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    LAMINATE, AND POLISHING MATERIAL AND GRINDING MATERIAL USING THE SAME, AND METHOD FOR PRODUCING THE LAMINATE
    1.
    发明申请
    LAMINATE, AND POLISHING MATERIAL AND GRINDING MATERIAL USING THE SAME, AND METHOD FOR PRODUCING THE LAMINATE 失效
    层压材料，抛光材料和使用其的研磨材料以及生产层压板的方法

    公开(公告)号：US20100092728A1

    公开(公告)日：2010-04-15

    申请号：US12445210

    申请日：2007-10-12

    申请人： Masataka Hasegawa ,  Kazuo Tsugawa ,  Masatou Ishihara ,  Yoshinori Koga

    发明人： Masataka Hasegawa ,  Kazuo Tsugawa ,  Masatou Ishihara ,  Yoshinori Koga

    IPC分类号： B24D3/00

    CPC分类号： B24D11/003 ,  B24B9/16 ,  B24D18/00 ,  C23C16/0254 ,  C23C16/26 ,  C23C30/00 ,  Y10T428/24372 ,  Y10T428/30

    摘要： The invention provides a laminate capable of polishing and grinding the surface of a material having a high hardness such as diamond, sapphire or hard carbon film, rapidly and in a simplified manner with high planarity and high accuracy, utilizing the high adhesiveness to substrates, the hardness and the surface planarity that a carbon film has, but using neither diamond abrasive grains nor alkali slurry. The laminate comprises a substrate and a carbon layer provided on the substrate, wherein the carbon layer comprises a diamond fine grain provided on the substrate and crushed by impact given thereto, a formation/growth inhibiting material that inhibits the formation of an impurity inhibiting the growth of a carbon grain and/or inhibits the growth of a carbon grain, and a carbon grain, and an amount (amount per unit volume) of the formation/growth inhibiting material decreases from a lower layer toward an upper layer on the substrate side. Preferably, the formation/growth inhibiting material is an SiO2 material or an Al2O3 material, and optionally an adhesiveness-reinforcing layer comprising titanium or a titanium alloy or the like may be provided between the substrate and the carbon layer.

    摘要翻译： 本发明提供了一种能够以高平坦度和高精度快速且简单地抛光和研磨具有高硬度的材料的表面的层压体，利用对基材的高粘附性， 硬度和碳膜具有的表面平面度，但不使用金刚石磨粒或碱浆。 层压体包括基材和设置在基材上的碳层，其中碳层包括设置在基材上的金刚石细晶粒并通过冲击赋予其破碎，抑制形成抑制生长的杂质的形成/生长抑制材料 的碳粒子和/或抑制碳粒的生长和碳粒子，并且，生成/生长抑制材料的量（每单位体积的量）从基材侧的下层向上层减少。 优选地，形成/生长抑制材料是SiO 2材料或Al 2 O 3材料，并且可以在基材和碳层之间设置任选的包含钛或钛合金等的粘合性增强层。

    Laminate and Method for Depositing Carbon Film
    2.
    发明申请
    Laminate and Method for Depositing Carbon Film 审中-公开
    层压板和沉积碳膜的方法

    公开(公告)号：US20090324892A1

    公开(公告)日：2009-12-31

    申请号：US12293370

    申请日：2007-03-15

    申请人： Masataka Hasegawa ,  Kazuo Tsugawa ,  Masatou Ishihara ,  Yoshinori Koga

    发明人： Masataka Hasegawa ,  Kazuo Tsugawa ,  Masatou Ishihara ,  Yoshinori Koga

    IPC分类号： B32B3/30 ,  B32B27/06 ,  H05H1/46

    CPC分类号： B32B9/04 ,  C23C16/0281 ,  C23C16/26 ,  Y10T428/24612 ,  Y10T428/269

    摘要： An object of the invention is to provide a resin material having further improved thermal conductivity, slidability, heat resistance, strength and rigidity of a resin material and having imparted thereto characteristics such as high thermal conductivity, rigidity, scratch prevention, high slidability and the like, and a method for producing the same. A laminate is obtained by laminating the resin material and a carbon film having a thermal conductivity of from 70 to 700 W/mK, a resistance value of 1×107 Ωcm or more (100° C.) and a film thickness of from 50 nm to 10 μm, the carbon film having a spectrum peak at a Brag's angle (2θ±0.3°) of from 41 to 42° in an X-ray diffraction spectrum by CuKα1 ray, or the laminate has a plasma-resistant film integrally molded on the resin material according to need. As a method for depositing a carbon film on the resin material, a method in which a reaction gas is used by mixing argon and/or hydrogen therewith, plasma is generated at a gas pressure of from 1 to 100 pascals, the substrate having provided thereon a plasma-resistant film is placed at a position that an electron temperature of plasma is from 0.5 to 3.0 eV, and radical species in the plasma are moved toward the substrate of the generation origin of the plasma such that the radical species almost uniformly reach on the surface of the substrate, is employed.

