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    CARBON FILM
    1.
    发明申请
    CARBON FILM 有权
    碳膜

    公开(公告)号：US20120199553A1

    公开(公告)日：2012-08-09

    申请号：US13183622

    申请日：2011-07-15

    申请人： Yoshinori Koga ,  Masataka Hasegawa ,  Sumio Iijima ,  Kazuo Tsugawa ,  Masatou Ishihara

    发明人： Yoshinori Koga ,  Masataka Hasegawa ,  Sumio Iijima ,  Kazuo Tsugawa ,  Masatou Ishihara

    IPC分类号： B44C1/22 ,  C23C16/50 ,  B82Y40/00

    CPC分类号： C23C16/26 ,  B24D11/003 ,  C03C17/007 ,  C03C17/22 ,  C03C2217/282 ,  C03C2217/42 ,  G02B1/105 ,  G02B1/14 ,  Y10T428/30

    摘要： ProblemTo provide a carbon film and a laminate having optical characteristics of retaining high transparency, having high refraction index and less double refractivity, being excellent in electric insulating property, being capable of being coated at good adhesion to various substrates, and being capable of being formed at a low temperature, and applications thereof.Means for Solving the ProblemThe invention relates to a carbon film which has an approximate spectrum curve obtainable by superimposing, on a peak fitting curve A at a Bragg's angle (2θ±0.3°) of 43.9°, a peak fitting curve B at 41.7° and a base line in an X-ray diffraction spectrum by a CuKa1 ray, and has a film thickness of from 2 mm to 100 μm. The intensity of the fitting curve B relative to the intensity of the fitting curve A is preferably from 5 to 90% in the approximated spectrum described above. In the carbon film, the Raman shift has a peak at a 1333±10 cm−1 in the Raman scattering spectrum, and the half-value width of the peak is from 10 to 40 cm−1. Further, the invention relates to a laminate characterized by disposing, on the substrate, a carbon aggregate film of 2 nm to 100 μm thickness comprising an aggregate of carbon particles having an approximate spectrum curve described above. Moreover, the invention relates to an optical device, optical glass, wrist watch, electronic circuit substrate, or grinding tool having the laminate described above.

    摘要翻译： 问题为了提供具有保持高透明度，高折射率和较低双折射率的光学特性的碳膜和层压板，具有优异的电绝缘性，能够以良好的粘合力涂覆在各种基板上，并且能够 在低温下形成，其应用。 解决问题的手段本发明涉及一种具有近似光谱曲线的碳膜，其可通过在布拉格角（2θ= 0.3°）为43.9°的峰值拟合曲线A上叠加峰值拟合曲线B，在41.7° °，通过CuKa1射线在X射线衍射光谱中为基线，膜厚为2mm〜100μm。 拟合曲线B相对于拟合曲线A的强度的强度在上述近似光谱中优选为5〜90％。 在碳膜中，在拉曼散射光谱中，拉曼位移在1333±10cm -1处具有峰值，峰值的半值宽度为10至40cm -1。 此外，本发明涉及一种层压体，其特征在于在基板上设置包括具有上述近似光谱曲线的碳粒子聚集体的2nm至100μm厚度的碳聚集体膜。 此外，本发明涉及具有上述层压体的光学装置，光学玻璃，手表，电子电路基板或研磨工具。

    METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE CARBON FILM, AND TRANSPARENT CONDUCTIVE CARBON FILM
    6.
    发明申请
    METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE CARBON FILM, AND TRANSPARENT CONDUCTIVE CARBON FILM 审中-公开
    透明导电碳膜的生产方法和透明导电碳膜

    公开(公告)号：US20130052119A1

    公开(公告)日：2013-02-28

    申请号：US13581361

    申请日：2011-03-17

    申请人： Jaeho Kim ,  Masatou Ishihara ,  Yoshinori Koga ,  Kazuo Tsugawa ,  Masataka Hasegawa ,  Sumio Iijima ,  Takatoshi Yamada

    发明人： Jaeho Kim ,  Masatou Ishihara ,  Yoshinori Koga ,  Kazuo Tsugawa ,  Masataka Hasegawa ,  Sumio Iijima ,  Takatoshi Yamada

    IPC分类号： C23C16/511 ,  C01B31/00

    CPC分类号： C23C16/511 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/188 ,  C23C16/26 ,  C23C16/545 ,  H01B1/04

    摘要： An object of the present invention is to solve problems such as high temperature processing and long processing time, which are issues of formation of a graphene film by thermal CVD, thereby providing a technique of forming a transparent conductive carbon film using a crystalline carbon film formed at lower temperature within a short time using a graphene film, and the method of the present invention is characterized by setting the temperature of a base material to 500° C. or lower and the pressure to 50 Pa or less, and also depositing a transparent conductive carbon film on a surface of a base material by a microwave surface-wave plasma CVD method in a gas atmosphere in which an oxidation inhibitor as an additive gas for suppressing oxidation of the surface of the base material is added to a carbon-containing gas or a mixed a carbon-containing gas and an inert gas.

