摘要:
A sealing apparatus, which provides a seal between a metal surface and a member sliding along the metal surface is made of rubber material which contains a rubber polymer having alkyl lateral chains. At least a part of alkyl group hydrogen of rubber polymer in cortex is substituted from fluorine by plasma treatment. The plasma treatment reduces the noise which is normally present in device as of this type.
摘要:
A master brake cylinder comprises a reservoir and a cylinder for generating fluid pressure. Provided in the cylinder is a sliding piston, and mounted to front and rear ends of piston are piston cups for sealing a gap between the piston and the cylinder. The piston cups comprise a substrate made of rubber and a coating layer made of diamond-like carbon and provided on an outer peripheral surface (sliding surface) of the substrate. A surface of the coating layer constitutes a sliding surface, and so a frictional resistance thereof relative to an inner peripheral surface of the cylinder, on which the coating layer slides, is made relatively low. The coating layer can easily follow deformation of the substrate and securely adheres to the substrate.
摘要:
Method and apparatus for improving the surface quality of a resin molding by treating it with a plasma gas, measuring and integrating ion density and stopping the treatment when the integration reaches a predetermined value.
摘要:
A method for manufacturing a resin product with a mold having at least two molds opposed to each other. Each of the molds 5 has a cavity surface defining a space therebetween. The method includes the steps of performing an ionic nitriding treatment to at least a part of at least one cavity surface to form fine projections and recesses therein. A nitride layer is provided on the one cavity surface. The method further includes filling the space with a plastic resin material, solidifying the resin material, and removing the solidified resin material from the mold.
摘要:
Method and apparatus for improving the surface quality of a resin molding by treating it with a plasma gas, measuring and integrating ion density and stopping the treatment when the integration reaches a predetermined value.
摘要:
A light emitting element has a well layer formed of a GaN-based semiconductor, a barrier layer next to the well layer, the barrier layer being formed of a GaN-based semiconductor, and a GaN-based semiconductor layer formed between the well layer and the barrier layer. The GaN-based semiconductor layer has a dopant to cancel a piezoelectric field caused between the well layer and the barrier layer.
摘要:
An insulation film 150 made of SiO2 is formed on a p-type layer 106, and a multiple thick film positive electrode 120, which is a metal film formed through metal deposition, is formed on the insulation film 150 and on the p-type layer 106 at the central portion of which has a window and is exposed. The insulation film 150 has a thickness of one fourth multiple of emission wavelength. Thickness of the insulation film 150 is generally determined by multiplying one fourth of intramedium emission wavelength by an odd number. By interference effect, directivity of radiated light along the optical axis direction can be improved.
摘要:
A first group III nitride compound layer, which is formed on a substrate by a method not using metal organic compounds as raw materials, is heated in an atmosphere of a mixture gas containing a hydrogen or nitrogen gas and an ammonia gas, so that the crystallinity of a second group III nitride compound semiconductor layer formed on the first group III nitride compound layer is improved. When the first group III nitride compound layer is formed on a substrate by a sputtering method, the thickness of the first group III nitride compound layer is set to be in a range of from 50 Å to 3000 Å.
摘要:
A group III nitride compound semiconductor device has a substrate and an AlN single crystal layer formed on the substrate. The AlN single crystal layer has a thickness of from 0.5 to 3 &mgr;m and has a substantially flat surface. The half-value width of an X-ray rocking curve of the AlN single crystal layer is not longer than 50 sec. In another device, a group III nitride compound semiconductor layer having a thickness of from 0.01 to 3.2 &mgr;m is grown at a temperature of from 1000 to 1180° C. on a sapphire substrate having a surface nitride layer having a thickness of not larger than 300 Å.
摘要:
An electrochromic element including a color-forming film and an electrolyte sandwiched between a pair of substrates each having a electrode film. Each electrode film is divided into a plurality of electrode pieces with micro grooves. One of the electrode films has its electrode pieces intersected with the electrode pieces of the other film so as to define a plurality of pairs of facing surfaces at intersecting portions. Resistors are connected between each of the electrode pieces and a power source to equalize values of current flowing between each of the pairs of the facing surfaces. The resistor may be an ordinary one, or resistance film made of conductive material, or a projected portion projecting from a longitudinal end of the electrode piece. A predetermined shape of cut-out is formed on the projected portion.