申请号：US12399775
申请日：2009-03-06
申请人： Johann Trenkler , Hans-Jürgen Mann , Udo Nothelfer
发明人： Johann Trenkler , Hans-Jürgen Mann , Udo Nothelfer
IPC分类号： F21V9/06
CPC分类号： G02B5/0891 , B82Y10/00 , G02B5/0816 , G02B5/085 , G03F7/7015 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system consisting of at least one layer. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.
摘要翻译： 提供了包含一个这样的元件的反射光学元件和EUV光刻设备，该器具显示出低的污染倾向。 反射光学元件具有由至少一层组成的保护层系统。 保护层系统的光学特性在间隔物和吸收体的光学特性之间，或者对应于间隔物的光学特性。 选择具有尽可能小的虚部的材料和在折射率方面尽可能接近1的实部导致根据两个厚度之间的保护层系统的厚度d1的平台型反射率过程 和d2。 保护层系统的厚度选择为小于d2。
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公开(公告)号：US20060066940A1
公开(公告)日：2006-03-30
申请号：US11216560
申请日：2005-08-31
申请人： Johann Trenkler , Hans-Jurgen Mann , Udo Nothelfer
发明人： Johann Trenkler , Hans-Jurgen Mann , Udo Nothelfer
CPC分类号： G02B5/0891 , B82Y10/00 , G02B5/0816 , G02B5/085 , G03F7/7015 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： The invention relates to a reflective optical element and an EUV lithography appliance containing one such element, said appliance displaying a low propensity to contamination. According to the invention, the reflective optical element has a protective layer system consisting of at least one layer. The optical characteristics of the protective layer system are between those of a spacer and an absorber or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.
摘要翻译： 本发明涉及一种包含一种这样的元件的反射光学元件和EUV光刻器具，所述器具显示出低的污染倾向。 根据本发明，反射型光学元件具有由至少一层构成的保护层系统。 保护层系统的光学特性在间隔物和吸收体的光学特性之间，或对应于间隔物的光学特性。 在折射率方面选择具有尽可能小的虚部和实部尽可能接近1的材料导致根据保护层系统的厚度在两个厚度d之间的平台型反射率过程 1和d 2。 选择保护层系统的厚度使其小于d 2。
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