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公开(公告)号：US08067578B2
公开(公告)日：2011-11-29
申请号：US12634475
申请日：2009-12-09
申请人： Martin J Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin J Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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2.发明授权Methods for photolithographic synthesis of polymer arrays utilizing anti-reflective coatings 失效使用抗反射涂层的光刻合成聚合物阵列的方法公开(公告)号：US08309496B2
公开(公告)日：2012-11-13
申请号：US13273399
申请日：2011-10-14
申请人： Martin J. Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin J. Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US20100331217A1
公开(公告)日：2010-12-30
申请号：US12634475
申请日：2009-12-09
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US5959098A
公开(公告)日：1999-09-28
申请号：US634053
申请日：1996-04-17
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , Macdonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , Macdonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
IPC分类号： C12N15/09 , B01J19/00 , C07B61/00 , C07H21/00 , C07K1/00 , C07K1/04 , C12Q1/68 , C40B40/06 , C40B40/10 , C40B60/14 , G01N33/53 , G01N37/00 , C08G63/48 , G01N33/543
CPC分类号： C07K1/047 , B01J19/0046 , B82Y30/00 , C07H21/00 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , C07B2200/11 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
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公开(公告)号：US20120071361A1
公开(公告)日：2012-03-22
申请号：US13273399
申请日：2011-10-14
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US20090062148A1
公开(公告)日：2009-03-05
申请号：US11500411
申请日：2006-08-08
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn Mcgall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn Mcgall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US06706875B1
公开(公告)日：2004-03-16
申请号：US09716507
申请日：2000-11-20
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
IPC分类号： C07H2100
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。本发明的方法将高通量工艺步骤与高分辨率光刻技术相结合 聚合物阵列的制造。
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公开(公告)号：US06307042B1
公开(公告)日：2001-10-23
申请号：US09244568
申请日：1999-02-04
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
IPC分类号： C12Q168
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US20060160099A1
公开(公告)日：2006-07-20
申请号：US11015257
申请日：2004-12-16
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
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公开(公告)号：US20050181396A1
公开(公告)日：2005-08-18
申请号：US11016629
申请日：2004-12-17
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard Rava
IPC分类号： B01J19/00 , C07B61/00 , C07H21/00 , C07K1/04 , C40B40/06 , C40B40/10 , C40B60/14 , C12Q1/68 , B05D3/00 , C12M1/34
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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