公开(公告)号：US07230254B2

公开(公告)日：2007-06-12

申请号：US11231791

申请日：2005-09-22

申请人： Martinus Arnoldus Henricus Terken ,  Hernes Jacobs ,  Harmen Klaas Van Der Schoot ,  Petrus Matthijs Henricus Vosters ,  Koen Jacobus Johannes Maria Zaal

发明人： Martinus Arnoldus Henricus Terken ,  Hernes Jacobs ,  Harmen Klaas Van Der Schoot ,  Petrus Matthijs Henricus Vosters ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G21K5/10

CPC分类号： G03F7/70716

摘要： A movable carriage for moving an article support member in a lithographic apparatus is provided. The article support member is constructed and arranged to move and support an article to be placed in a beam path of the lithographic apparatus. The carriage includes a compartmented composite structure.

摘要翻译： 提供了用于在光刻设备中移动物品支撑构件的可动托架。 物品支撑构件被构造和布置成移动和支撑待放置在光刻设备的光束路径中的物品。 托架包括隔层复合结构。

公开(公告)号：US07492440B2

公开(公告)日：2009-02-17

申请号：US10936712

申请日：2004-09-09

申请人： Koen Jacobus Johannes Maria Zaal ,  Edwin Johan Buis ,  Henrikus Herman Marie Cox ,  Noud Jan Gilissen ,  Harmen Klaas Van Der Schoot

发明人： Koen Jacobus Johannes Maria Zaal ,  Edwin Johan Buis ,  Henrikus Herman Marie Cox ,  Noud Jan Gilissen ,  Harmen Klaas Van Der Schoot

IPC分类号： G02B27/52 ,  G02B27/42 ,  H02K41/00

CPC分类号： G03F7/70716 ,  G03F7/709

摘要： A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.

摘要翻译： 在光刻设备中使用的基板或图案形成装置以及光刻装置的制造方法。 衬底和图案形成装置相对于图案化束对准并且由支撑件可移动地支撑。 然而，所述支撑件中的共振可能使制造的装置不可用和/或可能使控制系统复杂化。 因此，具有耦合到支撑件的柔性耦合装置的致动器组件框架设置有多个致动器，其构造成以多个自由度移动支撑件。 因此，谐振被柔性耦合装置阻尼，导致用于控制系统的较大带宽，从而使得支撑件具有更好的位置精度。

公开(公告)号：US20110242518A1

公开(公告)日：2011-10-06

申请号：US13050667

申请日：2011-03-17

申请人： Theodorus Petrus Maria Cadee ,  Jan Jaap Kuit ,  Johannes Catharinus Hubertus Mulkens ,  Koen Jacobus Johannes Maria Zaal

发明人： Theodorus Petrus Maria Cadee ,  Jan Jaap Kuit ,  Johannes Catharinus Hubertus Mulkens ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G03B27/58

CPC分类号： G03B21/58 ,  G03F7/70733

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 至少三个衬底台，其被构造成保持衬底; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述基板台可在基本上在垂直于所述图案化的辐射束的平面中延伸的公共移动区域中移动，所述移动区域包括至少三个工作 布置其至少一个工作位置的位置用于将衬底暴露于图案化的辐射束，并且至少一个工作位置被布置用于非曝光目的。

公开(公告)号：US07528935B2

公开(公告)日：2009-05-05

申请号：US11312654

申请日：2005-12-21

申请人： Koen Jacobus Johannes Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Hendricus Johannes Maria Meijer ,  Joost Jeroen Ottens ,  Marco Le Kluse ,  Jan Hopman

发明人： Koen Jacobus Johannes Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Hendricus Johannes Maria Meijer ,  Joost Jeroen Ottens ,  Marco Le Kluse ,  Jan Hopman

IPC分类号： G03B27/58 ,  G03B27/62 ,  H01T23/00

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于调节辐射束的照明器和物品保持器。 物品保持器包括多个突出部，其布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品。 这些突起通常在第一距离处等距离间隔开。 物品保持器还包括用于将物品夹持到保持器的一对电极。 电极设置在突起上方或下方的基本上相同的平面中，并且通过间隙彼此间隔开。 位于间隙的相对侧上的多个突起内的相邻突起被间隔开大于第一距离的第二距离。

公开(公告)号：US20080240501A1

公开(公告)日：2008-10-02

申请号：US11730190

申请日：2007-03-29

申请人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

发明人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G06K9/46

CPC分类号： G03F7/7085 ,  G03F7/70425 ,  G03F7/70775 ,  G03F7/70783

摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

摘要翻译： 编码器型测量系统被配置为测量可移动物体的位置相关信号，所述测量系统包括可安装在可移动物体上的至少一个传感器，可安装在基本上固定的框架上的传感器目标物体，以及安装装置， 传感器目标物体在基本上固定的框架上。 测量系统还包括补偿装置，其被配置为补偿传感器目标物体相对于基本上静止的框架的运动和/或变形。 补偿装置可以包括无源或主动阻尼装置和/或反馈位置控制系统。 在替代实施例中，补偿装置包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。

公开(公告)号：US07423725B2

公开(公告)日：2008-09-09

申请号：US11516050

申请日：2006-09-06

申请人： Koen Jacobus Johannes Maria Zaal ,  Antonius Johannes De Kort ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Hermen Folken Pen

发明人： Koen Jacobus Johannes Maria Zaal ,  Antonius Johannes De Kort ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Hermen Folken Pen

IPC分类号： G03B27/42

CPC分类号： G03F7/70633 ,  G03F7/70341 ,  G03F7/7045 ,  G03F7/70458

摘要： In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using, for example, normal and reversed meanders. The two data sets can then be used to eliminate effects due to substrate cooling.

