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    ERIOCITRIN-CONTAINING MATERIAL, METHOD FOR PRODUCTION OF THE ERIOCITRIN-CONTAINING MATERIAL, AND FOOD, BEVERAGE, PHARMACEUTICAL PREPARATION AND COSMETIC EACH COMPRISING THE EROCITRIN-CONTAINING MATERIAL
    1.
    发明申请
    ERIOCITRIN-CONTAINING MATERIAL, METHOD FOR PRODUCTION OF THE ERIOCITRIN-CONTAINING MATERIAL, AND FOOD, BEVERAGE, PHARMACEUTICAL PREPARATION AND COSMETIC EACH COMPRISING THE EROCITRIN-CONTAINING MATERIAL 有权
    含ERIOCITRIN的材料，含有含ERIITRIN的材料的生产方法，以及包含含EROCITRIN的材料的食品，饮料，药物制备和化妆品

    公开(公告)号：US20100256079A1

    公开(公告)日：2010-10-07

    申请号：US12740331

    申请日：2008-12-23

    申请人： Masanori Hiramitsu ,  Toshikazu Omori ,  Kenji Yamaguchi ,  Hiroaki Bessho

    发明人： Masanori Hiramitsu ,  Toshikazu Omori ,  Kenji Yamaguchi ,  Hiroaki Bessho

    IPC分类号： A61K31/7048 ,  A61P39/06

    CPC分类号： A61K31/7048 ,  A61K8/498 ,  A61K36/752 ,  A61Q19/00 ,  C07H17/07

    摘要： A process for producing an eriocitrin-containing material comprises the steps of: preparing an eriocitrin-containing citrus extract from a citrus fruit using an extractant; and separating eriocitrin from the citrus extract. The step of separating eriocitrin from the citrus extract comprises the steps of: bringing the citrus extract into contact with a porous synthetic adsorption resin such that eriocitrin in the citrus extract is adsorbed on the porous synthetic adsorption resin, the porous synthetic adsorption resin comprising a phenol-formaldehyde resin as a main framework and having amino and phenolic hydroxyl groups; and eluting the eriocitrin adsorbed on the porous synthetic adsorption resin using an elution solvent.

    摘要翻译： 一种用于产生含有黑色素的材料的方法包括以下步骤：使用提取剂从柑橘类水果制备含有黑色素的柑橘提取物; 并从柑橘提取物中分离出白藜芦醇。 从柑橘提取物中分离出白藜芦醇的步骤包括以下步骤：使柑橘提取物与多孔合成吸附树脂接触，使得柑橘提取物中的白藜芦醇吸附在多孔合成吸附树脂上，多孔合成吸附树脂包含苯酚 甲醛树脂为主要骨架，具有氨基和酚羟基; 并使用洗脱溶剂洗脱吸附在多孔合成吸附树脂上的白藜芦醇。

    Information processing apparatus displaying indices of video contents, information processing method and information processing program
    3.
    发明授权
    Information processing apparatus displaying indices of video contents, information processing method and information processing program 有权
    信息处理装置显示视频内容的索引，信息处理方法和信息处理程序

    公开(公告)号：US09172904B2

    公开(公告)日：2015-10-27

    申请号：US13360631

    申请日：2012-01-27

    申请人： Kenji Yamaguchi ,  Masaki Sato ,  Hidehito Taniura

    发明人： Kenji Yamaguchi ,  Masaki Sato ,  Hidehito Taniura

    IPC分类号： H04N5/77 ,  G11B27/10 ,  H04N9/82

    CPC分类号： G11B27/105 ,  H04N5/772 ,  H04N9/8227

    摘要： In order to quicken switching of indices and reduce the time required for display after switching, a mobile phone includes a video content specifying portion to specify at least one video content, an index element generating portion to generate a thumbnail for a video content when accepting a generation instruction and to stop generation of the thumbnail when accepting a cancellation instruction, an index element generation requesting portion, in response to the event that a video content is specified by the video content specifying portion, to output a generation instruction including identification information identifying the specified video content to the index element generating portion, and a cancellation instructing portion to output a cancellation instruction to stop generation of the thumbnail for the already specified video content when a new video content is specified before completion of generation of the thumbnail for the already specified video content.

