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12 条记录 (耗时 0.03 秒)

    Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductor devices
    4.
    发明授权
    Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductor devices 失效
    用于稳定诸如光学元件的物体形状的方法和装置，以及使用其的曝光装置和制造半导体器件的方法

    公开(公告)号：US5390228A

    公开(公告)日：1995-02-14

    申请号：US270794

    申请日：1994-07-05

    申请人： Masahito Niibe ,  Yasuaki Fukuda ,  Masami Hayashida

    发明人： Masahito Niibe ,  Yasuaki Fukuda ,  Masami Hayashida

    IPC分类号： G03F7/20 ,  G21K5/02

    CPC分类号： G03F7/70008 ,  G03F7/20 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70266 ,  G03F7/70866 ,  G03F7/70875 ,  G03F7/70891

    摘要： A temperature distribution of an object, such as an optical element, onto which radiation energy is irradiated, is measured. The change of the shape of the object is controlled by varying the temperature of a part of the object on the basis of the measured temperature distribution to stabilize the shape of the object. Also, the shape of the object being irradiated is stabilized by causing the same temperature distribution in the object when in the thermally stable condition to be generated in the object while it is being irradiated. If the shapes of masks used to manufacture semiconductor devices are stabilized by using the above methods, highly integrated semiconductor devices can be manufactured.

    摘要翻译： 测量照射有辐射能量的物体（例如光学元件）的温度分布。 通过基于测量的温度分布改变物体的一部分的温度来控制物体的形状的变化，以稳定物体的形状。 此外，当被照射时，当在物体中产生热稳定状态时，通过引起物体中相同的温度分布来稳定被照射物体的形状。 如果通过使用上述方法使用于制造半导体器件的掩模的形状稳定，则可以制造高度集成的半导体器件。

    X-ray exposure apparatus
    5.
    发明授权
    X-ray exposure apparatus 失效
    X射线曝光装置

    公开(公告)号：US5335259A

    公开(公告)日：1994-08-02

    申请号：US15434

    申请日：1993-02-09

    申请人： Masami Hayashida ,  Yasuaki Fukuda ,  Yutaka Watanabe

    发明人： Masami Hayashida ,  Yasuaki Fukuda ,  Yutaka Watanabe

    IPC分类号： G03F7/20 ,  G21K1/10 ,  H01L21/027 ,  G21K1/00

    CPC分类号： G03F7/70808 ,  G21K1/10

    摘要： An X-ray apparatus includes an X-ray pickup window through which synchrotron radiation light is projected, the X-ray pickup window having an X-ray transmission film; and a correcting system for correcting an intensity distribution of the synchrotron radiation light; wherein the X-ray transmission film has at least one of a film thickness distribution and a transmissivity distribution changing substantially in a predetermined direction; and wherein the X-ray transmission film is so disposed that the predetermined direction is substantially aligned with the direction of change of the intensity distribution of the synchrotron radiation light.

    摘要翻译： X射线装置包括X射线拾取窗口，X射线拾取窗口通过其投影同步加速器辐射光，X射线拾取窗口具有X射线透射膜; 以及用于校正同步加速器辐射光的强度分布的校正系统; 其中所述X射线透射膜具有基本上沿预定方向改变的膜厚度分布和透射率分布中的至少一个; 并且其中所述X射线透射膜被设置成使得所述预定方向基本上与所述同步加速器辐射光的强度分布的变化方向对准。

    X-ray lithography mask, light exposure apparatus and process therefore
    6.
    发明授权
    X-ray lithography mask, light exposure apparatus and process therefore 失效
    因此，X射线光刻掩模，曝光装置和工艺

    公开(公告)号：US5444753A

    公开(公告)日：1995-08-22

    申请号：US203752

    申请日：1994-03-01

    申请人： Masami Hayashida ,  Yutaka Watanabe

    发明人： Masami Hayashida ,  Yutaka Watanabe

    IPC分类号： G03F1/22 ,  G03F7/20 ,  H01L21/027 ,  G21K5/00

    CPC分类号： G03F7/70075 ,  G03F7/702

    摘要： Disclosed are an X-ray lithography mask, an exposure apparatus and an exposure process such as an X-ray lithography exposure apparatus and an X-ray lithography exposure process. An X-ray lithography mask includes an X-ray transmission membrane, a transfer pattern depicted on the X-ray transmission membrane and a frame for supporting the X-ray transmission membrane. The transfer pattern is depicted on the basis of a changing direction of a film thickness profile of the X-ray transmission membrane. In the exposure apparatus and process, a changing direction of an intensity profile of a radiation light illuminated on an exposure area of a mask is coincident with a changing direction of a film thickness profile of a light transmission membrane on the mask and an illumination time of the radiation light for the exposure area is changed on the basis of the intensity profile of the radiation light and the thickness profile of the light transmission membrane so that the intensity of a transfer patter image formed by the transmission of the radiation light through the light transmission membrane is rendered uniform.

    摘要翻译： 公开了X射线光刻掩模，曝光装置和曝光处理，例如X射线光刻曝光装置和X射线光刻曝光工艺。 X射线光刻掩模包括X射线透射膜，X射线透射膜上所示的转印图案和用于支撑X射线透过膜的框架。 基于X射线透过膜的膜厚分布的变化方向来描绘转印图案。 在曝光装置和处理中，照射在掩模的曝光区域上的辐射光的强度分布的改变方向与掩模上的透光膜的膜厚分布的变化方向一致，并且照射时间 基于辐射光的强度分布和透光膜的厚度分布来改变曝光区域的辐射光，使得通过透射光透过而形成的转印图案图像的强度 膜均匀。

    X-ray mirror, and x-ray exposure apparatus and device manufacturing method employing the same
    9.
    发明授权
    X-ray mirror, and x-ray exposure apparatus and device manufacturing method employing the same 失效
    X射线镜，X射线曝光装置及其制造方法

    公开(公告)号：US5461657A

    公开(公告)日：1995-10-24

    申请号：US266749

    申请日：1994-06-28

    申请人： Masami Hayashida ,  Yutaka Watanabe

    发明人： Masami Hayashida ,  Yutaka Watanabe

    IPC分类号： G03F7/20 ,  G21K1/06 ,  G21K1/00

    CPC分类号： G03F7/70058 ,  G03F7/708 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067

    摘要： An X-ray mirror has a silicon carbide substrate having a convex cylindrical surface, and a carbon layer coated on a surface of said substrate to a thickness ranging from 10 nm to 1 .mu.m by evaporation, such as CVD. In the X-ray mirror in which the carbon layer is coated thereon beforehand, changes in the intensity of reflected light, caused by a contaminating carbon layer attached to the surface of the mirror, can be restricted. When such a mirror is used in an X-ray lithographic apparatus, the number of times the intensity of X-rays is measured or corrected or the mirror is cleaned can be greatly reduced.

    摘要翻译： X射线镜具有具有凸圆柱形表面的碳化硅衬底和通过诸如CVD的蒸发在所述衬底的表面上涂覆至10nm至1μm的厚度的碳层。 在预先涂覆有碳层的X射线反射镜中，可以限制由附着在反射镜表面上的污染碳层引起的反射光强度的变化。 当在X射线光刻设备中使用这样的镜子时，可以大大减少测量或校正X射线强度或镜子被清洁的次数。