    摘要翻译： 本发明的目的是提供一种具有进一步提高树脂材料的导热性，滑动性，耐热性，强度和刚性的树脂材料，并赋予其特性，例如高导热性，刚性，防刮擦性，高滑动性等 ，及其制造方法。 通过层压树脂材料和导热率为70〜700W / mK，电阻值为1×10 7Ω·马克以上（100℃），膜厚为50nm〜10的碳膜， 在X射线衍射光谱中，通过CuKalpha1射线，具有41〜42°的布拉格角（2θ±0.3°）的光谱峰的碳膜或层叠体具有一体成型在树脂上的耐等离子体膜 材料根据需要。 作为在树脂材料上沉积碳膜的方法，通过将氩气和/或氢气混合使用反应气体的方法，在其上设置有1〜100帕斯卡的气体压力下产生等离子体 将等离子体膜放置在等离子体的电子温度为0.5〜3.0eV的位置，等离子体中的自由基向等离子体的产生原点的基底移动，使得自由基物质几乎均匀地达到 使用衬底的表面。

    CARBON FILM LAMINATE, METHOD OF MANUFACTURING SAID LAMINATE, AND LUBRICANT USING SAID LAMINATE
    3.
    发明申请
    CARBON FILM LAMINATE, METHOD OF MANUFACTURING SAID LAMINATE, AND LUBRICANT USING SAID LAMINATE 审中-公开
    碳膜层压板，制造层压板的方法和使用所述层压板的润滑剂

    公开(公告)号：US20140079910A1

    公开(公告)日：2014-03-20

    申请号：US14115447

    申请日：2012-05-10

    申请人： Kazuo Tsugawa ,  Shunsuke Kawaki ,  Masatou Ishihara ,  Yoshinori Koga ,  Masataka Hasegawa ,  Jaeho Kim

    发明人： Kazuo Tsugawa ,  Shunsuke Kawaki ,  Masatou Ishihara ,  Yoshinori Koga ,  Masataka Hasegawa ,  Jaeho Kim

    IPC分类号： C10M103/02 ,  C10M177/00

    CPC分类号： C10M103/02 ,  C10M103/06 ,  C10M177/00 ,  C10M2201/041 ,  C10M2201/042 ,  C10M2201/081 ,  C10M2201/102 ,  C10N2230/06 ,  C10N2240/10 ,  C10N2250/08 ,  C10N2250/10 ,  C10N2250/141 ,  C23C16/0272 ,  C23C16/26 ,  C23C16/511 ,  Y10T428/24355 ,  Y10T428/30

    摘要： An object of the invention is to provide a carbon film laminate having a sliding surface with low friction, low abrasion, and low counterpart aggressiveness using high adhesiveness to a base material, hardness, surface flatness, low counterpart aggressiveness, transparency, and high thermal conductivity which are provided to the carbon film without using liquid and semiliquid lubricants such as lubricating oil. Provided is a carbon film laminate including a base material, a carbon film adhesion reinforcing layer which is provided on the base material and which is formed from silicon oxide (SiOx, x=1 to 2) containing fluorine atoms (F) in a concentration of 1×1019 atoms/cm3 or more, and a carbon film that is formed on the carbon film adhesion reinforcing layer. The carbon film contains fluorine atoms in the film in a concentration of 1×1019 to 1×1021 atoms/cm3, and has an approximate spectrum curve obtained by superimposing, on a peak fitting curve A at a Bragg angle (2θ±0.5°) of 43.9° in an X-ray diffraction spectrum by CuKα1 rays, a peak fitting curve B at 41.7° and a baseline.