    摘要翻译： 为了加快索引的切换和减少切换后显示所需的时间，移动电话包括指定至少一个视频内容的视频内容指定部分，当接收到视频内容时生成用于视频内容的缩略图的索引元素生成部分 响应于由视频内容指定部分指定了视频内容的事件，生成指示，并且在接收到取消指令时停止生成缩略图，索引元素生成请求部分，输出包含识别信息的识别信息的生成指令 指定视频内容到索引元素生成部分，以及消除指示部分，在已经指定的缩略图的生成完成之前指定新的视频内容时，输出取消指令以停止生成已经指定的视频内容的缩略图 视频内容

    Polishing apparatus and polishing method
    4.
    发明授权
    Polishing apparatus and polishing method 有权
    抛光设备和抛光方法

    公开(公告)号：US08986069B2

    公开(公告)日：2015-03-24

    申请号：US13459421

    申请日：2012-04-30

    申请人： Tamami Takahashi ,  Masaya Seki ,  Hiroaki Kusa ,  Kenji Yamaguchi ,  Masayuki Nakanishi

    发明人： Tamami Takahashi ,  Masaya Seki ,  Hiroaki Kusa ,  Kenji Yamaguchi ,  Masayuki Nakanishi

    IPC分类号： B24B9/00 ,  B24B1/00 ,  B24B21/00 ,  B24B9/06 ,  B24B37/04 ,  B24B37/30

    CPC分类号： B24B21/002 ,  B24B9/065 ,  B24B21/004 ,  B24B21/008 ,  B24B21/20 ,  B24B27/0076 ,  B24B37/042 ,  B24B37/30 ,  B24B41/068 ,  B24B49/00 ,  Y10T428/24777

    摘要： A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.

    摘要翻译： 抛光装置抛光基板的周边。 该抛光装置包括：旋转保持机构，被配置为水平地保持基板并旋转基板;设置在基板周围的多个抛光头组件;多个胶带供给和恢复机构，被配置为向多个抛光头组件提供研磨带，并回收抛光带 以及多个移动机构，其构造成沿着由旋转保持机构保持的基板的径向方向移动多个研磨头组件。 胶带供给和回收机构在基板的径向方向上位于多个研磨头组件的外侧，并且胶带供给和回收机构被固定就位。

    Polishing apparatus and polishing method
    5.
    发明授权
    Polishing apparatus and polishing method 有权
    抛光设备和抛光方法

    公开(公告)号：US08187055B2

    公开(公告)日：2012-05-29

    申请号：US12292662

    申请日：2008-11-24

    申请人： Tamami Takahashi ,  Masaya Seki ,  Hiroaki Kusa ,  Kenji Yamaguchi ,  Masayuki Nakanishi

    发明人： Tamami Takahashi ,  Masaya Seki ,  Hiroaki Kusa ,  Kenji Yamaguchi ,  Masayuki Nakanishi

    IPC分类号： B24B1/00 ,  B24B49/00

    CPC分类号： B24B21/002 ,  B24B9/065 ,  B24B21/004 ,  B24B21/008 ,  B24B21/20 ,  B24B27/0076 ,  B24B37/042 ,  B24B37/30 ,  B24B41/068 ,  B24B49/00 ,  Y10T428/24777

    摘要： A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.

    摘要翻译： 抛光装置抛光基板的周边。 该抛光装置包括：旋转保持机构，被配置为水平地保持基板并旋转基板;设置在基板周围的多个抛光头组件;多个胶带供给和恢复机构，被配置为向多个抛光头组件提供研磨带，并回收抛光带 以及多个移动机构，其构造成沿着由旋转保持机构保持的基板的径向方向移动多个研磨头组件。 胶带供给和回收机构在基板的径向方向上位于多个研磨头组件的外侧，并且胶带供给和回收机构被固定就位。

    Acidic zirconia sol and production method of the same
    6.
    发明授权
    Acidic zirconia sol and production method of the same 有权
    酸性氧化锆溶胶及其制备方法相同

