摘要:
According to one embodiment, a method for producing an imprint mold includes forming, on a substrate, a plurality of guides including a first wall surface and a second wall surface, wherein an angle between at least one of the first and second wall surfaces and an exposed substrate surface is 131° or less, applying a self-assembling material, which forms a sphere when phase-separated, to a guide groove area defined by the first wall surface, the second wall surface and the substrate surface, and self-assembling the self-assembling material to form a dot pattern, etching the substrate by using the dot pattern as a mask to transfer the dot pattern and forming an imprint mold by using the substrate with the dot pattern transferred as a master mold.
摘要:
According to one embodiment, a servo area of a magnetic recording medium includes magnetic dots arrayed at a period L0. The magnetic dots include a plurality of magnetic dot regions divided in the cross track direction. A width Wm in the down track direction of the mth magnetic dot region from the innermost circumference and a number Nm of dot rows in the down track direction of the mth region meet a relationship represented by L0{Nm√3/2−0.3}≦Wm≦L0{Nm√3/2+0.3} (1).
摘要:
According to one embodiment, an imprinting method includes applying a resist to a substrate, imprinting a stamper on which protruded patterns are formed against the resist applied to the substrate, forcing a distal end of a peeling wedge into a part between the substrate and the stamper, and introducing a gas between the substrate and the stamper to peel off the stamper from the substrate, in which a gap between the substrate and the stamper is made larger than a thickness of the resist at a part into which the distal end of the peeling wedge is forced.
摘要:
According to one embodiment, a resin imprint stamper formed of a resin material in an annular shape having a through-hole in a central part thereof, including a pattern area formed on a part of a surface thereof in which a plurality of lands and grooves are circumferentially arranged with a track pitch of 100 nm or less, and the pattern height of at most 100 nm, wherein no protrusion and step having a height exceeding 10 μm from a top surface of the pattern area are present in a region less than 3 mm from an end of the pattern area toward an inner periphery thereof.
摘要:
According to one embodiment, a magnetic recording medium includes protruded magnetic patterns formed on a substrate, and a non-magnetic material filled in recesses between the magnetic patterns and made of a multi-element amorphous alloy containing Ni or Cu, and two or more metals selected from the group consisting of Ta, Nb, Ti, Zr, Hf, Cr, Mo and Ag.
摘要:
According to one embodiment, there is provided a stamper holder which holds a disk-shape metal stamper for molding having a center hole with an inner diameter of 17.5 mm or less and formed with patterns of protrusions and recesses for a recording medium on a surface in a state that the stamper holder is fixed to a first die having a center hole, in which the stamper holder has an approximately cylindrical shape so as to be inserted into the center hole of the first die and comprises a flange provided at one end configured to hold an inner peripheral portion of the stamper surface near the center hole, and an outer diameter of the flange is 17.6 mm or less.
摘要:
According to one embodiment, a substrate for a magnetic recording media has circumferential protrusions corresponding to recording tracks and circumferential recesses corresponding to grooves between the recording tracks, in which the substrate satisfying at least one of conditions of (a) a surface of the recess has a surface energy smaller than that of the protrusion, (b) the surface of the recess is modified with a thermally decomposable or deformable substance, (c) the surface of the recess has surface roughness smaller than that of the protrusion, (d) crystal orientation is more disturbed on the surface of the recess than on the protrusion, (e) the surface of the recess is modified with a substance that causes reaction with a magnetic material or that diffuses into the magnetic material, and (f) the surface of the recess is modified with a substance soluble in a solvent or with a deformable substance.
摘要:
According to one embodiment, a substrate for a magnetic recording media has circumferential protrusions corresponding to recording tracks and circumferential recesses corresponding to grooves between the recording tracks, in which the substrate satisfying at least one of conditions of (a) a surface of the recess has a surface energy smaller than that of the protrusion, (b) the surface of the recess is modified with a thermally decomposable or deformable substance, (c) the surface of the recess has surface roughness smaller than that of the protrusion, (d) crystal orientation is more disturbed on the surface of the recess than on the protrusion, (e) the surface of the recess is modified with a substance that causes reaction with a magnetic material or that diffuses into the magnetic material, and (f) the surface of the recess is modified with a substance soluble in a solvent or with a deformable substance.
摘要:
A method of manufacturing a patterned magnetic recording medium includes coating a magnetic film with a resist which is decomposed by exposure to electromagnetic radiation or an electron beam to have a low molecular weight, forming a pattern on the resist by an imprinting method, transferring the pattern to the magnetic film by using the resist having the pattern formed thereon as a mask, and removing the resist by exposing the resist to the electromagnetic radiation or the electron beam.
摘要:
A hard coating for a cutting tool being highly resistant to both wear and seizure; and a cutting tool coated with the hard coating. This hard coating is a multilayer film including two or more of the following layered in alternation: first coating layers including AgaCu1-a; and second coating layers including a nitride, oxide, carbide, carbonitride, or boride containing at least one element selected from among group IVA, VA, and VIA elements, aluminum, and silicon. Since the atomic proportion for the first coating layers is between 0.2 and 0.4, inclusive, the layering pitch of the first and second coating layers is between 0.2 and 100 nm, inclusive, and the total thickness is between 0.2 and 10.0 μm, inclusive, the coefficient of friction and cutting resistance can be reduced by the inclusion of silver in the coating, and provide a hard coating that exhibits superb lubricity and resistance to seizure.