    摘要翻译： 本发明的目的是提供一种具有低摩擦滑动面，低磨损性和低对比度侵蚀性的碳膜层叠体，其使用对基材的高粘附性，硬度，表面平整度，低对应物侵蚀性，透明性和高导热性 其被提供给碳膜而不使用液体和半液体润滑剂如润滑油。 本发明提供一种碳膜层压体，其特征在于，包括基材，碳膜附着增强层，其设置在所述基材上，且由含有氟原子（F）的氧化硅（SiO x，x = 1〜2）形成，所述氧化硅的浓度为 1×10 19原子/ cm 3以上，以及形成在碳膜附着增强层上的碳膜。 该碳膜的浓度为1×1019〜1×1021原子/ cm3的膜中含有氟原子，并且具有通过在布拉格角（2θ=±0.5°）的峰值拟合曲线A上叠加而获得的近似光谱曲线 ）在CuKα1射线的X射线衍射光谱中为43.9°，峰值拟合曲线B为41.7°，基线为。

    CARBON FILM
    4.
    发明申请
    CARBON FILM 有权
    碳膜

    公开(公告)号：US20120199553A1

    公开(公告)日：2012-08-09

    申请号：US13183622

    申请日：2011-07-15

    申请人： Yoshinori Koga ,  Masataka Hasegawa ,  Sumio Iijima ,  Kazuo Tsugawa ,  Masatou Ishihara

    发明人： Yoshinori Koga ,  Masataka Hasegawa ,  Sumio Iijima ,  Kazuo Tsugawa ,  Masatou Ishihara

    IPC分类号： B44C1/22 ,  C23C16/50 ,  B82Y40/00

    CPC分类号： C23C16/26 ,  B24D11/003 ,  C03C17/007 ,  C03C17/22 ,  C03C2217/282 ,  C03C2217/42 ,  G02B1/105 ,  G02B1/14 ,  Y10T428/30

    摘要： ProblemTo provide a carbon film and a laminate having optical characteristics of retaining high transparency, having high refraction index and less double refractivity, being excellent in electric insulating property, being capable of being coated at good adhesion to various substrates, and being capable of being formed at a low temperature, and applications thereof.Means for Solving the ProblemThe invention relates to a carbon film which has an approximate spectrum curve obtainable by superimposing, on a peak fitting curve A at a Bragg's angle (2θ±0.3°) of 43.9°, a peak fitting curve B at 41.7° and a base line in an X-ray diffraction spectrum by a CuKa1 ray, and has a film thickness of from 2 mm to 100 μm. The intensity of the fitting curve B relative to the intensity of the fitting curve A is preferably from 5 to 90% in the approximated spectrum described above. In the carbon film, the Raman shift has a peak at a 1333±10 cm−1 in the Raman scattering spectrum, and the half-value width of the peak is from 10 to 40 cm−1. Further, the invention relates to a laminate characterized by disposing, on the substrate, a carbon aggregate film of 2 nm to 100 μm thickness comprising an aggregate of carbon particles having an approximate spectrum curve described above. Moreover, the invention relates to an optical device, optical glass, wrist watch, electronic circuit substrate, or grinding tool having the laminate described above.

    摘要翻译： 问题为了提供具有保持高透明度，高折射率和较低双折射率的光学特性的碳膜和层压板，具有优异的电绝缘性，能够以良好的粘合力涂覆在各种基板上，并且能够 在低温下形成，其应用。 解决问题的手段本发明涉及一种具有近似光谱曲线的碳膜，其可通过在布拉格角（2θ= 0.3°）为43.9°的峰值拟合曲线A上叠加峰值拟合曲线B，在41.7° °，通过CuKa1射线在X射线衍射光谱中为基线，膜厚为2mm〜100μm。 拟合曲线B相对于拟合曲线A的强度的强度在上述近似光谱中优选为5〜90％。 在碳膜中，在拉曼散射光谱中，拉曼位移在1333±10cm -1处具有峰值，峰值的半值宽度为10至40cm -1。 此外，本发明涉及一种层压体，其特征在于在基板上设置包括具有上述近似光谱曲线的碳粒子聚集体的2nm至100μm厚度的碳聚集体膜。 此外，本发明涉及具有上述层压体的光学装置，光学玻璃，手表，电子电路基板或研磨工具。

    Laminate, and polishing material and grinding material using the same, and method for producing the laminate
    6.
    发明授权
    Laminate, and polishing material and grinding material using the same, and method for producing the laminate 失效
    层压材料，使用其的研磨材料和研磨材料以及层压体的制造方法