    公开(公告)号：US07691910B2

    公开(公告)日：2010-04-06

    申请号：US11918134

    申请日：2006-04-11

    申请人： Yutaka Ohmori ,  Hirokazu Kato ,  Kenji Yamaguchi

    发明人： Yutaka Ohmori ,  Hirokazu Kato ,  Kenji Yamaguchi

    IPC分类号： C09K3/00

    CPC分类号： C01G25/02 ,  B82Y30/00 ,  C01P2004/64

    摘要： There is provided an acidic zirconia sol having compatibility of particle properties and binding properties, and a production method of the same.The present invention relates to a production method of an acidic zirconia sol containing zirconia particles having a particle diameter of less than 20 nm in a content of 10 to 50% by mass, based on the mass of all zirconia particles including: a first process in which an alkaline zirconia sol (A) and a zirconium salt (B) are mixed in a mass ratio (Bs/As) ranging from 0.2 to 5.0 of a mass of a solid content (Bs) which is converted into an amount of ZrO2 in the zirconium salt (B) to a mass of a solid content (As) which is converted into an amount of ZrO2 in the alkaline zirconia sol (A); and a second process in which the resultant mixture is reacted at 80 to 250° C. to produce an acidic zirconia sol.

    摘要翻译： 提供了具有颗粒性质和结合性质的相容性的酸性氧化锆溶胶及其制备方法。 本发明涉及以氧化锆粒子的质量计，含有10〜50质量％的粒径小于20nm的氧化锆粒子的酸性氧化锆溶胶的制造方法，其特征在于，包括： 将碱土金属氧化锆溶胶（A）和锆盐（B）以质量比（Bs / As）为0.2〜5.0，以固体成分（Bs）的质量比转化成ZrO 2的量 在碱性氧化锆溶胶（A）中将锆盐（B）转化为一定量的ZrO 2的固体成分（As）的质量; 和第二种方法，其中所得混合物在80-250℃反应生成酸性氧化锆溶胶。

    Process for Producing Elongated-Shaped Silica Sol
    7.
    发明申请
    Process for Producing Elongated-Shaped Silica Sol 审中-公开
    生产细长二氧化硅溶胶的方法

    公开(公告)号：US20100037801A1

    公开(公告)日：2010-02-18

    申请号：US12449214

    申请日：2007-02-01

    申请人： Yutaka Ohmori ,  Hirotomo Itou ,  Kenji Yamaguchi

    发明人： Yutaka Ohmori ,  Hirotomo Itou ,  Kenji Yamaguchi

    IPC分类号： C04B14/04

    CPC分类号： C01B33/1465 ,  B82Y30/00 ,  C01P2004/64 ,  C01P2006/10 ,  C01P2006/22 ,  C01P2006/40 ,  C09C1/3045

    摘要： There is provided a method for producing an elongated-shaped silica sol comprising the following steps: (a) adding an aqueous solution containing a water soluble Ca salt and/or Mg salt to an aqueous colloidal solution of active silicic acid with an SiO2 concentration of 1 to 6% by mass and a pH of 2 to 5 in a mass ratio of CaO and/or MgO to SiO2 in the active silicic acid of 1500 to 15,000 ppm, and mixing; (b) adding alkali metal hydroxide, a water soluble organic base, or water soluble silicate thereof to an aqueous solution obtained through (a) in a determined molar ratio to SiO2, and mixing; (c) heating a mixture obtained through (b) at 85 to 200° C. for 0.5 to 20 hours so as to obtain a colloidal solution; (d) removing, from the colloidal solution obtained through (c), part of water and at least part of anions derived from the aqueous solution containing the water soluble Ca salt and/or Mg salt; and (e) heating a colloidal solution obtained through (d) at a temperature of 80 to 195° C. that is lower than a heating temperature in (c) for 0.5 to 20 hours.

