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    Anamorphotic telescope
    5.
    发明授权
    Anamorphotic telescope 有权
    变形望远镜

    公开(公告)号：US09304300B2

    公开(公告)日：2016-04-05

    申请号：US13816531

    申请日：2011-08-12

    申请人： Huibert Visser ,  Borgert Kruizinga ,  Michiel David Nijkerk

    发明人： Huibert Visser ,  Borgert Kruizinga ,  Michiel David Nijkerk

    IPC分类号： G01J3/28 ,  G02B13/12 ,  G02B17/06 ,  G02B23/06 ,  G02B13/08

    CPC分类号： G02B13/12 ,  G02B13/08 ,  G02B17/0621 ,  G02B23/06

    摘要： An anamorphotic telescope has mutually different magnification along directions of minimum and maximum magnification in an image plane. A spectroscope with an elongated input slit directed along one of the directions of maximum and minimum magnification may be located in the image plane. The anamorphotic telescope has a first and second reflector lens with mutually different first and second radii of curvature in directions (y, x) that optically correspond to directions of minimum and maximum magnification. At least one of the first and second reflector lens has a variable radius of curvature in one direction (x), which varies as a function of position in the other direction (y), the variable radius of curvature decreasing in a direction of the angle from the view direction to the light directed by the first reflector lens to the second reflector lens.

    摘要翻译： 变形望远镜在图像平面中沿着最小和最大倍率的方向具有相互不同的放大倍数。 具有沿着最大和最小放大倍数的方向指向的细长输入狭缝的分光镜可以位于图像平面中。 变形望远镜具有第一和第二反射器透镜，其在与最小和最大放大倍率的方向光学对应的方向（y，x）上具有相互不同的第一和第二曲率半径。 第一和第二反射器透镜中的至少一个在一个方向（x）上具有可变的曲率半径，其在另一方向（y）上作为位置的函数而变化，可变曲率半径在角度方向上减小 从观察方向到由第一反射器透镜指向的光到第二反射器透镜。

    ANAMORPHOTIC TELESCOPE
    7.
    发明申请
    ANAMORPHOTIC TELESCOPE 有权
    人造丝

    公开(公告)号：US20130293885A1

    公开(公告)日：2013-11-07

    申请号：US13816531

    申请日：2011-08-12

    申请人： Huibert Visser ,  Borgert Kruizinva ,  Michiel David Nijkerk

    发明人： Huibert Visser ,  Borgert Kruizinva ,  Michiel David Nijkerk

    IPC分类号： G02B13/12

    CPC分类号： G02B13/12 ,  G02B13/08 ,  G02B17/0621 ,  G02B23/06

    摘要： An anamorphotic telescope has mutually different magnification along directions of minimum and maximum magnification in an image plane. A spectroscope with an elongated input slit directed along one of the directions of maximum and minimum magnification may be located in the image plane. The anamorphotic telescope has a first and second reflector lens with mutually different first and second radii of curvature in directions (y, x) that optically correspond to directions of minimum and maximum magnification. At least one of the first and second reflector lens has a variable radius of curvature in one direction (x), which varies as a function of position in the other direction (y), the variable radius of curvature decreasing in a direction of the angle from the view direction to the light directed by the first reflector lens to the second reflector lens.

    摘要翻译： 变形望远镜在图像平面中沿着最小和最大倍率的方向具有相互不同的放大倍数。 具有沿着最大和最小放大倍数的方向指向的细长输入狭缝的分光镜可以位于图像平面中。 变形望远镜具有第一和第二反射器透镜，其在与最小和最大放大倍率的方向光学对应的方向（y，x）上具有相互不同的第一和第二曲率半径。 第一和第二反射器透镜中的至少一个在一个方向（x）上具有可变的曲率半径，其在另一方向（y）上作为位置的函数而变化，可变曲率半径在角度方向上减小 从观察方向到由第一反射器透镜指向的光到第二反射器透镜。

    Lithographic apparatus and device manufacturing method
    8.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US07379153B2

    公开(公告)日：2008-05-27

    申请号：US10356727

    申请日：2003-02-03

    申请人： Johannes Gerardus Gijsbertsen ,  Pieter Willem Horman De Jager ,  Michiel David Nijkerk

    发明人： Johannes Gerardus Gijsbertsen ,  Pieter Willem Horman De Jager ,  Michiel David Nijkerk

    IPC分类号： G03B27/00 ,  G01J1/00

    CPC分类号： G03F9/7053

    摘要： A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and beam of radiation, and is an off-axis alignment sensor.

    摘要翻译： 光刻投影装置包括一个对准传感器，该对准传感器具有一个电子束源，该电子束源被构造和布置成提供一个电子束，用于冲击基板上的一个对准标记;以及一个后向散射电子检测器，被构造和布置成检测从该对准反向散射的电子 标记。 对准传感器与投影系统和辐射束无关，是离轴对准传感器。

    Method of inspecting a specimen surface, apparatus and use of fluorescent material
    9.
    发明授权
    Method of inspecting a specimen surface, apparatus and use of fluorescent material 有权
    检测样品表面，设备和使用荧光材料的方法

    公开(公告)号：US07732762B2

    公开(公告)日：2010-06-08

    申请号：US11572398

    申请日：2005-07-21

    申请人： Michiel David Nijkerk ,  Pieter Kruit

    发明人： Michiel David Nijkerk ,  Pieter Kruit

    IPC分类号： G01N23/00

    CPC分类号： H01J37/244 ,  G01N23/2251 ,  H01J37/22 ,  H01J37/28 ,  H01J2237/1503 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/2482

    摘要： The invention relates to a method of inspecting a specimen surface. The method comprises the steps of generating a plurality of primary beams directed towards the specimen surface, focussing the plurality of primary beams onto respective loci on the specimen surface, collecting a plurality of secondary beams of charged particles originating from the specimen surface upon incidence of the primary beams, converting at least one of the collected secondary beams into an optical beam, and detecting the optical beam.

    摘要翻译： 本发明涉及一种检查样品表面的方法。 该方法包括以下步骤：产生指向样品表面的多个主光束，将多个主光束聚焦在样品表面上的相应位置上，在发射的样品表面上收集多个源自样品表面的带电粒子的次光束 主波束，将所收集的次波束中的至少一个转换成光束，以及检测光束。