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    PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE
    5.
    发明申请
    PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE 审中-公开
    投影目标及其制造方法

    公开(公告)号：US20090015951A1

    公开(公告)日：2009-01-15

    申请号：US12196618

    申请日：2008-08-22

    申请人： Hans-Juergen Mann ,  Stephan Muellender ,  Johann Trenkler ,  Hartmut Enkisch

    发明人： Hans-Juergen Mann ,  Stephan Muellender ,  Johann Trenkler ,  Hartmut Enkisch

    IPC分类号： G02B7/182 ,  G03B27/54

    CPC分类号： G03F7/706 ,  G02B5/0891 ,  G02B17/0663 ,  G03F7/70958 ,  G21K2201/067 ,  Y10S359/90

    摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.

    摘要翻译： 一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。 投影物镜（22）包括至少一个镜子（M1至M6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。 测量预组装的投影物镜的第一成像像差。 在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。 如果反射镜（M1至M6）对于没有涂层（26）的投影光不反射，则使用具有另一波长的测量光。 或者，可以提供两个相同的反射镜支撑件（246）。 具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。 另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

    Projection objective and method for its manufacture
    6.
    发明授权
    Projection objective and method for its manufacture 有权
    投影目的及其制造方法

    公开(公告)号：US07429116B2

    公开(公告)日：2008-09-30

    申请号：US11014537

    申请日：2004-12-16

    申请人： Hans-Juergen Mann ,  Stephan Muellender ,  Johann Trenkler ,  Hartmut Enkisch

    发明人： Hans-Juergen Mann ,  Stephan Muellender ,  Johann Trenkler ,  Hartmut Enkisch

    IPC分类号： G02B7/182

    CPC分类号： G03F7/706 ,  G02B5/0891 ,  G02B17/0663 ,  G03F7/70958 ,  G21K2201/067 ,  Y10S359/90

    摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.

    摘要翻译： 一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。 投影物镜（22）包括至少一个镜子（M 1至M 6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。 测量预组装的投影物镜的第一成像像差。 在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。 如果反射镜（M 1至M 6）对于没有涂层（26）的投射光不反射，则使用具有另一波长的测量光。 或者，可以提供两个相同的反射镜支撑件（246）。 具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。 另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

    Projection objective and method for its manufacture
    7.
    发明申请
    Projection objective and method for its manufacture 有权
    投影目的及其制造方法

    公开(公告)号：US20050134980A1

    公开(公告)日：2005-06-23

    申请号：US11014537

    申请日：2004-12-16

    申请人： Hans-Juergen Mann ,  Stephan Muellender ,  Johann Trenkler ,  Hartmut Enkisch

    发明人： Hans-Juergen Mann ,  Stephan Muellender ,  Johann Trenkler ,  Hartmut Enkisch

    IPC分类号： G02B1/10 ,  G02B5/08 ,  G02B17/06 ,  G03F7/20 ,  G02B26/08

    CPC分类号： G03F7/706 ,  G02B5/0891 ,  G02B17/0663 ,  G03F7/70958 ,  G21K2201/067 ,  Y10S359/90

    摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10) is described. The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.

    摘要翻译： 描述了制造微光刻投影曝光装置（10）的投影物镜（22）的方法。 投影物镜（22）包括至少一个镜子（M 1至M 6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。 测量预组装的投影物镜的第一成像像差。 在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。 如果反射镜（M 1至M 6）对于没有涂层（26）的投射光不反射，则使用具有另一波长的测量光。 或者，可以提供两个相同的反射镜支撑件（246）。 具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。 另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

    Mirror for use in a microlithography projection exposure apparatus
    8.
    发明授权
    Mirror for use in a microlithography projection exposure apparatus 有权
    用于微光刻投影曝光装置的镜子

    公开(公告)号：US09568845B2

    公开(公告)日：2017-02-14

    申请号：US13417510

    申请日：2012-03-12

    申请人： Martin Rocktaeschel ,  Hartmut Enkisch ,  Franz-Josef Stickel ,  Oliver Natt ,  Hans-Juergen Mann ,  Sascha Migura

    发明人： Martin Rocktaeschel ,  Hartmut Enkisch ,  Franz-Josef Stickel ,  Oliver Natt ,  Hans-Juergen Mann ,  Sascha Migura

    IPC分类号： G03B27/68 ,  G03B27/52 ,  G03B27/54 ,  G03F7/20 ,  G02B5/08

    CPC分类号： G03F7/70958 ,  G02B5/0833 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70316

    摘要： A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second material layers, arranged one above another. The refractive index of the first material for radiation in the range of 5-30 nm is greater than the refractive index of the second material in that wavelength range. The first group of layers is configured to have a number of layers that is greater than 20, such that, upon irradiation with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers, which has a layer thickness variation for correcting the surface form of the mirror.

    摘要翻译： 一种包括基板和反射涂层的反射镜，其包括布置在基板和第一组层之间的第一组层和第二组层。 第一组和第二组都包括多个交替的第一材料层和第二材料层，其彼此排列。 用于5-30nm范围内的辐射的第一材料的折射率大于在该波长范围内的第二材料的折射率。 第一组层被配置为具有大于20的多个层，使得当辐射具有在5-30nm范围内的波长的辐射时，少于20％的辐射达到第二组 层，其具有用于校正反射镜的表面形式的层厚度变化。

    Lens made of a crystalline material
    9.
    发明申请
    Lens made of a crystalline material 有权
    透镜由结晶材料制成

    公开(公告)号：US20050170748A1

    公开(公告)日：2005-08-04

    申请号：US10983569

    申请日：2004-11-08

    申请人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

    发明人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

    IPC分类号： G02B17/08 ,  B24B49/00 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G03F7/70966 ,  B24B13/00 ,  G02B1/02 ,  G02B3/00

    摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.

    摘要翻译： 作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。 作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。 然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。 随后，将标记施加到光学毛坯或光学毛坯的安装元件。 标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

    IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION
    10.
    发明申请
    IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION 有权
    成像光学系统和投影曝光安装

    公开(公告)号：US20100265481A1

    公开(公告)日：2010-10-21

    申请号：US12767627

    申请日：2010-04-26

    申请人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Stephan Muellender ,  Hartmut Enkisch

    发明人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Stephan Muellender ,  Hartmut Enkisch

    IPC分类号： G03F7/20 ,  G02B17/06 ,  G21K1/06 ,  G03B27/70

    CPC分类号： G02B5/0891 ,  G02B13/143 ,  G02B17/06 ,  G03F7/70175 ,  G03F7/70233

    摘要： An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.

    摘要翻译： 成像光学系统具有多个反射镜。 这些图像将物体平面中的对象场映射成图像平面中的图像场。 在成像光学系统中，成像光在镜面反射面上的最大入射角与成像光学系统的像侧数值孔径之比小于33.8°。 这可以导致成像光学系统，其为反射镜的反射涂层提供了良好的条件，通过该成像光学系统可以实现低反射损失，用于在通过成像光学系统时成像光，特别是甚至在EUV范围的波长 小于10nm。