    摘要翻译： 提供了一种生产细长形硅溶胶的方法，包括以下步骤：（a）将含有水溶性Ca盐和/或Mg盐的水溶液加入到活性硅酸的水溶胶体溶液中，SiO 2浓度为 1〜6质量％，活性硅酸中CaO和/或MgO与SiO 2的质量比为1500〜15000ppm的pH为2〜5，混合; （b）将碱金属氢氧化物，水溶性有机碱或其水溶性硅酸盐添加到通过（a）以与SiO 2确定的摩尔比获得的水溶液中，并混合; （c）在85〜200℃下加热通过（b）得到的混合物0.5〜20小时，得到胶体溶液; （d）从通过（c）获得的胶体溶液中除去部分水和至少部分源自含有水溶性Ca盐和/或Mg盐的水溶液的阴离子; 和（e）将（d）得到的胶体溶液在（c）中的加热温度低于80〜195℃的温度下加热0.5〜20小时。

    Polishing apparatus and substrate processing apparatus
    8.
    发明申请
    Polishing apparatus and substrate processing apparatus 有权
    抛光装置和基板处理装置

    公开(公告)号：US20090117828A1

    公开(公告)日：2009-05-07

    申请号：US10581669

    申请日：2005-02-23

    申请人： Akihisa Hongo ,  Kenya Ito ,  Kenji Yamaguchi ,  Masayuki Nakanishi

    发明人： Akihisa Hongo ,  Kenya Ito ,  Kenji Yamaguchi ,  Masayuki Nakanishi

    IPC分类号： B24B49/04 ,  B24B1/04 ,  B24B49/12 ,  B24B9/02 ,  B24B57/02

    CPC分类号： B24B37/02 ,  B24B9/065 ,  B24B21/002

    摘要： The present invention relates to a polishing apparatus for removing surface roughness produced at a peripheral portion of a substrate, or for removing a film formed on a peripheral portion of a substrate. The polishing apparatus includes a housing (3) for forming a polishing chamber (2) therein, a rotational table (1) for holding and rotating a substrate (W), a polishing tape supply mechanism (6) for supplying a polishing tape (5) into the polishing chamber (2) and supplied to the polishing chamber (2), a polishing head (35) for pressing the polishing tape (5) against a bevel portion of the substrate (W), a liquid supply (50) for supplying a liquid to a front surface and a rear surface of the substrate (W), and a regulation mechanism (16) for making an internal pressure of the polishing chamber (2) being set to be lower than an external pressure of the polishing chamber (2).

    摘要翻译： 本发明涉及一种用于去除在基板的周边部分产生的表面粗糙度或用于去除形成在基板的周边部分上的膜的抛光装置。 抛光装置包括用于在其中形成研磨室（2）的壳体（3），用于保持和旋转基底（W）的旋转台（1），用于供应研磨带（5）的研磨带供给机构 ）到抛光室（2）中并供给到抛光室（2），用于将抛光带（5）压靠在基板（W）的斜面部分上的抛光头（35） 将液体供给到所述基板（W）的前表面和后表面;以及调节机构（16），用于使所述研磨室（2）的内部压力被设定为低于所述研磨室 （2）。

    Exposure head controller and image formation device
    10.
    发明申请
    Exposure head controller and image formation device 审中-公开
    曝光头控制器和图像形成装置

    公开(公告)号：US20060203310A1

    公开(公告)日：2006-09-14

    申请号：US11370382

    申请日：2006-03-02

    申请人： Kenji Yamaguchi ,  Mitsukazu Kurose ,  Nozomu Inoue ,  Ken Ikuma

    发明人： Kenji Yamaguchi ,  Mitsukazu Kurose ,  Nozomu Inoue ,  Ken Ikuma

    IPC分类号： G03F3/08

    CPC分类号： H04N1/40031 ,  H04N1/4015

    摘要： Provided is an exposure head controller for controlling a plurality of light-emitting elements arranged in a first direction and exposing a plurality of pixels, including: an exposure data generator for generating, based on pixel exposure data for exposing the respective pixels, a plurality of area exposure data for respectively exposing a plurality of areas in which the respective pixels are divided in a second direction intersecting with the first direction; and an exposure controller for exposing the plurality of pixels by controlling the plurality of light-emitting elements and exposing the plurality of areas based on the area exposure data.

    摘要翻译： 提供了一种用于控制沿第一方向布置的多个发光元件并暴露多个像素的曝光头控制器，包括：曝光数据发生器，用于基于用于曝光各个像素的像素曝光数据产生多个像素， 区域曝光数据，用于分别在与第一方向相交的第二方向上分别曝光各像素分割的多个区域; 以及曝光控制器，用于通过控制多个发光元件并基于区域曝光数据曝光多个区域来曝光多个像素。