摘要翻译： 在浸没式光刻设备的叠加性能的校准中，使用例如正常和反向蜿蜒进行的曝光获得两组覆盖数据。 然后可以使用两个数据集来消除由于衬底冷却引起的影响。

公开(公告)号：US07411657B2

公开(公告)日：2008-08-12

申请号：US10990323

申请日：2004-11-17

申请人： Joost Jeroen Ottens ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders ,  Koen Jacobus Johannes Maria Zaal

发明人： Joost Jeroen Ottens ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

公开(公告)号：US07187433B2

公开(公告)日：2007-03-06

申请号：US11099650

申请日：2005-04-06

申请人： Joost Jeroen Ottens ,  Hendrik Antony Johannes Neerhof ,  Koen Jacobus Johannes Maria Zaal ,  Marco Le Kluse

发明人： Joost Jeroen Ottens ,  Hendrik Antony Johannes Neerhof ,  Koen Jacobus Johannes Maria Zaal ,  Marco Le Kluse

IPC分类号： G03B27/58 ,  G03B27/62 ,  G03B27/42

CPC分类号： H01L21/6831 ,  G03F7/707 ,  G03F7/70708

摘要： An electrostatic clamp assembly for a lithographic apparatus is provided. The clamp assembly includes an electrostatic clamp structured to clamp an article against an article support structure during projection of a beam of radiation, and a controller structured to control at least one of the clamp and a backfill gas pressure to release the article from the article support structure by use of the backfill gas pressure.

摘要翻译： 提供了一种用于光刻设备的静电夹持组件。 夹具组件包括静电夹具，其被构造成在辐射束投影期间将制品夹紧在物品支撑结构上;以及控制器，其被构造成控制夹具和回填气体压力中的至少一个以将物品从物品支撑件 结构通过使用回填气压力。

公开(公告)号：US07133120B2

公开(公告)日：2006-11-07

申请号：US10837914

申请日：2004-05-04

申请人： Koen Jacobus Johannes Maria Zaal ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Joost Jeroen Ottens

发明人： Koen Jacobus Johannes Maria Zaal ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Joost Jeroen Ottens

IPC分类号： G03B27/62 ,  G03B27/58

CPC分类号： G03F7/707

摘要： A lithographic apparatus having an illumination system for providing a projection beam of radiation; an article support member for supporting an article to be placed in a beam path of the projection beam of radiation on the article support; and a clamp for providing a clamping pressure for clamping the article against the article support during projection. The article support member includes a section that is trimmed for locally adjusting a clamping pressure.

摘要翻译： 一种具有用于提供投影射线束的照明系统的光刻设备; 物品支撑构件，用于支撑将物品放置在所述物品支撑件上的所述投影射束的光束路径中; 以及用于在投影期间提供用于将物品夹紧在物品支撑件上的夹紧压力的夹具。 物品支撑构件包括用于局部调整夹紧压力的部分。

公开(公告)号：US08616598B2

公开(公告)日：2013-12-31

申请号：US13081919

申请日：2011-04-07

申请人： Theodorus Petrus Maria Cadee ,  Koen Jacobus Johannes Maria Zaal ,  Timo Hol ,  Michael Wilhelmus Theodorus Koot

发明人： Theodorus Petrus Maria Cadee ,  Koen Jacobus Johannes Maria Zaal ,  Timo Hol ,  Michael Wilhelmus Theodorus Koot

IPC分类号： B25J15/06

CPC分类号： H01L21/68785 ,  G03F7/7075 ,  H01L21/6838

摘要： An apparatus configured to handle an object in a contactless manner, the apparatus includes a carrying body having a carrying surface which is configured to be directed towards the object, the carrying surface being provided with a plurality of traction members and a plurality of overpressure members, each overpressure member being provided with at least one exhaust opening, each traction member being provided with an indentation and at least two suction openings that are arranged in the indentation, the at least two suction openings of each traction member being configured to generate a pressure gradient between them so as to create a traction fluid flow in the indentation in a direction substantially parallel to the carrying surface; and a pressure controller configured to control the pressure gradient between the at least two suction openings of each traction member.

摘要翻译： 一种被配置为以非接触方式处理物体的装置，该装置包括：承载体，其具有构造成朝向物体的承载表面，承载表面设置有多个牵引构件和多个超压构件， 每个超压构件设置有至少一个排气口，每个牵引构件设置有凹陷和布置在凹陷中的至少两个抽吸开口，每个牵引构件的至少两个抽吸孔构造成产生压力梯度 在它们之间以在基本上平行于承载表面的方向上在压痕中产生牵引流体流动; 以及压力控制器，被配置为控制每个牵引构件的至少两个吸入口之间的压力梯度。