    摘要翻译： 本发明的目的是解决通过热CVD形成石墨烯膜的问题，例如高温处理和长处理时间等问题，从而提供使用形成的结晶性碳膜形成透明导电性碳膜的技术 使用石墨烯膜在短时间内在较低的温度下进行，本发明的方法的特征在于将基材的温度设定在500℃以下，将压力设定为50Pa以下，并且还沉积透明 通过微波表面波等离子体CVD法在基体材料的表面上形成导电性碳膜，在气体气氛中，将作为用于抑制基材表面的氧化的添加气体的氧化抑制剂添加到含碳气体中 或混合的含碳气体和惰性气体。

    CARBON FILM
    7.
    发明申请
    CARBON FILM 审中-公开
    碳膜

    公开(公告)号：US20090226718A1

    公开(公告)日：2009-09-10

    申请号：US11994587

    申请日：2006-07-04

    申请人： Masataka Hasegawa ,  Kazuo Tsugawa ,  Yoshinori Koga ,  Masatou Ishihara ,  Sumio Iijima

    发明人： Masataka Hasegawa ,  Kazuo Tsugawa ,  Yoshinori Koga ,  Masatou Ishihara ,  Sumio Iijima

    IPC分类号： B32B27/04 ,  C23C16/26

    CPC分类号： C23C16/26 ,  C03C17/007 ,  C03C17/3411 ,  C03C2217/42 ,  C03C2218/153 ,  C23C16/0272 ,  C23C16/27 ,  C23C16/277 ,  C23C16/279 ,  C23C16/511 ,  G04B39/006 ,  Y10T428/268 ,  Y10T428/269

    摘要： A carbon film including: carbon grains having substantially the same grain size in the range of 1 nm to 1,000 nm, and preferably in the range of 2 nm to 200 nm, in the thickness-wise direction of the carbon film; and an amorphous substance for suppressing generation of impurities accompanied by formation of the carbon grains and/or for suppressing growth of said carbon grains, the amorphous substance existing at least on the surfaces of the carbon grains in a grain boundary between the carbon grains and/or gaps between the carbon grains. Such a carbon film has excellent optical properties such as high transparency, a high refractive index and small birefringence, and exhibits excellent electrical insulation. Further, the carbon film can be coated on various substrates with high adhesion and can be formed at a low temperature. Therefore, the carbon film is extremely useful for application to an optical device, a wrist watch, an electronic circuit substrate, a grinding tool or a protection film.

    摘要翻译： 一种碳膜，包括：在碳膜的厚度方向上具有在1nm至1000nm范围内，优选在2nm至200nm范围内的基本相同晶粒尺寸的碳颗粒; 以及用于抑制伴随形成碳粒子的杂质的产生和/或用于抑制所述碳粒子生长的无定形物质，所述无定形物质至少存在于所述碳粒子之间的晶界中的所述碳粒子表面和/ 或碳粒之间的间隙。 这种碳膜具有优异的光学性能，例如高透明度，高折射率和小双折射，并且表现出优异的电绝缘性。 此外，碳膜可以以高粘合力涂布在各种基材上，并且可以在低温下形成。 因此，碳膜对于应用于光学装置，手表，电子电路基板，研磨工具或保护膜是非常有用的。

    Carbon film
    8.
    发明申请
    Carbon film 有权
    碳膜

    公开(公告)号：US20070172660A1

    公开(公告)日：2007-07-26

    申请号：US11578660

    申请日：2005-04-15

    申请人： Yoshinori Koga ,  Masataka Hasegawa ,  Sumio Iijima ,  Kazuo Tsugawa ,  Masatou Ishihara

    发明人： Yoshinori Koga ,  Masataka Hasegawa ,  Sumio Iijima ,  Kazuo Tsugawa ,  Masatou Ishihara

    IPC分类号： B32B9/00

    CPC分类号： C23C16/26 ,  B24D11/003 ,  C03C17/007 ,  C03C17/22 ,  C03C2217/282 ,  C03C2217/42 ,  G02B1/105 ,  G02B1/14 ,  Y10T428/30

    摘要： Problem To provide a carbon film and a laminate having optical characteristics of retaining high transparency, having high refraction index and less double refractivity, being excellent in electric insulating property, being capable of being coated at good adhesion to various substrates, and being capable of being formed at a low temperature, and applications thereof. Means for Solving the Problem The invention relates to a carbon film which has an approximate spectrum curve obtainable by superimposing, on a peak fitting curve A at a Bragg's angle (2θ±0.3°) of 43.9°, a peak fitting curve B at 41.7° and a base line in an X-ray diffraction spectrum by a CuKa1 ray, and has a film thickness of from 2 mm to 100 μm. The intensity of the fitting curve B relative to the intensity of the fitting curve A is preferably from 5 to 90% in the approximated spectrum described above. In the carbon film, the Raman shift has a peak at a 1333±10 cm−1 in the Raman scattering spectrum, and the half-value width of the peak is from 10 to 40 cm−1. Further, the invention relates to a laminate characterized by disposing, on the substrate, a carbon aggregate film of 2 nm to 100 μm thickness comprising an aggregate of carbon particles having an approximate spectrum curve described above. Moreover, the invention relates to an optical device, optical glass, wrist watch, electronic circuit substrate, or grinding tool having the laminate described above.

    摘要翻译： 问题为了提供具有保持高透明度，高折射率和较低双折射率的光学特性的碳膜和层压板，具有优异的电绝缘性，能够以良好的粘合力涂覆在各种基板上，并且能够 在低温下形成，其应用。 解决问题的手段本发明涉及一种碳膜，其具有通过在布拉格角（2θ±0.3°）为43.9°的峰值拟合曲线A上以41.7°的峰值拟合曲线B叠加而获得的近似光谱曲线 和通过CuKa 1 X射线在X射线衍射光谱中的基线，并且具有2mm至100μm的膜厚度。 拟合曲线B相对于拟合曲线A的强度的强度在上述近似光谱中优选为5〜90％。 在碳膜中，拉曼位移在拉曼散射光谱中的1333±10cm -1处具有峰值，峰的半值宽度为10至40cm -1， -1 。 此外，本发明涉及一种层压体，其特征在于在基材上设置包含具有上述近似光谱曲线的碳颗粒聚集体的2nm至100μm厚度的碳聚集体膜。 此外，本发明涉及具有上述层压体的光学装置，光学玻璃，手表，电子电路基板或研磨工具。