    公开(公告)号：US08691364B2

    公开(公告)日：2014-04-08

    申请号：US12445210

    申请日：2007-10-12

    申请人： Masataka Hasegawa ,  Kazuo Tsugawa ,  Masatou Ishihara ,  Yoshinori Koga

    发明人： Masataka Hasegawa ,  Kazuo Tsugawa ,  Masatou Ishihara ,  Yoshinori Koga

    IPC分类号： B24D3/00

    CPC分类号： B24D11/003 ,  B24B9/16 ,  B24D18/00 ,  C23C16/0254 ,  C23C16/26 ,  C23C30/00 ,  Y10T428/24372 ,  Y10T428/30

    摘要： The invention provides a laminate capable of polishing and grinding the surface of a material having a high hardness such as diamond, sapphire or hard carbon film, rapidly and in a simplified manner with high planarity and high accuracy, utilizing the high adhesiveness to substrates, the hardness and the surface planarity that a carbon film has, but using neither diamond abrasive grains nor alkali slurry. The laminate comprises a substrate and a carbon layer provided on the substrate, wherein the carbon layer comprises a diamond fine grain provided on the substrate and crushed by impact given thereto, a formation/growth inhibiting material that inhibits the formation of an impurity inhibiting the growth of a carbon grain and/or inhibits the growth of a carbon grain, and a carbon grain, and an amount (amount per unit volume) of the formation/growth inhibiting material decreases from a lower layer toward an upper layer on the substrate side. Preferably, the formation/growth inhibiting material is an SiO2 material or an Al2O3 material, and optionally an adhesiveness-reinforcing layer comprising titanium or a titanium alloy or the like may be provided between the substrate and the carbon layer.

    摘要翻译： 本发明提供了一种能够以高平坦度和高精度快速且简单地抛光和研磨具有高硬度的材料的表面的层压体，利用对基材的高粘附性， 硬度和碳膜具有的表面平面度，但不使用金刚石磨粒或碱浆。 层压体包括基材和设置在基材上的碳层，其中碳层包括设置在基材上的金刚石细晶粒并通过冲击赋予其破碎，抑制形成抑制生长的杂质的形成/生长抑制材料 的碳粒子和/或抑制碳粒的生长和碳粒子，并且，生成/生长抑制材料的量（每单位体积的量）从基材侧的下层向上层减少。 优选地，形成/生长抑制材料是SiO 2材料或Al 2 O 3材料，并且可以在基材和碳层之间设置任选的包含钛或钛合金等的粘合性增强层。

    METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE CARBON FILM, AND TRANSPARENT CONDUCTIVE CARBON FILM
    10.
    发明申请
    METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE CARBON FILM, AND TRANSPARENT CONDUCTIVE CARBON FILM 审中-公开
    透明导电碳膜的生产方法和透明导电碳膜

    公开(公告)号：US20130052119A1

    公开(公告)日：2013-02-28

    申请号：US13581361

    申请日：2011-03-17

    申请人： Jaeho Kim ,  Masatou Ishihara ,  Yoshinori Koga ,  Kazuo Tsugawa ,  Masataka Hasegawa ,  Sumio Iijima ,  Takatoshi Yamada

    发明人： Jaeho Kim ,  Masatou Ishihara ,  Yoshinori Koga ,  Kazuo Tsugawa ,  Masataka Hasegawa ,  Sumio Iijima ,  Takatoshi Yamada

    IPC分类号： C23C16/511 ,  C01B31/00

    CPC分类号： C23C16/511 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/188 ,  C23C16/26 ,  C23C16/545 ,  H01B1/04

    摘要： An object of the present invention is to solve problems such as high temperature processing and long processing time, which are issues of formation of a graphene film by thermal CVD, thereby providing a technique of forming a transparent conductive carbon film using a crystalline carbon film formed at lower temperature within a short time using a graphene film, and the method of the present invention is characterized by setting the temperature of a base material to 500° C. or lower and the pressure to 50 Pa or less, and also depositing a transparent conductive carbon film on a surface of a base material by a microwave surface-wave plasma CVD method in a gas atmosphere in which an oxidation inhibitor as an additive gas for suppressing oxidation of the surface of the base material is added to a carbon-containing gas or a mixed a carbon-containing gas and an inert gas.

    摘要翻译： 本发明的目的是解决通过热CVD形成石墨烯膜的问题，例如高温处理和长处理时间等问题，从而提供使用形成的结晶性碳膜形成透明导电性碳膜的技术 使用石墨烯膜在短时间内在较低的温度下进行，本发明的方法的特征在于将基材的温度设定在500℃以下，将压力设定为50Pa以下，并且还沉积透明 通过微波表面波等离子体CVD法在基体材料的表面上形成导电性碳膜，在气体气氛中，将作为用于抑制基材表面的氧化的添加气体的氧化抑制剂添加到含碳气体中 或混合的含碳气体和惰性气体。